Hideyuki Yamamoto

Person

Kudamatsu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing system and apparatus and a sample processing method
- Patent number 7,686,917
- Issue date Mar 30, 2010
- Hitachi, Ltd.
- Toshio Masuda
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 7,611,993
- Issue date Nov 3, 2009
- Hitachi High-Technologies Corporation
- Tetsuo Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Disturbance-free, recipe-controlled plasma processing system and me...
- Patent number 7,601,240
- Issue date Oct 13, 2009
- Hitachi, Ltd.
- Akira Kagoshima
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Device and method for detecting foreign material on the surface of...
- Patent number 7,526,948
- Issue date May 5, 2009
- Hitachi High-Technologies Corporation
- Hideyuki Yamamoto
- G01 - MEASURING TESTING
Information Patent Grant
Method for processing semiconductor
- Patent number 7,473,332
- Issue date Jan 6, 2009
- Hitachi High-Technologies Corporation
- Junichi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated service management system for remote customer support
- Patent number 7,464,152
- Issue date Dec 9, 2008
- Hitachi, Ltd.
- Takeshi Ishizaki
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process monitoring device for sample processing apparatus and contr...
- Patent number 7,376,479
- Issue date May 20, 2008
- Hitachi, Ltd.
- Junichi Tanaka
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
System for monitoring and controlling a semiconductor manufacturing...
- Patent number 7,343,217
- Issue date Mar 11, 2008
- Hitachi, Ltd.
- Junichi Tanaka
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Etching apparatus, method for measuring self-bias voltage, and meth...
- Patent number 7,330,346
- Issue date Feb 12, 2008
- Hitachi High-Technologies Corporation
- Shoji Ikuhara
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Method for operating a semiconductor processing apparatus
- Patent number 7,183,715
- Issue date Feb 27, 2007
- Hitachi High-Technologies Corporation
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system and apparatus and a sample processing method
- Patent number 7,169,254
- Issue date Jan 30, 2007
- Hitachi, Ltd.
- Toshio Masuda
- G01 - MEASURING TESTING
Information Patent Grant
Particle control device and particle control method for vacuum proc...
- Patent number 7,166,480
- Issue date Jan 23, 2007
- Hitachi High-Technologies Corporation
- Daisuke Shiraishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process monitoring device for sample processing apparatus and contr...
- Patent number 7,158,848
- Issue date Jan 2, 2007
- Hitachi, Ltd.
- Junichi Tanaka
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Plasma processing method
- Patent number 7,147,748
- Issue date Dec 12, 2006
- Hitachi High-Technologies Corporation
- Go Miya
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 7,147,747
- Issue date Dec 12, 2006
- Hitachi High-Technologies Corporation
- Go Miya
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for determining endpoint of semiconductor elem...
- Patent number 7,126,697
- Issue date Oct 24, 2006
- Hitachi, Ltd.
- Tatehito Usui
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for processing semiconductor
- Patent number 7,122,096
- Issue date Oct 17, 2006
- Hitachi High-Technologies Corporation
- Junichi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for controlling semiconductor processing apparatus
- Patent number 7,107,115
- Issue date Sep 12, 2006
- Hitachi High-Technologies Corporation
- Junichi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated service management system for remote customer support
- Patent number 7,085,827
- Issue date Aug 1, 2006
- Hitachi, Ltd.
- Takeshi Ishizaki
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Maintenance method and system for plasma processing apparatus
- Patent number 7,062,347
- Issue date Jun 13, 2006
- Hitachi, Ltd.
- Hideyuki Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of monitoring and/or controlling a semiconductor manufacturi...
- Patent number 7,058,470
- Issue date Jun 6, 2006
- Hitachi, Ltd.
- Junichi Tanaka
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Process monitoring device for sample processing apparatus and contr...
- Patent number 7,058,467
- Issue date Jun 6, 2006
- Hitachi, Ltd.
- Junichi Tanaka
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method for controlling semiconductor processing apparatus
- Patent number 7,010,374
- Issue date Mar 7, 2006
- Hitachi High-Technologies Corporation
- Junichi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for determining endpoint of semiconductor elem...
- Patent number 7,009,715
- Issue date Mar 7, 2006
- Hitachi, Ltd.
- Tatehito Usui
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing apparatus and processing method
- Patent number 6,939,435
- Issue date Sep 6, 2005
- Hitachi, Ltd.
- Junichi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample processing apparatus and sample processing system
- Patent number 6,939,433
- Issue date Sep 6, 2005
- Hitachi High-Technologies Corporation
- Shoji Ikuhara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system and apparatus and a sample processing method
- Patent number 6,923,885
- Issue date Aug 2, 2005
- Hitachi, Ltd.
- Toshio Masuda
- G01 - MEASURING TESTING
Information Patent Grant
Etching system and etching method
- Patent number 6,916,396
- Issue date Jul 12, 2005
- Hitachi High-Technologies Corporation
- Akira Kagoshima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and apparatus using dynamic sensing of a p...
- Patent number 6,911,157
- Issue date Jun 28, 2005
- Hitachi, Ltd.
- Manabu Edamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 6,908,529
