Hideaki Tsubaki

Person

Shizuoka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, pat...
- Patent number 11,640,113
- Issue date May 2, 2023
- FUJIFILM Corporation
- Hideaki Tsubaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive composition, method fo...
- Patent number 11,460,769
- Issue date Oct 4, 2022
- FUJIFILM Corporation
- Wataru Nihashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive composition, method fo...
- Patent number 11,156,915
- Issue date Oct 26, 2021
- FUJIFILM Corporation
- Hideaki Tsubaki
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Treatment liquid and pattern forming method
- Patent number 11,042,094
- Issue date Jun 22, 2021
- FUJIFILM Corporation
- Shuji Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Treatment liquid and pattern forming method
- Patent number 10,962,884
- Issue date Mar 30, 2021
- FUJIFILM Corporation
- Hideaki Tsubaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method, resist pattern, method for manufacturing el...
- Patent number 10,890,847
- Issue date Jan 12, 2021
- FUJIFILM Corporation
- Toru Tsuchihashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern forming method and electronic device manufacturing method
- Patent number 10,788,754
- Issue date Sep 29, 2020
- FUJIFILM Corporation
- Wataru Nihashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, method for manufacturing electronic device,...
- Patent number 10,761,426
- Issue date Sep 1, 2020
- FUJIFILM Corporation
- Hideaki Tsubaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method, method for manufacturing electronic device,...
- Patent number 10,663,864
- Issue date May 26, 2020
- FUJIFILM Corporation
- Wataru Nihashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Rinsing liquid, pattern forming method, and electronic device manuf...
- Patent number 10,599,038
- Issue date Mar 24, 2020
- FUJIFILM Corporation
- Hideaki Tsubaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developer, pattern forming method, and electronic device manufactur...
- Patent number 10,562,991
- Issue date Feb 18, 2020
- FUJIFILM Corporation
- Hideaki Tsubaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method and method for manufacturing electronic device
- Patent number 10,394,127
- Issue date Aug 27, 2019
- FUJIFILM Corporation
- Wataru Nihashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition, resist film...
- Patent number 9,568,824
- Issue date Feb 14, 2017
- FUJIFILM Corporation
- Toshiya Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, actinic ray-sensitive or radiation-sensitive resin compos...
- Patent number 9,527,809
- Issue date Dec 27, 2016
- FUJIFILM Corporation
- Natsumi Yokokawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive composition, resist fi...
- Patent number 9,500,951
- Issue date Nov 22, 2016
- FUJIFILM Corporation
- Natsumi Yokokawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming method, electron beam-sensitive or extreme ultravio...
- Patent number 9,470,980
- Issue date Oct 18, 2016
- FUJIFILM Corporation
- Naoki Inoue
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern forming method, resist composition for multiple development...
- Patent number 9,465,298
- Issue date Oct 11, 2016
- FUJIFILM Corporation
- Hideaki Tsubaki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive composition, resist fi...
- Patent number 9,459,531
- Issue date Oct 4, 2016
- FUJIFILM Corporation
- Natsumi Yokokawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of forming patterns
- Patent number 9,458,343
- Issue date Oct 4, 2016
- FUJIFILM Corporation
- Hideaki Tsubaki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 9,448,477
- Issue date Sep 20, 2016
- FUJIFILM Corporation
- Takeshi Kawabata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern forming method, electron beam-sensitive or extreme ultravio...
- Patent number 9,411,230
- Issue date Aug 9, 2016
- FUJIFILM Corporation
- Hiroo Takizawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition, actinic-ray-...
- Patent number 9,323,150
- Issue date Apr 26, 2016
- FUJIFILM Corporation
- Shuji Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, and...
- Patent number 9,323,153
- Issue date Apr 26, 2016
- FUJIFILM Corporation
- Shuji Hirano
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern forming method, resist composition for multiple development...
- Patent number 9,291,904
- Issue date Mar 22, 2016
- FUJIFILM Corporation
- Hideaki Tsubaki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Pattern forming method, resist composition for multiple development...
- Patent number 9,250,530
- Issue date Feb 2, 2016
- FUJIFILM Corporation
- Hideaki Tsubaki
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive composition, actinic r...
- Patent number 9,223,215
- Issue date Dec 29, 2015
- FUJIFILM Corporation
- Natsumi Yokokawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive composition, resist fi...
- Patent number 9,188,865
- Issue date Nov 17, 2015
- FUJIFILM Corporation
- Natsumi Yokokawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, and...
- Patent number 9,188,862
- Issue date Nov 17, 2015
- FUJIFILM Corporation
- Shuji Hirano
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method of forming patterns
- Patent number 9,176,386
- Issue date Nov 3, 2015
- FUJIFILM Corporation
- Hideaki Tsubaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming method, electron beam-sensitive or extreme ultravio...
- Patent number 9,170,489
- Issue date Oct 27, 2015
- FUJIFILM Corporation
