Hirotoshi Nakanishi

Person

Osaka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Chemical amplification type resist composition
- Patent number 7,220,532
- Issue date May 22, 2007
- Sumitomo Chemical Company, Limited
- Yoshiyuki Takata
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polyhydric phenol compound and positive resist composition comprisi...
- Patent number 5,714,620
- Issue date Feb 3, 1998
- Sumitomo Chemical Company, Limited
- Jun Tomioka
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Bislactone compound and a process for producing the same
- Patent number 5,591,871
- Issue date Jan 7, 1997
- Sumitomo Chemical Co., Ltd.
- Naoko Suzuki
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polyhydric phenol compound and positive resist composition comprisi...
- Patent number 5,587,492
- Issue date Dec 24, 1996
- Sumitomo Chemical Company, Limited
- Jun Tomioka
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Process for the preparation of polyhydric phenol compounds
- Patent number 5,556,995
- Issue date Sep 17, 1996
- Sumitomo Chemical Co., Ltd.
- Naoko Suzuki
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition
- Patent number 5,436,107
- Issue date Jul 25, 1995
- Sumitomo Chemical Company, Limited
- Jun Tomioka
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive resist composition comprising a quinone diazide sulfonic a...
- Patent number 5,413,895
- Issue date May 9, 1995
- Sumitomo Chemical Company, Limited
- Jun Tomioka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition
- Patent number 5,407,778
- Issue date Apr 18, 1995
- Sumitomo Chemical Company, Limited
- Yasunori Uetani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition
- Patent number 5,407,779
- Issue date Apr 18, 1995
- Sumitomo Chemical Company, Limited
- Yasunori Uetani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition comprising a quinone diazide sulfonic diester an...
- Patent number 5,378,586
- Issue date Jan 3, 1995
- Sumitomo Chemical Company, Limited
- Yasunori Uetani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition
- Patent number 5,374,742
- Issue date Dec 20, 1994
- Sumitomo Chemical Company, Limited
- Yasunori Uetani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Quinone diazide photoresist composition containing alkali-soluble r...
- Patent number 5,362,598
- Issue date Nov 8, 1994
- Sumitomo Chemical Co., Ltd.
- Naoki Takeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, novel phenol compound and quinone diazide sulfo...
- Patent number 5,290,656
- Issue date Mar 1, 1994
- Sumitomo Chemical Company, Limited
- Yasunori Uetani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive working quinone diazide and alkali soluble resin resist co...
- Patent number 5,290,657
- Issue date Mar 1, 1994
- Sumitomo Chemical Company, Limited
- Yasunori Uetani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition comprising an alkali-soluble resin and...
- Patent number 5,283,155
- Issue date Feb 1, 1994
- Sumitomo Chemical Company, Limited
- Yasunori Uetani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for preparing radiation sensitive compound and positive res...
- Patent number 5,283,324
- Issue date Feb 1, 1994
- Sumitomo Chemical Company, Limited
- Jun Tomioka
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive radiation-sensitive resist composition
- Patent number 5,275,910
- Issue date Jan 4, 1994
- Sumitomo Chemical Company, Limited
- Hiroshi Moriuma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photoresist composition containing alkali-soluble resin an...
- Patent number 5,124,228
- Issue date Jun 23, 1992
- Sumitomo Chemical Co., Ltd.
- Yasunori Uetani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for preparing a positive resist composition by mixing the c...
- Patent number 5,080,997
- Issue date Jan 14, 1992
- Sumitomo Chemical Company, Limited
- Takeshi Hioki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition containing quinone diazide sulfonic aci...
- Patent number 5,059,507
- Issue date Oct 22, 1991
- Sumitomo Chemical Company, Limited
- Yasunori Uetani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for producing benzaldehydes
- Patent number 4,500,721
- Issue date Feb 19, 1985
- Sumitomo Chemical Company Limited
- Hiroshi Yamachika
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Synthesis of substituted phenylacetic acid
- Patent number 4,220,592
- Issue date Sep 2, 1980
- Sumitomo Chemical Company, Limited
- Keiji Kagawa
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
CBP COMPOUND
- Publication number 20100089439
- Publication date Apr 15, 2010
- Yasunori Uetani
- C07 - ORGANIC CHEMISTRY
Information Patent Application
LIGHT EMITTING POLYMER COMPOSITION AND POLYMER LIGHT EMITTING DEVICE
- Publication number 20090039765
- Publication date Feb 12, 2009
- Yasunori Uetani
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Luminescent-polymer composition
- Publication number 20070020479
- Publication date Jan 25, 2007
- Yasunori Uetani
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Chemical amplification type resist composition
- Publication number 20040053171
- Publication date Mar 18, 2004
- Sumitomo Chemical Company, Limited
- Yoshiyuki Takata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hirotoshi Nakanishi

Person

Patents Grantslast 30 patents

Chemical amplification type resist composition

Polyhydric phenol compound and positive resist composition comprisi...

Bislactone compound and a process for producing the same

Polyhydric phenol compound and positive resist composition comprisi...

Process for the preparation of polyhydric phenol compounds

Positive resist composition

Positive resist composition comprising a quinone diazide sulfonic a...

Positive resist composition

Positive resist composition

Resist composition comprising a quinone diazide sulfonic diester an...

Positive resist composition

Quinone diazide photoresist composition containing alkali-soluble r...

Resist composition, novel phenol compound and quinone diazide sulfo...

Positive working quinone diazide and alkali soluble resin resist co...

Positive resist composition comprising an alkali-soluble resin and...

Process for preparing radiation sensitive compound and positive res...

Positive radiation-sensitive resist composition

Positive photoresist composition containing alkali-soluble resin an...

Process for preparing a positive resist composition by mixing the c...

Positive resist composition containing quinone diazide sulfonic aci...

Process for producing benzaldehydes

Synthesis of substituted phenylacetic acid

Patents Applicationslast 30 patents

CBP COMPOUND

LIGHT EMITTING POLYMER COMPOSITION AND POLYMER LIGHT EMITTING DEVICE

Luminescent-polymer composition

Chemical amplification type resist composition