Hiraku Ishikawa

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Film forming method, boron film, and film forming apparatus
- Patent number 10,388,524
- Issue date Aug 20, 2019
- Tokyo Electron Limited
- Hirokazu Ueda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of aftertreatment of amorphous hydrocarbon film and method f...
- Patent number 8,936,829
- Issue date Jan 20, 2015
- Tokyo Electron Limited
- Hiraku Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Pattern-forming method and method for manufacturing semiconductor d...
- Patent number 8,809,207
- Issue date Aug 19, 2014
- Tokyo Electron Limited
- Hiraku Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming amorphous carbon nitride film, amorphous carbon...
- Patent number 8,741,396
- Issue date Jun 3, 2014
- Tokyo Electron Limited
- Hiraku Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sealing film forming method, sealing film forming device, and light...
- Patent number 8,674,397
- Issue date Mar 18, 2014
- Tokyo Electron Limited
- Hiraku Ishikawa
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method for processing amorphous carbon film, and semiconductor devi...
- Patent number 8,461,047
- Issue date Jun 11, 2013
- Tokyo Electron Limited
- Hiraku Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Forming method of amorphous carbon film, amorphous carbon film, mul...
- Patent number 8,409,460
- Issue date Apr 2, 2013
- Tokyo Electron Limited
- Hiraku Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Aftertreatment method for amorphous carbon film
- Patent number 8,377,818
- Issue date Feb 19, 2013
- Tokyo Electron Limited
- Hiraku Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus, plasma processing method and storage m...
- Patent number 8,262,844
- Issue date Sep 11, 2012
- Tokyo Electron Limited
- Hiraku Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 8,017,519
- Issue date Sep 13, 2011
- Tokyo Electron Limited
- Hiraku Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing methods
- Patent number 7,842,356
- Issue date Nov 30, 2010
- Tokyo Electron Limited
- Hiraku Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma film-forming apparatus and plasma film-forming method
- Patent number 7,658,799
- Issue date Feb 9, 2010
- Tokyo Electron Limited
- Hiraku Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and semiconductor device
- Patent number 6,716,725
- Issue date Apr 6, 2004
- Tokyo Electron Limited
- Hiraku Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 6,528,410
- Issue date Mar 4, 2003
- NEC Corporation
- Tatsuya Usami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device using a thermal treatment of the device in a p...
- Patent number 6,319,847
- Issue date Nov 20, 2001
- NEC Corporation
- Hiraku Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing isolation trenches using silicon nitride liner
- Patent number 6,277,706
- Issue date Aug 21, 2001
- NEC Corporation
- Hiraku Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multilevel interconnection in a semiconductor device and method for...
- Patent number 6,239,016
- Issue date May 29, 2001
- NEC Corporation
- Hiraku Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluorine doping concentrations in a multi-structure semiconductor d...
- Patent number 6,157,083
- Issue date Dec 5, 2000
- NEC Corporation
- Tatsuya Usami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing a reliable semiconductor device using ECR-...
- Patent number 6,071,832
- Issue date Jun 6, 2000
- NEC Corporation
- Hiraku Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wiring layer in semiconductor device
- Patent number 5,894,170
- Issue date Apr 13, 1999
- NEC Corporation
- Hiraku Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating salicide-structure semiconductor device
- Patent number 5,882,975
- Issue date Mar 16, 1999
- NEC Corporation
- Hiraku Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multilevel interconnection in a semiconductor device and method for...
- Patent number 5,861,674
- Issue date Jan 19, 1999
- NEC Corporation
- Hiraku Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a polysilicon resistor element with inc...
- Patent number 5,751,050
- Issue date May 12, 1998
- NEC Corporation
- Hiraku Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device capable of rapidly f...
- Patent number 5,723,386
- Issue date Mar 3, 1998
- NEC Corporation
- Hiraku Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Planarization of insulation film using low wettingness surface
- Patent number 5,633,208
- Issue date May 27, 1997
- NEC Corporation
- Hiraku Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating an oxynitride film for use in a semiconducto...
- Patent number 5,587,344
- Issue date Dec 24, 1996
- NEC Corporation
- Hiraku Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Film Forming Method, Boron Film, and Film Forming Apparatus
- Publication number 20180174838
- Publication date Jun 21, 2018
- TOKYO ELECTRON LIMITED
- Hirokazu UEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING SILICON NITRIDE FILM, AND APPARATUS FOR FORMING...
- Publication number 20150194637
- Publication date Jul 9, 2015
- TOKYO ELECTRON LIMITED
- Hiraku Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PATTERN-FORMING METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR D...
- Publication number 20140080307
- Publication date Mar 20, 2014
- TOKYO ELECTRON LIMITED
- Hiraku Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING DEVICE, SUBSTRATE PROCESSING SYSTEM AND SEMICONDUCTOR...
- Publication number 20130330928
- Publication date Dec 12, 2013
- TOKYO ELECTRON LIMITED
- Hiraku Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EVAPORATING APPARATUS AND EVAPORATING METHOD
- Publication number 20130209666
- Publication date Aug 15, 2013
- TOKYO ELECTRON LIMITED
- Tomiko Kamada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEALING FILM FORMING METHOD, SEALING FILM FORMING DEVICE, AND LIGHT...
- Publication number 20130126939
- Publication date May 23, 2013
- TOKYO ELECTRON LIMITED
- Hiraku ISHIKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTERING DEVICE
- Publication number 20120160671
- Publication date Jun 28, 2012
- TOKYO ELECTRON LIMITED
- Hiraku Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD OF AMORPHOUS CARBON FILM AND MANUFACTURING METH...
- Publication number 20120156884
- Publication date Jun 21, 2012
- TOKYO ELECTRON LIMITED
- Toshihisa Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING AMORPHOUS CARBON NITRIDE FILM, AMORPHOUS CARBON...
- Publication number 20110201206
- Publication date Aug 18, 2011
- TOKYO ELECTRON LIMITED
- Hiraku Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR PROCESSING AMORPHOUS CARBON FILM, AND SEMICONDUCTOR DEVI...
- Publication number 20110053375
- Publication date Mar 3, 2011
- TOKYO ELECTRON LIMITED
- Hiraku Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20100323516
- Publication date Dec 23, 2010
- TOKYO ELECTRON LIMITED
- Hiraku Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF AFTERTREATMENT OF AMORPHOUS HYDROCARBON FILM AND METHOD F...
- Publication number 20100304014
- Publication date Dec 2, 2010
- TOKYO ELECTRON LIMITED
- Hiraku Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ORGANIC ELECTRONIC DEVICE, ORGANIC ELECTRONIC DEVICE MANUFACTURING...
- Publication number 20100243999
- Publication date Sep 30, 2010
- TOKYO ELECTRON LIMITED
- Hiraku Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FORMING METHOD OF AMORPHOUS CARBON FILM, AMORPHOUS CARBON FILM, MUL...
- Publication number 20100105213
- Publication date Apr 29, 2010
- TOKYO ELECTRON LIMITED
- Hiraku Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND STORAGE M...
- Publication number 20100089871
- Publication date Apr 15, 2010
- TOKYO ELECTRON LIMITED
- Hiraku Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Aftertreatment Method for Amorphous Carbon Film
- Publication number 20100062612
- Publication date Mar 11, 2010
- TOKYO ELECTRON LIMITED
- Hiraku Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
AMORPHOUS CARBON FILM, SEMICONDUCTOR DEVICE, FILM FORMING METHOD, F...
- Publication number 20100032838
- Publication date Feb 11, 2010
- TOKYO ELECTRON LIMITED
- Yoshiyuki Kikuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film Forming Method of Amorphous Carbon Film and Manufacturing Meth...
- Publication number 20090011602
- Publication date Jan 8, 2009
- TOKYO ELECTRON LIMITED
- Toshihisa Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Film-Forming Apparatus and Plasma Film-Forming Method
- Publication number 20080213504
- Publication date Sep 4, 2008
- TOKYO ELECTRON LIMITED
- Hiraku Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Substrate processing method, computer readable recording medium and...
- Publication number 20070062453
- Publication date Mar 22, 2007
- TOKYO ELECTRON LIMITED
- Hiraku Ishikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Hiraku Ishikawa

