Hiroo Takizawa

Person

Ashigarakami-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Organic electroluminescence device
- Patent number 11,832,508
- Issue date Nov 28, 2023
- UDC Ireland Limited
- Hiroo Takizawa
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Pattern formation method, active light-sensitive or radiation-sensi...
- Patent number 10,444,627
- Issue date Oct 15, 2019
- FUJIFILM Corporation
- Hiroo Takizawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organic electroluminescence device
- Patent number 10,403,832
- Issue date Sep 3, 2019
- UDC Ireland Limited
- Hiroo Takizawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition, actinic-ray-...
- Patent number 10,234,759
- Issue date Mar 19, 2019
- Fujifilm Corporation
- Takeshi Kawabata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, composition kit and resist film, manufactur...
- Patent number 10,031,419
- Issue date Jul 24, 2018
- FUJIFILM Corporation
- Hiroo Takizawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organic thin-film transistor and method for manufacturing same
- Patent number 10,008,671
- Issue date Jun 26, 2018
- FUJIFILM Corporation
- Hiroo Takizawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern forming method, composition kit and resist film, and method...
- Patent number 9,915,870
- Issue date Mar 13, 2018
- FUJIFILM Corporation
- Hiroo Takizawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device and insulating layer-forming composition
- Patent number 9,905,768
- Issue date Feb 27, 2018
- FUJIFILM Corporation
- Yuzo Nagata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern formation method, active light-sensitive or radiation-sensi...
- Patent number 9,829,796
- Issue date Nov 28, 2017
- FUJIFILM Corporation
- Hiroo Takizawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organic thin-film transistor and method for manufacturing same
- Patent number 9,799,832
- Issue date Oct 24, 2017
- FUJIFILM Corporation
- Hiroo Takizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 9,766,547
- Issue date Sep 19, 2017
- FUJIFILM Corporation
- Hiroo Takizawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Thin film transistor
- Patent number 9,755,160
- Issue date Sep 5, 2017
- FUJIFILM Corporation
- Hiroo Takizawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern forming method, active light sensitive or radiation sensiti...
- Patent number 9,651,863
- Issue date May 16, 2017
- FUJIFILM Corporation
- Hiroo Takizawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, electron beam- or extreme ultraviolet-sensi...
- Patent number 9,612,535
- Issue date Apr 4, 2017
- FUJIFILM Corporation
- Shuji Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 9,557,643
- Issue date Jan 31, 2017
- FUJIFILM Corporation
- Hiroo Takizawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 9,551,933
- Issue date Jan 24, 2017
- FUJIFILM Corporation
- Hiroo Takizawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, actinic ray-sensitive or radiation-sensitive resin compos...
- Patent number 9,527,809
- Issue date Dec 27, 2016
- FUJIFILM Corporation
- Natsumi Yokokawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive composition, resist fi...
- Patent number 9,500,951
- Issue date Nov 22, 2016
- FUJIFILM Corporation
- Natsumi Yokokawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming method, electron beam-sensitive or extreme ultravio...
- Patent number 9,470,980
- Issue date Oct 18, 2016
- FUJIFILM Corporation
- Naoki Inoue
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive composition, resist fi...
- Patent number 9,459,531
- Issue date Oct 4, 2016
- FUJIFILM Corporation
- Natsumi Yokokawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 9,448,477
- Issue date Sep 20, 2016
- FUJIFILM Corporation
- Takeshi Kawabata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern forming method, resist pattern formed by the method, method...
- Patent number 9,448,482
- Issue date Sep 20, 2016
- FUJIFILM Corporation
- Kaoru Iwato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, electron beam-sensitive or extreme ultravio...
- Patent number 9,423,690
- Issue date Aug 23, 2016
- FUJIFILM Corporation
- Hiroo Takizawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern forming method, electron beam-sensitive or extreme ultravio...
- Patent number 9,411,230
- Issue date Aug 9, 2016
- FUJIFILM Corporation
- Hiroo Takizawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition, actinic-ray-...
- Patent number 9,400,430
- Issue date Jul 26, 2016
- FUJIFILM Corporation
- Tomotaka Tsuchimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Actinic-ray- or radiation-sensitive resin composition, actinic-ray-...
- Patent number 9,323,150
- Issue date Apr 26, 2016
- FUJIFILM Corporation
- Shuji Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, and...
- Patent number 9,323,153
- Issue date Apr 26, 2016
- FUJIFILM Corporation
- Shuji Hirano
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 9,291,897
- Issue date Mar 22, 2016
- FUJIFILM Corporation
- Shuji Hirano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 9,291,898
- Issue date Mar 22, 2016
- FUJIFILM Corporation
- Natsumi Yokokawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 9,291,896
- Issue date Mar 22, 2016
- FUJIFILM Corporation
- Shuji Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
Organic Electroluminescent Device
