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Henry Gerung
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Jawa Timur, ID
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last 30 patents
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Patent Grant
Method for forming an extended metal gate using a damascene process
Patent number
6,387,765
Issue date
May 14, 2002
Chartered Semiconductor Manufacturing Ltd.
Vijai Kumar Chhagan
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method for forming an extended metal gate using a damascene process
Patent number
6,303,447
Issue date
Oct 16, 2001
Chartered Semiconductor Manufacturing Ltd.
Vijai Komar Chhagan
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method to reduce trench cone formation in the fabrication of shallo...
Patent number
6,281,093
Issue date
Aug 28, 2001
Chartered Semiconductor Manufacturing Ltd.
Yelehanka Ramachandramurthy Pradeep
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of shallow trench isolation
Patent number
5,930,646
Issue date
Jul 27, 1999
Chartered Semiconductor Manufacturing, Ltd.
Henry Gerung
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
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Patent Application
Method for forming an extended metal gate using a damascene process
Publication number
20020006715
Publication date
Jan 17, 2002
Chartered Semiconductor Manufacturing Ltd.
Vijai Komar Chhagan
H01 - BASIC ELECTRIC ELEMENTS