Claims
- 1. A method for the formation of an isolated patterned resist layer which comprises the steps of:(a) forming, on the surface of a substrate, a layer of a positive-working chemical-amplification photoresist composition which comprises, as a uniform blend: (A) 100 parts by weight of a copolymeric resin capable of being imparted with an increased solubility in an aqueous alkaline solution in the presence of an acid and consisting of from 50 to 85% by moles of hydroxyl group-containing styrene units, from 15 to 35% by moles of styrene units and from 2 to 20% by moles of tert-butyl acrylate or methacrylate units; and (B) from 1 to 20 parts by weight of a radiation-sensitive acid-generating agent releasing an acid by decomposition under irradiation with actinic rays; (b) subjecting the photoresist layer to a first heat treatment at a temperature in the range from 100° C. to 110° C.; (c) subjecting the photoresist layer to patternwise exposure to actinic rays; (d) subjecting the photoresist layer to a second heat treatment at a temperature in the range from 100° C. to 110° C.; and (e) subjecting the photoresist layer to a development treatment.
- 2. The method for the formation of a patterned resist layer as claimed in claim 1 in which each of the first and second heat treatments is conducted for a length of time in the range from 30 to 150 seconds.
- 3. The method for the formation of a patterned resist layer as claimed in claim 2 in which each of the first and second heat treatments is conducted for a length of time in the range from 60 to 120 seconds.
- 4. The chemical-amplification photoresist composition as claimed in claim 1 in which the copolymerization ratios of the comonomers for the copolymeric resin (A) are in the ranges of 62 to 68% by moles of hydroxystyrene, 15 to 25% by moles of styrene and 12 to 18% by moles of tert-butyl acrylate or methacrylate.
Priority Claims (1)
Number |
Date |
Country |
Kind |
10-113587 |
Apr 1998 |
JP |
|
Parent Case Info
This is a divisional of Ser. No. 09/657,228, filed Sep. 7, 2000, U.S. Pat. No. 6,284,430 which is a continuation of Ser. No. 09/291,115, filed Apr. 14, 1999, now abandoned.
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Continuations (1)
|
Number |
Date |
Country |
Parent |
09/291115 |
Apr 1999 |
US |
Child |
09/657228 |
|
US |