Hirokazu Ueda

Person

Hyogo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,112,921
- Issue date Oct 8, 2024
- Tokyo Electron Limited
- Hiroyuki Ikuta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 12,077,865
- Issue date Sep 3, 2024
- Tokyo Electron Limited
- Hideki Yuasa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 12,060,641
- Issue date Aug 13, 2024
- Tokyo Electron Limited
- Hirokazu Ueda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and ionic liquid
- Patent number 12,011,738
- Issue date Jun 18, 2024
- Tokyo Electron Limited
- Takeo Nakano
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Processing apparatus and film forming method
- Patent number 11,972,929
- Issue date Apr 30, 2024
- Tokyo Electron Limited
- Makoto Wada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,842,886
- Issue date Dec 12, 2023
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming boron-based film, formation apparatus
- Patent number 11,615,957
- Issue date Mar 28, 2023
- Tokyo Electron Limited
- Hirokazu Ueda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming boron-based film, and film forming apparatus
- Patent number 11,145,522
- Issue date Oct 12, 2021
- Tokyo Electron Limited
- Yoshimasa Watanabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method, boron film, and film forming apparatus
- Patent number 10,388,524
- Issue date Aug 20, 2019
- Tokyo Electron Limited
- Hirokazu Ueda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for using heated substrates for process chemistry control
- Patent number 10,249,498
- Issue date Apr 2, 2019
- Tokyo Electron Limited
- Peter L. G. Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and measurement method
- Patent number 9,658,106
- Issue date May 23, 2017
- Tokyo Electron Limited
- Yuuki Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Doping method, doping apparatus and method of manufacturing semicon...
- Patent number 9,472,404
- Issue date Oct 18, 2016
- Tokyo Electron Limited
- Hirokazu Ueda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating semiconductor device and the semiconductor d...
- Patent number 9,230,799
- Issue date Jan 5, 2016
- Tohoku University
- Akinobu Teramoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed gas plasma doping method and apparatus
- Patent number 9,165,771
- Issue date Oct 20, 2015
- Tokyo Electron Limited
- Peter Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming method using plasma
- Patent number 9,034,774
- Issue date May 19, 2015
- Tokyo Electron Limited
- Kouji Tanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma doping apparatus and plasma doping method
- Patent number 9,029,249
- Issue date May 12, 2015
- Tokyo Electron Limited
- Hirokazu Ueda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method
- Patent number 8,497,214
- Issue date Jul 30, 2013
- Tokyo Electron Limited
- Hirokazu Ueda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method of silicon oxide film, silicon oxide film, semi...
- Patent number 8,486,792
- Issue date Jul 16, 2013
- Tokyo Electron Limited
- Hirokazu Ueda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Word line driver circuitry and methods for using the same
- Patent number 7,366,051
- Issue date Apr 29, 2008
- Micron Technology, Inc.
- Hirokazu Ueda
- G11 - INFORMATION STORAGE
Information Patent Grant
Memory cell with trench-isolated transistor including first and sec...
- Patent number 7,268,402
- Issue date Sep 11, 2007
- Micron Technology, Inc.
- Keiji Jono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Word line driver circuitry and methods for using the same
- Patent number 7,269,091
- Issue date Sep 11, 2007
- Micron Technology Inc.
- Hirokazu Ueda
- G11 - INFORMATION STORAGE
Information Patent Grant
Method of apparatus for enhanced sensing of low voltage memory
- Patent number 7,116,596
- Issue date Oct 3, 2006
- Micron Technology, Inc.
- Hirokazu Ueda
- G11 - INFORMATION STORAGE
Information Patent Grant
Trench isolated transistors, trench isolation structures, memory ce...
- Patent number 6,894,354
- Issue date May 17, 2005
- Micron Technology, Inc.
- Keiji Jono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for enhanced sensing of low voltage memory
- Patent number 6,873,559
- Issue date Mar 29, 2005
- Micron Technology, Inc.
- Hirokazu Ueda
- G11 - INFORMATION STORAGE
Information Patent Grant
METHODS OF FORMING AN ISOLATION TRENCH IN A SEMICONDUCTOR, METHODS...
- Patent number 6,830,977
- Issue date Dec 14, 2004
- Micron Technology, Inc.
- Keiji Jono
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing field effect transistor capable of success...
- Patent number 6,387,735
- Issue date May 14, 2002
- KMT Semiconductor, Ltd.
- Hirokazu Ueda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical vapor deposition using inductively coupled plasma and syst...
- Patent number 5,824,158
- Issue date Oct 20, 1998
- Kabushiki Kaisha Kobe Seiko Sho
- Koichiro Takeuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
LIQUID CIRCULATION SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND LIQU...
- Publication number 20240420970
- Publication date Dec 19, 2024
- TOKYO ELECTRON LIMITED
- Takao OKABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PERFORMING CLEANING AND APPARATUS FOR PERFORMING SUBSTRAT...
- Publication number 20240200193
