Hiroshi Komano

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Negative photoresist compositions for the formation of thick films,...
- Patent number 7,419,769
- Issue date Sep 2, 2008
- Tokyo Ohka Kogyo Co., Ltd.
- Koji Saito
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative photoresist compositions for the formation of thick films,...
- Patent number 7,129,018
- Issue date Oct 31, 2006
- Toyko Ohka Kogyo Co., Ltd.
- Koji Saito
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Negative photoresist compositions for the formation of thick films,...
- Patent number 7,063,934
- Issue date Jun 20, 2006
- Toyko Ohka Kogyo Co., Ltd.
- Koji Saito
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Fluorine-containing monomeric ester compound for base resin in phot...
- Patent number 6,846,949
- Issue date Jan 25, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified negative photoresist composition for the forma...
- Patent number 6,838,229
- Issue date Jan 4, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Yasushi Washio
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive resist composition and base material carrying layer of the...
- Patent number 6,787,284
- Issue date Sep 7, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Fluorine-containing monomeric ester compound for base resin in phot...
- Patent number 6,683,202
- Issue date Jan 27, 2004
- Tokyo Ohka, Kogyo Co., Ltd.
- Toshiyuki Ogata
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive photoresist composition for the formation of thick films,...
- Patent number 6,641,972
- Issue date Nov 4, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Kouichi Misumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical-sensitization photoresist composition
- Patent number 6,388,101
- Issue date May 14, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photopolymerizable composition for color filter
- Patent number 6,376,153
- Issue date Apr 23, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Kiyoshi Uchikawa
- G02 - OPTICS
Information Patent Grant
Developer solution for acitinic ray sensitive resist
- Patent number 6,329,126
- Issue date Dec 11, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Hatsuyuki Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming antireflective coating film and method for...
- Patent number 6,268,108
- Issue date Jul 31, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Etsuko Iguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for producing color filter
- Patent number 6,265,116
- Issue date Jul 24, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Kiyoshi Uchikawa
- G02 - OPTICS
Information Patent Grant
Post-ashing treating liquid compositions and a process for treatmen...
- Patent number 6,261,745
- Issue date Jul 17, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working photoresist composition
- Patent number 6,225,476
- Issue date May 1, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working chemical-amplification photoresist composition
- Patent number 6,171,749
- Issue date Jan 9, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Toshikazu Tachikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid coating composition for use in forming antireflective film a...
- Patent number 6,136,505
- Issue date Oct 24, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working photoresist composition
- Patent number 6,087,063
- Issue date Jul 11, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working resist composition
- Patent number 6,077,644
- Issue date Jun 20, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemical-sensitization photoresist composition
- Patent number 6,063,953
- Issue date May 16, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemical-sensitization photoresist composition
- Patent number 6,022,666
- Issue date Feb 8, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition containing a triazine compound and...
- Patent number 6,010,824
- Issue date Jan 4, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroshi Komano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative-working chemical-sensitization photoresist composition
- Patent number 5,990,338
- Issue date Nov 23, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive-working chemical-sensitization photoresist composition
- Patent number 5,973,187
- Issue date Oct 26, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Negative-working chemical-sensitization photoresist composition com...
- Patent number 5,928,837
- Issue date Jul 27, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Mitsuru Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compounds for use in a positive-working resist composition
- Patent number 5,929,271
- Issue date Jul 27, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Image formation method with a post exposure heating step
- Patent number 5,908,734
- Issue date Jun 1, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiki Okui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition for forming light shielding films,...
- Patent number 5,908,720
- Issue date Jun 1, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Kiyoshi Uchikawa
- G02 - OPTICS
Information Patent Grant
Chemical-sensitization photoresist composition
- Patent number 5,902,713
- Issue date May 11, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cyano group-containing oxime sulfonate compounds
- Patent number 5,892,095
- Issue date Apr 6, 1999
- Tokyo Ohka Kogyo Co., Ltd.
- Hideo Hada
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
Negative photoresist compositions for the formation of thick films,...
- Publication number 20060035169
- Publication date Feb 16, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Koji Saito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative photoresist compositions for the formation of thick films,...
- Publication number 20060035170
- Publication date Feb 16, 2006
- Koji Saito
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition and base material carrying layer of the...
- Publication number 20050123854
- Publication date Jun 9, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition and base material carrying layer of the...
- Publication number 20040152860
- Publication date Aug 5, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Novel fluorine-containing monomeric ester compound for base resin i...
- Publication number 20040122255
- Publication date Jun 24, 2004
- Toshiyuki Ogata
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Negative photoresist compositions for the formation of thick films,...
- Publication number 20030064319
- Publication date Apr 3, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Koji Saito
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Positive photoresist composition for the formation of thick films,...
- Publication number 20030059706
- Publication date Mar 27, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Kouichi Misumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemically amplified negative photoresist composition for the forma...
- Publication number 20030039921
- Publication date Feb 27, 2003
- Tokyo Ohka Kogyo Co., Ltd.
- Yasushi Washio
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Novel fluorine-containing monomeric ester compound for base resin i...
- Publication number 20020115883
- Publication date Aug 22, 2002
- Toshiyuki Ogata
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Positive resist composition and base material carrying layer of the...
- Publication number 20020025495
- Publication date Feb 28, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Toshiyuki Ogata
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Photopolymerizable composition for color filter and process for pro...
- Publication number 20010036584
- Publication date Nov 1, 2001
- Kiyoshi Uchikawa
- G02 - OPTICS

Hiroshi Komano

Person

Patents Grantslast 30 patents

Negative photoresist compositions for the formation of thick films,...

Negative photoresist compositions for the formation of thick films,...

Negative photoresist compositions for the formation of thick films,...

Fluorine-containing monomeric ester compound for base resin in phot...

Chemically amplified negative photoresist composition for the forma...

Positive resist composition and base material carrying layer of the...

Fluorine-containing monomeric ester compound for base resin in phot...

Positive photoresist composition for the formation of thick films,...

Chemical-sensitization photoresist composition

Photopolymerizable composition for color filter

Developer solution for acitinic ray sensitive resist

Composition for forming antireflective coating film and method for...

Process for producing color filter

Post-ashing treating liquid compositions and a process for treatmen...

Positive-working photoresist composition

Negative-working chemical-amplification photoresist composition

Liquid coating composition for use in forming antireflective film a...

Positive-working photoresist composition

Positive-working resist composition

Chemical-sensitization photoresist composition

Chemical-sensitization photoresist composition

Photosensitive resin composition containing a triazine compound and...

Negative-working chemical-sensitization photoresist composition

Positive-working chemical-sensitization photoresist composition

Negative-working chemical-sensitization photoresist composition com...

Compounds for use in a positive-working resist composition

Image formation method with a post exposure heating step

Photosensitive resin composition for forming light shielding films,...

Chemical-sensitization photoresist composition

Cyano group-containing oxime sulfonate compounds

Patents Applicationslast 30 patents

Negative photoresist compositions for the formation of thick films,...

Negative photoresist compositions for the formation of thick films,...

Positive resist composition and base material carrying layer of the...

Positive resist composition and base material carrying layer of the...

Novel fluorine-containing monomeric ester compound for base resin i...

Negative photoresist compositions for the formation of thick films,...

Positive photoresist composition for the formation of thick films,...

Chemically amplified negative photoresist composition for the forma...

Novel fluorine-containing monomeric ester compound for base resin i...

Positive resist composition and base material carrying layer of the...

Photopolymerizable composition for color filter and process for pro...