Hessel Sprey

Person

Leuven, BE

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate rack and a substrate processing system and method
- Patent number 11,088,002
- Issue date Aug 10, 2021
- ASM IP Holding B.V.
- Dieter Pierreux
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atomic layer deposition of antimony oxide films
- Patent number 10,699,899
- Issue date Jun 30, 2020
- ASM International N.V.
- Raija H. Matero
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atomic layer deposition of antimony oxide films
- Patent number 10,056,249
- Issue date Aug 21, 2018
- ASM International N.V.
- Raija H. Matero
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cyclic aluminum nitride deposition in a batch reactor
- Patent number 9,552,979
- Issue date Jan 24, 2017
- ASM IP Holding B.V.
- Werner Knaepen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atomic layer deposition of antimony oxide films
- Patent number 9,514,934
- Issue date Dec 6, 2016
- ASM International N.V.
- Raija H. Matero
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer deposition of antimony oxide films
- Patent number 9,006,112
- Issue date Apr 14, 2015
- ASM International N.V.
- Raija H. Matero
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin films
- Patent number 7,981,791
- Issue date Jul 19, 2011
- ASM International N.V.
- Suvi P. Haukka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Liner materials and related processes for 3-D integration
- Patent number 7,884,016
- Issue date Feb 8, 2011
- ASM International, NV.
- Hessel Sprey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma pre-treating surfaces for atomic layer deposition
- Patent number 7,498,242
- Issue date Mar 3, 2009
- ASM America, Inc.
- Devendra Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thin films
- Patent number 7,419,903
- Issue date Sep 2, 2008
- ASM International N.V.
- Suvi P. Haukka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and installation for etching a substrate
- Patent number 6,884,317
- Issue date Apr 26, 2005
- ASM International, N.V.
- Hessel Sprey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In situ reduction of copper oxide prior to silicon carbide deposition
- Patent number 6,878,628
- Issue date Apr 12, 2005
- ASM International NV
- Auguste J. L. Sophie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sealing porous structures
- Patent number 6,759,325
- Issue date Jul 6, 2004
- ASM Microchemistry OY
- Ivo Raaijmakers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for growing thin silicon oxides on a silicon substrate using...
- Patent number 6,387,827
- Issue date May 14, 2002
- Imec (vzw)
- Paul Mertens
- C30 - CRYSTAL GROWTH

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF DEPOSITING MATERIAL AND SEMICONDUCTOR DEVICES
- Publication number 20220384197
- Publication date Dec 1, 2022
- ASM IP HOLDING B.V.
- Johanna Henrica Deijkers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE RACK AND A SUBSTRATE PROCESSING SYSTEM AND METHOD
- Publication number 20190304821
- Publication date Oct 3, 2019
- ASM IP HOLDING B.V.
- Dieter Pierreux
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ATOMIC LAYER DEPOSITION OF ANTIMONY OXIDE FILMS
- Publication number 20190103266
- Publication date Apr 4, 2019
- ASM INTERNATIONAL N.V.
- Raija H. Matero
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ATOMIC LAYER DEPOSITION OF ANTIMONY OXIDE FILMS
- Publication number 20170140918
- Publication date May 18, 2017
- ASM INTERNATIONAL N.V.
- Raija H. Matero
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER DEPOSITION OF ANTIMONY OXIDE FILMS
- Publication number 20150249005
- Publication date Sep 3, 2015
- ASM International, N.V.
- RAIJA H. MATERO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CYCLIC ALUMINUM NITRIDE DEPOSITION IN A BATCH REACTOR
- Publication number 20140357090
- Publication date Dec 4, 2014
- Werner Knaepen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ATOMIC LAYER DEPOSITION OF ANTIMONY OXIDE FILMS
- Publication number 20130095664
- Publication date Apr 18, 2013
- ASM INTERNATIONAL N.V.
- Raija H. Matero
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILMS
- Publication number 20110256718
- Publication date Oct 20, 2011
- ASM INTERNATIONAL N.V.
- Suvi P. Haukka
- C30 - CRYSTAL GROWTH
Information Patent Application
LINER MATERIALS AND RELATED PROCESSES FOR 3-D INTEGRATION
- Publication number 20100200989
- Publication date Aug 12, 2010
- ASM International, N.V.
- Hessel Sprey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CYCLICAL OXIDATION PROCESS
- Publication number 20090269939
- Publication date Oct 29, 2009
- ASM International, N.V.
- Hessel Sprey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
THIN FILMS
- Publication number 20090068832
- Publication date Mar 12, 2009
- ASM INTERNATIONAL N.V.
- Suvi P. Haukka
- C30 - CRYSTAL GROWTH
Information Patent Application
PROCESS OF FILLING DEEP VIAS FOR 3-D INTEGRATION OF SUBSTRATES
- Publication number 20080242078
- Publication date Oct 2, 2008
- ASM NUTOOL, INC.
- Hessel Sprey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma pre-treating surfaces for atomic layer deposition
- Publication number 20060216932
- Publication date Sep 28, 2006
- Devendra Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Thin films
- Publication number 20050181555
- Publication date Aug 18, 2005
- Suvi P. Haukka
- C30 - CRYSTAL GROWTH
Information Patent Application
Sealing porous structures
- Publication number 20030143839
- Publication date Jul 31, 2003
- Ivo Raaijmakers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
In situ reduction of copper oxide prior to silicon carbide deposition
- Publication number 20020098685
- Publication date Jul 25, 2002
- Auguste J.L. Sophie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and installation for etching a substrate
- Publication number 20010015343
- Publication date Aug 23, 2001
- Hessel Sprey
- H01 - BASIC ELECTRIC ELEMENTS

Hessel Sprey

Person

Patents Grantslast 30 patents

Substrate rack and a substrate processing system and method

Atomic layer deposition of antimony oxide films

Atomic layer deposition of antimony oxide films

Cyclic aluminum nitride deposition in a batch reactor

Atomic layer deposition of antimony oxide films

Atomic layer deposition of antimony oxide films

Thin films

Liner materials and related processes for 3-D integration

Plasma pre-treating surfaces for atomic layer deposition

Thin films

Method and installation for etching a substrate

In situ reduction of copper oxide prior to silicon carbide deposition

Sealing porous structures

Method for growing thin silicon oxides on a silicon substrate using...

Patents Applicationslast 30 patents

METHOD OF DEPOSITING MATERIAL AND SEMICONDUCTOR DEVICES

SUBSTRATE RACK AND A SUBSTRATE PROCESSING SYSTEM AND METHOD

ATOMIC LAYER DEPOSITION OF ANTIMONY OXIDE FILMS

ATOMIC LAYER DEPOSITION OF ANTIMONY OXIDE FILMS

ATOMIC LAYER DEPOSITION OF ANTIMONY OXIDE FILMS

CYCLIC ALUMINUM NITRIDE DEPOSITION IN A BATCH REACTOR

ATOMIC LAYER DEPOSITION OF ANTIMONY OXIDE FILMS

THIN FILMS

LINER MATERIALS AND RELATED PROCESSES FOR 3-D INTEGRATION

CYCLICAL OXIDATION PROCESS

THIN FILMS

PROCESS OF FILLING DEEP VIAS FOR 3-D INTEGRATION OF SUBSTRATES

Plasma pre-treating surfaces for atomic layer deposition

Thin films

Sealing porous structures

In situ reduction of copper oxide prior to silicon carbide deposition

Method and installation for etching a substrate