- Hiroo Takizawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20240353753
- Publication date Oct 24, 2024
- FUJIFILM CORPORATION
- Asahi TAKAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20240329531
- Publication date Oct 3, 2024
- FUJIFILM CORPORATION
- Takamitsu TOMIGA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20240053679
- Publication date Feb 15, 2024
- FUJIFILM CORPORATION
- Takamitsu TOMIGA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TREATMENT LIQUID AND PATTERN FORMING METHOD
- Publication number 20210200097
- Publication date Jul 1, 2021
- FUJIFILM CORPORATION
- Hideaki TSUBAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COATING COMPOSITION, ANTIREFLECTION FILM, MANUFACTURING METHOD THER...
- Publication number 20190334037
- Publication date Oct 31, 2019
- FUJIFILM CORPORATION
- Ayana FUJIMAKI
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
COATING COMPOSITION, ANTIREFLECTION FILM, LAMINATE, METHOD FOR MANU...
- Publication number 20190233677
- Publication date Aug 1, 2019
- FUJIFILM CORPORATION
- Hideaki TSUBAKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...
- Publication number 20190219921
- Publication date Jul 18, 2019
- FUJIFILM CORPORATION
- Hideaki TSUBAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION, PATTERN FORMING METHOD, AND METHOD OF MANUFACTU...
- Publication number 20190219922
- Publication date Jul 18, 2019
- FUJIFILM CORPORATION
- Akihiro KANEKO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...
- Publication number 20190187558
- Publication date Jun 20, 2019
- FUJIFILM CORPORATION
- Wataru NIHASHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, METHOD FO...
- Publication number 20190018317
- Publication date Jan 17, 2019
- FUJIFILM CORPORATION
- Hideaki TSUBAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, METHOD FO...
- Publication number 20180364568
- Publication date Dec 20, 2018
- FUJIFILM CORPORATION
- Hideaki TSUBAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, METHOD FO...
- Publication number 20180364569
- Publication date Dec 20, 2018
- FUJIFILM CORPORATION
- Wataru NIHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
- Publication number 20180267404
- Publication date Sep 20, 2018
- FUJIFILM CORPORATION
- Akihiro KANEKO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
TREATMENT LIQUID AND PATTERN FORMING METHOD
- Publication number 20180217503
- Publication date Aug 2, 2018
- FUJIFILM CORPORATION
- Hideaki TSUBAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TREATMENT LIQUID AND PATTERN FORMING METHOD
- Publication number 20180217499
- Publication date Aug 2, 2018
- FUJIFILM CORPORATION
- Shuji HIRANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVELOPER, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE MANUFACTUR...
- Publication number 20180186907
- Publication date Jul 5, 2018
- FUJIFILM CORPORATION
- Hideaki TSUBAKI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE,...
- Publication number 20180181003
- Publication date Jun 28, 2018
- FUJIFILM CORPORATION
- Wataru NIHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE,...
- Publication number 20180180996
- Publication date Jun 28, 2018
- FUJIFILM CORPORATION
- Hideaki Tsubaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD AND ELECTRONIC DEVICE MANUFACTURING METHOD
- Publication number 20180120705
- Publication date May 3, 2018
- FUJIFILM CORPORATION
- Wataru NIHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RINSING LIQUID, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE MANUF...
- Publication number 20180120708
- Publication date May 3, 2018
- FUJIFILM CORPORATION
- Hideaki TSUBAKI
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
TREATMENT LIQUID AND PATTERN FORMING METHOD
- Publication number 20180101100
- Publication date Apr 12, 2018
- FUJIFILM CORPORATION
- Hideaki TSUBAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
- Publication number 20180017872
- Publication date Jan 18, 2018
- FUJIFILM CORPORATION
- Wataru NIHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANIC PROCESSING LIQUID AND PATTERN FORMING METHOD
- Publication number 20170285482
- Publication date Oct 5, 2017
- FUJIFILM CORPORATION
- Toru TSUCHIHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD, RESIST PATTERN, METHOD FOR MANUFACTURING EL...
- Publication number 20170075222
- Publication date Mar 16, 2017
- FUJIFILM CORPORATION
- Toru TSUCHIHASHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD, RESIST COMPOSITION FOR MULTIPLE DEVELOPMENT...
- Publication number 20160349619
- Publication date Dec 1, 2016
- FUJIFILM CORPORATION
- Hideaki TSUBAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, RESIST COMPOSITION FOR MULTIPLE DEVELOPMENT...
- Publication number 20160103395
- Publication date Apr 14, 2016
- FUJIFILM CORPORATION
- Hideaki TSUBAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOS...
- Publication number 20160024005
- Publication date Jan 28, 2016
- FUJIFILM CORPORATION
- NATSUMI YOKOKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD OF FORMING PATTERNS
- Publication number 20160009936
- Publication date Jan 14, 2016
- FUJIFILM CORPORATION
- Hideaki TSUBAKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FI...
- Publication number 20150293446
- Publication date Oct 15, 2015
- FUJIFILM CORPORATION
- Natsumi YOKOKAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FI...
- Publication number 20150284492
- Publication date Oct 8, 2015
- FUJIFILM CORPORATION
- Natsumi YOKOKAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Hideaki Tsubaki

