Hiroshi Maehara

Person

Kanagawa, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resin composition with biodegradable non-liquid-crystalline and liq...
- Patent number 7,608,593
- Issue date Oct 27, 2009
- Canon Kabushiki Kaisha
- Hiroshi Maehara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Apparatus for handling minute object
- Patent number 7,295,357
- Issue date Nov 13, 2007
- Canon Kabushiki Kaisha
- Hiroshi Maehara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Recyclable polymer and process for production thereof
- Patent number 7,291,679
- Issue date Nov 6, 2007
- Canon Kabushiki Kaisha
- Hiroshi Maehara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition, resist composition, fabrication m...
- Patent number 7,122,297
- Issue date Oct 17, 2006
- Canon Kabushiki Kaisha
- Hiroshi Maehara
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Reflection type mask
- Patent number 7,072,438
- Issue date Jul 4, 2006
- Canon Kabushiki Kaisha
- Keiko Chiba
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Resin composition, method of molding the same, and method of recycl...
- Patent number 7,064,113
- Issue date Jun 20, 2006
- Canon Kabushiki Kaisha
- Hiroshi Maehara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Decomposable resin composition and method for producing the same
- Patent number 7,019,043
- Issue date Mar 28, 2006
- Canon Kabushiki Kaisha
- Hiroshi Maehara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Recyclable polymer, process for production thereof, and recycling t...
- Patent number 7,009,007
- Issue date Mar 7, 2006
- Canon Kabushiki Kaisha
- Hiroshi Maehara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Electron optical system array, method of manufacturing the same, ch...
- Patent number 6,872,952
- Issue date Mar 29, 2005
- Canon Kabushiki Kaisha
- Yasuhiro Shimada
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Photosensitive resin composition, resist composition, fabricating m...
- Patent number 6,866,973
- Issue date Mar 15, 2005
- Canon Kabushiki Kaisha
- Hiroshi Maehara
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Optical system and optical instrument with diffractive optical element
- Patent number 6,829,091
- Issue date Dec 7, 2004
- Canon Kabushiki Kaisha
- Takashi Kato
- G02 - OPTICS
Information Patent Grant
Illuminator, exposure apparatus, and method for fabricating device...
- Patent number 6,795,166
- Issue date Sep 21, 2004
- Canon Kabushiki Kaisha
- Hideo Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
X-ray mask, and exposure method and apparatus using the same
- Patent number 6,728,332
- Issue date Apr 27, 2004
- Canon Kabushiki Kaisha
- Keiko Chiba
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Decomposable resin composition and method for producing the same
- Patent number 6,653,364
- Issue date Nov 25, 2003
- Canon Kabushiki Kaisha
- Hiroshi Maehara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for manufacture of optical element
- Patent number 6,652,781
- Issue date Nov 25, 2003
- Canon Kabushiki Kaisha
- Hideo Kato
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Charged-particle beam exposure apparatus and device manufacturing m...
- Patent number 6,603,128
- Issue date Aug 5, 2003
- Canon Kabushiki Kaisha
- Hiroshi Maehara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure apparatus
- Patent number 6,594,012
- Issue date Jul 15, 2003
- Canon Kabushiki Kaisha
- Seiji Takeuchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin, resist composition using the photosensitive r...
- Patent number 6,479,212
- Issue date Nov 12, 2002
- Canon Kabushiki Kaisha
- Minoru Matsuda
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Optical element
- Patent number 6,476,968
- Issue date Nov 5, 2002
- Canon Kabushiki Kaisha
- Hideo Kato
- G02 - OPTICS
Information Patent Grant
Optical element
- Patent number 6,421,188
- Issue date Jul 16, 2002
- Canon Kabushiki Kaisha
- Hiroshi Maehara
- G02 - OPTICS
Information Patent Grant
Mask structure exposure method
- Patent number 6,337,161
- Issue date Jan 8, 2002
- Canon Kabushiki Kaisha
- Keiko Chiba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element
- Patent number 6,317,274
- Issue date Nov 13, 2001
- Canon Kabushiki Kaisha
- Hideo Kato
- G02 - OPTICS
Information Patent Grant
X-ray mask, and exposure method and apparatus using the same
- Patent number 6,317,479
- Issue date Nov 13, 2001
- Canon Kabushiki Kaisha
- Keiko Chiba
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photosensitive resin, resist based on the photosensitive resin, exp...
- Patent number 6,225,019
- Issue date May 1, 2001
- Canon Kabushiki Kaisha
- Minoru Matsuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
X-ray mask and X-ray exposure method using the same
- Patent number 6,101,237
- Issue date Aug 8, 2000
- Canon Kabushiki Kaisha
