Hidekazu Hayashi

Person

Yokohama-Shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device, method of manufacturing semiconductor device,...
- Patent number 12,148,666
- Issue date Nov 19, 2024
- Kioxia Corporation
- Hidekazu Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle measuring device, calibration method, and measuring device
- Patent number 11,774,340
- Issue date Oct 3, 2023
- National Institute of Advanced Industrial Science and Technology
- Haruhisa Kato
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor device, method of manufacturing semiconductor device,...
- Patent number 11,652,000
- Issue date May 16, 2023
- Kioxia Corporation
- Hidekazu Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor memory device and method for driving the same
- Patent number 11,444,061
- Issue date Sep 13, 2022
- Kioxia Corporation
- Takuro Okubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus and method for manufacturing...
- Patent number 11,276,586
- Issue date Mar 15, 2022
- Kioxia Corporation
- Hidekazu Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle measuring method and detection liquid
- Patent number 11,112,344
- Issue date Sep 7, 2021
- Kioxia Corporation
- Hiroshi Tomita
- G01 - MEASURING TESTING
Information Patent Grant
Substrate processing method, substrate processing apparatus, and st...
- Patent number 10,199,240
- Issue date Feb 5, 2019
- TOSHIBA MEMORY CORPORATION
- Hidekazu Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and storage medium
- Patent number 10,096,462
- Issue date Oct 9, 2018
- TOSHIBA MEMORY CORPORATION
- Hidekazu Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing method
- Patent number 9,754,781
- Issue date Sep 5, 2017
- TOSHIBA MEMORY CORPORATION
- Shinya Okuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Supercritical drying method for semiconductor substrate and supercr...
- Patent number 9,583,330
- Issue date Feb 28, 2017
- Tokyo Electron Limited
- Linan Ji
- F26 - DRYING
Information Patent Grant
Supercritical drying method for semiconductor substrate
- Patent number 9,570,286
- Issue date Feb 14, 2017
- Kabushiki Kaisha Toshiba
- Yohei Sato
- F26 - DRYING
Information Patent Grant
Supercritical drying method for semiconductor substrate
- Patent number 9,437,416
- Issue date Sep 6, 2016
- Kabushiki Kaisha Toshiba
- Hidekazu Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for cleaning imprinting mask
- Patent number 9,164,377
- Issue date Oct 20, 2015
- Kabushiki Kaisha Toshiba
- Hiroshi Tomita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Supercritical drying method for semiconductor substrate
- Patent number 8,950,082
- Issue date Feb 10, 2015
- Kabushiki Kaisha Toshiba
- Yohei Sato
- F26 - DRYING
Information Patent Grant
Supercritical drying method for semiconductor substrate and supercr...
- Patent number 8,771,429
- Issue date Jul 8, 2014
- Kabushiki Kaisha Toshiba
- Linan Ji
- F26 - DRYING
Information Patent Grant
Supercritical drying method for semiconductor substrate
- Patent number 8,709,170
- Issue date Apr 29, 2014
- Kabushiki Kaisha Toshiba
- Yohei Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Supercritical drying method and apparatus for semiconductor substrates
- Patent number 8,372,212
- Issue date Feb 12, 2013
- Kabushiki Kaisha Toshiba
- Yohei Sato
- F26 - DRYING
Information Patent Grant
Semiconductor device and adhesive sheet
- Patent number 8,294,282
- Issue date Oct 23, 2012
- Kabushiki Kaisha Toshiba
- Hidekazu Hayashi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 8,097,538
- Issue date Jan 17, 2012
- Kabushiki Kaisha Toshiba
- Tatsuhiko Koide
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
PROCESSING APPARATUS USING LASER, METHOD OF LASER LIFT-OFF AND METH...
- Publication number 20240096682
- Publication date Mar 21, 2024
- KIOXIA Corporation
- Takuro OKUBO
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20230301080
- Publication date Sep 21, 2023
- KIOXIA Corporation
- Hidekazu HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE,...
- Publication number 20230245927
- Publication date Aug 3, 2023
- Kioxia Corporation
- Hidekazu HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING APPARATUS USING LASER, METHOD OF PROCESSING A SUBSTRATE...
- Publication number 20230105004
- Publication date Apr 6, 2023
- KIOXIA Corporation
- Takuro OKUBO
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING...
- Publication number 20220084846
- Publication date Mar 17, 2022
- Toshiba Memory Corporation
- Hidekazu HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE,...
- Publication number 20220059408
- Publication date Feb 24, 2022
- KIOXIA Corporation
- Hidekazu HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR DRIVING THE SAME
- Publication number 20220028833
- Publication date Jan 27, 2022
- KIOXIA Corporation
- Takuro OKUBO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PARTICLE MEASURING DEVICE, CALIBRATION METHOD, AND MEASURING DEVICE
- Publication number 20210348999
- Publication date Nov 11, 2021
- NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Haruhisa KATO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PARTICLE MEASURING METHOD AND DETECTION LIQUID
- Publication number 20200284714
- Publication date Sep 10, 2020
- KIOXIA Corporation
- Hiroshi TOMITA
- G01 - MEASURING TESTING
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING...
- Publication number 20200083066
- Publication date Mar 12, 2020
- Toshiba Memory Corporation
- Hidekazu HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING METHOD
- Publication number 20160276170
- Publication date Sep 22, 2016
- Kabushiki Kaisha Toshiba
- Shinya OKUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND APPARATUS THEREFOR
- Publication number 20150206773
- Publication date Jul 23, 2015
- Kabushiki Kaisha Toshiba
- Hidekazu HAYASHI
- B08 - CLEANING
Information Patent Application
SUPERCRITICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE
- Publication number 20150135549
- Publication date May 21, 2015
- Kabushiki Kaisha Toshiba
- Yohei Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPERCRITICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE AND SUPERCR...
- Publication number 20140250714
- Publication date Sep 11, 2014
- Kabushiki Kaisha Toshiba
- Linan JI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPERCRITICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE
- Publication number 20140174482
- Publication date Jun 26, 2014
- Kabushiki Kaisha Toshiba
- Yohei Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CLEANING IMPRINTING MASK
- Publication number 20140170307
- Publication date Jun 19, 2014
- Hiroshi TOMITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND STO...
- Publication number 20140020721
- Publication date Jan 23, 2014
- Hidekazu HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20130122706
- Publication date May 16, 2013
- Hisashi OKUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPERCRITICAL DRYING METHOD AND SUPERCRITICAL DRYING APPARATUS FOR...
- Publication number 20130061492
- Publication date Mar 14, 2013
- Hisashi OKUCHI
- F26 - DRYING
Information Patent Application
SUPERCRlTICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE
- Publication number 20130055584
- Publication date Mar 7, 2013
- Yohei Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPERCRITICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE AND SUPERCR...
- Publication number 20130019905
- Publication date Jan 24, 2013
- Linan JI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND ST...
- Publication number 20120304485
- Publication date Dec 6, 2012
- TOKYO ELECTRON LIMITED
- Hidekazu Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPERCRITICAL DRYING METHOD AND APPARATUS FOR SEMICONDUCTOR SUBSTRATES
- Publication number 20120247516
- Publication date Oct 4, 2012
- Yohei SATO
- F26 - DRYING
Information Patent Application
SUPERCRITICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE
- Publication number 20120240426
- Publication date Sep 27, 2012
- Hidekazu HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPERCRITICAL DRYING DEVICE AND METHOD
- Publication number 20120186097
- Publication date Jul 26, 2012
- Hidekazu HAYASHI
- F26 - DRYING
Information Patent Application
SUPERCRITICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE
- Publication number 20120118332
- Publication date May 17, 2012
- Yohei SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPERCRITICAL DRYING METHOD AND SUPERCRITICAL DRYING SYSTEM
- Publication number 20120048304
- Publication date Mar 1, 2012
- Yukiko KITAJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE DRYING METHOD
- Publication number 20110314689
- Publication date Dec 29, 2011
- Hisashi OKUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPERCRITICAL DRYING METHOD
- Publication number 20110289793
- Publication date Dec 1, 2011
- Hidekazu HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR TEMPLATE SURFACE TREATMENT, AND PATTERN FO...
- Publication number 20110244131
- Publication date Oct 6, 2011
- Yoshihisa KAWAMURA
- B82 - NANO-TECHNOLOGY

