Hironori Ikezawa

Person

Saitama-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Projection optical system, exposure system, and exposure method
- Patent number 7,978,310
- Issue date Jul 12, 2011
- Nikon Corporation
- Hironori Ikezawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection optical system, exposure system, and exposure method
- Patent number 7,710,653
- Issue date May 4, 2010
- Nikon Corporation
- Hironori Ikezawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection optical system and method for photolithography and expos...
- Patent number 7,701,640
- Issue date Apr 20, 2010
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Projection optical system and method for photolithography and expos...
- Patent number 7,688,517
- Issue date Mar 30, 2010
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Projection optical system, exposure system, and exposure method
- Patent number 7,688,422
- Issue date Mar 30, 2010
- Nikon Corporation
- Hironori Ikezawa
- G02 - OPTICS
Information Patent Grant
Projection optical system and method for photolithography and expos...
- Patent number 7,619,827
- Issue date Nov 17, 2009
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Projection optical system and method for photolithography and expos...
- Patent number 7,609,455
- Issue date Oct 27, 2009
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Projection optical system and method for photolithography and expos...
- Patent number 7,580,197
- Issue date Aug 25, 2009
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Immersion objective optical system, exposure apparatus, device fabr...
- Patent number 7,557,997
- Issue date Jul 7, 2009
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Projection optical system and method for photolithography and expos...
- Patent number 7,551,362
- Issue date Jun 23, 2009
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Projection optical system, exposure apparatus, and exposure method
- Patent number 7,471,374
- Issue date Dec 30, 2008
- Nikon Corporation
- Yasuhiro Omura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection optical system and method for photolithography and expos...
- Patent number 7,362,508
- Issue date Apr 22, 2008
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Grant
Production method of projection optical system
- Patent number 6,788,389
- Issue date Sep 7, 2004
- Nikon Corporation
- Youhei Fujishima
- C30 - CRYSTAL GROWTH

Patents Applicationslast 30 patents

Information Patent Application
PROJECTION OPTICAL ASSEMBLY, PROJECTION OPTICAL ASSEMBLY ADJUSTMENT...
- Publication number 20130278910
- Publication date Oct 24, 2013
- Hironori Ikezawa
- G02 - OPTICS
Information Patent Application
PROJECTION OPTICAL SYSTEM, EXPOSURE SYSTEM, AND EXPOSURE METHOD
- Publication number 20100159401
- Publication date Jun 24, 2010
- Nikon Corporation
- Hironori Ikezawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Projection optical system and method for photolithography and expos...
- Publication number 20080094696
- Publication date Apr 24, 2008
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
Immersion objective optical system, exposure apparatus, device fabr...
- Publication number 20080080067
- Publication date Apr 3, 2008
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
Projection optical system and method for photolithography and expos...
- Publication number 20080068576
- Publication date Mar 20, 2008
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
Projection optical system and method for photolithography and expos...
- Publication number 20080068573
- Publication date Mar 20, 2008
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
Projection optical system and method for photolithography and expos...
- Publication number 20080068724
- Publication date Mar 20, 2008
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
Projection optical system and method for photolithography and expos...
- Publication number 20080049336
- Publication date Feb 28, 2008
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
Projection optical system and method for photolithography and expos...
- Publication number 20080049306
- Publication date Feb 28, 2008
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
Projection Optical System, Exposure System, And Exposure Method
- Publication number 20070285633
- Publication date Dec 13, 2007
- Nikon Corporation
- Hironori Ikezawa
- G02 - OPTICS
Information Patent Application
Projection optical system, exposure system, and exposure method
- Publication number 20070188879
- Publication date Aug 16, 2007
- Nikon Corporation
- Hironori Ikezawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Projection optical system, exposure apparatus, and exposure method
- Publication number 20060087633
- Publication date Apr 27, 2006
- Nikon Corporation
- Yasuhiro Omura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Projection optical system and method for photolithography and expos...
- Publication number 20050248856
- Publication date Nov 10, 2005
- Nikon Corporation
- Yasuhiro Omura
- G02 - OPTICS
Information Patent Application
Production method of projection optical system
- Publication number 20030053036
- Publication date Mar 20, 2003
- Nikon Corporation
- Youhei Fujishima
- C30 - CRYSTAL GROWTH

Hironori Ikezawa

Person

Patents Grantslast 30 patents

Projection optical system, exposure system, and exposure method

Projection optical system, exposure system, and exposure method

Projection optical system and method for photolithography and expos...

Projection optical system and method for photolithography and expos...

Projection optical system, exposure system, and exposure method

Projection optical system and method for photolithography and expos...

Projection optical system and method for photolithography and expos...

Projection optical system and method for photolithography and expos...

Immersion objective optical system, exposure apparatus, device fabr...

Projection optical system and method for photolithography and expos...

Projection optical system, exposure apparatus, and exposure method

Projection optical system and method for photolithography and expos...

Production method of projection optical system

Patents Applicationslast 30 patents

PROJECTION OPTICAL ASSEMBLY, PROJECTION OPTICAL ASSEMBLY ADJUSTMENT...

PROJECTION OPTICAL SYSTEM, EXPOSURE SYSTEM, AND EXPOSURE METHOD

Projection optical system and method for photolithography and expos...

Immersion objective optical system, exposure apparatus, device fabr...

Projection optical system and method for photolithography and expos...

Projection optical system and method for photolithography and expos...

Projection optical system and method for photolithography and expos...

Projection optical system and method for photolithography and expos...

Projection optical system and method for photolithography and expos...

Projection Optical System, Exposure System, And Exposure Method

Projection optical system, exposure system, and exposure method

Projection optical system, exposure apparatus, and exposure method

Projection optical system and method for photolithography and expos...

Production method of projection optical system