- Takeshi Miyachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing semiconductor devices by performing coating...
- Patent number 6,087,076
- Issue date Jul 11, 2000
- Canon Kabushiki Kaisha
- Keita Sakai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Diffractive optical element and optical instrument having the same
- Patent number 6,008,942
- Issue date Dec 28, 1999
- Canon Kabushiki Kaisha
- Makoto Ogusu
- G02 - OPTICS
Information Patent Grant
Resist solution for photolithography including a base resin and an...
- Patent number 5,952,149
- Issue date Sep 14, 1999
- Canon Kabushiki Kaisha
- Keita Sakai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflection type mask structure and exposure apparatus using the same
- Patent number 5,889,758
- Issue date Mar 30, 1999
- Canon Kabushiki Kaisha
- Hiroshi Maehara
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Membrane and mask, and exposure apparatus using the mask, and devic...
- Patent number 5,882,826
- Issue date Mar 16, 1999
- Canon Kabushiki Kaisha
- Hideo Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
LAYERED SILICATE COMPOUND AND RESIN COMPOSITION CONTAINING THE LAYE...
- Publication number 20070232742
- Publication date Oct 4, 2007
- Canon Kabushiki Kaisha
- HIROSHI MAEHARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resin composition with biodegradable non-liquid-crystalline and liq...
- Publication number 20060035860
- Publication date Feb 16, 2006
- Caon Kabushiki Kaisha
- Hiroshi Maehara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Recyclable polymer and process for production thereof
- Publication number 20060030675
- Publication date Feb 9, 2006
- Canon Kabushiki Kaisha
- Hiroshi Maehara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photosensitive resin composition, resist composition, fabrication m...
- Publication number 20050031992
- Publication date Feb 10, 2005
- Canon Kabushiki Kaisha
- Hiroshi Maehara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reflection type mask
- Publication number 20040125911
- Publication date Jul 1, 2004
- Canon Kabushiki Kaisha
- Keiko Chiba
- B82 - NANO-TECHNOLOGY
Information Patent Application
Decomposable resin composition and method for producing the same
- Publication number 20040010051
- Publication date Jan 15, 2004
- Canon Kabushiki Kaisha
- Hiroshi Maehara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Recyclable polymer, process for production thereof, and recycling t...
- Publication number 20030225213
- Publication date Dec 4, 2003
- Canon Kabushiki Kaisha
- Hiroshi Maehara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
OPTICAL SYSTEM AND OPTICAL INSTRUMENT WITH DIFFRACTIVE OPTICAL ELEMENT
- Publication number 20030016447
- Publication date Jan 23, 2003
- TAKASHI KATO
- G02 - OPTICS
Information Patent Application
Resin composition, method of molding the same, and method of recycl...
- Publication number 20020130436
- Publication date Sep 19, 2002
- Hiroshi Maehara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Decomposable resin composition and method for producing the same
- Publication number 20020091172
- Publication date Jul 11, 2002
- Hiroshi Maehara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Photosensitive resin composition, resist composition, fabricating m...
- Publication number 20020086226
- Publication date Jul 4, 2002
- Hiroshi Maehara
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
DIFFRACTIVE OPTICAL ELEMENT AND OPTICAL SYSTEM HAVING THE SAME
- Publication number 20020030890
- Publication date Mar 14, 2002
- HIDEO KATO
- G02 - OPTICS
Information Patent Application
METHOD FOR MANUFACTURE OF OPTICAL ELEMENT
- Publication number 20020027301
- Publication date Mar 7, 2002
- Hideo Kato
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
X-ray mask, and exposure method and apparatus using the same
- Publication number 20020021781
- Publication date Feb 21, 2002
- Keiko Chiba
- B82 - NANO-TECHNOLOGY
Information Patent Application
Charged-particle beam exposure apparatus and device manufacturing m...
- Publication number 20020009901
- Publication date Jan 24, 2002
- Hiroshi Maehara
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron optical system array, method of manufacturing the same, ch...
- Publication number 20010052576
- Publication date Dec 20, 2001
- Yasuhiro Shimada
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
ILLUMINATOR, EXPOSURE APPARATUS, AND METHOD FOR FABRICATING DEVICE...
- Publication number 20010043320
- Publication date Nov 22, 2001
- HIDEO KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK STRUCTURE EXPOSURE METHOD
- Publication number 20010038950
- Publication date Nov 8, 2001
- Keiko Chiba
- KEIKO CHIBA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for manufacture of optical element
- Publication number 20010002074
- Publication date May 31, 2001
- Hideo Kato
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

