Claims
- 1. A production method of a projection optical system which transfers an image of a first surface onto a second surface based on light having a predetermined wavelength and which includes at least one refractive member made of an isometric system crystal material that transmits a light beam having the predetermined wavelength, comprising:
a design step, including a sub-step of determining a direction of a crystal axis of the refractive member made of the at least one isometric system crystal material while evaluating the light of a first polarization component and a second polarization component differing from the first polarization component, for obtaining predetermined design data; a crystal material preparation step of preparing the isometric system crystal material; a crystal axis measurement step of measuring a crystal axis of the isometric system crystal material; a refractive member formation step of forming a refractive member with a predetermined shape from the isometric system crystal material based on the design data in the design step; and an assembly step of arranging the refractive member based on the direction of the crystal axis of the refractive member obtained in the design step.
- 2. A production method of the projection optical system of claim 1, further comprising another step of preparing the refractive member with a predetermined birefringence distribution, wherein the birefringence distribution is determined based on the design data in the design step.
- 3. A production method of the projection optical system of claim 2, wherein the predetermined birefringence distribution is at least one of a predetermined stress birefringence distribution of the refractive member and birefringence distribution caused by a thin film provided on the refractive member.
- 4. A production method of claim 3, wherein the refractive member having the predetermined birefringence distribution is made of silica or fluoride doped silica.
- 5. A production method of the projection optical system of claim 4, which satisfies
- 6. A production method of the projection optical system of claim 5, further comprising an aspherical surface creation step of forming a surface shape of at least one optical member in the projection optical system in an aspherical shape, wherein the aspherical shape is determined by the design data of the design step.
- 7. A production method of the projection optical system of claim 6, wherein the aspherical surface shape contains an asymmetric aspherical shape relative to an optical axis of the optical member.
- 8. A production method of the projection optical system of claim 7, wherein the assembly step comprises:
an optical performance measurement sub-step of measuring the optical performance of the assembled projection optical system; an optical member correction sub-step of changing a position and/or a posture of at least one optical member in the projection optical system in order to make the optical performance measured be a predetermined optical performance; and an aspherical surface processing sub-step of forming a surface shape of at least one optical member in the projection optical system in order to make the measured optical performance be a predetermined optical performance.
- 9. A production method of the projection optical system of claim 8, wherein the aspherical surface shape is determined by considering the design data in the design step.
- 10. A production method of the projection optical system of claim 9, wherein the assembly step includes an azimuth correction sub-step of correcting an azimuth around an optical axis of the refractive member made of the isometric system crystal material.
- 11. A production method of the projection optical system of claim 10, wherein the assembly step includes a polarization optical performance measurement sub-step of measuring an optical performance of the assembled projection optical system regarding a plurality of polarization component light beams, and wherein the azimuth correction sub-step corrects the azimuth of the refractive member to make the optical performance regarding the plurality of polarization components assume a predetermined value based on the optical performance regarding the measured multiple polarization components.
- 12. A production method of the projection optical system of claim 10, wherein the assembly step includes an optical performance measurement sub-step of measuring the optical performance of the assembled projection optical system, and wherein the azimuth correction sub-step corrects the azimuth of the refractive member made of the isometric system to make the optical performance of the projection optical system assume a predetermined value based on the measured optical performance.
- 13. A production method of the projection optical system of claim 10, wherein the isometric system crystal material includes calcium fluoride or barium fluoride.
- 14. A production method of the projection optical system of claim 13, wherein the predetermined wavelength is less than or equal to 200 nm.
- 15. A projection optical system that is produced by a production method of claim 1.
- 16. A projection optical system in which an image of a first surface is projected onto a second surface based on a light beam having a predetermined wavelength, comprising: at least one isometric system refractive member made of an isometric system crystal material that transmits a light beam having the predetermined wavelength, and an amorphous refractive member made of an amorphous material for compensating the deterioration of optical performance due to intrinsic birefringence of the isometric system refractive member.
