Claims
- 1. A maintenance method for a plasma processing apparatus having a vacuum vessel having a formed processing chamber inside, a plasma generation device for generating plasma in said processing chamber, and an electrode for holding a sample to be processed in said processing chamber, wherein said plasma processing chamber is structured so that an upper wall of said vacuum vessel is an open-close part, and at least one of parts constituting said plasma generation device including a non-metallic brittle member is arranged in said open-close part, and at least one part of an upper wall constituting an upper side surface of said processing chamber is rotated around an almost horizontal axis and said open-close part can be held stably in a state that said open-close part on an inner side of said processing chamber is directed upward, and said open-close part on said inner side of said processing chamber is kept at an angle of less than 30 degrees from a horizontal plane with said part held when said open-close part is opened, and said open-close part is opened at an angle that said open-close part on said inner side of said processing chamber is directed upward with said part kept, and a maintenance operation for said plasma processing apparatus is performed.
- 2. A maintenance method for a plasma processing apparatus according to claim 1, wherein said open-close part is opened toward a maintenance operation area and said maintenance operation for said plasma processing apparatus is performed.
Priority Claims (1)
Number |
Date |
Country |
Kind |
11-72577 |
Mar 1999 |
JP |
|
CROSS REFERENCE TO RELATED APPLICATION
[0001] This is a divisional of U.S. application Ser. No. 09/936,766, filed Sep. 17, 2001, the subject matter of which is incorporated by reference herein.
Divisions (1)
|
Number |
Date |
Country |
Parent |
09936766 |
Sep 2001 |
US |
Child |
10202094 |
Jul 2002 |
US |