Person

Patents Grantslast 30 patents

Film forming method, boron film, and film forming apparatus

Method of aftertreatment of amorphous hydrocarbon film and method f...

Pattern-forming method and method for manufacturing semiconductor d...

Method for forming amorphous carbon nitride film, amorphous carbon...

Sealing film forming method, sealing film forming device, and light...

Method for processing amorphous carbon film, and semiconductor devi...

Forming method of amorphous carbon film, amorphous carbon film, mul...

Aftertreatment method for amorphous carbon film

Plasma processing apparatus, plasma processing method and storage m...

Semiconductor device and manufacturing method thereof

Substrate processing methods

Plasma film-forming apparatus and plasma film-forming method

Plasma processing method and semiconductor device

Method for manufacturing semiconductor device

Semiconductor device using a thermal treatment of the device in a p...

Method of manufacturing isolation trenches using silicon nitride liner

Multilevel interconnection in a semiconductor device and method for...

Fluorine doping concentrations in a multi-structure semiconductor d...

Method for manufacturing a reliable semiconductor device using ECR-...

Wiring layer in semiconductor device

Method of fabricating salicide-structure semiconductor device

Multilevel interconnection in a semiconductor device and method for...

Semiconductor device having a polysilicon resistor element with inc...

Method of manufacturing a semiconductor device capable of rapidly f...

Planarization of insulation film using low wettingness surface

Method for fabricating an oxynitride film for use in a semiconducto...

Patents Applicationslast 30 patents

Film Forming Method, Boron Film, and Film Forming Apparatus

METHOD FOR FORMING SILICON NITRIDE FILM, AND APPARATUS FOR FORMING...

PATTERN-FORMING METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR D...

FILM FORMING DEVICE, SUBSTRATE PROCESSING SYSTEM AND SEMICONDUCTOR...

EVAPORATING APPARATUS AND EVAPORATING METHOD

SEALING FILM FORMING METHOD, SEALING FILM FORMING DEVICE, AND LIGHT...

SPUTTERING DEVICE

FILM FORMING METHOD OF AMORPHOUS CARBON FILM AND MANUFACTURING METH...

METHOD FOR FORMING AMORPHOUS CARBON NITRIDE FILM, AMORPHOUS CARBON...

METHOD FOR PROCESSING AMORPHOUS CARBON FILM, AND SEMICONDUCTOR DEVI...

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

METHOD OF AFTERTREATMENT OF AMORPHOUS HYDROCARBON FILM AND METHOD F...

ORGANIC ELECTRONIC DEVICE, ORGANIC ELECTRONIC DEVICE MANUFACTURING...

FORMING METHOD OF AMORPHOUS CARBON FILM, AMORPHOUS CARBON FILM, MUL...

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND STORAGE M...

Aftertreatment Method for Amorphous Carbon Film

AMORPHOUS CARBON FILM, SEMICONDUCTOR DEVICE, FILM FORMING METHOD, F...

Film Forming Method of Amorphous Carbon Film and Manufacturing Meth...

Plasma Film-Forming Apparatus and Plasma Film-Forming Method

Substrate processing method, computer readable recording medium and...