HIROSHI KUDO

Person

KANAGAWA, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device having insulating layers containing oxygen and...
- Patent number 9,704,740
- Issue date Jul 11, 2017
- Fujitsu Semiconductor Limited
- Hirosato Ochimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having insulating layers containing oxygen and...
- Patent number 8,836,126
- Issue date Sep 16, 2014
- Fujitsu Semiconductor Limited
- Hirosato Ochimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 8,067,791
- Issue date Nov 29, 2011
- Fujitsu Semiconductor Limited
- Hiroshi Kudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 7,928,476
- Issue date Apr 19, 2011
- Fujitsu Semiconductor Limited
- Hiroshi Kudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device
- Patent number 7,915,733
- Issue date Mar 29, 2011
- Fujitsu Semiconductor Limited
- Hiroshi Kudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 7,679,144
- Issue date Mar 16, 2010
- Fujitsu Microelectronics Limited
- Hiroshi Kudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 7,642,577
- Issue date Jan 5, 2010
- Fujitsu Microelectronics Limited
- Hiroshi Kudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a semiconductor device
- Patent number 7,163,887
- Issue date Jan 16, 2007
- Fujitsu Limited
- Hiroshi Kudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 7,064,038
- Issue date Jun 20, 2006
- Fujitsu Limited
- Hiroshi Kudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a multilayer interconnection structure
- Patent number 7,041,586
- Issue date May 9, 2006
- Fujitsu Limited
- Hiroshi Kudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for forming insulating film
- Patent number 6,448,666
- Issue date Sep 10, 2002
- Fujitsu Limited
- Hiroshi Kudo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device manufacturing method
- Patent number 6,420,261
- Issue date Jul 16, 2002
- Fujitsu Limited
- Hiroshi Kudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a multilayer interconnection structure
- Patent number 6,417,116
- Issue date Jul 9, 2002
- Fujitsu Limited
- Hiroshi Kudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of making ferroelectric film with protective cover film agai...
- Patent number 6,344,363
- Issue date Feb 5, 2002
- Fujitsu Limited
- Rika Shinohara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming insulating film
- Patent number 6,037,274
- Issue date Mar 14, 2000
- Fujitsu Limited
- Hiroshi Kudo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for the production of semiconductor devices
- Patent number 5,602,060
- Issue date Feb 11, 1997
- Fujitsu Limited
- Michiko Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE HAVING INSULATING LAYERS CONTAINING OXYGEN AND...
- Publication number 20170047246
- Publication date Feb 16, 2017
- FUJITSU SEMICONDUCTOR LIMITED
- Hirosato OCHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE HAVING INSULATING LAYERS CONTAINING OXYGEN AND...
- Publication number 20140353829
- Publication date Dec 4, 2014
- Hirosato OCHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20110183515
- Publication date Jul 28, 2011
- FUJITSU SEMICONDUCTOR LIMITED
- Hiroshi Kudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20100059828
- Publication date Mar 11, 2010
- Fujitsu Microelectronics Limited
- Hiroshi KUDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20100038792
- Publication date Feb 18, 2010
- Fujitsu Microelectronics Limited
- Hirosato OCHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20090200676
- Publication date Aug 13, 2009
- Fujitsu Microelectronics Limited
- Hiroshi KUDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20090146309
- Publication date Jun 11, 2009
- Fujitsu Microelectronics Limited
- Hiroshi KUDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20080061445
- Publication date Mar 13, 2008
- Fujitsu Limited
- Hiroshi KUDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of manufacturing the same
- Publication number 20080012081
- Publication date Jan 17, 2008
- Fujitsu Limited
- Hiroshi Kudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method for fabricating the same
- Publication number 20060035427
- Publication date Feb 16, 2006
- FUJITSU LIMITED
- Hiroshi Kudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for fabricating a semiconductor device
- Publication number 20050020057
- Publication date Jan 27, 2005
- FUJITSU LIMITED
- Hiroshi Kudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method for fabricating the same
- Publication number 20040142546
- Publication date Jul 22, 2004
- FUJITSU LIMITED
- Hiroshi Kudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device having a multilayer interconnection structure
- Publication number 20020151190
- Publication date Oct 17, 2002
- FUJITSU LIMITED
- Hiroshi Kudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD
- Publication number 20020001941
- Publication date Jan 3, 2002
- HIROSHI KUDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE HAVING A MULTILAYER INTERCONNECTION STRUCTURE
- Publication number 20010044201
- Publication date Nov 22, 2001
- HIROSHI KUDO
- H01 - BASIC ELECTRIC ELEMENTS

HIROSHI KUDO

Person

Patents Grantslast 30 patents

Semiconductor device having insulating layers containing oxygen and...

Semiconductor device having insulating layers containing oxygen and...

Semiconductor device and method for fabricating the same

Semiconductor device and method of manufacturing the same

Semiconductor device

Semiconductor device and method for manufacturing the same

Semiconductor device and method for fabricating the same

Method for fabricating a semiconductor device

Semiconductor device and method for fabricating the same

Semiconductor device having a multilayer interconnection structure

Semiconductor device and method for forming insulating film

Semiconductor device manufacturing method

Semiconductor device having a multilayer interconnection structure

Method of making ferroelectric film with protective cover film agai...

Method for forming insulating film

Process for the production of semiconductor devices

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE HAVING INSULATING LAYERS CONTAINING OXYGEN AND...

SEMICONDUCTOR DEVICE HAVING INSULATING LAYERS CONTAINING OXYGEN AND...

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

Semiconductor device and method of manufacturing the same

Semiconductor device and method for fabricating the same

Method for fabricating a semiconductor device

Semiconductor device and method for fabricating the same

Semiconductor device having a multilayer interconnection structure

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

SEMICONDUCTOR DEVICE HAVING A MULTILAYER INTERCONNECTION STRUCTURE