Hiroshi Komiya

Person

Koshi-Shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate liquid processing apparatus, substrate liquid processing...
- Patent number 11,862,486
- Issue date Jan 2, 2024
- Tokyo Electron Limited
- Kazuki Kosai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,712,710
- Issue date Aug 1, 2023
- Tokyo Electron Limited
- Fumihiro Kamimura
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Liquid processing apparatus and liquid processing method
- Patent number 11,353,894
- Issue date Jun 7, 2022
- Tokyo Electron Limited
- Keigo Satake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing apparatus, abnormality detection method, and storage medium
- Patent number 11,094,568
- Issue date Aug 17, 2021
- Tokyo Electron Limited
- Kenji Nakamizo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate liquid processing apparatus, substrate liquid processing...
- Patent number 10,770,316
- Issue date Sep 8, 2020
- Tokyo Electron Limited
- Kazuki Kosai
- B08 - CLEANING
Information Patent Grant
Substrate liquid processing apparatus and substrate liquid processi...
- Patent number 10,591,935
- Issue date Mar 17, 2020
- Tokyo Electron Limited
- Yasuhiro Takaki
- G05 - CONTROLLING REGULATING
Information Patent Grant
Substrate liquid processing apparatus
- Patent number 10,573,539
- Issue date Feb 25, 2020
- Tokyo Electron Limited
- Hiroshi Komiya
- B08 - CLEANING
Information Patent Grant
Substrate liquid processing apparatus and substrate liquid processi...
- Patent number 10,162,371
- Issue date Dec 25, 2018
- Tokyo Electron Limited
- Yasuhiro Takaki
- G05 - CONTROLLING REGULATING
Information Patent Grant
Substrate processing apparatus
- Patent number 10,153,182
- Issue date Dec 11, 2018
- Kurashiki Boseki Kabushiki Kaisha
- Noboru Higashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing apparatus, liquid processing method, and storage...
- Patent number 9,452,397
- Issue date Sep 27, 2016
- Tokyo Electron Limited
- Hiroshi Komiya
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Ultrasonic cleaning apparatus, ultrasonic cleaning method, and stor...
- Patent number 8,567,417
- Issue date Oct 29, 2013
- Tokyo Electron Limited
- Yuji Kamikawa
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
FILTER CLEANING SYSTEM AND FILTER CLEANING METHOD
- Publication number 20230091875
- Publication date Mar 23, 2023
- TOKYO ELECTRON LIMITED
- Yuki OTSUKA
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING...
- Publication number 20200365424
- Publication date Nov 19, 2020
- TOKYO ELECTRON LIMITED
- Kazuki Kosai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...
- Publication number 20200070196
- Publication date Mar 5, 2020
- TOKYO ELECTRON LIMITED
- Fumihiro KAMIMURA
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Substrate Processing Apparatus and Substrate Processing Method
- Publication number 20200038897
- Publication date Feb 6, 2020
- TOKYO ELECTRON LIMITED
- Fumihiro KAMIMURA
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSI...
- Publication number 20190079544
- Publication date Mar 14, 2019
- TOKYO ELECTRON LIMITED
- Yasuhiro Takaki
- G05 - CONTROLLING REGULATING
Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS
- Publication number 20180358240
- Publication date Dec 13, 2018
- TOKYO ELECTRON LIMITED
- Hiroshi Komiya
- B08 - CLEANING
Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING...
- Publication number 20180337067
- Publication date Nov 22, 2018
- TOKYO ELECTRON LIMITED
- Kazuki Kosai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING APPARATUS, ABNORMALITY DETECTION METHOD, AND STORAGE MEDIUM
- Publication number 20180308730
- Publication date Oct 25, 2018
- TOKYO ELECTRON LIMITED
- Kenji NAKAMIZO
- G01 - MEASURING TESTING
Information Patent Application
LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD
- Publication number 20180032092
- Publication date Feb 1, 2018
- TOKYO ELECTRON LIMITED
- Keigo Satake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSI...
- Publication number 20150131403
- Publication date May 14, 2015
- TOKYO ELECTRON LIMITED
- Yasuhiro Takaki
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORAGE...
- Publication number 20130223180
- Publication date Aug 29, 2013
- TOKYO ELECTRON LIMITED
- Hiroshi Komiya
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20130048215
- Publication date Feb 28, 2013
- TOKYO ELECTRON LIMITED
- Noboru Higashi
- G01 - MEASURING TESTING
Information Patent Application
ULTRASONIC CLEANING APPARATUS, ULTRASONIC CLEANING METHOD, AND STOR...
- Publication number 20110079240
- Publication date Apr 7, 2011
- TOKYO ELECTRON LIMITED
- Yuji KAMIKAWA
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, PROGRA...
- Publication number 20100043835
- Publication date Feb 25, 2010
- TOKYO ELECTRON LIMITED
- Kazuyoshi ESHIMA
- H01 - BASIC ELECTRIC ELEMENTS

Hiroshi Komiya

Person

Patents Grantslast 30 patents

Substrate liquid processing apparatus, substrate liquid processing...

Substrate processing apparatus and substrate processing method

Liquid processing apparatus and liquid processing method

Processing apparatus, abnormality detection method, and storage medium

Substrate liquid processing apparatus, substrate liquid processing...

Substrate liquid processing apparatus and substrate liquid processi...

Substrate liquid processing apparatus

Substrate liquid processing apparatus and substrate liquid processi...

Substrate processing apparatus

Liquid processing apparatus, liquid processing method, and storage...

Ultrasonic cleaning apparatus, ultrasonic cleaning method, and stor...

Patents Applicationslast 30 patents

FILTER CLEANING SYSTEM AND FILTER CLEANING METHOD

SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ST...

Substrate Processing Apparatus and Substrate Processing Method

SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSI...

SUBSTRATE LIQUID PROCESSING APPARATUS

SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING...

PROCESSING APPARATUS, ABNORMALITY DETECTION METHOD, AND STORAGE MEDIUM

LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD

SUBSTRATE LIQUID PROCESSING APPARATUS AND SUBSTRATE LIQUID PROCESSI...

LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORAGE...

SUBSTRATE PROCESSING APPARATUS

ULTRASONIC CLEANING APPARATUS, ULTRASONIC CLEANING METHOD, AND STOR...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, PROGRA...