Hichem M'Saad

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Reactor system including a gas distribution assembly for use with a...
- Patent number 12,006,572
- Issue date Jun 11, 2024
- ASM IP Holding B.V.
- Xing Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tunable ground planes in plasma chambers
- Patent number 10,774,423
- Issue date Sep 15, 2020
- Applied Materials, Inc.
- Karthik Janakiraman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for substrate clamping in a plasma chamber
- Patent number 9,337,072
- Issue date May 10, 2016
- Applied Materials, Inc.
- Ganesh Balasubramanian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method to increase tensile stress of silicon nitride films using a...
- Patent number 8,753,989
- Issue date Jun 17, 2014
- Applied Materials, Inc.
- Mihaela Balseanu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for supplying a cleaning gas into a process chamber
- Patent number 8,591,699
- Issue date Nov 26, 2013
- Applied Materials, Inc.
- Ramprakash Sankarakrishnan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method to minimize wet etch undercuts and provide pore sealing of e...
- Patent number 8,445,075
- Issue date May 21, 2013
- Applied Materials, Inc.
- Huiwen Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Air gap integration scheme
- Patent number 8,389,376
- Issue date Mar 5, 2013
- Applied Materials, Inc.
- Alexandros T. Demos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fluid filtration for substrate processing chamber
- Patent number 8,382,885
- Issue date Feb 26, 2013
- Applied Materials, Inc.
- Dustin W. Ho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods to improve the in-film defectivity of PECVD amorphous carbo...
- Patent number 8,282,734
- Issue date Oct 9, 2012
- Applied Materials, Inc.
- Deenesh Padhi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method to increase silicon nitride tensile stress using nitrogen pl...
- Patent number 8,138,104
- Issue date Mar 20, 2012
- Applied Materials, Inc.
- Mihaela Balseanu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method to increase tensile stress of silicon nitride films using a...
- Patent number 8,129,290
- Issue date Mar 6, 2012
- Applied Materials, Inc.
- Mihaela Balseanu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing boron nitride and boron nitride-derived materials
- Patent number 8,084,105
- Issue date Dec 27, 2011
- Applied Materials, Inc.
- Jeong-Uk Huh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
CMP pad thickness and profile monitoring system
- Patent number 8,043,870
- Issue date Oct 25, 2011
- Applied Materials, Inc.
- Antoine P. Manens
- B24 - GRINDING POLISHING
Information Patent Grant
Methods to obtain low k dielectric barrier with superior etch resis...
- Patent number 7,964,442
- Issue date Jun 21, 2011
- Applied Materials, Inc.
- Huiwen Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Decreasing the etch rate of silicon nitride by carbon addition
- Patent number 7,951,730
- Issue date May 31, 2011
- Applied Materials, Inc.
- Ritwik Bhatia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to improve the step coverage and pattern loading for dielect...
- Patent number 7,923,386
- Issue date Apr 12, 2011
- Applied Materials, Inc.
- Mihaela Balseanu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for forming at least one dielectric layer
- Patent number 7,871,926
- Issue date Jan 18, 2011
- Applied Materials, Inc.
- Li-Qun Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for depositing an amorphous carbon film with improved densit...
- Patent number 7,867,578
- Issue date Jan 11, 2011
- Applied Materials, Inc.
- Deenesh Padhi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method to mitigate impact of UV and E-beam exposure on semiconducto...
- Patent number 7,851,384
- Issue date Dec 14, 2010
- Applied Materials, Inc.
- Yijun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to deposit functionally graded dielectric films via chemical...
- Patent number 7,802,538
- Issue date Sep 28, 2010
- Applied Materials, Inc.
- Deenesh Padhi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method to increase the compressive stress of PECVD dielectric films
