Hiroyuki KITAMURA

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method of manufacturing semiconductor device and semiconductor device
- Patent number 7,767,513
- Issue date Aug 3, 2010
- Elpida Memory, Inc.
- Hiroyuki Kitamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-line processing for forming a silicon nitride film
- Patent number 7,491,652
- Issue date Feb 17, 2009
- Elpida Memory, Inc.
- Naonori Fujiwara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hemispherical silicon grain capacitor with variable grain size
- Patent number 7,298,002
- Issue date Nov 20, 2007
- Elpida Memory Inc.
- Hiroyuki Kitamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for semiconductor device manufacturing to include multistage...
- Patent number 6,939,760
- Issue date Sep 6, 2005
- Elpida Memory, Inc.
- Hirofumi Fujioka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method of forming the same
- Patent number 6,559,498
- Issue date May 6, 2003
- NEC Electronics Corporation
- Hiroyuki Kitamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating a capacitor having a tantalum oxide dielectr...
- Patent number 6,436,757
- Issue date Aug 20, 2002
- NEC Corporation
- Hiroyuki Kitamura
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20110281411
- Publication date Nov 17, 2011
- Elpida Memory, Inc.
- Hiroyuki KITAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE
- Publication number 20080272444
- Publication date Nov 6, 2008
- Elpida Memory, Inc.
- Hiroyuki KITAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE INCLUDING A STACKED...
- Publication number 20080090375
- Publication date Apr 17, 2008
- Elpida Memory, Inc.
- Hiroyuki KITAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20070210365
- Publication date Sep 13, 2007
- Elpida Memory, Inc.
- Yuki TOGASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
In-line processing for forming a silicon nitride film
- Publication number 20070004223
- Publication date Jan 4, 2007
- Elpida Memory, Inc.
- Naonori Fujiwara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method for manufacturing the same
- Publication number 20060022251
- Publication date Feb 2, 2006
- Hiroyuki Kitamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and method of forming the same
- Publication number 20040005757
- Publication date Jan 8, 2004
- NEC ELECTRONICS CORPORATION
- Hiroyuki Kitamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Capacitance dielectric film and method of manufacturing the same
- Publication number 20020089009
- Publication date Jul 11, 2002
- NEC Corporation
- Hiroyuki Kitamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF FORMING THE SAME
- Publication number 20020064915
- Publication date May 30, 2002
- HIROYUKI KITAMURA
- H01 - BASIC ELECTRIC ELEMENTS

Hiroyuki KITAMURA

Person

Patents Grantslast 30 patents

Method of manufacturing semiconductor device and semiconductor device

In-line processing for forming a silicon nitride film

Hemispherical silicon grain capacitor with variable grain size

Method for semiconductor device manufacturing to include multistage...

Semiconductor device and method of forming the same

Method for fabricating a capacitor having a tantalum oxide dielectr...

Patents Applicationslast 30 patents

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE

METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE INCLUDING A STACKED...

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

In-line processing for forming a silicon nitride film

Semiconductor device and method for manufacturing the same

Semiconductor device and method of forming the same

Capacitance dielectric film and method of manufacturing the same

SEMICONDUCTOR DEVICE AND METHOD OF FORMING THE SAME