- Issue date Jun 21, 2005
- Hitachi High-Technologies Corporation
- Hideyuki Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Plasma Processing Method
- Publication number 20100297783
- Publication date Nov 25, 2010
- Shoji Ikuhara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus
- Publication number 20100132888
- Publication date Jun 3, 2010
- Shoji Ikuhara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Disturbance-Free, Recipe-Controlled Plasma Processing System And Me...
- Publication number 20090120580
- Publication date May 14, 2009
- Akira Kagoshima
- G05 - CONTROLLING REGULATING
Information Patent Application
Plasma Processing System And Apparatus And A Sample Processing Method
- Publication number 20080011422
- Publication date Jan 17, 2008
- Toshio Masuda
- G01 - MEASURING TESTING
Information Patent Application
Etching apparatus, method for measuring self-bias voltage, and meth...
- Publication number 20070217118
- Publication date Sep 20, 2007
- Shoji Ikuhara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Disturbance-free, recipe-controlled plasma processing system and me...
- Publication number 20070193687
- Publication date Aug 23, 2007
- Akira Kagoshima
- G05 - CONTROLLING REGULATING
Information Patent Application
Plasma Processing Method And Plasma Processing Apparatus
- Publication number 20070184562
- Publication date Aug 9, 2007
- Tetsuo Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process monitoring device for sample processing apparatus and contr...
- Publication number 20070162172
- Publication date Jul 12, 2007
- Junichi Tanaka
- G05 - CONTROLLING REGULATING
Information Patent Application
Device and method for detecting foreign material on the surface of...
- Publication number 20070032088
- Publication date Feb 8, 2007
- Hideyuki Yamamoto
- G01 - MEASURING TESTING
Information Patent Application
Plasma processing apparatus
- Publication number 20060260746
- Publication date Nov 23, 2006
- Shoji Ikuhara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated service management system for remote customer support
- Publication number 20060242290
- Publication date Oct 26, 2006
- Hitachi, Ltd
- Takeshi Ishizaki
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method of monitoring and/or controlling a semiconductor manufacturi...
- Publication number 20060212156
- Publication date Sep 21, 2006
- Junichi Tanaka
- G05 - CONTROLLING REGULATING
Information Patent Application
Data processing apparatus for semiconductor processing apparatus
- Publication number 20060199288
- Publication date Sep 7, 2006
- Junichi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method
- Publication number 20060151429
- Publication date Jul 13, 2006
- Hiroyuki Kitsunai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process monitoring device for sample processing apparatus and contr...
- Publication number 20060142888
- Publication date Jun 29, 2006
- Junichi Tanaka
- G05 - CONTROLLING REGULATING
Information Patent Application
Method and apparatus for determining endpoint of semiconductor elem...
- Publication number 20060132798
- Publication date Jun 22, 2006
- Tatehito Usui
- G01 - MEASURING TESTING
Information Patent Application
Disturbance-free, recipe-controlled plasma processing system and me...
- Publication number 20060124243
- Publication date Jun 15, 2006
- Akira Kagoshima
- G05 - CONTROLLING REGULATING
Information Patent Application
Method for controlling semiconductor processing apparatus
- Publication number 20060129264
- Publication date Jun 15, 2006
- Junichi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor fabricating apparatus and method and apparatus for de...
- Publication number 20060073619
- Publication date Apr 6, 2006
- Tatehito Usui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and processing method
- Publication number 20050284574
- Publication date Dec 29, 2005
- Junichi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching system and etching method
- Publication number 20050236364
- Publication date Oct 27, 2005
- Akira Kagoshima
- G05 - CONTROLLING REGULATING
Information Patent Application
Semiconductor fabricating apparatus and method and apparatus for de...
- Publication number 20050202575
- Publication date Sep 15, 2005
- Tatehito Usui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PROCESSING METHOD
- Publication number 20050189070
- Publication date Sep 1, 2005
- Junichi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method
- Publication number 20050189320
- Publication date Sep 1, 2005
- Tomoyoshi Ichimaru
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method and plasma processing apparatus
- Publication number 20050183822
- Publication date Aug 25, 2005
- Tetsuo Ono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for processing semiconductor
- Publication number 20050158886
- Publication date Jul 21, 2005
- Junichi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Remote diagnostic system for facilities and remote diagnostic method
- Publication number 20050108577
- Publication date May 19, 2005
- Kouji Nishihata
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method for operating a semiconductor processing apparatus
- Publication number 20050089625
- Publication date Apr 28, 2005
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process monitoring device for sample processing apparatus and contr...
- Publication number 20050090914
- Publication date Apr 28, 2005
- Junichi Tanaka
- G05 - CONTROLLING REGULATING
Information Patent Application
Method of monitoring and/or controlling a semiconductor manufacturi...
- Publication number 20050087298
- Publication date Apr 28, 2005
- Junichi Tanaka
- G05 - CONTROLLING REGULATING