- Publication number 20240057469
- Publication date Feb 15, 2024
- UDC IRELAND LIMITED
- Hiroo Takizawa
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Organic Electroluminescence Device
- Publication number 20190372030
- Publication date Dec 5, 2019
- UDC IRELAND LIMITED
- Hiroo Takizawa
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ORGANIC THIN FILM TRANSISTOR, METHOD OF MANUFACTURING ORGANIC THIN...
- Publication number 20180175299
- Publication date Jun 21, 2018
- FUJIFILM CORPORATION
- Yosuke YAMAMOTO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ORGANIC THIN FILM TRANSISTOR, METHOD OF MANUFACTURING ORGANIC THIN...
- Publication number 20180175300
- Publication date Jun 21, 2018
- FUJIFILM CORPORATION
- Yosuke YAMAMOTO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SEMICONDUCTOR DEVICE AND INSULATING LAYER-FORMING COMPOSITION
- Publication number 20170054076
- Publication date Feb 23, 2017
- FUJIFILM CORPORATION
- Yuzo NAGATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR ELEMENT AND INSULATING LAYER-FORMING COMPOSITION
- Publication number 20170005266
- Publication date Jan 5, 2017
- FUJIFILM CORPORATION
- Yuzo NAGATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ORGANIC THIN-FILM TRANSISTOR AND METHOD FOR MANUFACTURING SAME
- Publication number 20160372663
- Publication date Dec 22, 2016
- FUJIFILM CORPORATION
- Hiroo TAKIZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ORGANIC THIN-FILM TRANSISTOR AND METHOD FOR MANUFACTURING SAME
- Publication number 20160372662
- Publication date Dec 22, 2016
- FUJIFILM CORPORATION
- Hiroo TAKIZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILM TRANSISTOR
- Publication number 20160351824
- Publication date Dec 1, 2016
- FUJIFILM CORPORATION
- Hiroo TAKIZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, ELE...
- Publication number 20160291461
- Publication date Oct 6, 2016
- FUJIFILM CORPORATION
- Hayato YOSHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY SENSITIVE OR RADIATION SENSITIV...
- Publication number 20160147147
- Publication date May 26, 2016
- FUJIFILM CORPORATION
- Shuji HIRANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMATION METHOD, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSI...
- Publication number 20160147154
- Publication date May 26, 2016
- FUJIFILM CORPORATION
- Hiroo TAKIZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMATION METHOD, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSI...
- Publication number 20160147155
- Publication date May 26, 2016
- FUJIFILM CORPORATION
- Hiroo TAKIZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, COMPOSITION KIT AND RESIST FILM, MANUFACTUR...
- Publication number 20160048075
- Publication date Feb 18, 2016
- FUJIFILM CORPORATION
- Hiroo TAKIZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITI...
- Publication number 20160041465
- Publication date Feb 11, 2016
- FUJIFILM CORPORATION
- Hiroo TAKIZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOS...
- Publication number 20160024005
- Publication date Jan 28, 2016
- FUJIFILM CORPORATION
- NATSUMI YOKOKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERN FORMING METHOD, COMPOSITION KIT AND RESIST FILM, AND METHOD...
- Publication number 20160018734
- Publication date Jan 21, 2016
- FUJIFILM CORPORATION
- HIROO TAKIZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20160011517
- Publication date Jan 14, 2016
- FUJIFILM CORPORATION
- HIROO TAKIZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, ELECTRON BEAM- OR EXTREME ULTRAVIOLET-SENSI...
- Publication number 20150370170
- Publication date Dec 24, 2015
- FUJIFILM CORPORATION
- SHUJI HIRANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...
- Publication number 20150338736
- Publication date Nov 26, 2015
- FUJIFILM CORPORATION
- Takeshi KAWABATA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FI...
- Publication number 20150293446
- Publication date Oct 15, 2015
- FUJIFILM CORPORATION
- Natsumi YOKOKAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FI...
- Publication number 20150284492
- Publication date Oct 8, 2015
- FUJIFILM CORPORATION
- Natsumi YOKOKAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD, RESIST PATTERN FORMED BY THE METHOD, METHOD...
- Publication number 20150253673
- Publication date Sep 10, 2015
- FUJIFILM CORPORATION
- Kaoru IWATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Organic Electroluminescence Device
- Publication number 20150243913
- Publication date Aug 27, 2015
- UDC IRELAND LIMITED
- Hiroo Takizawa
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20150185610
- Publication date Jul 2, 2015
- FUJIFILM CORPORATION
- Shuji HIRANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20150185612
- Publication date Jul 2, 2015
- FUJIFILM CORPORATION
- Takeshi KAWABATA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIO...
- Publication number 20150168834
- Publication date Jun 18, 2015
- FUJIFILM CORPORATION
- Hiroo TAKIZAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20150147688
- Publication date May 28, 2015
- FUJIFILM CORPORATION
- Natsumi YOKOKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20150140484
- Publication date May 21, 2015
- FUJIFILM CORPORATION
- Hiroo TAKIZAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20150132688
- Publication date May 14, 2015
- FUJIFILM CORPORATION
- Natsumi YOKOKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hiroo Takizawa

