Hiroki MURAKAMI

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing method and substrate processing system
- Patent number 11,996,296
- Issue date May 28, 2024
- Tokyo Electron Limited
- Kae Kumagai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 11,915,914
- Issue date Feb 27, 2024
- Tokyo Electron Limited
- Sena Fujita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film deposition apparatus for fine pattern forming
- Patent number 11,881,379
- Issue date Jan 23, 2024
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming film
- Patent number 11,830,741
- Issue date Nov 28, 2023
- Tokyo Electron Limited
- Shinichi Ike
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film deposition apparatus for fine pattern forming
- Patent number 11,404,272
- Issue date Aug 2, 2022
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film deposition apparatus for fine pattern forming
- Patent number 11,404,271
- Issue date Aug 2, 2022
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming nitride film and apparatus for forming nitride film
- Patent number 11,380,538
- Issue date Jul 5, 2022
- Tokyo Electron Limited
- Hiroki Murakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,322,365
- Issue date May 3, 2022
- Tokyo Electron Limited
- Hiroki Murakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask pattern forming method, fine pattern forming method, and film...
- Patent number 10,879,066
- Issue date Dec 29, 2020
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching method and etching apparatus
- Patent number 10,672,617
- Issue date Jun 2, 2020
- Tokyo Electron Limited
- Hiroki Murakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective growth method
- Patent number 10,546,741
- Issue date Jan 28, 2020
- Tokyo Electron Limited
- Hiroki Murakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective film forming method and method of manufacturing semicondu...
- Patent number 10,490,443
- Issue date Nov 26, 2019
- Tokyo Electron Limited
- Yumiko Kawano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heating method, film forming method, semiconductor device manufactu...
- Patent number 10,475,665
- Issue date Nov 12, 2019
- Tokyo Electron Limited
- Takahiro Miyahara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of filling recess and processing apparatus
- Patent number 10,475,645
- Issue date Nov 12, 2019
- Tokyo Electron Limited
- Hiroki Murakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Nitride film forming method and storage medium
- Patent number 10,312,078
- Issue date Jun 4, 2019
- Tokyo Electron Limited
- Hiroki Murakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for forming nitride film
- Patent number 10,304,676
- Issue date May 28, 2019
- Tokyo Electron Limited
- Takahiro Miyahara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of filling recess and processing apparatus
- Patent number 10,269,561
- Issue date Apr 23, 2019
- Tokyo Electron Limited
- Hiroki Murakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mask pattern forming method, fine pattern forming method, and film...
- Patent number 10,191,378
- Issue date Jan 29, 2019
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mask pattern forming method, fine pattern forming method, and film...
- Patent number 10,176,992
- Issue date Jan 8, 2019
- Tokyo Electron Limited
- Kazuhide Hasebe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask pattern forming method, fine pattern forming method, and film...
- Patent number 10,141,187
- Issue date Nov 27, 2018
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Nitride film forming method and storage medium
- Patent number 9,972,486
- Issue date May 15, 2018
- Tokyo Electron Limited
- Hiroki Murakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 9,966,256
- Issue date May 8, 2018
- Tokyo Electron Limited
- Satoshi Takagi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method, film forming apparatus and storage medium
- Patent number 9,562,285
- Issue date Feb 7, 2017
- Tokyo Electron Limited
- Keisuke Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming silicon oxide film
- Patent number 9,472,394
- Issue date Oct 18, 2016
- Tokyo Electron Limited
- Hiroki Murakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming method
- Patent number 9,390,912
- Issue date Jul 12, 2016
- Tokyo Electron Limited
- Hiroki Murakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Amorphous silicon film formation method and amorphous silicon film...
- Patent number 9,123,782
- Issue date Sep 1, 2015
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Amorphous silicon film formation method and amorphous silicon film...
- Patent number 9,006,021
- Issue date Apr 14, 2015
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for forming silicon nitride film
- Patent number 8,753,984
- Issue date Jun 17, 2014
- Tokyo Electron Limited
- Hiroki Murakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film formation method and film formation apparatus
- Patent number 8,431,494
- Issue date Apr 30, 2013
- Tokyo Electron Limited
- Hiroki Murakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mask pattern forming method, fine pattern forming method, and film...
- Patent number 8,426,117
- Issue date Apr 23, 2013
- Tokyo Electron Limited
- Kazuhide Hasebe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
FILM-FORMING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240384412
