Hideaki Fukuda

Person

Hachioji, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Methods and apparatuses for flowable gap-fill
- Patent number 12,129,546
- Issue date Oct 29, 2024
- ASM IP Holding B.V.
- Shinya Yoshimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Storage system, data write control method, and non-transitory compu...
- Patent number 12,045,507
- Issue date Jul 23, 2024
- Hitachi, Ltd.
- Yutaro Kobayashi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Silicon precursors for silicon nitride deposition
- Patent number 11,996,286
- Issue date May 28, 2024
- ASM IP Holding B.V.
- Charles Dezelah
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for filling a gap
- Patent number 11,610,775
- Issue date Mar 21, 2023
- ASM IP Holding B.V.
- Viljami Pore
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Si precursors for deposition of SiN at low temperatures
- Patent number 11,587,783
- Issue date Feb 21, 2023
- ASM IP Holding B.V.
- Antti J. Niskanen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 11,302,527
- Issue date Apr 12, 2022
- ASM International N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Si precursors for deposition of SiN at low temperatures
- Patent number 11,069,522
- Issue date Jul 20, 2021
- ASM IP Holding B.V.
- Antti J. Niskanen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer-supporting device and method for producing same
- Patent number 10,854,498
- Issue date Dec 1, 2020
- ASM IP Holding B.V.
- Fumitaka Shoji
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 10,784,105
- Issue date Sep 22, 2020
- ASM International N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Computer system, communication device, and storage control method w...
- Patent number 10,733,118
- Issue date Aug 4, 2020
- Hitachi, Ltd.
- Sho Takizawa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 10,510,530
- Issue date Dec 17, 2019
- ASM International N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Si precursors for deposition of SiN at low temperatures
- Patent number 10,395,917
- Issue date Aug 27, 2019
- ASM IP Holding B.V.
- Antti J. Niskanen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 10,147,600
- Issue date Dec 4, 2018
- ASM International N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Si precursors for deposition of SiN at low temperatures
- Patent number 9,905,416
- Issue date Feb 27, 2018
- ASM IP Holding B.V.
- Antti J. Niskanen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 9,875,893
- Issue date Jan 23, 2018
- ASM International N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for filling a gap
- Patent number 9,812,320
- Issue date Nov 7, 2017
- ASM IP Holding B.V.
- Viljami Pore
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Continuous process incorporating atomic layer etching
- Patent number 9,627,221
- Issue date Apr 18, 2017
- ASM IP Holding B.V.
- Masaru Zaitsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of boron and carbon containing materials
- Patent number 9,576,790
- Issue date Feb 21, 2017
- ASM IP Holding B.V.
- Viljami J. Pore
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Si precursors for deposition of SiN at low temperatures
- Patent number 9,564,309
- Issue date Feb 7, 2017
- ASM IP Holding B.V.
- Antti J. Niskanen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 9,564,314
- Issue date Feb 7, 2017
- ASM International N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming dielectric film in trenches by PEALD using H-con...
- Patent number 9,455,138
- Issue date Sep 27, 2016
- ASM IP Holding B.V.
- Atsuki Fukazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 9,368,352
- Issue date Jun 14, 2016
- ASM International N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming multi-element thin film constituted by at least...
- Patent number 9,343,297
- Issue date May 17, 2016
- ASM IP Holding B.V.
- Atsuki Fukazawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming metal oxide hardmask
- Patent number 9,171,716
- Issue date Oct 27, 2015
- ASM Japan K.K.
- Hideaki Fukuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 9,153,441
- Issue date Oct 6, 2015
- ASM International, NV.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Storage system and data transfer control method
- Patent number 8,924,606
- Issue date Dec 30, 2014
- Hitachi, Ltd.
- Koji Akiyama
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of forming metal oxide hardmask
- Patent number 8,901,016
- Issue date Dec 2, 2014
- ASM Japan K.K.
- Jeongseok Ha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming aluminum oxide film using Al compound containing...
- Patent number 8,784,950
- Issue date Jul 22, 2014
- ASM IP Holding B.V.
- Atsuki Fukazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for forming doped silicon oxide thin films
- Patent number 8,679,958
- Issue date Mar 25, 2014
- ASM International N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of tailoring conformality of Si-containing film
- Patent number 8,669,185
- Issue date Mar 11, 2014
- ASM Japan K.K.
- Shigeyuki Onizawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SILICON PRECURSORS FOR SILICON NITRIDE DEPOSITION