- 17. A projection optical system of claim 16, wherein the isometric system refractive member is formed in such a manner that a crystal axis [100] or a crystal axis that is optically equivalent to the crystal axis [100] substantially coincides with the optical axis of the isometric system refractive member.
- 18. A projection optical system of claim 16, wherein the isometric system refractive member made of the isometric system crystal material includes a plurality of isometric system refractive members, and wherein directions of the crystal axes of the plurality of isometric system refractive members are respectively determined in such a manner that deterioration of the optical performance due to intrinsic birefringence is reduced.
- 19. A projection optical system of claim 18, wherein a maximum angle of the light beam passing through the isometric system refractive member whose crystal axis direction is determined in such a manner that the deterioration of the optical performance due to the intrinsic birefringence is reduced, is no more than 20 degrees relative to the optical axis.
- 20. A projection optical system of claim 19, wherein the isometric system refractive member whose crystal axis direction is determined in such a manner that the deterioration of the optical performance due to the intrinsic birefringence is reduced, is arranged between a pupil position closest to a second surface side and the second surface of the projection optical system.
- 21. A projection optical system of claim 18, wherein the plurality of isometric system refractive members comprises:
a first group of radiation transmissive members which are formed in such a manner that a crystal axis [100], or a crystal axis that is optically equivalent to the crystal axis [100], substantially coincides with the optical axis; and a second group of radiation transmissive members which are formed in such a manner that the crystal axis [100], or the crystal axis that is optically equivalent to the crystal axis [100], substantially coincides with the optical axis; wherein the first group of the transmissive members and the second group of radiation transmissive members have a positional relationship in which they are rotated substantially 45 degrees relative to each other around the optical axis.
- 22. A projection optical system of claim 18, wherein the plurality of isometric system refractive members comprises:
a third group of radiation transmissive members which are formed in such a manner that a crystal axis [111], or a crystal axis that is optically equivalent to the crystal axis [111], substantially coincides with the optical axis; and a fourth group of radiation transmissive members which are formed in such a manner that the crystal axis [111], or the crystal axis that is optically equivalent to the crystal axis [111], substantially coincides with the optical axis; and wherein the third group of radiation transmissive members and the fourth group of radiation transmissive members have a positional relationship such that they are rotated substantially 60 degrees relative to each other around the optical axis.
- 23. A projection optical system of claim 18, wherein the plurality of isometric system refractive members comprises:
a fifth group of radiation transmissive members which are formed in such a manner that a crystal axis [110], or a crystal axis that is optically equivalent to the crystal axis [110], substantially coincides with the optical axis; and a sixth group of radiation transmissive members which are formed in such a manner that the crystal axis [110], or the crystal axis that is optically equivalent to the crystal axis [110], substantially coincides with the optical axis; and wherein the fifth group of radiation transmissive members and the sixth group of radiation transmissive members have a positional relationship such that they are rotated substantially 90 degrees relative to each other around the optical axis.
- 24. A projection optical system of claim 18, wherein the plurality of isometric system refractive members comprises:
a first group of radiation transmissive members which are formed in such a manner that the crystal axis [100], or a crystal axis that is optically equivalent to the crystal axis [100], substantially coincides with the optical axis; and a fifth group of radiation transmissive members which are formed in such a manner that a crystal axis [110], or a crystal axis that is optically equivalent to the crystal axis [110], substantially coincides with the optical axis.
- 25. A projection optical system of claim 24, wherein the plurality of isometric system refractive members further comprises: a third group of radiation transmissive members which are formed in such a manner that a crystal axis [111], or a crystal axis that is optically equivalent to the crystal axis [111], substantially coincides with the optical axis.
