Herve A. Besaucele

Person

San Diego, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Laser gas injection system
- Patent number 7,835,414
- Issue date Nov 16, 2010
- Cymer, Inc.
- Wayne J. Dunstan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi-chambered excimer or molecular fluorine gas discharge laser f...
- Patent number 7,741,639
- Issue date Jun 22, 2010
- Cymer, Inc.
- Herve A. Besaucele
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Very narrow band, two chamber, high rep-rate gas discharge laser sy...
- Patent number 7,567,607
- Issue date Jul 28, 2009
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Grant
Gas discharge laser output light beam parameter control
- Patent number 7,471,708
- Issue date Dec 30, 2008
- Cymer, Inc.
- Herve A. Besaucele
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Line selected F2 two chamber laser system
- Patent number 7,218,661
- Issue date May 15, 2007
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Grant
Very narrow band, two chamber, high rep-rate gas discharge laser sy...
- Patent number 7,061,961
- Issue date Jun 13, 2006
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Grant
Line selected F2 two chamber laser system
- Patent number 7,058,107
- Issue date Jun 6, 2006
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Grant
Very narrow band, two chamber, high reprate gas discharge laser system
- Patent number 6,985,508
- Issue date Jan 10, 2006
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Grant
Line selected F2 two chamber laser system
- Patent number 6,801,560
- Issue date Oct 5, 2004
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Grant
Lithography laser with beam delivery and beam pointing control
- Patent number 6,704,339
- Issue date Mar 9, 2004
- Cymer, Inc.
- Leonard Lublin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Very narrow band, two chamber, high rep rate gas discharge laser sy...
- Patent number 6,625,191
- Issue date Sep 23, 2003
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Grant
Very narrow band, two chamber, high rep rate gas discharge laser sy...
- Patent number 6,567,450
- Issue date May 20, 2003
- Cymer, Inc.
- David W. Myers
- G01 - MEASURING TESTING
Information Patent Grant
ArF laser with low pulse energy and high rep rate
- Patent number 6,553,049
- Issue date Apr 22, 2003
- Cymer, Inc.
- Herve A. Besaucele
- G01 - MEASURING TESTING
Information Patent Grant
Reliable, modular, production quality narrow-band high rep rate F2...
- Patent number RE38054
- Issue date Apr 1, 2003
- Cymer, Inc.
- Thomas Hofmann
- 372 - Coherent light generators
Information Patent Grant
Reliable, modular, production quality narrow-band high rep rate ArF...
- Patent number 6,330,261
- Issue date Dec 11, 2001
- Cymer, Inc.
- Toshihiko Ishihara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Narrow band gas discharge laser with gas additive
- Patent number 6,188,710
- Issue date Feb 13, 2001
- Cymer, Inc.
- Herve A. Besaucele
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reliable modular production quality narrow-band high REP rate excim...
- Patent number 6,128,323
- Issue date Oct 3, 2000
- Cymer, Inc.
- David W. Myers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Laser-illuminated stepper or scanner with energy sensor feedback
- Patent number 6,067,306
- Issue date May 23, 2000
- Cymer, Inc.
- Richard L. Sandstrom
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reliable, modular, production quality narrow-band high rep rate F.s...
- Patent number 6,018,537
- Issue date Jan 25, 2000
- Cymer, Inc.
- Thomas Hofmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pulse energy control for excimer laser
- Patent number 6,005,879
- Issue date Dec 21, 1999
- Cymer, Inc.
- Richard L. Sandstrom
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reliable. modular, production quality narrow-band KRF excimer laser
- Patent number 5,991,324
- Issue date Nov 23, 1999
- Cymer, Inc.
- David S. Knowles
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Laser chamber with minimized acoustic and shock wave disturbances
- Patent number 5,978,405
- Issue date Nov 2, 1999
- Cymer, Inc.
- Tibor Juhasz
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Laser gas injection system
- Publication number 20080205472
- Publication date Aug 28, 2008
- Cymer, Inc.
- Wayne J. Dunstan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Gas discharge laser output light beam parameter control
- Publication number 20060227839
- Publication date Oct 12, 2006
- Cymer, Inc.
- Herve A. Besaucele
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Very narrow band, two chamber, high rep-rate gas discharge laser sy...
- Publication number 20060126697
- Publication date Jun 15, 2006
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Application
VERY NARROW BAND, TWO CHAMBER, HIGH REP-RATE GAS DISCHARGE LASER SY...
- Publication number 20050271109
- Publication date Dec 8, 2005
- Cymer, Inc.
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Application
Multi-chambered excimer or molecular fluorine gas discharge laser f...
- Publication number 20050094698
- Publication date May 5, 2005
- Herve A. Besaucele
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Line selected F2 two chamber laser system
- Publication number 20040258122
- Publication date Dec 23, 2004
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Application
Line selected F2 two chamber laser system
- Publication number 20040174919
- Publication date Sep 9, 2004
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Application
Very narrow band, two chamber, high reprate gas discharge laser system
- Publication number 20040047385
- Publication date Mar 11, 2004
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Application
Lithography laser with beam delivery and beam pointing control
- Publication number 20030043876
- Publication date Mar 6, 2003
- Leonard Lublin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Very narrow band, two chamber, high rep rate gas discharge laser sy...
- Publication number 20020154668
- Publication date Oct 24, 2002
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Application
Line selected F2 two chamber laser system
- Publication number 20020154671
- Publication date Oct 24, 2002
- David S. Knowles
- G01 - MEASURING TESTING
Information Patent Application
Very narrow band, two chamber, high rep rate gas discharge laser sy...
- Publication number 20020044586
- Publication date Apr 18, 2002
- David W. Myers
- G01 - MEASURING TESTING

