Hiroki Endo

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and monitoring device
- Patent number 12,106,948
- Issue date Oct 1, 2024
- Tokyo Electron Limited
- Ken Hirano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Correction data creating method, substrate processing method, and s...
- Patent number 11,923,211
- Issue date Mar 5, 2024
- Tokyo Electron Limited
- Hiroki Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system and substrate processing method
- Patent number 11,917,729
- Issue date Feb 27, 2024
- Tokyo Electron Limited
- Hiroki Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage and plasma processing apparatus
- Patent number 11,694,881
- Issue date Jul 4, 2023
- Tokyo Electron Limited
- Hiroki Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 11,581,168
- Issue date Feb 14, 2023
- Tokyo Electron Limited
- Kazuhito Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus with heater and power frequency control
- Patent number 11,239,062
- Issue date Feb 1, 2022
- Tokyo Electron Limited
- Kazuhito Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 10,896,832
- Issue date Jan 19, 2021
- Tokyo Electron Limited
- Kazuhito Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage and plasma processing apparatus
- Patent number 10,886,109
- Issue date Jan 5, 2021
- Tokyo Electron Limited
- Hiroki Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 10,264,662
- Issue date Apr 16, 2019
- Tokyo Electron Limited
- Manabu Iwata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flow rate control system and shower plate used for partial pressure...
- Patent number 8,109,288
- Issue date Feb 7, 2012
- Tokyo Electron Limited
- Hideki Nagaoka
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Partial pressure control system, flow rate control system and showe...
- Patent number 7,481,240
- Issue date Jan 27, 2009
- Tokyo Electron Limited
- Hideki Nagaoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Relative pressure control system and relative flow control system
- Patent number 7,353,841
- Issue date Apr 8, 2008
- CKD Corporation
- Tetsujiro Kono
- G05 - CONTROLLING REGULATING

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD
- Publication number 20240155737
- Publication date May 9, 2024
- TOKYO ELECTRON LIMITED
- Hiroki ENDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPONENT REPLACEMENT METHOD, COMPONENT REPLACEMENT DEVICE, AND COM...
- Publication number 20240128064
- Publication date Apr 18, 2024
- TOKYO ELECTRON LIMITED
- Hiroki ENDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240006165
- Publication date Jan 4, 2024
- TOKYO ELECTRON LIMITED
- Yoshihiro YANAGI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND MAINTENANCE METHOD FOR SUBSTRATE...
- Publication number 20230071478
- Publication date Mar 9, 2023
- TOKYO ELECTRON LIMITED
- Hiroki Endo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND MONITORING DEVICE
- Publication number 20220254617
- Publication date Aug 11, 2022
- TOKYO ELECTRON LIMITED
- Ken HIRANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND PARAMETER ACQUISITION METHOD
- Publication number 20210366692
- Publication date Nov 25, 2021
- TOKYO ELECTRON LIMITED
- Kazuhito Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND STAGE
- Publication number 20210265143
- Publication date Aug 26, 2021
- TOKYO ELECTRON LIMITED
- Hiroki ENDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE AND PLASMA PROCESSING APPARATUS
- Publication number 20210104386
- Publication date Apr 8, 2021
- TOKYO ELECTRON LIMITED
- Hiroki ENDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD
- Publication number 20210051769
- Publication date Feb 18, 2021
- TOKYO ELECTRON LIMITED
- Hiroki ENDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CORRECTION DATA CREATING METHOD, SUBSTRATE PROCESSING METHOD, AND S...
- Publication number 20200411339
- Publication date Dec 31, 2020
- TOKYO ELECTRON LIMITED
- Hiroki ENDO
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20200402778
- Publication date Dec 24, 2020
- TOKYO ELECTRON LIMITED
- Kazuhito YAMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20190371634
- Publication date Dec 5, 2019
- TOKYO ELECTRON LIMITED
- Kazuhito YAMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE AND PLASMA PROCESSING APPARATUS
- Publication number 20180350570
- Publication date Dec 6, 2018
- TOKYO ELECTRON LIMITED
- Hiroki ENDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20130199727
- Publication date Aug 8, 2013
- TOKYO ELECTRON LIMITED
- Manabu IWATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Flow rate control system and shower plate used for partial pressure...
- Publication number 20080300728
- Publication date Dec 4, 2008
- TOKYO ELECTRON LIMITED
- Hideki Nagaoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Relative pressure control system and relative flow control system
- Publication number 20060097644
- Publication date May 11, 2006
- CKD CORPORATION
- Tetsujiro Kono
- G05 - CONTROLLING REGULATING
Information Patent Application
Partial pressure control system, flow rate control system and showe...
- Publication number 20050029369
- Publication date Feb 10, 2005
- Hideki Nagaoka
- H01 - BASIC ELECTRIC ELEMENTS

Hiroki Endo

Person

Patents Grantslast 30 patents

Plasma processing apparatus and monitoring device

Correction data creating method, substrate processing method, and s...

Substrate processing system and substrate processing method

Stage and plasma processing apparatus

Plasma processing apparatus and method

Plasma processing apparatus with heater and power frequency control

Substrate processing method and substrate processing apparatus

Stage and plasma processing apparatus

Plasma processing apparatus

Flow rate control system and shower plate used for partial pressure...

Partial pressure control system, flow rate control system and showe...

Relative pressure control system and relative flow control system

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

COMPONENT REPLACEMENT METHOD, COMPONENT REPLACEMENT DEVICE, AND COM...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND MAINTENANCE METHOD FOR SUBSTRATE...

PLASMA PROCESSING APPARATUS AND MONITORING DEVICE

SUBSTRATE PROCESSING APPARATUS AND PARAMETER ACQUISITION METHOD

SUBSTRATE PROCESSING APPARATUS AND STAGE

STAGE AND PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

CORRECTION DATA CREATING METHOD, SUBSTRATE PROCESSING METHOD, AND S...

PLASMA PROCESSING APPARATUS AND METHOD

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

STAGE AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

Flow rate control system and shower plate used for partial pressure...

Relative pressure control system and relative flow control system

Partial pressure control system, flow rate control system and showe...