Hiroya OHTA

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Charged particle beam device
- Patent number 12,205,790
- Issue date Jan 21, 2025
- HITACHI HIGH-TECH CORPORATION
- Momoyo Enyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern measurement device and pattern measurement method
- Patent number 12,174,551
- Issue date Dec 24, 2024
- Hitachi High-Technologies Corporation
- Takuma Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 11,869,745
- Issue date Jan 9, 2024
- HITACHI HIGH-TECH CORPORATION
- Minami Shouji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Calibration sample, electron beam adjustment method and electron be...
- Patent number 11,435,178
- Issue date Sep 6, 2022
- HITACHI HIGH-TECH CORPORATION
- Yasunari Sohda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern measurement device and pattern measurement method
- Patent number 11,353,798
- Issue date Jun 7, 2022
- Hitachi High-Technologies Corporation
- Takuma Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern measurement device and pattern measurement method
- Patent number 10,816,332
- Issue date Oct 27, 2020
- HITACHI HIGH-TECH CORPORATION
- Hiroya Ohta
- G01 - MEASURING TESTING
Information Patent Grant
Charged particle beam apparatus
- Patent number 10,636,618
- Issue date Apr 28, 2020
- Hitachi High-Technologies Corporation
- Kaori Bizen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 10,629,408
- Issue date Apr 21, 2020
- Hitachi High-Technologies Corporation
- Toshimasa Kameda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope and electron trajectory adjustment met...
- Patent number 10,262,830
- Issue date Apr 16, 2019
- Hitachi, Ltd.
- Daisuke Bizen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device and aberration corrector
- Patent number 9,991,088
- Issue date Jun 5, 2018
- Hitachi, Ltd.
- Yasuhiro Shirasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device, simulation method, and simulation device
- Patent number 9,966,225
- Issue date May 8, 2018
- Hitachi, Ltd.
- Daisuke Bizen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor inspection device including a counter electrode with...
- Patent number 9,846,133
- Issue date Dec 19, 2017
- Hitachi, Ltd.
- Yoshinobu Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor inspection method, semiconductor inspection device an...
- Patent number 9,508,611
- Issue date Nov 29, 2016
- Hitachi, Ltd.
- Yoshinobu Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 8,592,776
- Issue date Nov 26, 2013
- Hitachi High-Technologies Corporation
- Momoyo Enyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device and sample observation method
- Patent number 8,552,373
- Issue date Oct 8, 2013
- Hitachi High-Technologies Corporation
- Momoyo Enyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam applied apparatus
- Patent number 8,350,214
- Issue date Jan 8, 2013
- Hitachi High-Technologies Corporation
- Hiroki Otaki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam apparatus and specimen inspection method
- Patent number 8,330,103
- Issue date Dec 11, 2012
- Hitachi High-Technologies Corporation
- Momoyo Enyama
- G01 - MEASURING TESTING
Information Patent Grant
Electron beam inspection method and electron beam inspection apparatus
- Patent number 8,288,722
- Issue date Oct 16, 2012
- Hitachi, Ltd.
- Masaki Hasegawa
- G01 - MEASURING TESTING
Information Patent Grant
Pattern forming method and its mold
- Patent number 8,268,209
- Issue date Sep 18, 2012
- Hitachi, Ltd.
- Masahiko Ogino
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged particle beam apparatus
- Patent number 8,193,493
- Issue date Jun 5, 2012
- Hitachi High-Technologies Corporation
- Sayaka Tanimoto
- G01 - MEASURING TESTING
Information Patent Grant
Charged particle beam equipments, and charged particle beam microscope
- Patent number 8,022,365
- Issue date Sep 20, 2011
- Hitachi, Ltd.
- Osamu Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 7,906,761
- Issue date Mar 15, 2011
- Hitachi High-Technologies Corporation
- Sayaka Tanimoto
- G01 - MEASURING TESTING
Information Patent Grant
Electron beam apparatus
- Patent number 7,880,143
- Issue date Feb 1, 2011
- Hitachi High-Technologies Corporation
- Sayaka Tanimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam inspection method and electron beam inspection apparatus
- Patent number 7,863,565
- Issue date Jan 4, 2011
- Hitachi, Ltd.
- Masaki Hasegawa
- G01 - MEASURING TESTING
Information Patent Grant
Measurement method of electron beam current, electron beam writing...
- Patent number 7,425,714
- Issue date Sep 16, 2008
- Hitachi High-Technologies Corporation
- Makoto Sakakibara
- G01 - MEASURING TESTING
Information Patent Grant
Electron beam writing system and electron beam writing method
- Patent number 7,423,274
- Issue date Sep 9, 2008
- Hitachi High-Technologies Corporation
- Yoshinori Nakayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aberration measuring apparatus for charged particle beam optical sy...
- Patent number 7,378,671
- Issue date May 27, 2008
- Canon Kabushiki Kaisha
- Masato Muraki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aberration adjusting method, device fabrication method, and charged...
- Patent number 7,230,252
- Issue date Jun 12, 2007
- Canon Kabushiki Kaisha
- Masato Muraki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron gun
- Patent number 7,189,979
- Issue date Mar 13, 2007
- Canon Kabushiki Kaisha
- Masahiko Okunuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-electron beam exposure method and apparatus
- Patent number 7,126,140
- Issue date Oct 24, 2006
- Hitachi, Ltd.
- Haruo Yoda
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Pattern Measurement Device and Pattern Measurement Method
- Publication number 20250060678