Herve A. Besaucele

Person

Patents Grantslast 30 patents

Laser gas injection system

Multi-chambered excimer or molecular fluorine gas discharge laser f...

Very narrow band, two chamber, high rep-rate gas discharge laser sy...

Gas discharge laser output light beam parameter control

Line selected F2 two chamber laser system

Very narrow band, two chamber, high rep-rate gas discharge laser sy...

Line selected F2 two chamber laser system

Very narrow band, two chamber, high reprate gas discharge laser system

Line selected F2 two chamber laser system

Lithography laser with beam delivery and beam pointing control

Very narrow band, two chamber, high rep rate gas discharge laser sy...

Very narrow band, two chamber, high rep rate gas discharge laser sy...

ArF laser with low pulse energy and high rep rate

Reliable, modular, production quality narrow-band high rep rate F2...

Reliable, modular, production quality narrow-band high rep rate ArF...

Narrow band gas discharge laser with gas additive

Reliable modular production quality narrow-band high REP rate excim...

Laser-illuminated stepper or scanner with energy sensor feedback

Reliable, modular, production quality narrow-band high rep rate F.s...

Pulse energy control for excimer laser

Reliable. modular, production quality narrow-band KRF excimer laser

Laser chamber with minimized acoustic and shock wave disturbances

Patents Applicationslast 30 patents

Laser gas injection system

Gas discharge laser output light beam parameter control

Very narrow band, two chamber, high rep-rate gas discharge laser sy...

VERY NARROW BAND, TWO CHAMBER, HIGH REP-RATE GAS DISCHARGE LASER SY...

Multi-chambered excimer or molecular fluorine gas discharge laser f...

Line selected F2 two chamber laser system

Line selected F2 two chamber laser system

Very narrow band, two chamber, high reprate gas discharge laser system

Lithography laser with beam delivery and beam pointing control

Very narrow band, two chamber, high rep rate gas discharge laser sy...

Line selected F2 two chamber laser system

Very narrow band, two chamber, high rep rate gas discharge laser sy...