Hiromitsu Namba

Person

Kumamoto, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,437,252
- Issue date Sep 6, 2022
- Tokyo Electron Limited
- Hiromitsu Namba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 10,707,102
- Issue date Jul 7, 2020
- Tokyo Electron Limited
- Hiromitsu Namba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 9,859,136
- Issue date Jan 2, 2018
- Tokyo Electron Limited
- Hiromitsu Namba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning jig and cleaning method for cleaning substrate processing...
- Patent number 9,508,567
- Issue date Nov 29, 2016
- Tokyo Electron Limited
- Hiromitsu Namba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing method, liquid processing apparatus and storage m...
- Patent number 9,165,800
- Issue date Oct 20, 2015
- Tokyo Electron Limited
- Hiromitsu Namba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 8,828,183
- Issue date Sep 9, 2014
- Tokyo Electron Limited
- Hiromitsu Namba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing method, recording medium having recorded program...
- Patent number 8,815,112
- Issue date Aug 26, 2014
- Tokyo Electron Limited
- Tsuyoshi Mizuno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Liquid processing apparatus and liquid processing method
- Patent number 8,696,863
- Issue date Apr 15, 2014
- Tokyo Electron Limited
- Jiro Higashijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing apparatus
- Patent number 8,590,547
- Issue date Nov 26, 2013
- Tokyo Electron Limited
- Jiro Higashijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing apparatus
- Patent number 8,567,339
- Issue date Oct 29, 2013
- Tokyo Electron Limited
- Jiro Higashijima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing apparatus, liquid processing method, and storage...
- Patent number 8,529,707
- Issue date Sep 10, 2013
- Tokyo Electron Limited
- Hiromitsu Namba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical-liquid processing apparatus and chemical-liquid processing...
- Patent number 8,398,817
- Issue date Mar 19, 2013
- Tokyo Electron Limited
- Hiromitsu Namba
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20200328095
- Publication date Oct 15, 2020
- TOKYO ELECTRON LIMITED
- Hiromitsu NAMBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20180108544
- Publication date Apr 19, 2018
- TOKYO ELECTRON LIMITED
- Hiromitsu NAMBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20140374022
- Publication date Dec 25, 2014
- Hiromitsu Namba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20140251539
- Publication date Sep 11, 2014
- TOKYO ELECTRON LIMITED
- Tsuyoshi Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING JIG AND CLEANING METHOD FOR CLEANING SUBSTRATE PROCESSING...
- Publication number 20140182631
- Publication date Jul 3, 2014
- Hiromitsu Namba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID PROCESSING METHOD, LIQUID PROCESSING APPARATUS AND STORAGE M...
- Publication number 20140048109
- Publication date Feb 20, 2014
- TOKYO ELECTRON LIMITED
- Hiromitsu Namba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20130171831
- Publication date Jul 4, 2013
- TOKYO ELECTRON LIMITED
- Hiromitsu NAMBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Liquid Processing Method, Recording Medium Having Recorded Program...
- Publication number 20120067846
- Publication date Mar 22, 2012
- Tsuyoshi Mizuno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Liquid Processing Apparatus, Liquid Processing Method, and Storage...
- Publication number 20110308554
- Publication date Dec 22, 2011
- Hiromitsu Namba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE LIQUID-PROCESSING METHOD, SUBSTRATE LIQUID-PROCESSING APP...
- Publication number 20110062114
- Publication date Mar 17, 2011
- TOKYO ELECTRON LIMITED
- Tsuyoshi MIZUNO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID PROCESSING APPARATUS
- Publication number 20100319615
- Publication date Dec 23, 2010
- TOKYO ELECTRON LIMITED
- Jiro HIGASHIJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD
- Publication number 20100200547
- Publication date Aug 12, 2010
- TOKYO ELECTRON LIMITED
- Jiro HIGASHIJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL-LIQUID PROCESSING APPARATUS AND CHEMICAL-LIQUID PROCESSING...
- Publication number 20100181290
- Publication date Jul 22, 2010
- TOKYO ELECTRON LIMITED
- Hiromitsu NAMBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID PROCESSING METHOD, LIQUID PROCESSING APPARATUS, AND STORAGE...
- Publication number 20100139703
- Publication date Jun 10, 2010
- TOKYO ELECTRON LIMITED
- Hiromitsu NAMBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID PROCESSING METHOD, LIQUID PROCESSING APPARATUS AND STORAGE M...
- Publication number 20100139702
- Publication date Jun 10, 2010
- TOKYO ELECTRON LIMITED
- Hiromitsu NAMBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID PROCESSING APPARATUS
- Publication number 20100018557
- Publication date Jan 28, 2010
- TOKYO ELECTRON LIMITED
- Jiro Higashijima
- H01 - BASIC ELECTRIC ELEMENTS

Hiromitsu Namba

Person

Patents Grantslast 30 patents

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Cleaning jig and cleaning method for cleaning substrate processing...

Liquid processing method, liquid processing apparatus and storage m...

Substrate processing apparatus and substrate processing method

Liquid processing method, recording medium having recorded program...

Liquid processing apparatus and liquid processing method

Liquid processing apparatus

Liquid processing apparatus

Liquid processing apparatus, liquid processing method, and storage...

Chemical-liquid processing apparatus and chemical-liquid processing...

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

CLEANING JIG AND CLEANING METHOD FOR CLEANING SUBSTRATE PROCESSING...

LIQUID PROCESSING METHOD, LIQUID PROCESSING APPARATUS AND STORAGE M...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

Liquid Processing Method, Recording Medium Having Recorded Program...

Liquid Processing Apparatus, Liquid Processing Method, and Storage...

SUBSTRATE LIQUID-PROCESSING METHOD, SUBSTRATE LIQUID-PROCESSING APP...

LIQUID PROCESSING APPARATUS

LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD

CHEMICAL-LIQUID PROCESSING APPARATUS AND CHEMICAL-LIQUID PROCESSING...

LIQUID PROCESSING METHOD, LIQUID PROCESSING APPARATUS, AND STORAGE...

LIQUID PROCESSING METHOD, LIQUID PROCESSING APPARATUS AND STORAGE M...

LIQUID PROCESSING APPARATUS