Hidetsugu Ogishi

Person

Hachioji, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Fabrication method of semiconductor integrated circuit device
- Patent number 7,189,636
- Issue date Mar 13, 2007
- Renesas Technology Corp.
- Kazuhito Ichinose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor integrated circuit device, process for fabricating th...
- Patent number 6,894,334
- Issue date May 17, 2005
- Hitachi, Ltd.
- Jun Sugiura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor integrated circuit device having switching misfet and...
- Patent number 6,737,318
- Issue date May 18, 2004
- Hitachi, Ltd.
- Jun Murata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE HAVING A FIRST WIRING STRIP...
- Patent number 6,548,847
- Issue date Apr 15, 2003
- Hitachi, Ltd.
- Jun Sugiura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor integrated circuit device, process for fabricating th...
- Patent number 6,342,412
- Issue date Jan 29, 2002
- Hitachi, Ltd.
- Jun Sugiura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of producing semiconductor integrated circuit device having...
- Patent number 6,281,071
- Issue date Aug 28, 2001
- Hiatchi, Ltd.
- Jun Murata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor integrated circuit device, process for fabricating th...
- Patent number 6,169,324
- Issue date Jan 2, 2001
- Hitachi, Ltd.
- Jun Sugiura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor integrated circuit device, process for fabricating th...
- Patent number 6,127,255
- Issue date Oct 3, 2000
- Hitachi, Ltd.
- Jun Sugiura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of producing semiconductor integrated circuit device having...
- Patent number 5,930,624
- Issue date Jul 27, 1999
- Hitachi, Ltd.
- Jun Murata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming teos oxide and silicon nitride passivation layer...
- Patent number 5,811,316
- Issue date Sep 22, 1998
- Hitachi Ltd.
- Jun Sugiura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor integrated circuit device, process for fabricating th...
- Patent number 5,780,882
- Issue date Jul 14, 1998
- Hitachi, Ltd.
- Jun Sugiura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor integrated circuit device having switching MISFET and...
- Patent number 5,753,550
- Issue date May 19, 1998
- Hitachi, Ltd.
- Jun Murata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor integrated circuit device process for fabricating the...
- Patent number 5,739,589
- Issue date Apr 14, 1998
- Hitachi, Ltd.
- Jun Sugiura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor integrated circuit device, process for fabricating th...
- Patent number 5,557,147
- Issue date Sep 17, 1996
- Hitachi, Ltd.
- Jun Sugiura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of producing semiconductor integrated circuit device having...
- Patent number 5,504,029
- Issue date Apr 2, 1996
- Hitachi, Ltd.
- Jun Murata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor integrated circuit device, process for fabricating th...
- Patent number 5,331,191
- Issue date Jul 19, 1994
- Hitachi, Ltd.
- Jun Sugiura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor integrated circuit device, process for fabricating th...
- Patent number 5,202,275
- Issue date Apr 13, 1993
- Hitachi Ltd.
- Jun Sugiura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor integrated circuit device having switching MISFET and...
- Patent number 5,153,685
- Issue date Oct 6, 1992
- Hitachi, Ltd.
- Jun Murata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Target for sputtering
- Patent number 4,610,774
- Issue date Sep 9, 1986
- Hitachi, Ltd.
- Masao Sakata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Planar magnetron sputtering with modified field configuration
- Patent number 4,606,802
- Issue date Aug 19, 1986
- Hitachi, Ltd.
- Shigeru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Semiconductor integrated circuit device having switching MISFET and...
- Publication number 20040155289
- Publication date Aug 12, 2004
- Jun Murata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fabrication method of semiconductor integrated circuit device
- Publication number 20040121591
- Publication date Jun 24, 2004
- Kazuhito Ichinose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor integrated circuit device, process for fabricating th...
- Publication number 20030189255
- Publication date Oct 9, 2003
- Jun Sugiura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor integrated circuit device having switching misfet and...
- Publication number 20020127793
- Publication date Sep 12, 2002
- Jun Murata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor integrated circuit device having switching misfet and...
- Publication number 20020028574
- Publication date Mar 7, 2002
- Jun Murata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor integrated circuit device, process for fabricating th...
- Publication number 20020017669
- Publication date Feb 14, 2002
- Jun Sugiura
- H01 - BASIC ELECTRIC ELEMENTS

Hidetsugu Ogishi

Person

Patents Grantslast 30 patents

Fabrication method of semiconductor integrated circuit device

Semiconductor integrated circuit device, process for fabricating th...

Semiconductor integrated circuit device having switching misfet and...

SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE HAVING A FIRST WIRING STRIP...

Semiconductor integrated circuit device, process for fabricating th...

Method of producing semiconductor integrated circuit device having...

Semiconductor integrated circuit device, process for fabricating th...

Semiconductor integrated circuit device, process for fabricating th...

Method of producing semiconductor integrated circuit device having...

Method of forming teos oxide and silicon nitride passivation layer...

Semiconductor integrated circuit device, process for fabricating th...

Semiconductor integrated circuit device having switching MISFET and...

Semiconductor integrated circuit device process for fabricating the...

Semiconductor integrated circuit device, process for fabricating th...

Method of producing semiconductor integrated circuit device having...

Semiconductor integrated circuit device, process for fabricating th...

Semiconductor integrated circuit device, process for fabricating th...

Semiconductor integrated circuit device having switching MISFET and...

Target for sputtering

Planar magnetron sputtering with modified field configuration

Patents Applicationslast 30 patents

Semiconductor integrated circuit device having switching MISFET and...

Fabrication method of semiconductor integrated circuit device

Semiconductor integrated circuit device, process for fabricating th...

Semiconductor integrated circuit device having switching misfet and...

Semiconductor integrated circuit device having switching misfet and...

Semiconductor integrated circuit device, process for fabricating th...