Hiroshi Kanekiyo

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Kudamatsu, JP

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing system and apparatus and a sample processing method
- Patent number 7,686,917
- Issue date Mar 30, 2010
- Hitachi, Ltd.
- Toshio Masuda
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing system and apparatus and a sample processing method
- Patent number 7,169,254
- Issue date Jan 30, 2007
- Hitachi, Ltd.
- Toshio Masuda
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing system and apparatus and a sample processing method
- Patent number 6,923,885
- Issue date Aug 2, 2005
- Hitachi, Ltd.
- Toshio Masuda
- G01 - MEASURING TESTING
Information Patent Grant
Plasma etching method
- Patent number 6,914,005
- Issue date Jul 5, 2005
- Hitachi High-Technologies Corporation
- Muneo Furuse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system and apparatus and a sample processing method
- Patent number 6,755,932
- Issue date Jun 29, 2004
- Hitachi, Ltd.
- Toshio Masuda
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
Plasma Processing System And Apparatus And A Sample Processing Method
- Publication number 20080011422
- Publication date Jan 17, 2008
- Toshio Masuda
- G01 - MEASURING TESTING
Information Patent Application
Plasma processing system and apparatus and a sample processing method
- Publication number 20040177925
- Publication date Sep 16, 2004
- Toshio Masuda
- G01 - MEASURING TESTING
Information Patent Application
Plasma processing system and apparatus and a sample processing method
- Publication number 20040118517
- Publication date Jun 24, 2004
- Toshio Masuda
- G01 - MEASURING TESTING
Information Patent Application
Plasma processing system and apparatus and a sample processing method
- Publication number 20040118518
- Publication date Jun 24, 2004
- Toshio Masuda
- G01 - MEASURING TESTING
Information Patent Application
Plasma etching method
- Publication number 20030166343
- Publication date Sep 4, 2003
- Muneo Furuse
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and maintenance method therefor
- Publication number 20020179245
- Publication date Dec 5, 2002
- Toshio Masuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing system and apparatus and a sample processing method
- Publication number 20010015175
- Publication date Aug 23, 2001
- Toshio Masuda
- G01 - MEASURING TESTING