Hideaki Mitsui

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing a transfer mask and method of manufacturing...
- Patent number 8,609,304
- Issue date Dec 17, 2013
- Hoya Corporation
- Masaru Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, photomask, and methods of manufacturing the same
- Patent number 8,048,594
- Issue date Nov 1, 2011
- Hoya Corporation
- Masahiro Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, photomask, and methods of manufacturing the same
- Patent number 8,021,806
- Issue date Sep 20, 2011
- Hoya Corporation
- Masahiro Hashimoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing method and apparatus of phase shift mask blank
- Patent number 8,012,314
- Issue date Sep 6, 2011
- Hoya Corporation
- Osamu Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Halftone type phase shift mask blank and phase shift mask thereof
- Patent number 7,862,963
- Issue date Jan 4, 2011
- Hoya Corporation
- Yuuki Shiota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift mask blank, halftone phase shift mask, and met...
- Patent number 7,632,612
- Issue date Dec 15, 2009
- Hoya Corporation
- Yuuki Shiota
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Halftone type phase shift mask blank and phase shift mask thereof
- Patent number 7,592,106
- Issue date Sep 22, 2009
- Hoya Corporation
- Yuuki Shiota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing method and apparatus of phase shift mask blank
- Patent number 7,402,228
- Issue date Jul 22, 2008
- Hoya Corporation
- Osamu Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Manufacturing method and apparatus of phase shift mask blank
- Patent number 7,282,121
- Issue date Oct 16, 2007
- Hoya Corporation
- Osamu Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Halftone type phase shift mask blank and phase shift mask thereof
- Patent number 7,169,513
- Issue date Jan 30, 2007
- Hoya Corporation
- Yuuki Shiota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift mask blank, halftone phase shift mask, and met...
- Patent number 7,115,341
- Issue date Oct 3, 2006
- Hoya Corporation
- Yuuki Shiota
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Halftone phase-shift mask blank and halftone phase-shift mask
- Patent number 7,060,394
- Issue date Jun 13, 2006
- Hoya Corporation
- Yuki Shiota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone-type phase-shift mask blank, and halftone-type phase-shift...
- Patent number 7,011,910
- Issue date Mar 14, 2006
- Hoya Corporation
- Yuki Shiota
- G02 - OPTICS
Information Patent Grant
Method for producing a halftone phase shift mask blank, a halftone...
- Patent number 6,844,119
- Issue date Jan 18, 2005
- Hoya Corporation
- Osamu Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Manufacturing method and apparatus of phase shift mask blank
- Patent number 6,783,634
- Issue date Aug 31, 2004
- Hoya Corporation
- Osamu Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Phase shift mask blank, photo mask blank and manufacturing apparatu...
- Patent number 6,762,000
- Issue date Jul 13, 2004
- Hoya Corporation
- Osamu Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing phase shift mask blank and method for manu...
- Patent number 6,723,477
- Issue date Apr 20, 2004
- Hoya Corporation
- Osamu Nozawa
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Phase shift mask blank, phase shift mask, and method for manufactur...
- Patent number 6,677,087
- Issue date Jan 13, 2004
- Hoya Corporation
- Osamu Nozawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask and phase shift mask blank
- Patent number 6,395,434
- Issue date May 28, 2002
- Hoya Corporation
- Osamu Nozawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask and phase shift mask blank
- Patent number 6,335,124
- Issue date Jan 1, 2002
- Hoya Corporation
- Hideaki Mitsui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Phase shift mask and phase shift mask blank
- Patent number 6,087,047
- Issue date Jul 11, 2000
- Hoya Corporation
- Hideaki Mitsui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase-shift mask blank and process for the production thereof compr...
- Patent number 5,955,223
- Issue date Sep 21, 1999
- Hoya Corporation
- Hideaki Mitsui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF MANUFACTURING A TRANSFER MASK AND METHOD OF MANUFACTURING...
- Publication number 20120251928
- Publication date Oct 4, 2012
- HOYA CORPORATION
- Masaru TANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask Blank, Photomask, and Pattern Transfer Method Using Photo...
- Publication number 20120034553
- Publication date Feb 9, 2012
- Hoya Corporation
- Mitsuhiro Kureishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK, PHOTOMASK, AND METHODS OF MANUFACTURING THE SAME
- Publication number 20100075236
- Publication date Mar 25, 2010
- HOYA CORPORATION
- Masahiro HASHIMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HALFTONE TYPE PHASE SHIFT MASK BLANK AND PHASE SHIFT MASK THEREOF
- Publication number 20100040961
- Publication date Feb 18, 2010
- HOYA CORPORATION
- Yuuki Shiota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK, PHOTOMASK, AND METHODS OF MANUFACTURING THE SAME
- Publication number 20090325084
- Publication date Dec 31, 2009
- HOYA CORPORATION
- Masahiro HASHIMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Manufacturing Method and Apparatus of Phase Shift Mask Blank
- Publication number 20070187228
- Publication date Aug 16, 2007
- Hoya Corporation
- Osamu Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HALFTONE TYPE PHASE SHIFT MASK BLANK AND PHASE SHIFT MASK THEREOF
- Publication number 20070092808
- Publication date Apr 26, 2007
- Hoya Corporation
- Yuuki Shiota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Halftone phase shift mask blank, halftone phase shift mask, and met...
- Publication number 20070082278
- Publication date Apr 12, 2007
- Hoya Corporation
- Yuuki Shiota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase shift mask blank, photo mask blank, and manufacturing apparat...
- Publication number 20070034499
- Publication date Feb 15, 2007
- Hoya Corporation
- Osamu Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Mask blank, phase shift mask manufacturing method and template manu...
- Publication number 20050277034
- Publication date Dec 15, 2005
- Hoya Corporation
- Hideaki Mitsui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Manufacturing method and apparatus of phase shift mask blank
- Publication number 20040191651
- Publication date Sep 30, 2004
- Hoya Corporation
- Osamu Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Manufacturing method and apparatus of phase shift mask blank
- Publication number 20040157138
- Publication date Aug 12, 2004
- Hoya Corporation
- Osamu Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Halftone-type phase-shift mask blank, and halftone-type phase-shift...
- Publication number 20040086788
- Publication date May 6, 2004
- Hoya Corporation
- Yuki Shiota
- G02 - OPTICS
Information Patent Application
Phase shift mask blank, photo mask blank, and manufacturing apparat...
- Publication number 20040058254
- Publication date Mar 25, 2004
- Hoya Corporation
- Osamu Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for producing a halftone phase shift mask blank, a halftone...
- Publication number 20040023125
- Publication date Feb 5, 2004
- Hoya Corporation
- Osamu Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Halftone phase shift mask blank, halftone phase shift mask, and met...
- Publication number 20030180631
- Publication date Sep 25, 2003
- Hoya Corporation
- Yuuki Shiota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Halftone type phase shift mask blank and phase shift mask thereof
- Publication number 20030180630
- Publication date Sep 25, 2003
- Hoya Corporation
- Yuuki Shiota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Halftone phase-shift mask blank and halftone phase-shift mask
- Publication number 20030064297
- Publication date Apr 3, 2003
- Hoya Corporation
- Yuki Shiota
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase shift mask blank, photo mask blank and manufacturing apparatu...
- Publication number 20020110741
- Publication date Aug 15, 2002
- Hoya Corporation
- Osamu Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Manufacturing method and apparatus of phase shift mask blank
- Publication number 20020086220
- Publication date Jul 4, 2002
- Hoya Corporation
- Osamu Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Phase shift mask blank, phase shift mask, and method for manufactur...
- Publication number 20020061452
- Publication date May 23, 2002
- Hoya Corporation
- Osamu Nozawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for manufacturing phase shift mask blank and method for manu...
- Publication number 20020058186
- Publication date May 16, 2002
- Hoya Corporation
- Osamu Nozawa
- C03 - GLASS MINERAL OR SLAG WOOL