- Publication date Nov 21, 2024
- TOKYO ELECTRON LIMITED
- Hiroki MURAKAMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION APPARATUS AND DEPOSITION METHOD
- Publication number 20240301551
- Publication date Sep 12, 2024
- TOKYO ELECTRON LIMITED
- Hiroki MURAKAMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING METHOD AND PROCESSING APPARATUS
- Publication number 20240295022
- Publication date Sep 5, 2024
- TOKYO ELECTRON LIMITED
- Hiroki MURAKAMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240194456
- Publication date Jun 13, 2024
- Tokyo Electron Limited
- Hiroki MURAKAMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SURFACE TREATMENT METHOD AND SUBSTRATE TREATMENT DEVICE
- Publication number 20240191344
- Publication date Jun 13, 2024
- Tokyo Electron Limited
- Hiroki MURAKAMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING METHOD, PROCESSING APPARATUS, AND PROCESSING SYSTEM
- Publication number 20240175121
- Publication date May 30, 2024
- Tokyo Electron Limited
- Munehito KAGAYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMATION METHOD AND FILM FORMATION SYSTEM
- Publication number 20240150895
- Publication date May 9, 2024
- TOKYO ELECTRON LIMITED
- Shuji AZUMO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING
- Publication number 20240096595
- Publication date Mar 21, 2024
- TOKYO ELECTRON LIMITED
- Kazuhide HASEBE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE
- Publication number 20230411146
- Publication date Dec 21, 2023
- TOKYO ELECTRON LIMITED
- Hiroki MURAKAMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20230377953
- Publication date Nov 23, 2023
- Tokyo Electron Limited
- Hiroki MURAKAMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20230162977
- Publication date May 25, 2023
- TOKYO ELECTRON LIMITED
- Hiroki MURAKAMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20230146375
- Publication date May 11, 2023
- Tokyo Electron Limited
- Hiroki MURAKAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20230135342
- Publication date May 4, 2023
- TOKYO ELECTRON LIMITED
- Sena FUJITA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20230128868
- Publication date Apr 27, 2023
- Tokyo Electron Limited
- Hiroki MURAKAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING
- Publication number 20220328301
- Publication date Oct 13, 2022
- TOKYO ELECTRON LIMITED
- Kazuhide HASEBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING FILM
- Publication number 20220189778
- Publication date Jun 16, 2022
- Tokyo Electron Limited
- Shinichi IKE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMATION METHOD AND FILM FORMATION APPARATUS
- Publication number 20220189777
- Publication date Jun 16, 2022
- Tokyo Electron Limited
- Yumiko KAWANO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20220157616
- Publication date May 19, 2022
- TOKYO ELECTRON LIMITED
- Kae KUMAGAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210098267
- Publication date Apr 1, 2021
- TOKYO ELECTRON LIMITED
- Hiroki MURAKAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Forming Nitride Film and Apparatus for Forming Nitride Film
- Publication number 20200219716
- Publication date Jul 9, 2020
- TOKYO ELECTRON LIMITED
- Hiroki MURAKAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FILLING RECESS AND PROCESSING APPARATUS
- Publication number 20190172710
- Publication date Jun 6, 2019
- TOKYO ELECTRON LIMITED
- Hiroki MURAKAMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MASK PATTERN FORMING METHOD, FINE PATTERN FORMING METHOD, AND FILM...
- Publication number 20190115204
- Publication date Apr 18, 2019
- TOKYO ELECTRON LIMITED
- Kazuhide HASEBE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MASK PATTERN FORMING METHOD, FINE PATTERN FORMING METHOD, AND FILM...
- Publication number 20190096658
- Publication date Mar 28, 2019
- TOKYO ELECTRON LIMITED
- Kazuhide HASEBE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Selective Film Forming Method and Method of Manufacturing Semicondu...
- Publication number 20190096750
- Publication date Mar 28, 2019
- TOKYO ELECTRON LIMITED
- Yumiko KAWANO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK PATTERN FORMING METHOD, FINE PATTERN FORMING METHOD, AND FILM...
- Publication number 20190041756
- Publication date Feb 7, 2019
- TOKYO ELECTRON LIMITED
- Kazuhide HASEBE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE GROWTH METHOD
- Publication number 20180286667
- Publication date Oct 4, 2018
- TOKYO ELECTRON LIMITED
- Hiroki MURAKAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Filling Recess and Processing Apparatus
- Publication number 20180286673
- Publication date Oct 4, 2018
- TOKYO ELECTRON LIMITED
- Hiroki MURAKAMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING METHOD AND ETCHING APPARATUS
- Publication number 20180286691
- Publication date Oct 4, 2018
- TOKYO ELECTRON LIMITED
- Hiroki MURAKAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATING METHOD, FILM FORMING METHOD, SEMICONDUCTOR DEVICE MANUFACTU...
- Publication number 20180277389
- Publication date Sep 27, 2018
- TOKYO ELECTRON LIMITED
- Takahiro Miyahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HARD MASK AND MANUFACTURING METHOD THEREOF
- Publication number 20180090319
- Publication date Mar 29, 2018
- TOKYO ELECTRON LIMITED
- Takahiro Miyahara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Hiroki MURAKAMI