- Publication date Feb 20, 2025
- HITACHI HIGH-TECH CORPORATION
- Takuma Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20240363306
- Publication date Oct 31, 2024
- HITACHI HIGH-TECH CORPORATION
- Minami SHOUJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Training Method for Learning Apparatus, and Image Generation System
- Publication number 20240144560
- Publication date May 2, 2024
- Hitachi High-Tech Corporation
- Zhaohui CHENG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Charged Particle Beam Device
- Publication number 20230274909
- Publication date Aug 31, 2023
- Hitachi High-Tech Corporation
- Minami SHOUJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Apparatus
- Publication number 20230170182
- Publication date Jun 1, 2023
- Hitachi High-Tech Corporation
- Kazufumi YACHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20220359150
- Publication date Nov 10, 2022
- Hitachi High-Tech Corporation
- Momoyo Enyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pattern Measurement Device and Pattern Measurement Method
- Publication number 20220260930
- Publication date Aug 18, 2022
- HITACHI HIGH-TECH CORPORATION
- Takuma Yamamoto
- G01 - MEASURING TESTING
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20220216032
- Publication date Jul 7, 2022
- HITACHI HIGH-TECH CORPORATION
- Minami SHOUJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20220139667
- Publication date May 5, 2022
- Hitachi High-Tech Corporation
- Minami Shouji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CALIBRATION SAMPLE, ELECTRON BEAM ADJUSTMENT METHOD AND ELECTRON BE...
- Publication number 20210131801
- Publication date May 6, 2021
- Hitachi High-Technologies Corporation
- Yasunari SOHDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pattern Measurement Device and Pattern Measurement Method
- Publication number 20200292308
- Publication date Sep 17, 2020
- Hitachi High-Technologies Corporation
- Hiroya OHTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pattern Measurement Device and Pattern Measurement Method
- Publication number 20200278615
- Publication date Sep 3, 2020
- Hitachi High-Technologies Corporation
- Takuma YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device
- Publication number 20190221400
- Publication date Jul 18, 2019
- Hitachi High-Technologies Corporation
- Toshimasa KAMEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS
- Publication number 20190066969
- Publication date Feb 28, 2019
- Hitachi High-Technologies Corporation
- Kaori BIZEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device and Aberration Corrector
- Publication number 20180025886
- Publication date Jan 25, 2018
- Hitachi, Ltd
- Yasuhiro SHIRASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNING ELECTRON MICROSCOPE AND ELECTRON TRAJECTORY ADJUSTMENT MET...
- Publication number 20170263415
- Publication date Sep 14, 2017
- Hitachi, Ltd
- Daisuke BIZEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE, SIMULATION METHOD, AND SIMULATION DEVICE
- Publication number 20170213695
- Publication date Jul 27, 2017
- Hitachi, Ltd
- Daisuke BIZEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR INSPECTION METHOD, SEMICONDUCTOR INSPECTION DEVICE AN...
- Publication number 20160190020
- Publication date Jun 30, 2016
- Hitachi, Ltd
- Yoshinobu KIMURA
- G01 - MEASURING TESTING
Information Patent Application
SEMICONDUCTOR INSPECTION DEVICE, AND INSPECTION METHOD USING CHARGE...
- Publication number 20150303030
- Publication date Oct 22, 2015
- Hitachi, Ltd
- Yoshinobu Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM APPARATUS AND LENS ARRAY
- Publication number 20130248731
- Publication date Sep 26, 2013
- Hitachi High-Technologies Corporation
- Sayaka TANIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE AND SAMPLE OBSERVATION METHOD
- Publication number 20120061565
- Publication date Mar 15, 2012
- Hitachi High-Technologies Corporation
- Momoyo Enyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPLIED APPARATUS
- Publication number 20110272576
- Publication date Nov 10, 2011
- Hitachi High-Technologies Corporation
- Hiroki Otaki
- G01 - MEASURING TESTING
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS
- Publication number 20110139985
- Publication date Jun 16, 2011
- Hitachi High-Technologies Corporation
- Sayaka TANIMOTO
- G01 - MEASURING TESTING
Information Patent Application
Electron beam inspection method and electron beam inspection apparatus
- Publication number 20110068267
- Publication date Mar 24, 2011
- Hitachi, Ltd.
- Masaki Hasegawa
- G01 - MEASURING TESTING
Information Patent Application
DIFFRACTION PATTERN CAPTURING METHOD AND CHARGED PARTICLE BEAM DEVICE
- Publication number 20110049344
- Publication date Mar 3, 2011
- Hitachi, Ltd
- Takashi Dobashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM APPARATUS
- Publication number 20100133433
- Publication date Jun 3, 2010
- Sayaka TANIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS
- Publication number 20100065753
- Publication date Mar 18, 2010
- Hitachi High-Technologies Corporation
- Momoyo ENYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM EQUIPMENTS, AND CHARGED PARTICLE BEAM MICROSCOPE
- Publication number 20090014651
- Publication date Jan 15, 2009
- Hitachi, Ltd.
- Osamu Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged particle beam apparatus and specimen inspection method
- Publication number 20090001267
- Publication date Jan 1, 2009
- Hitachi High-Technologies Corporation
- Momoyo Enyama
- G01 - MEASURING TESTING
Information Patent Application
Electron beam inspection method and electron beam inspection apparatus
- Publication number 20080315093
- Publication date Dec 25, 2008
- Hitachi, Ltd.
- Masaki Hasegawa
- G01 - MEASURING TESTING