- 26. A projection optical system of claim 18, wherein the crystal axis direction of the plurality of isometric system refractive members is determined in such a manner that deterioration of the optical performance due to intrinsic birefringence is reduced, and further comprising a seventh group of radiation transmissive members formed in such a manner that a predetermined crystal axis substantially coincides with the optical axis, and an eighth group of radiation transmissive members formed in such a manner that the predetermined crystal axis substantially coincides with the optical axis, and wherein an equation
- 27. A projection optical system of claim 26, wherein the maximum value of the angle of the light beam passing through the seventh group and the eighth group of radiation transmissive members is more than 20 degrees relative to the optical axis.
- 28. A projection optical system of claim 26, wherein the seventh group and the eighth group of radiation transmissive members are arranged between a pupil position closest to a second surface side and the second surface in the projection optical system.
- 29. A projection optical system of claim 16, further comprising an aspherical surface for reducing a scalar component of the deterioration of the optical performance due to intrinsic birefringence.
- 30. A projection optical system of claim 29, wherein the aspherical surface has a rotationally asymmetric shape relative to the optical axis of the refractive members on which the aspherical surface is provided.
- 31. A projection optical system of claim 16, wherein the amorphous refractive member has a birefringence stress distribution.
- 32. A projection optical system of claim 31, wherein the birefringence stress distribution is generated due at least to impurities during creation of the amorphous refractive member or density distribution caused by a temperature program.
- 33. A projection optical system of claim 32, wherein the amorphous optical member is silica or fluoride doped silica.
- 34. A production method of the projection optical system of claim 16, wherein the isometric system refractive members include calcium fluoride or barium fluoride.
- 35. A projection optical system that projects an image of a first surface onto a second surface based on a light beam having a predetermined wavelength, comprising twin crystal refractive members made of twin crystals that are transmissive of the light beam having the predetermined wavelength.
- 36. A projection optical system of claim 35, wherein a twin boundary or a twinning plane of the twin crystal refractive members is determined in such a manner that deterioration of the optical performance due to intrinsic birefringence of the twin crystal is reduced.
- 37. A projection optical system of claim 35, wherein the predetermined wavelength is less than or equal to 200 nm.
- 38. A projection exposure system in which an image of an original which is arranged on a first surface is projection exposed onto a workpiece arranged on a second surface by a light beam having a predetermined wavelength, comprising:
a light source that supplies the light beam having the predetermined wavelength; an illumination optical system that guides the light beam from the light source to the original; and a projection optical system of claim 35, which is arranged on an optical path between the first surface and the second surface and which forms the image of the original onto the second surface.
- 39. A projection exposure method in which an image of an original which is arranged on a first surface is projection exposed onto a workpiece arranged on a second surface by a light beam having a predetermined wavelength, comprising:
supplying the light beam having the predetermined wavelength; illuminating the original using the light beam having the predetermined wavelength; and forming the image of the original onto the second surface using a projection optical system of claim 35, based on the illuminated light beam from the original.
- 40. A production method of the projection optical system of claim 2, which satisfies
- 41. A production method of the projection optical system of claim 1, further comprising an aspherical surface creation step of forming a surface shape of at least one optical member in the projection optical system in an aspherical shape, wherein the aspherical shape is determined by the design data of the design step.
- 42. A production method of the projection optical system of claim 41, wherein the aspherical surface shape contains an asymmetric aspherical shape relative to an optical axis of the optical member.
- 43. A production method of the projection optical system of claim 41, wherein the assembly step comprises:
an optical performance measurement sub-step of measuring the optical performance of the assembled projection optical system; an optical member correction sub-step of changing a position and/or a posture of at least one optical member in the projection optical system in order to make the optical performance measured be a predetermined optical performance; and an aspherical surface processing sub-step of forming a surface shape of at least one optical member in the projection optical system in order to make the measured optical performance be a predetermined optical performance.
- 44. A production method of the projection optical system of claim 43, wherein the aspherical surface shape is determined by considering the design data in the design step.