Person

Patents Grantslast 30 patents

Actinic ray-sensitive or radiation-sensitive resin composition, pat...

Actinic ray-sensitive or radiation-sensitive composition, method fo...

Actinic ray-sensitive or radiation-sensitive composition, method fo...

Treatment liquid and pattern forming method

Treatment liquid and pattern forming method

Pattern forming method, resist pattern, method for manufacturing el...

Pattern forming method and electronic device manufacturing method

Pattern forming method, method for manufacturing electronic device,...

Pattern forming method, method for manufacturing electronic device,...

Rinsing liquid, pattern forming method, and electronic device manuf...

Developer, pattern forming method, and electronic device manufactur...

Pattern forming method and method for manufacturing electronic device

Actinic-ray- or radiation-sensitive resin composition, resist film...

Compound, actinic ray-sensitive or radiation-sensitive resin compos...

Actinic ray-sensitive or radiation-sensitive composition, resist fi...

Pattern-forming method, electron beam-sensitive or extreme ultravio...

Pattern forming method, resist composition for multiple development...

Actinic ray-sensitive or radiation-sensitive composition, resist fi...

Method of forming patterns

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Pattern forming method, electron beam-sensitive or extreme ultravio...

Actinic-ray- or radiation-sensitive resin composition, actinic-ray-...

Actinic ray-sensitive or radiation-sensitive resin composition, and...

Pattern forming method, resist composition for multiple development...

Pattern forming method, resist composition for multiple development...

Actinic ray-sensitive or radiation-sensitive composition, actinic r...

Actinic ray-sensitive or radiation-sensitive composition, resist fi...

Actinic ray-sensitive or radiation-sensitive resin composition, and...

Method of forming patterns

Pattern-forming method, electron beam-sensitive or extreme ultravio...

Patents Applicationslast 30 patents

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

TREATMENT LIQUID AND PATTERN FORMING METHOD

COATING COMPOSITION, ANTIREFLECTION FILM, MANUFACTURING METHOD THER...

COATING COMPOSITION, ANTIREFLECTION FILM, LAMINATE, METHOD FOR MANU...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...

RESIST COMPOSITION, PATTERN FORMING METHOD, AND METHOD OF MANUFACTU...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PAT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, METHOD FO...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, METHOD FO...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, METHOD FO...

PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

TREATMENT LIQUID AND PATTERN FORMING METHOD

TREATMENT LIQUID AND PATTERN FORMING METHOD

DEVELOPER, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE MANUFACTUR...

PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE,...

PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE,...

PATTERN FORMING METHOD AND ELECTRONIC DEVICE MANUFACTURING METHOD

RINSING LIQUID, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE MANUF...

TREATMENT LIQUID AND PATTERN FORMING METHOD

PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

ORGANIC PROCESSING LIQUID AND PATTERN FORMING METHOD

PATTERN FORMING METHOD, RESIST PATTERN, METHOD FOR MANUFACTURING EL...

PATTERN FORMING METHOD, RESIST COMPOSITION FOR MULTIPLE DEVELOPMENT...

PATTERN FORMING METHOD, RESIST COMPOSITION FOR MULTIPLE DEVELOPMENT...

COMPOUND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOS...

METHOD OF FORMING PATTERNS

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FI...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FI...