Hiroya OHTA

Person

Patents Grantslast 30 patents

Charged particle beam device

Pattern measurement device and pattern measurement method

Charged particle beam device

Calibration sample, electron beam adjustment method and electron be...

Pattern measurement device and pattern measurement method

Pattern measurement device and pattern measurement method

Charged particle beam apparatus

Charged particle beam device

Scanning electron microscope and electron trajectory adjustment met...

Charged particle beam device and aberration corrector

Charged particle beam device, simulation method, and simulation device

Semiconductor inspection device including a counter electrode with...

Semiconductor inspection method, semiconductor inspection device an...

Charged particle beam apparatus

Charged particle beam device and sample observation method

Charged particle beam applied apparatus

Charged particle beam apparatus and specimen inspection method

Electron beam inspection method and electron beam inspection apparatus

Pattern forming method and its mold

Charged particle beam apparatus

Charged particle beam equipments, and charged particle beam microscope

Charged particle beam apparatus

Electron beam apparatus

Electron beam inspection method and electron beam inspection apparatus

Measurement method of electron beam current, electron beam writing...

Electron beam writing system and electron beam writing method

Aberration measuring apparatus for charged particle beam optical sy...

Aberration adjusting method, device fabrication method, and charged...

Electron gun

Multi-electron beam exposure method and apparatus

Patents Applicationslast 30 patents

Pattern Measurement Device and Pattern Measurement Method

CHARGED PARTICLE BEAM DEVICE

Training Method for Learning Apparatus, and Image Generation System

Charged Particle Beam Device

Charged Particle Beam Apparatus

CHARGED PARTICLE BEAM DEVICE

Pattern Measurement Device and Pattern Measurement Method

CHARGED PARTICLE BEAM DEVICE

CHARGED PARTICLE BEAM DEVICE

CALIBRATION SAMPLE, ELECTRON BEAM ADJUSTMENT METHOD AND ELECTRON BE...

Pattern Measurement Device and Pattern Measurement Method

Pattern Measurement Device and Pattern Measurement Method

Charged Particle Beam Device

CHARGED PARTICLE BEAM APPARATUS

Charged Particle Beam Device and Aberration Corrector

SCANNING ELECTRON MICROSCOPE AND ELECTRON TRAJECTORY ADJUSTMENT MET...

CHARGED PARTICLE BEAM DEVICE, SIMULATION METHOD, AND SIMULATION DEVICE

SEMICONDUCTOR INSPECTION METHOD, SEMICONDUCTOR INSPECTION DEVICE AN...

SEMICONDUCTOR INSPECTION DEVICE, AND INSPECTION METHOD USING CHARGE...

ELECTRON BEAM APPARATUS AND LENS ARRAY

CHARGED PARTICLE BEAM DEVICE AND SAMPLE OBSERVATION METHOD

CHARGED PARTICLE BEAM APPLIED APPARATUS

CHARGED PARTICLE BEAM APPARATUS

Electron beam inspection method and electron beam inspection apparatus

DIFFRACTION PATTERN CAPTURING METHOD AND CHARGED PARTICLE BEAM DEVICE

ELECTRON BEAM APPARATUS

CHARGED PARTICLE BEAM APPARATUS

CHARGED PARTICLE BEAM EQUIPMENTS, AND CHARGED PARTICLE BEAM MICROSCOPE

Charged particle beam apparatus and specimen inspection method

Electron beam inspection method and electron beam inspection apparatus