- 45. A production method of the projection optical system of claim 43, wherein the assembly step includes an azimuth correction sub-step of correcting an azimuth around an optical axis of the refractive member made of the isometric system crystal material.
- 46. A production method of the projection optical system of claim 1, wherein the assembly step comprises:
an optical performance measurement sub-step of measuring the optical performance of the assembled projection optical system; an optical member correction sub-step of changing a position and/or a posture of at least one optical member in the projection optical system in order to make the optical performance measured be a predetermined optical performance; and an aspherical surface processing sub-step of forming a surface shape of at least one optical member in the projection optical system in order to make the measured optical performance be a predetermined optical performance.
- 47. A production method of the projection optical system of claim 46, wherein the aspherical surface shape is determined by considering the design data in the design step.
- 48. A production method of the projection optical system of claim 46, wherein the assembly step includes an azimuth correction sub-step of correcting an azimuth around an optical axis of the refractive member made of the isometric system crystal material.
- 49. A production method of the projection optical system of claim 1, wherein the assembly step includes an azimuth correction sub-step of correcting an azimuth around an optical axis of the refractive member made of the isometric system crystal material.
- 50. A production method of the projection optical system of claim 49, wherein the assembly step includes a polarization optical performance measurement sub-step of measuring an optical performance of the assembled projection optical system regarding a plurality of polarization component light beams, and wherein the azimuth correction sub-step corrects the azimuth of the refractive member to make the optical performance regarding the plurality of polarization components assume a predetermined value based on the optical performance regarding the measured multiple polarization components.
- 51. A production method of the projection optical system of claim 49, wherein the assembly step includes an optical performance measurement sub-step of measuring the optical performance of the assembled projection optical system, and wherein the azimuth correction sub-step corrects the azimuth of the refractive member made of the isometric system to make the optical performance of the projection optical system assume a predetermined value based on the measured optical performance.
- 52. A production method of the projection optical system of claim 1, wherein the assembly step includes a polarization optical performance measurement sub-step of measuring an optical performance of the assembled projection optical system regarding a plurality of polarization component light beams, and wherein the azimuth correction sub-step corrects the azimuth of the refractive member to make the optical performance regarding the plurality of polarization components assume a predetermined value based on the optical performance regarding the measured multiple polarization components.
- 53. A projection exposure system in which an image of an original which is arranged on a first surface is projection exposed onto a workpiece arranged on a second surface by a light beam having a predetermined wavelength, comprising:
a light source that supplies the light beam having the predetermined wavelength; an illumination optical system that guides the light beam from the light source to the original; and a projection optical system of claim 15, which is arranged on an optical path between the first surface and the second surface and which forms the image of the original onto the second surface.
- 54. A projection exposure method in which an image of an original which is arranged on a first surface is projection exposed onto a workpiece arranged on a second surface by a light beam having a predetermined wavelength, comprising:
supplying the light beam having the predetermined wavelength; illuminating the original using the light beam having the predetermined wavelength; and forming the image of the original onto the second surface using a projection optical system of claim 15, based on the illuminated light beam from the original.
- 55. A projection optical system of claim 18, wherein the isometric system refractive member whose crystal axis direction is determined in such a manner that the deterioration of the optical performance due to the intrinsic birefringence is reduced, is arranged between a pupil position closest to a second surface side and the second surface of the projection optical system.
- 56. A projection optical system of claim 18, wherein the amorphous refractive member has a birefringence stress distribution.
- 57. A production method of the projection optical system of claim 18, wherein the isometric system refractive members include calcium fluoride or barium fluoride.
- 58. A projection optical system of claim 21, wherein the plurality of isometric system refractive members comprises:
a third group of radiation transmissive members which are formed in such a manner that a crystal axis [111], or a crystal axis that is optically equivalent to the crystal axis [111], substantially coincides with the optical axis; and a fourth group of radiation transmissive members which are formed in such a manner that the crystal axis [111], or the crystal axis that is optically equivalent to the crystal axis [111], substantially coincides with the optical axis; and wherein the third group of radiation transmissive members and the fourth group of radiation transmissive members have a positional relationship such that they are rotated substantially 60 degrees relative to each other around the optical axis.
