Hiroto Yukawa

Person

Yokohama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Positive-working chemical-amplification photoresist composition
- Patent number 7,147,984
- Issue date Dec 12, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroto Yukawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive-working chemical-amplification photoresist composition
- Patent number 6,890,697
- Issue date May 10, 2005
- Tokyo Ohka Kogyo Co., Ltd.
- Katsumi Oomori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive-working chemical-amplification photoresist composition
- Patent number 6,869,745
- Issue date Mar 22, 2005
- Tokyo Ohka Kogyo, Co., Inc.
- Katsumi Oomori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive-working chemical-amplification photoresist composition
- Patent number 6,773,863
- Issue date Aug 10, 2004
- Tokyo Ohka Kogyo Co., Ltd.
- Katsumi Oomori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive-working chemical-amplification photoresist composition and...
- Patent number 6,548,229
- Issue date Apr 15, 2003
- Tokyo Ohka Kogyo, Co., Ltd.
- Katsumi Oomori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive-working photoresist composition
- Patent number 6,485,887
- Issue date Nov 26, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Katsumi Oomori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive-working chemical-amplification photoresist composition
- Patent number 6,387,587
- Issue date May 14, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Katsumi Oomori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working photoresist composition
- Patent number 6,340,553
- Issue date Jan 22, 2002
- Tokyo Ohka Kogyo Co., Ltd.
- Katsumi Oomori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-working chemical-amplification photoresist composition and...
- Patent number 6,284,430
- Issue date Sep 4, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Katsumi Oomori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for formation of patterned resist layer
- Patent number 6,255,041
- Issue date Jul 3, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Katsumi Oomori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Poly (disulfonyl diazomethane) compound and positive-working chemic...
- Patent number 6,180,313
- Issue date Jan 30, 2001
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroto Yukawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
(Disulfonyl diazomethane compounds)
- Patent number 6,153,733
- Issue date Nov 28, 2000
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroto Yukawa
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
Positive-working chemical-amplification photoresist composition
- Publication number 20040191677
- Publication date Sep 30, 2004
- Hiroto Yukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive-working chemical-amplification photoresist composition
- Publication number 20040023163
- Publication date Feb 5, 2004
- Hiroto Yukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive-working chemical-amplification photoresist composition
- Publication number 20030152865
- Publication date Aug 14, 2003
- Katsumi Oomori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive-working chemical-amplification photoresist composition
- Publication number 20020119393
- Publication date Aug 29, 2002
- Hiroto Yukawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Positive-working chemical-amplification photoresist composition and...
- Publication number 20020090567
- Publication date Jul 11, 2002
- Katsumi Oomori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Positive-working photoresist composition
- Publication number 20020031722
- Publication date Mar 14, 2002
- Katsumi Oomori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
Positive-working chemical-amplification photoresist composition
- Publication number 20020028407
- Publication date Mar 7, 2002
- Katsumi Oomori
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Hiroto Yukawa

Person

Patents Grantslast 30 patents

Positive-working chemical-amplification photoresist composition

Positive-working chemical-amplification photoresist composition

Positive-working chemical-amplification photoresist composition

Positive-working chemical-amplification photoresist composition

Positive-working chemical-amplification photoresist composition and...

Positive-working photoresist composition

Positive-working chemical-amplification photoresist composition

Positive-working photoresist composition

Positive-working chemical-amplification photoresist composition and...

Method for formation of patterned resist layer

Poly (disulfonyl diazomethane) compound and positive-working chemic...

(Disulfonyl diazomethane compounds)

Patents Applicationslast 30 patents

Positive-working chemical-amplification photoresist composition

Positive-working chemical-amplification photoresist composition

Positive-working chemical-amplification photoresist composition

Positive-working chemical-amplification photoresist composition

Positive-working chemical-amplification photoresist composition and...

Positive-working photoresist composition

Positive-working chemical-amplification photoresist composition