Claims
- 1. A chemical-sensitization positive-working photoresist composition which comprises, as a uniform solution in an organic solvent:
- (A) 100 parts by weight of a film-forming acrylic resin which undergoes an increase in solubility in an aqueous alkaline solution by interacting with an acid; and
- (B) from 0.5 to 20 parts by weight of a radiation-sensitive acid-generating agent which is a compound capable of releasing an acid when irradiated with actinic rays, the acrylic resin as the component (A) being a polymer or copolymer comprising the monomeric units of a (meth)acrylic acid ester of hydroxy bicyclo[3.1.1]heptanone unsubstituted or substituted by an alkyl group.
- 2. The chemical-sensitization positive-working photoresist composition as claimed in claim 1 in which the monomeric unit of a (meth)acrylic acid ester of hydroxy bicyclo[3.1.1]-heptanone unsubstituted or substituted by an alkyl group is represented by the general formula ##STR5## in which R.sup.1 is a hydrogen atom or a methyl group and R.sup.2, R.sup.3 and R.sup.4 are each, independently from the others, a hydrogen atom or a lower alkyl group having 1 to 4 carbon atoms.
- 3. The chemical-sensitization positive-working photoresist composition as claimed in claim 2 in which the molar fraction of the monomeric units represented by the general formula is in the range from 30% to 70%.
- 4. The chemical-sensitization positive-working photoresist composition as claimed in claim 1 in which the acrylic resin as the component (A) is a copolymer consisting of the monomeric units of the (meth)acrylic acid ester of hydroxy bicyclo[3.1.1]heptanone and monomeric units of a comonomer selected from the group consisting of acrylic acid, methacrylic acid, tert-butyl acrylate and tert-butyl methacrylate.
- 5. The chemical-sensitization positive-working photoresist composition as claimed in claim 4 in which the molar fraction of the monomeric units of the (meth)acrylic acid ester of hydroxy bicyclo[3.1.1]heptanone is in the range from 30% to 70% and the molar fraction of the monomeric units of the comonomer is in the range from 70% to 30%.
- 6. The chemical-sensitization positive-working photoresist composition as claimed in claim 5 in which the molar fraction of the monomeric units of the (meth)acrylic acid ester of hydroxy bicyclo[3.1.1]heptanone is in the range from 50% to 65% and the molar fraction of the monomeric units of the comonomer is in the range from 35% to 50%.
- 7. The chemical-sensitization positive-working photoresist composition as claimed in claim 1 in which the (meth)acrylic acid ester of hydroxy bicyclo[3.1.1]heptanone is hydroxypinanone acrylate or hydroxypinanone methacrylate.
- 8. The chemical-sensitization positive-working photoresist composition as claimed in claim 1 in which the radiation-sensitive acid-generating agent is an oximesulfonate compound having a cyano group in the molecule.
- 9. The chemical-sensitization positive-working photoresist composition as claimed in claim 1 in which the radiation-sensitive acid-generating agent is an onium salt compound.
- 10. The chemical-sensitization positive-working photoresist composition as claimed in claim 1 in which the amount of the component (B) is in the range from 1 to 10 parts by weight per parts by weight of the component (A).
Priority Claims (1)
Number |
Date |
Country |
Kind |
8-218803 |
Aug 1996 |
JPX |
|
Parent Case Info
This is a divisional of Ser. No. 08/912,123, filed Aug. 15, 1997, U.S. Pat. No. 5,929,271.
Foreign Referenced Citations (2)
Number |
Date |
Country |
4-39665 |
Feb 1992 |
JPX |
8-82925 |
Mar 1996 |
JPX |
Divisions (1)
|
Number |
Date |
Country |
Parent |
912123 |
Aug 1997 |
|