- Patent number 7,790,635
- Issue date Sep 7, 2010
- Applied Materials, Inc.
- Mihaela Balseanu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Clean process for an electron beam source
- Patent number 7,790,583
- Issue date Sep 7, 2010
- Applied Materials, Inc.
- Alexandros T. Demos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method to improve the step coverage and pattern loading for dielect...
- Patent number 7,780,865
- Issue date Aug 24, 2010
- Applied Materials, Inc.
- Mihaela Balseanu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum reaction chamber with x-lamp heater
- Patent number 7,777,197
- Issue date Aug 17, 2010
- Applied Materials, Inc.
- Amir Al-Bayati
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method to increase the compressive stress of PECVD silicon nitride...
- Patent number 7,732,342
- Issue date Jun 8, 2010
- Applied Materials, Inc.
- Mihaela Balseanu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reduction of hillocks prior to dielectric barrier deposition in Cu...
- Patent number 7,723,228
- Issue date May 25, 2010
- Applied Materials, Inc.
- Nagarajan Rajagopalan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective copper-silicon-nitride layer formation for an improved di...
- Patent number 7,718,548
- Issue date May 18, 2010
- Applied Materials, Inc.
- Sang M. Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Techniques for the use of amorphous carbon (APF) for various etch a...
- Patent number 7,718,081
- Issue date May 18, 2010
- Applied Materials, Inc.
- Wei Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Boron derived materials deposition method
- Patent number 7,704,816
- Issue date Apr 27, 2010
- Applied Materials, Inc.
- Jeong-Uk Huh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Oxide-like seasoning for dielectric low k films
- Patent number 7,700,486
- Issue date Apr 20, 2010
- Applied Materials, Inc.
- Sohyun Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
HIGH-THROUGHPUT SILICON CARBIDE REACTOR
- Publication number 20240175130
- Publication date May 30, 2024
- ASM IP HOLDING B.V.
- Hichem M’Saad
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EPITAXIAL REACTOR SYSTEMS AND METHODS OF USING SAME
- Publication number 20230203706
- Publication date Jun 29, 2023
- ASM IP HOLDING B.V.
- Alexandros Demos
- C30 - CRYSTAL GROWTH
Information Patent Application
SYSTEMS AND METHODS FOR PROCESSING A SILICON SURFACE USING MULTIPLE...
- Publication number 20230193475
- Publication date Jun 22, 2023
- ASM IP HOLDING, B.V.
- Gregory Deye
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REACTOR SYSTEMS AND METHODS FOR CLEANING REACTOR SYSTEMS
- Publication number 20220349051
- Publication date Nov 3, 2022
- ASM IP HOLDING B.V.
- Amit Mishra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WAFER TEMPERATURE GRADIENT CONTROL TO SUPPRESS SLIP FORMATION IN HI...
- Publication number 20220298672
- Publication date Sep 22, 2022
- ASM IP HOLDING B.V.
- Hichem M'Saad
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REACTOR SYSTEM INCLUDING A GAS DISTRIBUTION ASSEMBLY FOR USE WITH A...
- Publication number 20210102292
- Publication date Apr 8, 2021
- ASM IP HOLDING B.V.
- Xing Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TUNABLE GROUND PLANES IN PLASMA CHAMBERS
- Publication number 20180073142
- Publication date Mar 15, 2018
- Applied Materials, Inc.
- Karthik Janakiraman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TUNABLE GROUND PLANES IN PLASMA CHAMBERS
- Publication number 20160145742
- Publication date May 26, 2016
- Applied Materials, Inc.
- Karthik Janakiraman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND SYSTEM FOR SUPPLYING A CLEANING GAS INTO A PROCESS CHAMBER
- Publication number 20160084400
- Publication date Mar 24, 2016
- Applied Materials, Inc.
- Ramprakash SANKARAKRISHNAN
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Application
METHOD AND SYSTEM FOR SUPPLYING A CLEANING GAS INTO A PROCESS CHAMBER
- Publication number 20130213574
- Publication date Aug 22, 2013