Person

Patents Grantslast 30 patents

Organic electroluminescence device

Pattern formation method, active light-sensitive or radiation-sensi...

Organic electroluminescence device

Actinic-ray- or radiation-sensitive resin composition, actinic-ray-...

Pattern forming method, composition kit and resist film, manufactur...

Organic thin-film transistor and method for manufacturing same

Pattern forming method, composition kit and resist film, and method...

Semiconductor device and insulating layer-forming composition

Pattern formation method, active light-sensitive or radiation-sensi...

Organic thin-film transistor and method for manufacturing same

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Thin film transistor

Pattern forming method, active light sensitive or radiation sensiti...

Pattern forming method, electron beam- or extreme ultraviolet-sensi...

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Compound, actinic ray-sensitive or radiation-sensitive resin compos...

Actinic ray-sensitive or radiation-sensitive composition, resist fi...

Pattern-forming method, electron beam-sensitive or extreme ultravio...

Actinic ray-sensitive or radiation-sensitive composition, resist fi...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Pattern forming method, resist pattern formed by the method, method...

Pattern forming method, electron beam-sensitive or extreme ultravio...

Pattern forming method, electron beam-sensitive or extreme ultravio...

Actinic-ray- or radiation-sensitive resin composition, actinic-ray-...

Actinic-ray- or radiation-sensitive resin composition, actinic-ray-...

Actinic ray-sensitive or radiation-sensitive resin composition, and...

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Patents Applicationslast 30 patents

Organic Electroluminescent Device

Organic Electroluminescence Device

ORGANIC THIN FILM TRANSISTOR, METHOD OF MANUFACTURING ORGANIC THIN...

ORGANIC THIN FILM TRANSISTOR, METHOD OF MANUFACTURING ORGANIC THIN...

SEMICONDUCTOR DEVICE AND INSULATING LAYER-FORMING COMPOSITION

SEMICONDUCTOR ELEMENT AND INSULATING LAYER-FORMING COMPOSITION

ORGANIC THIN-FILM TRANSISTOR AND METHOD FOR MANUFACTURING SAME

ORGANIC THIN-FILM TRANSISTOR AND METHOD FOR MANUFACTURING SAME

THIN FILM TRANSISTOR

PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, ELE...

PATTERN FORMING METHOD, ACTINIC RAY SENSITIVE OR RADIATION SENSITIV...

PATTERN FORMATION METHOD, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSI...

PATTERN FORMATION METHOD, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSI...

PATTERN FORMING METHOD, COMPOSITION KIT AND RESIST FILM, MANUFACTUR...

PATTERN FORMING METHOD, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITI...

COMPOUND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOS...

PATTERN FORMING METHOD, COMPOSITION KIT AND RESIST FILM, AND METHOD...

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

PATTERN FORMING METHOD, ELECTRON BEAM- OR EXTREME ULTRAVIOLET-SENSI...

ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FI...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FI...

PATTERN FORMING METHOD, RESIST PATTERN FORMED BY THE METHOD, METHOD...

Organic Electroluminescence Device

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

PATTERN FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIO...

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...