- Publication number 20240297039
- Publication date Sep 5, 2024
- ASM IP HOLDING B.V.
- Charles Dezelah
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF DEPOSITING CONDENSABLE MATERIAL ONTO A SURFACE OF A SUBST...
- Publication number 20240014033
- Publication date Jan 11, 2024
- ASM IP HOLDING B.V.
- Hiroshi Kou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION OF FLOWABLE SICN FILMS BY PLASMA ENHANCED ATOMIC LAYER D...
- Publication number 20230335392
- Publication date Oct 19, 2023
- ASM IP HOLDING B.V.
- Shinya Yoshimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
STORAGE DEVICE AND PROTOCOL CONVERSION METHOD BY STORAGE DEVICE
- Publication number 20230315345
- Publication date Oct 5, 2023
- Hitachi, Ltd
- Katsuya TANAKA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR FILLING A GAP
- Publication number 20230207309
- Publication date Jun 29, 2023
- ASM IP HOLDING B.V.
- Viljami PORE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20230031720
- Publication date Feb 2, 2023
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STORAGE SYSTEM, DATA WRITE CONTROL METHOD, AND NON-TRANSITORY COMPU...
- Publication number 20230008395
- Publication date Jan 12, 2023
- Hitachi, Ltd
- Yutaro KOBAYASHI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF FORMING AN ADHESION LAYER ON A PHOTORESIST UNDERLAYER AND...
- Publication number 20220350248
- Publication date Nov 3, 2022
- ASM IP HOLDING B.V.
- Zecheng Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILICON PRECURSORS FOR SILICON NITRIDE DEPOSITION
- Publication number 20220181148
- Publication date Jun 9, 2022
- ASM IP HOLDING B.V.
- Charles Dezelah
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APARATUSES FOR FLOWABLE GAP-FILL
- Publication number 20220119944
- Publication date Apr 21, 2022
- ASM IP HOLDING B.V.
- Shinya Yoshimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR FILLING A GAP
- Publication number 20210313167
- Publication date Oct 7, 2021
- ASM IP HOLDING B.V.
- Viljami PORE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A STRUCTURE INCLUDING SILICON OXIDE
- Publication number 20210143003
- Publication date May 13, 2021
- ASM IP HOLDING B.V.
- Hideaki Fukuda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Si PRECURSORS FOR DEPOSITION OF SiN AT LOW TEMPERATURES
- Publication number 20210082684
- Publication date Mar 18, 2021
- ASM IP HOLDING B.V.
- Antti J. Niskanen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20200388487
- Publication date Dec 10, 2020
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20200185218
- Publication date Jun 11, 2020
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Si PRECURSORS FOR DEPOSITION OF SiN AT LOW TEMPERATURES
- Publication number 20190371594
- Publication date Dec 5, 2019
- ASM IP HOLDING B.V.
- Antti J. Niskanen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20190172708
- Publication date Jun 6, 2019
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPUTER SYSTEM, COMMUNICATION DEVICE, AND STORAGE CONTROL METHOD
- Publication number 20190012279
- Publication date Jan 10, 2019
- Hitachi, Ltd
- Sho TAKIZAWA
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
Si PRECURSORS FOR DEPOSITION OF SiN AT LOW TEMPERATURES
- Publication number 20180366314
- Publication date Dec 20, 2018
- ASM IP HOLDING B.V.
- Antti J. Niskanen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20180211834
- Publication date Jul 26, 2018
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20170338111
- Publication date Nov 23, 2017
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Si PRECURSORS FOR DEPOSITION OF SiN AT LOW TEMPERATURES
- Publication number 20170133216
- Publication date May 11, 2017
- ASM IP HOLDING B.V.
- Antti J. Niskanen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING SIN OR SICN FILM IN TRENCHES BY PEALD
- Publication number 20170051405
- Publication date Feb 23, 2017
- Atsuki Fukazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20160196970
- Publication date Jul 7, 2016
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DEPOSITING METAL-CONTAINING FILM USING PARTICLE-REDUCTIO...
- Publication number 20160168699
- Publication date Jun 16, 2016
- ASM IP HOLDING B.V.
- Atsuki Fukazawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION OF BORON AND CARBON CONTAINING MATERIALS
- Publication number 20150287591
- Publication date Oct 8, 2015
- ASM IP HOLDING B.V.
- Viljami J. Pore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20150147875
- Publication date May 28, 2015
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Forming Metal Oxide Hardmask
- Publication number 20150056540
- Publication date Feb 26, 2015
- ASM JAPAN K.K.
- Hideaki Fukuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20150017794
- Publication date Jan 15, 2015
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Si PRECURSORS FOR DEPOSITION OF SiN AT LOW TEMPERATURES
- Publication number 20140273531
- Publication date Sep 18, 2014
- ASM IP HOLDING B.V.
- Antti J. Niskanen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Hideaki Fukuda