Person

Patents Grantslast 30 patents

Substrate processing method and substrate processing system

Film forming method and film forming apparatus

Film deposition apparatus for fine pattern forming

Method for forming film

Film deposition apparatus for fine pattern forming

Film deposition apparatus for fine pattern forming

Method of forming nitride film and apparatus for forming nitride film

Substrate processing method and substrate processing apparatus

Mask pattern forming method, fine pattern forming method, and film...

Etching method and etching apparatus

Selective growth method

Selective film forming method and method of manufacturing semicondu...

Heating method, film forming method, semiconductor device manufactu...

Method of filling recess and processing apparatus

Nitride film forming method and storage medium

Method and apparatus for forming nitride film

Method of filling recess and processing apparatus

Mask pattern forming method, fine pattern forming method, and film...

Mask pattern forming method, fine pattern forming method, and film...

Mask pattern forming method, fine pattern forming method, and film...

Nitride film forming method and storage medium

Film forming method and film forming apparatus

Film forming method, film forming apparatus and storage medium

Method of forming silicon oxide film

Film forming method

Amorphous silicon film formation method and amorphous silicon film...

Amorphous silicon film formation method and amorphous silicon film...

Method and apparatus for forming silicon nitride film

Film formation method and film formation apparatus

Mask pattern forming method, fine pattern forming method, and film...

Patents Applicationslast 30 patents

FILM-FORMING METHOD AND SUBSTRATE PROCESSING APPARATUS

DEPOSITION APPARATUS AND DEPOSITION METHOD

PROCESSING METHOD AND PROCESSING APPARATUS

FILM FORMING METHOD AND SUBSTRATE PROCESSING APPARATUS

SURFACE TREATMENT METHOD AND SUBSTRATE TREATMENT DEVICE

FILM FORMING METHOD, PROCESSING APPARATUS, AND PROCESSING SYSTEM

FILM FORMATION METHOD AND FILM FORMATION SYSTEM

FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

FILM FORMING METHOD AND FILM FORMING APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

FILM DEPOSITION APPARATUS FOR FINE PATTERN FORMING

METHOD FOR FORMING FILM

FILM FORMATION METHOD AND FILM FORMATION APPARATUS

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

Method of Forming Nitride Film and Apparatus for Forming Nitride Film

METHOD OF FILLING RECESS AND PROCESSING APPARATUS

MASK PATTERN FORMING METHOD, FINE PATTERN FORMING METHOD, AND FILM...

MASK PATTERN FORMING METHOD, FINE PATTERN FORMING METHOD, AND FILM...

Selective Film Forming Method and Method of Manufacturing Semicondu...

MASK PATTERN FORMING METHOD, FINE PATTERN FORMING METHOD, AND FILM...

SELECTIVE GROWTH METHOD

Method of Filling Recess and Processing Apparatus

ETCHING METHOD AND ETCHING APPARATUS

HEATING METHOD, FILM FORMING METHOD, SEMICONDUCTOR DEVICE MANUFACTU...

HARD MASK AND MANUFACTURING METHOD THEREOF