Hideyuki Yamamoto

Person

Patents Grantslast 30 patents

Plasma processing system and apparatus and a sample processing method

Plasma processing method and plasma processing apparatus

Disturbance-free, recipe-controlled plasma processing system and me...

Device and method for detecting foreign material on the surface of...

Method for processing semiconductor

Integrated service management system for remote customer support

Process monitoring device for sample processing apparatus and contr...

System for monitoring and controlling a semiconductor manufacturing...

Etching apparatus, method for measuring self-bias voltage, and meth...

Method for operating a semiconductor processing apparatus

Plasma processing system and apparatus and a sample processing method

Particle control device and particle control method for vacuum proc...

Process monitoring device for sample processing apparatus and contr...

Plasma processing method

Plasma processing apparatus and plasma processing method

Method and apparatus for determining endpoint of semiconductor elem...

Method and apparatus for processing semiconductor

Method for controlling semiconductor processing apparatus

Integrated service management system for remote customer support

Maintenance method and system for plasma processing apparatus

Method of monitoring and/or controlling a semiconductor manufacturi...

Process monitoring device for sample processing apparatus and contr...

Method for controlling semiconductor processing apparatus

Method and apparatus for determining endpoint of semiconductor elem...

Plasma processing apparatus and processing method

Sample processing apparatus and sample processing system

Plasma processing system and apparatus and a sample processing method

Etching system and etching method

Plasma processing method and apparatus using dynamic sensing of a p...

Plasma processing apparatus and method

Patents Applicationslast 30 patents

Plasma Processing Method

Plasma Processing Apparatus

Disturbance-Free, Recipe-Controlled Plasma Processing System And Me...

Plasma Processing System And Apparatus And A Sample Processing Method

Etching apparatus, method for measuring self-bias voltage, and meth...

Disturbance-free, recipe-controlled plasma processing system and me...

Plasma Processing Method And Plasma Processing Apparatus

Process monitoring device for sample processing apparatus and contr...

Device and method for detecting foreign material on the surface of...

Plasma processing apparatus

Integrated service management system for remote customer support

Method of monitoring and/or controlling a semiconductor manufacturi...

Data processing apparatus for semiconductor processing apparatus

Plasma processing method

Process monitoring device for sample processing apparatus and contr...

Method and apparatus for determining endpoint of semiconductor elem...

Disturbance-free, recipe-controlled plasma processing system and me...

Method for controlling semiconductor processing apparatus

Semiconductor fabricating apparatus and method and apparatus for de...

Plasma processing apparatus and processing method

Etching system and etching method

Semiconductor fabricating apparatus and method and apparatus for de...

PLASMA PROCESSING APPARATUS AND PROCESSING METHOD

Plasma processing method

Plasma processing method and plasma processing apparatus

Method for processing semiconductor

Remote diagnostic system for facilities and remote diagnostic method

Method for operating a semiconductor processing apparatus

Process monitoring device for sample processing apparatus and contr...

Method of monitoring and/or controlling a semiconductor manufacturi...