- 59. A projection optical system of claim 58, wherein the crystal axis direction of the plurality of isometric system refractive members is determined in such a manner that deterioration of the optical performance due to intrinsic birefringence is reduced, and further comprising a seventh group of radiation transmissive members formed in such a manner that a predetermined crystal axis substantially coincides with the optical axis, and an eighth group of radiation transmissive members formed in such a manner that the predetermined crystal axis substantially coincides with the optical axis, and wherein an equation
- 60. A projection optical system of claim 59, wherein the maximum value of the angle of the light beam passing through the seventh group and the eighth group of radiation transmissive members is more than 20 degrees relative to the optical axis.
- 61. A projection optical system of claim 59, wherein the seventh group and the eighth group of radiation transmissive members are arranged between a pupil position closest to a second surface side and the second surface in the projection optical system.
- 62. A projection optical system of claim 22, wherein the crystal axis direction of the plurality of isometric system refractive members is determined in such a manner that deterioration of the optical performance due to intrinsic birefringence is reduced, and further comprising a seventh group of radiation transmissive members formed in such a manner that a predetermined crystal axis substantially coincides with the optical axis, and an eighth group of radiation transmissive members formed in such a manner that the predetermined crystal axis substantially coincides with the optical axis, and wherein an equation
- 63. A projection optical system of claim 62, wherein the maximum value of the angle of the light beam passing through the seventh group and the eighth group of radiation transmissive members is more than 20 degrees relative to the optical axis.
- 64. A projection optical system of claim 62, wherein the seventh group and the eighth group of radiation transmissive members are arranged between a pupil position closest to a second surface side and the second surface in the projection optical system.
- 65. A projection optical system of claim 16, wherein the amorphous optical member is silica or fluoride doped silica.
- 66. A projection optical system of claim 16, wherein the predetermined wavelength is less than or equal to 200 nm.
- 67. A projection exposure system in which an image of an original which is arranged on a first surface is projection exposed onto a workpiece arranged on a second surface by a light beam having a predetermined wavelength, comprising:
a light source that supplies the light beam having the predetermined wavelength; an illumination optical system that guides the light beam from the light source to the original; and a projection optical system of claim 16, which is arranged on an optical path between the first surface and the second surface and which forms the image of the original onto the second surface.
- 68. A projection exposure method in which an image of an original which is arranged on a first surface is projection exposed onto a workpiece arranged on a second surface by a light beam having a predetermined wavelength, comprising:
supplying the light beam having the predetermined wavelength; illuminating the original using the light beam having the predetermined wavelength; and forming the image of the original onto the second surface using a projection optical system of claim 16, based on the illuminated light beam from the original.
- 69. A production method of a projection optical system which transfers an image of a first surface onto a second surface based on light having a predetermined wavelength and which includes at least one refractive member made of an isometric crystal material that transmits light having the predetermined wavelength, comprising the steps of:
preparing another refractive member which has at least one of a birefringence amount and a birefringence distribution that is different from that of the refractive member; and exchanging the refractive member for the different refractive member.
- 70. A production method of claim 69, wherein the another refractive member includes one of an isometric crystal material and an amorphous material.
- 71. A projection optical system produced by the production method of claim 69.
- 72. A projection exposure apparatus for exposing an image of a mask which is arranged on a first surface onto a workpiece arranged on a second surface by a light beam having a predetermined wavelength, comprising:
a light source that supplies the light beam having the predetermined wavelength; an illumination optical system, arranged in an optical path between the light source and the mask, that guides the light beam from the light source to the mask; and a projection optical system of claim 42, arranged in an optical path between the first surface and the second surface and which forms the image of the mask onto the workpiece.