Hidekazu Hayashi

Person

Patents Grantslast 30 patents

Semiconductor device, method of manufacturing semiconductor device,...

Particle measuring device, calibration method, and measuring device

Semiconductor device, method of manufacturing semiconductor device,...

Semiconductor memory device and method for driving the same

Semiconductor manufacturing apparatus and method for manufacturing...

Particle measuring method and detection liquid

Substrate processing method, substrate processing apparatus, and st...

Substrate processing method and storage medium

Semiconductor manufacturing method

Supercritical drying method for semiconductor substrate and supercr...

Supercritical drying method for semiconductor substrate

Supercritical drying method for semiconductor substrate

Method for cleaning imprinting mask

Supercritical drying method for semiconductor substrate

Supercritical drying method for semiconductor substrate and supercr...

Supercritical drying method for semiconductor substrate

Supercritical drying method and apparatus for semiconductor substrates

Semiconductor device and adhesive sheet

Method of manufacturing semiconductor device

Patents Applicationslast 30 patents

PROCESSING APPARATUS USING LASER, METHOD OF LASER LIFT-OFF AND METH...

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE,...

PROCESSING APPARATUS USING LASER, METHOD OF PROCESSING A SUBSTRATE...

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING...

SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE,...

SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR DRIVING THE SAME

PARTICLE MEASURING DEVICE, CALIBRATION METHOD, AND MEASURING DEVICE

PARTICLE MEASURING METHOD AND DETECTION LIQUID

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING...

SEMICONDUCTOR MANUFACTURING METHOD

SUBSTRATE PROCESSING METHOD AND APPARATUS THEREFOR

SUPERCRITICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE

SUPERCRITICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE AND SUPERCR...

SUPERCRITICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE

METHOD FOR CLEANING IMPRINTING MASK

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND STO...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

SUPERCRITICAL DRYING METHOD AND SUPERCRITICAL DRYING APPARATUS FOR...

SUPERCRlTICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE

SUPERCRITICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE AND SUPERCR...

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND ST...

SUPERCRITICAL DRYING METHOD AND APPARATUS FOR SEMICONDUCTOR SUBSTRATES

SUPERCRITICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE

SUPERCRITICAL DRYING DEVICE AND METHOD

SUPERCRITICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE

SUPERCRITICAL DRYING METHOD AND SUPERCRITICAL DRYING SYSTEM

SUBSTRATE DRYING METHOD

SUPERCRITICAL DRYING METHOD

METHOD AND APPARATUS FOR TEMPLATE SURFACE TREATMENT, AND PATTERN FO...