Hiroshi Maehara

Person

Patents Grantslast 30 patents

Resin composition with biodegradable non-liquid-crystalline and liq...

Apparatus for handling minute object

Recyclable polymer and process for production thereof

Photosensitive resin composition, resist composition, fabrication m...

Reflection type mask

Resin composition, method of molding the same, and method of recycl...

Decomposable resin composition and method for producing the same

Recyclable polymer, process for production thereof, and recycling t...

Electron optical system array, method of manufacturing the same, ch...

Photosensitive resin composition, resist composition, fabricating m...

Optical system and optical instrument with diffractive optical element

Illuminator, exposure apparatus, and method for fabricating device...

X-ray mask, and exposure method and apparatus using the same

Decomposable resin composition and method for producing the same

Method for manufacture of optical element

Charged-particle beam exposure apparatus and device manufacturing m...

Exposure apparatus

Photosensitive resin, resist composition using the photosensitive r...

Optical element

Optical element

Mask structure exposure method

Optical element

X-ray mask, and exposure method and apparatus using the same

Photosensitive resin, resist based on the photosensitive resin, exp...

X-ray mask and X-ray exposure method using the same

Method of manufacturing semiconductor devices by performing coating...

Diffractive optical element and optical instrument having the same

Resist solution for photolithography including a base resin and an...

Reflection type mask structure and exposure apparatus using the same

Membrane and mask, and exposure apparatus using the mask, and devic...

Patents Applicationslast 30 patents

LAYERED SILICATE COMPOUND AND RESIN COMPOSITION CONTAINING THE LAYE...

Resin composition with biodegradable non-liquid-crystalline and liq...

Recyclable polymer and process for production thereof

Photosensitive resin composition, resist composition, fabrication m...

Reflection type mask

Decomposable resin composition and method for producing the same

Recyclable polymer, process for production thereof, and recycling t...

OPTICAL SYSTEM AND OPTICAL INSTRUMENT WITH DIFFRACTIVE OPTICAL ELEMENT

Resin composition, method of molding the same, and method of recycl...

Decomposable resin composition and method for producing the same

Photosensitive resin composition, resist composition, fabricating m...

DIFFRACTIVE OPTICAL ELEMENT AND OPTICAL SYSTEM HAVING THE SAME

METHOD FOR MANUFACTURE OF OPTICAL ELEMENT

X-ray mask, and exposure method and apparatus using the same

Charged-particle beam exposure apparatus and device manufacturing m...

Electron optical system array, method of manufacturing the same, ch...

ILLUMINATOR, EXPOSURE APPARATUS, AND METHOD FOR FABRICATING DEVICE...

MASK STRUCTURE EXPOSURE METHOD

Method for manufacture of optical element