Hideaki Mitsui

Person

Patents Grantslast 30 patents

Method of manufacturing a transfer mask and method of manufacturing...

Photomask blank, photomask, and methods of manufacturing the same

Photomask blank, photomask, and methods of manufacturing the same

Manufacturing method and apparatus of phase shift mask blank

Halftone type phase shift mask blank and phase shift mask thereof

Halftone phase shift mask blank, halftone phase shift mask, and met...

Halftone type phase shift mask blank and phase shift mask thereof

Manufacturing method and apparatus of phase shift mask blank

Manufacturing method and apparatus of phase shift mask blank

Halftone type phase shift mask blank and phase shift mask thereof

Halftone phase shift mask blank, halftone phase shift mask, and met...

Halftone phase-shift mask blank and halftone phase-shift mask

Halftone-type phase-shift mask blank, and halftone-type phase-shift...

Method for producing a halftone phase shift mask blank, a halftone...

Manufacturing method and apparatus of phase shift mask blank

Phase shift mask blank, photo mask blank and manufacturing apparatu...

Method for manufacturing phase shift mask blank and method for manu...

Phase shift mask blank, phase shift mask, and method for manufactur...

Phase shift mask and phase shift mask blank

Phase shift mask and phase shift mask blank

Phase shift mask and phase shift mask blank

Phase-shift mask blank and process for the production thereof compr...

Patents Applicationslast 30 patents

METHOD OF MANUFACTURING A TRANSFER MASK AND METHOD OF MANUFACTURING...

Photomask Blank, Photomask, and Pattern Transfer Method Using Photo...

PHOTOMASK BLANK, PHOTOMASK, AND METHODS OF MANUFACTURING THE SAME

HALFTONE TYPE PHASE SHIFT MASK BLANK AND PHASE SHIFT MASK THEREOF

PHOTOMASK BLANK, PHOTOMASK, AND METHODS OF MANUFACTURING THE SAME

Manufacturing Method and Apparatus of Phase Shift Mask Blank

HALFTONE TYPE PHASE SHIFT MASK BLANK AND PHASE SHIFT MASK THEREOF

Halftone phase shift mask blank, halftone phase shift mask, and met...

Phase shift mask blank, photo mask blank, and manufacturing apparat...

Mask blank, phase shift mask manufacturing method and template manu...

Manufacturing method and apparatus of phase shift mask blank

Manufacturing method and apparatus of phase shift mask blank

Halftone-type phase-shift mask blank, and halftone-type phase-shift...

Phase shift mask blank, photo mask blank, and manufacturing apparat...

Method for producing a halftone phase shift mask blank, a halftone...

Halftone phase shift mask blank, halftone phase shift mask, and met...

Halftone type phase shift mask blank and phase shift mask thereof

Halftone phase-shift mask blank and halftone phase-shift mask

Phase shift mask blank, photo mask blank and manufacturing apparatu...

Manufacturing method and apparatus of phase shift mask blank

Phase shift mask blank, phase shift mask, and method for manufactur...

Method for manufacturing phase shift mask blank and method for manu...