- Publication date Jun 20, 2024
- TOKYO ELECTRON LIMITED
- Hiroaki ASHIZAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VACUUM PROCESSING APPARATUS AND OXIDIZING GAS REMOVAL METHOD
- Publication number 20240087916
- Publication date Mar 14, 2024
- TOKYO ELECTRON LIMITED
- Hirokazu UEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20230230855
- Publication date Jul 20, 2023
- TOKYO ELECTRON LIMITED
- Takeo NAKANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND IONIC LIQUID
- Publication number 20230226571
- Publication date Jul 20, 2023
- TOKYO ELECTRON LIMITED
- Takeo NAKANO
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR MANUFAC...
- Publication number 20230223251
- Publication date Jul 13, 2023
- TOKYO ELECTRON LIMITED
- Hirokazu UEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROCALORIC EFFECT ELEMENT, HEAT TRANSFER DEVICE, SEMICONDUCTOR...
- Publication number 20230135523
- Publication date May 4, 2023
- TOKYO ELECTRON LIMITED
- Koji AKIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PURIFICATION PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND...
- Publication number 20230111710
- Publication date Apr 13, 2023
- TOKYO ELECTRON LIMITED
- Takeya INOUE
- B08 - CLEANING
Information Patent Application
APPARATUS FOR PROCESSING SUBSTRATE, GAS SHOWER HEAD, AND METHOD FOR...
- Publication number 20230094546
- Publication date Mar 30, 2023
- TOKYO ELECTRON LIMITED
- Hirokazu UEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20230061151
- Publication date Mar 2, 2023
- TOKYO ELECTRON LIMITED
- Hideki YUASA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20230062105
- Publication date Mar 2, 2023
- TOKYO ELECTRON LIMITED
- Makoto WADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMATION METHOD AND FILM FORMATION APPARATUS
- Publication number 20230042099
- Publication date Feb 9, 2023
- Tokyo Electron Limited
- Makoto WADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VACUUM PROCESSING APPARATUS AND OXIDIZING GAS REMOVAL METHOD
- Publication number 20220403509
- Publication date Dec 22, 2022
- TOKYO ELECTRON LIMITED
- Hirokazu UEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING APPARATUS AND FILM FORMING METHOD
- Publication number 20220316065
- Publication date Oct 6, 2022
- TOKYO ELECTRON LIMITED
- Makoto WADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20220235462
- Publication date Jul 28, 2022
- TOKYO ELECTRON LIMITED
- Hirokazu UEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20220223378
- Publication date Jul 14, 2022
- TOKYO ELECTRON LIMITED
- Hiroyuki IKUTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20210111003
- Publication date Apr 15, 2021
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- B08 - CLEANING
Information Patent Application
METHOD FOR FORMING BORON-BASED FILM, FORMATION APPARATUS
- Publication number 20210090888
- Publication date Mar 25, 2021
- TOKYO ELECTRON LIMITED
- Hirokazu UEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BORON-BASED FILM FORMING METHOD AND APPARATUS
- Publication number 20190301019
- Publication date Oct 3, 2019
- TOKYO ELECTRON LIMITED
- Yoshimasa WATANABE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of Forming Boron-Based Film, and Film Forming Apparatus
- Publication number 20190244838
- Publication date Aug 8, 2019
- TOKYO ELECTRON LIMITED
- Yoshimasa WATANABE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20190237326
- Publication date Aug 1, 2019
- TOKYO ELECTRON LIMITED
- Takayuki KOMIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BORON FILM REMOVING METHOD, AND PATTERN FORMING METHOD AND APPARATU...
- Publication number 20180350598
- Publication date Dec 6, 2018
- TOKYO ELECTRON LIMITED
- Yoshimasa WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20180190521
- Publication date Jul 5, 2018
- TOKYO ELECTRON LIMITED
- Hirokazu Ueda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film Forming Method, Boron Film, and Film Forming Apparatus
- Publication number 20180174838
- Publication date Jun 21, 2018
- TOKYO ELECTRON LIMITED
- Hirokazu UEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DOPING METHOD, DOPING APPARATUS, AND SEMICONDUCTOR ELEMENT MANUFACT...
- Publication number 20180012763
- Publication date Jan 11, 2018
- TOKYO ELECTRON LIMITED
- Hirokazu UEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Using Heated Substrates for Process Chemistry Control
- Publication number 20160372327
- Publication date Dec 22, 2016
- TOKYO ELECTRON LIMITED
- Peter L.G. Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR ELEMENT MANUFACTURING METHOD
- Publication number 20160351398
- Publication date Dec 1, 2016
- TOKYO ELECTRON LIMITED
- Hirokazu UEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DOPING METHOD AND SEMICONDUCTOR ELEMENT MANUFACTURING METHOD
- Publication number 20160189963
- Publication date Jun 30, 2016
- TOKYO ELECTRON LIMITED
- Hirokazu UEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND MEASUREMENT METHOD
- Publication number 20150318220
- Publication date Nov 5, 2015
- TOKYO ELECTRON LIMITED
- Yuuki KOBAYASHI
- G01 - MEASURING TESTING
Information Patent Application
DOPING METHOD, DOPING APPARATUS AND METHOD OF MANUFACTURING SEMICON...
- Publication number 20150187582
- Publication date Jul 2, 2015
- TOKYO ELECTRON LIMITED
- Hirokazu UEDA
- H01 - BASIC ELECTRIC ELEMENTS