- 73. A projection exposure method for exposing an image of a mask which is arranged on a first surface onto a workpiece which is arranged on a second surface by a light beam having a predetermined wavelength, comprising the steps of:
supplying the light beam having the predetermined wavelength; illuminating the mask with the light beam having the predetermined wavelength; and forming the image of the mask onto the workpiece using a projection optical system of claim 42, based on the illuminated light beam from the mask.
- 74. A production method of a projection optical system which transfers an image of a first surface onto a second surface based on light having a predetermined wavelength and which includes at least one refractive member made of an isometric crystal material that transmits light having the predetermined wavelength, comprising the steps of:
preparing a refractive member which has a predetermined birefringence distribution; and adjusting at least one of a position and a posture of the refractive member which is arranged in the projection optical system, so as to adjust a polarization aberration of the projection optical system.
- 75. A production method of claim 74, wherein the polarization aberration includes an asymmetrical polarization aberration.
- 76. A projection optical system produced by the production method of claim 74.
- 77. A projection exposure apparatus for exposing an image of a mask which is arranged on a first surface onto a workpiece arranged on a second surface by a light beam having a predetermined wavelength, comprising:
a light source that supplies the light beam having the predetermined wavelength; an illumination optical system, arranged in an optical path between the light source and the mask, that guides the light beam from the light source to the mask; and a projection optical system of claim 76, arranged in an optical path between the first surface and the second surface and which forms the image of the mask onto the workpiece.
- 78. A projection exposure method for exposing an image of a mask which is arranged on a first surface onto a workpiece which is arranged on a second surface by a light beam having a predetermined wavelength, comprising the steps of:
supplying the light beam having the predetermined wavelength; illuminating the mask with the light beam having the predetermined wavelength; and forming the image of the mask onto the workpiece using a projection optical system of claim 76, based on the illuminated light beam from the mask.
- 79. A production method of an illumination optical system which is applied to a projection exposure apparatus which transfers an image of a first surface onto a second surface based on light having a predetermined wavelength, the illumination optical system includes at least one refractive member made of an isometric crystal material that transmits light having the predetermined wavelength, comprising the steps of:
preparing a refractive member made of the isometric crystal material; and optimizing a crystal axis direction of the refractive member so as to reduce a polarization aberration.
- 80. A production method of claim 79, further comprising:
preparing an amorphous refractive member made of an amorphous material, the amorphous refractive member corrects residual polarization aberration.
- 81. An illumination optical system produced by the production method of claim 79.
- 82. A projection exposure apparatus for exposing an image of a mask which is arranged on a first surface onto a workpiece arranged on a second surface by a light beam having a predetermined wavelength, comprising:
a light source that supplies the light beam having the predetermined wavelength; an illumination optical system of claim 81, arranged in an optical path between the light source and the mask, that guides the light beam from the light source to the mask; and a projection optical system, arranged in an optical path between the first surface and the second surface and which forms the image of the mask onto the workpiece.
- 83. A projection exposure method for exposing an image of a mask which is arranged on a first surface onto a workpiece which is arranged on a second surface by a light beam having a predetermined wavelength, comprising the steps of:
supplying the light beam having the predetermined wavelength; illuminating the mask with the light beam having the predetermined wavelength using the illumination optical system of claim 81; and forming the image of the mask onto the workpiece based on the illuminated light beam from the mask.
Priority Claims (1)
Number |
Date |
Country |
Kind |
2001-208837 |
Jul 2001 |
JP |
|
PRODUCTION METHOD OF PROJECTION OPTICAL SYSTEM
[0001] This non-provisional application claims the benefit of U.S. Provisional Application No. 60/308,840 filed Aug. 1, 2001. The disclosure of Japanese Priority Application No. 2001-208837 filed Jul. 10, 2001, is incorporated herein by reference in its entirety.
Provisional Applications (1)
|
Number |
Date |
Country |
|
60308840 |
Aug 2001 |
US |