- Ramprakash Sankarakrishnan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TUNABLE GROUND PLANES IN PLASMA CHAMBERS
- Publication number 20120205046
- Publication date Aug 16, 2012
- Applied Materials, Inc.
- Karthik Janakiraman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS TO IMPROVE THE IN-FILM DEFECTIVITY OF PECVD AMORPHOUS CARBO...
- Publication number 20120204795
- Publication date Aug 16, 2012
- Applied Materials, Inc.
- Deenesh Padhi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR DEPOSITING AN AMORPHOUS CARBON FILM WITH IMPROVED DENSIT...
- Publication number 20120208373
- Publication date Aug 16, 2012
- Applied Materials, Inc.
- DEENESH PADHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD TO INCREASE TENSILE STRESS OF SILICON NITRIDE FILMS USING A...
- Publication number 20120196452
- Publication date Aug 2, 2012
- Applied Materials, Inc.
- Mihaela Balseanu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD TO INCREASE SILICON NITRIDE TENSILE STRESS USING NITROGEN PL...
- Publication number 20120196450
- Publication date Aug 2, 2012
- Applied Materials, Inc.
- Mihaela Balseanu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FLUID FILTRATION FOR SUBSTRATE PROCESSING CHAMBER
- Publication number 20110256041
- Publication date Oct 20, 2011
- Applied Materials, Inc.
- Dustin W. HO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR DEPOSITING AN AMORPHOUS CARBON FILM WITH IMPROVED DENSIT...
- Publication number 20110104400
- Publication date May 5, 2011
- Deenesh Padhi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR SUBSTRATE CLAMPING IN A PLASMA CHAMBER
- Publication number 20110090613
- Publication date Apr 21, 2011
- Ganesh Balasubramanian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD TO MINIMIZE WET ETCH UNDERCUTS AND PROVIDE PORE SEALING OF E...
- Publication number 20110092077
- Publication date Apr 21, 2011
- Huiwen Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NOVEL AIR GAP INTEGRATION SCHEME
- Publication number 20100151671
- Publication date Jun 17, 2010
- Applied Materials, Inc.
- Alexandros T. Demos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD TO IMPROVE THE STEP COVERAGE AND PATTERN LOADING FOR DIELECT...
- Publication number 20100048030
- Publication date Feb 25, 2010
- Applied Materials, Inc.
- MIHAELA BALSEANU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Supplying a Cleaning Gas Into a Process Chamber
- Publication number 20100012273
- Publication date Jan 21, 2010
- Applied Materials, Inc.
- Ramprakash Sankarakrishnan
- B08 - CLEANING
Information Patent Application
METHOD AND SYSTEM FOR SUPPLYING A CLEANING GAS INTO A PROCESS CHAMBER
- Publication number 20090314309
- Publication date Dec 24, 2009
- APPLIED MATERIALS, INC.
- Ramprakash Sankarakrishnan
- B08 - CLEANING
Information Patent Application
CMP PAD THICKNESS AND PROFILE MONITORING SYSTEM
- Publication number 20090280580
- Publication date Nov 12, 2009
- Applied Materials, Inc.
- Antoine P. Manens
- B24 - GRINDING POLISHING
Information Patent Application
PAD PROPERTIES USING NANOPARTICLE ADDITIVES
- Publication number 20090278081
- Publication date Nov 12, 2009
- Applied Materials, Inc.
- Hichem M'Saad
- B24 - GRINDING POLISHING
Information Patent Application
TUNABLE GROUND PLANES IN PLASMA CHAMBERS
- Publication number 20090236214
- Publication date Sep 24, 2009
- Karthik Janakiraman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH EFFICIENCY UV CURING SYSTEM
- Publication number 20090162259
- Publication date Jun 25, 2009
- Thomas Nowak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DECREASING THE ETCH RATE OF SILICON NITRIDE BY CARBON ADDITION
- Publication number 20090137132
- Publication date May 28, 2009
- Ritwik Bhatia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and Systems for Forming at Least One Dielectric Layer
- Publication number 20090104764
- Publication date Apr 23, 2009
- Applied Materials, Inc.
- Li-Qun Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR HIGH TEMPERATURE DEPOSITION OF AN AMORPHOUS CARBON LAYER
- Publication number 20090093128
- Publication date Apr 9, 2009
- MARTIN JAY SEAMONS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Hichem M'Saad