Person

Patents Grantslast 30 patents

Methods and apparatuses for flowable gap-fill

Storage system, data write control method, and non-transitory compu...

Silicon precursors for silicon nitride deposition

Method and apparatus for filling a gap

Si precursors for deposition of SiN at low temperatures

Methods for forming doped silicon oxide thin films

Si precursors for deposition of SiN at low temperatures

Wafer-supporting device and method for producing same

Methods for forming doped silicon oxide thin films

Computer system, communication device, and storage control method w...

Methods for forming doped silicon oxide thin films

Si precursors for deposition of SiN at low temperatures

Methods for forming doped silicon oxide thin films

Si precursors for deposition of SiN at low temperatures

Methods for forming doped silicon oxide thin films

Method and apparatus for filling a gap

Continuous process incorporating atomic layer etching

Deposition of boron and carbon containing materials

Si precursors for deposition of SiN at low temperatures

Methods for forming doped silicon oxide thin films

Method for forming dielectric film in trenches by PEALD using H-con...

Methods for forming doped silicon oxide thin films

Method for forming multi-element thin film constituted by at least...

Method of forming metal oxide hardmask

Methods for forming doped silicon oxide thin films

Storage system and data transfer control method

Method of forming metal oxide hardmask

Method for forming aluminum oxide film using Al compound containing...

Methods for forming doped silicon oxide thin films

Method of tailoring conformality of Si-containing film

Patents Applicationslast 30 patents

SILICON PRECURSORS FOR SILICON NITRIDE DEPOSITION

METHOD OF DEPOSITING CONDENSABLE MATERIAL ONTO A SURFACE OF A SUBST...

DEPOSITION OF FLOWABLE SICN FILMS BY PLASMA ENHANCED ATOMIC LAYER D...

STORAGE DEVICE AND PROTOCOL CONVERSION METHOD BY STORAGE DEVICE

METHOD AND APPARATUS FOR FILLING A GAP

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

STORAGE SYSTEM, DATA WRITE CONTROL METHOD, AND NON-TRANSITORY COMPU...

METHOD OF FORMING AN ADHESION LAYER ON A PHOTORESIST UNDERLAYER AND...

SILICON PRECURSORS FOR SILICON NITRIDE DEPOSITION

METHODS AND APARATUSES FOR FLOWABLE GAP-FILL

METHOD AND APPARATUS FOR FILLING A GAP

METHOD OF FORMING A STRUCTURE INCLUDING SILICON OXIDE

Si PRECURSORS FOR DEPOSITION OF SiN AT LOW TEMPERATURES

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

Si PRECURSORS FOR DEPOSITION OF SiN AT LOW TEMPERATURES

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

COMPUTER SYSTEM, COMMUNICATION DEVICE, AND STORAGE CONTROL METHOD

Si PRECURSORS FOR DEPOSITION OF SiN AT LOW TEMPERATURES

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

Si PRECURSORS FOR DEPOSITION OF SiN AT LOW TEMPERATURES

METHOD FOR FORMING SIN OR SICN FILM IN TRENCHES BY PEALD

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

METHOD FOR DEPOSITING METAL-CONTAINING FILM USING PARTICLE-REDUCTIO...

DEPOSITION OF BORON AND CARBON CONTAINING MATERIALS

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

Method of Forming Metal Oxide Hardmask

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

Si PRECURSORS FOR DEPOSITION OF SiN AT LOW TEMPERATURES