Hirokazu Ueda

Person

Patents Grantslast 30 patents

Plasma processing method and plasma processing apparatus

Film forming method and film forming apparatus

Film forming method and film forming apparatus

Substrate processing method and ionic liquid

Processing apparatus and film forming method

Plasma processing method and plasma processing apparatus

Method for forming boron-based film, formation apparatus

Method of forming boron-based film, and film forming apparatus

Film forming method, boron film, and film forming apparatus

Method for using heated substrates for process chemistry control

Plasma processing apparatus and measurement method

Doping method, doping apparatus and method of manufacturing semicon...

Method for fabricating semiconductor device and the semiconductor d...

Pulsed gas plasma doping method and apparatus

Film forming method using plasma

Plasma doping apparatus and plasma doping method

Semiconductor device manufacturing method

Film forming method of silicon oxide film, silicon oxide film, semi...

Word line driver circuitry and methods for using the same

Memory cell with trench-isolated transistor including first and sec...

Word line driver circuitry and methods for using the same

Method of apparatus for enhanced sensing of low voltage memory

Trench isolated transistors, trench isolation structures, memory ce...

Method and apparatus for enhanced sensing of low voltage memory

METHODS OF FORMING AN ISOLATION TRENCH IN A SEMICONDUCTOR, METHODS...

Method for manufacturing field effect transistor capable of success...

Chemical vapor deposition using inductively coupled plasma and syst...

Patents Applicationslast 30 patents

LIQUID CIRCULATION SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND LIQU...

METHOD OF PERFORMING CLEANING AND APPARATUS FOR PERFORMING SUBSTRAT...

VACUUM PROCESSING APPARATUS AND OXIDIZING GAS REMOVAL METHOD

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

SUBSTRATE PROCESSING METHOD AND IONIC LIQUID

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR MANUFAC...

ELECTROCALORIC EFFECT ELEMENT, HEAT TRANSFER DEVICE, SEMICONDUCTOR...

PURIFICATION PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND...

APPARATUS FOR PROCESSING SUBSTRATE, GAS SHOWER HEAD, AND METHOD FOR...

FILM FORMING METHOD AND FILM FORMING APPARATUS

FILM FORMING METHOD AND FILM FORMING APPARATUS

FILM FORMATION METHOD AND FILM FORMATION APPARATUS

VACUUM PROCESSING APPARATUS AND OXIDIZING GAS REMOVAL METHOD

PROCESSING APPARATUS AND FILM FORMING METHOD

FILM FORMING METHOD AND FILM FORMING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

METHOD FOR FORMING BORON-BASED FILM, FORMATION APPARATUS

BORON-BASED FILM FORMING METHOD AND APPARATUS

Method of Forming Boron-Based Film, and Film Forming Apparatus

SELECTIVE FILM FORMING METHOD AND FILM FORMING APPARATUS

BORON FILM REMOVING METHOD, AND PATTERN FORMING METHOD AND APPARATU...

SUBSTRATE PROCESSING APPARATUS

Film Forming Method, Boron Film, and Film Forming Apparatus

DOPING METHOD, DOPING APPARATUS, AND SEMICONDUCTOR ELEMENT MANUFACT...

Method for Using Heated Substrates for Process Chemistry Control

SEMICONDUCTOR ELEMENT MANUFACTURING METHOD

DOPING METHOD AND SEMICONDUCTOR ELEMENT MANUFACTURING METHOD

PLASMA PROCESSING APPARATUS AND MEASUREMENT METHOD

DOPING METHOD, DOPING APPARATUS AND METHOD OF MANUFACTURING SEMICON...