Person

Patents Grantslast 30 patents

Reactor system including a gas distribution assembly for use with a...

Tunable ground planes in plasma chambers

Apparatus and method for substrate clamping in a plasma chamber

Method to increase tensile stress of silicon nitride films using a...

Method and system for supplying a cleaning gas into a process chamber

Method to minimize wet etch undercuts and provide pore sealing of e...

Air gap integration scheme

Fluid filtration for substrate processing chamber

Methods to improve the in-film defectivity of PECVD amorphous carbo...

Method to increase silicon nitride tensile stress using nitrogen pl...

Method to increase tensile stress of silicon nitride films using a...

Method of depositing boron nitride and boron nitride-derived materials

CMP pad thickness and profile monitoring system

Methods to obtain low k dielectric barrier with superior etch resis...

Decreasing the etch rate of silicon nitride by carbon addition

Method to improve the step coverage and pattern loading for dielect...

Methods and systems for forming at least one dielectric layer

Method for depositing an amorphous carbon film with improved densit...

Method to mitigate impact of UV and E-beam exposure on semiconducto...

Method to deposit functionally graded dielectric films via chemical...

Method to increase the compressive stress of PECVD dielectric films

Clean process for an electron beam source

Method to improve the step coverage and pattern loading for dielect...

Vacuum reaction chamber with x-lamp heater

Method to increase the compressive stress of PECVD silicon nitride...

Reduction of hillocks prior to dielectric barrier deposition in Cu...

Selective copper-silicon-nitride layer formation for an improved di...

Techniques for the use of amorphous carbon (APF) for various etch a...

Boron derived materials deposition method

Oxide-like seasoning for dielectric low k films

Patents Applicationslast 30 patents

HIGH-THROUGHPUT SILICON CARBIDE REACTOR

EPITAXIAL REACTOR SYSTEMS AND METHODS OF USING SAME

SYSTEMS AND METHODS FOR PROCESSING A SILICON SURFACE USING MULTIPLE...

REACTOR SYSTEMS AND METHODS FOR CLEANING REACTOR SYSTEMS

WAFER TEMPERATURE GRADIENT CONTROL TO SUPPRESS SLIP FORMATION IN HI...

REACTOR SYSTEM INCLUDING A GAS DISTRIBUTION ASSEMBLY FOR USE WITH A...

TUNABLE GROUND PLANES IN PLASMA CHAMBERS

TUNABLE GROUND PLANES IN PLASMA CHAMBERS

METHOD AND SYSTEM FOR SUPPLYING A CLEANING GAS INTO A PROCESS CHAMBER

METHOD AND SYSTEM FOR SUPPLYING A CLEANING GAS INTO A PROCESS CHAMBER

TUNABLE GROUND PLANES IN PLASMA CHAMBERS

METHODS TO IMPROVE THE IN-FILM DEFECTIVITY OF PECVD AMORPHOUS CARBO...

METHOD FOR DEPOSITING AN AMORPHOUS CARBON FILM WITH IMPROVED DENSIT...

METHOD TO INCREASE TENSILE STRESS OF SILICON NITRIDE FILMS USING A...

METHOD TO INCREASE SILICON NITRIDE TENSILE STRESS USING NITROGEN PL...

FLUID FILTRATION FOR SUBSTRATE PROCESSING CHAMBER

METHOD FOR DEPOSITING AN AMORPHOUS CARBON FILM WITH IMPROVED DENSIT...

APPARATUS AND METHOD FOR SUBSTRATE CLAMPING IN A PLASMA CHAMBER

METHOD TO MINIMIZE WET ETCH UNDERCUTS AND PROVIDE PORE SEALING OF E...

NOVEL AIR GAP INTEGRATION SCHEME

METHOD TO IMPROVE THE STEP COVERAGE AND PATTERN LOADING FOR DIELECT...

Method and System for Supplying a Cleaning Gas Into a Process Chamber

METHOD AND SYSTEM FOR SUPPLYING A CLEANING GAS INTO A PROCESS CHAMBER

CMP PAD THICKNESS AND PROFILE MONITORING SYSTEM

PAD PROPERTIES USING NANOPARTICLE ADDITIVES

TUNABLE GROUND PLANES IN PLASMA CHAMBERS

HIGH EFFICIENCY UV CURING SYSTEM

DECREASING THE ETCH RATE OF SILICON NITRIDE BY CARBON ADDITION

Methods and Systems for Forming at Least One Dielectric Layer

METHODS FOR HIGH TEMPERATURE DEPOSITION OF AN AMORPHOUS CARBON LAYER