Hirokazu Tokuno

Person

Cupertino, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Void free interlayer dielectric
- Patent number 8,614,475
- Issue date Dec 24, 2013
- Spansion LLC
- Minh Van Ngo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gap-filling with uniform properties
- Patent number 8,415,256
- Issue date Apr 9, 2013
- Alexander Nickel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Void free interlayer dielectric
- Patent number 8,367,493
- Issue date Feb 5, 2013
- Spansion LLC
- Minh Van Ngo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multilayer low reflectivity hard mask and process therefor
- Patent number 8,309,457
- Issue date Nov 13, 2012
- Advanced Micro Devices, Inc.
- Kouros Ghandehari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multilayer low reflectivity hard mask and process therefor
- Patent number 8,048,797
- Issue date Nov 1, 2011
- Advanced Micro Devices, Inc.
- Kouros Ghandehari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cu annealing for improved data retention in flash memory devices
- Patent number 8,026,169
- Issue date Sep 27, 2011
- Advanced Micro Devices, Inc.
- Lu You
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film stacks to prevent UV-induced device damage
- Patent number 7,927,723
- Issue date Apr 19, 2011
- Spansion LLC
- Angela T. Hui
- G02 - OPTICS
Information Patent Grant
Triple layer anti-reflective hard mask
- Patent number 7,888,269
- Issue date Feb 15, 2011
- Spansion LLC
- Kouros Ghandehari
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Gap-filling with uniform properties
- Patent number 7,884,030
- Issue date Feb 8, 2011
- Advanced Micro Devices, Inc. and Spansion LLC
- Alexander Nickel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multilayer low reflectivity hard mask and process therefor
- Patent number 7,538,026
- Issue date May 26, 2009
- Advanced Micro Devices, Inc.
- Kouros Ghandehari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor devices with copper interconnects and composite silic...
- Patent number 7,534,732
- Issue date May 19, 2009
- Spansion LLC
- Minh Van Ngo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Disposable hard mask for forming bit lines
- Patent number 7,341,956
- Issue date Mar 11, 2008
- Spansion LLC
- Hirokazu Tokuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Void free interlayer dielectric
- Patent number 7,307,027
- Issue date Dec 11, 2007
- Advanced Micro Devices, Inc.
- Minh Van Ngo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Non-volatile memory device with increased reliability
- Patent number 7,238,571
- Issue date Jul 3, 2007
- Advanced Micro Devices, Inc.
- Hirokazu Tokuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for gate formation in a semiconductor device
- Patent number 7,220,643
- Issue date May 22, 2007
- Spansion LLC
- Hajime Wada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Using thin undoped TEOS with BPTEOS ILD or BPTEOS ILD alone to impr...
- Patent number 7,157,335
- Issue date Jan 2, 2007
- Spansion LLC
- Ning Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure and method for preventing UV radiation damage in a memory...
- Patent number 6,894,342
- Issue date May 17, 2005
- Spansion LLC
- Angela Hui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure and method for preventing process-induced UV radiation da...
- Patent number 6,833,581
- Issue date Dec 21, 2004
- Spansion LLC
- Angela Hui
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
VOID FREE INTERLAYER DIELECTRIC
- Publication number 20130140720
- Publication date Jun 6, 2013
- Advanced Micro Devices, Inc.
- Minh Van Ngo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTILAYER LOW REFLECTIVITY HARD MASK AND PROCESS THEREFOR
- Publication number 20120045888
- Publication date Feb 23, 2012
- Kouros Ghandehari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTILAYER LOW REFLECTIVITY HARD MASK AND PROCESS THEREFOR
- Publication number 20100009536
- Publication date Jan 14, 2010
- Advanced Micro Devices, Inc.
- Kouros Ghandehari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Cu annealing for improved data retention in flash memory devices
- Publication number 20080108193
- Publication date May 8, 2008
- Spansion LLC
- Lu You
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Conformal liner for gap-filling
- Publication number 20080096364
- Publication date Apr 24, 2008
- Spansion LLC
- Erik Wilson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Triple layer anti-reflective hard mask
- Publication number 20070093070
- Publication date Apr 26, 2007
- Kouros Ghandehari
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Using thin undoped TEOS with BPTEOS ILD or BPTEOS ILD alone to impr...
- Publication number 20070029604
- Publication date Feb 8, 2007
- Ning Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of fabricating the same
- Publication number 20060214218
- Publication date Sep 28, 2006
- Kiyokazu Shishido
- H01 - BASIC ELECTRIC ELEMENTS

Hirokazu Tokuno

Person

Patents Grantslast 30 patents

Void free interlayer dielectric

Gap-filling with uniform properties

Void free interlayer dielectric

Multilayer low reflectivity hard mask and process therefor

Multilayer low reflectivity hard mask and process therefor

Cu annealing for improved data retention in flash memory devices

Film stacks to prevent UV-induced device damage

Triple layer anti-reflective hard mask

Gap-filling with uniform properties

Multilayer low reflectivity hard mask and process therefor

Semiconductor devices with copper interconnects and composite silic...

Disposable hard mask for forming bit lines

Void free interlayer dielectric

Non-volatile memory device with increased reliability

System and method for gate formation in a semiconductor device

Using thin undoped TEOS with BPTEOS ILD or BPTEOS ILD alone to impr...

Structure and method for preventing UV radiation damage in a memory...

Structure and method for preventing process-induced UV radiation da...

Patents Applicationslast 30 patents

VOID FREE INTERLAYER DIELECTRIC

MULTILAYER LOW REFLECTIVITY HARD MASK AND PROCESS THEREFOR

MULTILAYER LOW REFLECTIVITY HARD MASK AND PROCESS THEREFOR

Cu annealing for improved data retention in flash memory devices

Conformal liner for gap-filling

Triple layer anti-reflective hard mask

Using thin undoped TEOS with BPTEOS ILD or BPTEOS ILD alone to impr...

Semiconductor device and method of fabricating the same