Hiroyuki Kitsunai

Person

Chiyoda-machi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Measurement or inspecting apparatus
- Patent number 8,921,781
- Issue date Dec 30, 2014
- Hitachi High-Technologies Corporation
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron microscope, and specimen holding method
- Patent number 8,680,466
- Issue date Mar 25, 2014
- Hitachi High-Technologies Coporation
- Seiichiro Kanno
- G01 - MEASURING TESTING
Information Patent Grant
Charged particle beam device and evaluation method using the charge...
- Patent number 8,653,455
- Issue date Feb 18, 2014
- Hitachi High-Technologies Corporation
- Hiroyuki Kitsunai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope
- Patent number 8,653,459
- Issue date Feb 18, 2014
- Hitachi High-Technologies Corporation
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor inspecting apparatus
- Patent number 8,519,332
- Issue date Aug 27, 2013
- Hitachi High-Technologies Corporation
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor inspecting apparatus
- Patent number 8,232,522
- Issue date Jul 31, 2012
- Hitachi High-Technologies Corporation
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Disturbance-free, recipe-controlled plasma processing system and me...
- Patent number 7,601,240
- Issue date Oct 13, 2009
- Hitachi, Ltd.
- Akira Kagoshima
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 7,567,422
- Issue date Jul 28, 2009
- Hitachi High-Technologies Corporation
- Hiroyuki Kitsunai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for processing semiconductor
- Patent number 7,473,332
- Issue date Jan 6, 2009
- Hitachi High-Technologies Corporation
- Junichi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process monitoring device for sample processing apparatus and contr...
- Patent number 7,376,479
- Issue date May 20, 2008
- Hitachi, Ltd.
- Junichi Tanaka
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
System for monitoring and controlling a semiconductor manufacturing...
- Patent number 7,343,217
- Issue date Mar 11, 2008
- Hitachi, Ltd.
- Junichi Tanaka
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Process monitoring device for sample processing apparatus and contr...
- Patent number 7,158,848
- Issue date Jan 2, 2007
- Hitachi, Ltd.
- Junichi Tanaka
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Plasma processing method
- Patent number 7,147,748
- Issue date Dec 12, 2006
- Hitachi High-Technologies Corporation
- Go Miya
- G01 - MEASURING TESTING
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 7,147,747
- Issue date Dec 12, 2006
- Hitachi High-Technologies Corporation
- Go Miya
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for processing semiconductor
- Patent number 7,122,096
- Issue date Oct 17, 2006
- Hitachi High-Technologies Corporation
- Junichi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of monitoring and/or controlling a semiconductor manufacturi...
- Patent number 7,058,470
- Issue date Jun 6, 2006
- Hitachi, Ltd.
- Junichi Tanaka
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Process monitoring device for sample processing apparatus and contr...
- Patent number 7,058,467
- Issue date Jun 6, 2006
- Hitachi, Ltd.
- Junichi Tanaka
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Plasma processing apparatus and processing method
- Patent number 6,939,435
- Issue date Sep 6, 2005
- Hitachi, Ltd.
- Junichi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Disturbance-free, recipe-controlled plasma processing method
- Patent number 6,881,352
- Issue date Apr 19, 2005
- Hitachi, Ltd.
- Akira Kagoshima
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Process monitoring device for sample processing apparatus and contr...
- Patent number 6,879,867
- Issue date Apr 12, 2005
- Hitachi, Ltd.
- Junichi Tanaka
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Semiconductor plasma processing apparatus with first and second pro...
- Patent number 6,828,165
- Issue date Dec 7, 2004
- Hitachi, Ltd.
- Junichi Tanaka
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Plasma processing apparatus and method
- Patent number 6,747,239
- Issue date Jun 8, 2004
- Hitachi, Ltd.
- Junichi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for producing a semiconductor device including etching usin...
- Patent number 6,743,733
- Issue date Jun 1, 2004
- Hitachi, Ltd.
- Hiroyuki Kitsunai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Disturbance-free, recipe-controlled plasma processing system and me...
- Patent number 6,733,618
- Issue date May 11, 2004
- Hitachi, Ltd.
- Akira Kagoshima
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method of monitoring and/or controlling a semiconductor manufacturi...
- Patent number 6,706,543
- Issue date Mar 16, 2004
- Hitachi, Ltd.
- Junichi Tanaka
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Method of monitoring and/or controlling a semiconductor manufacturi...
- Patent number 6,616,759
- Issue date Sep 9, 2003
- Hitachi, Ltd.
- Junichi Tanaka
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Plasma processing apparatus and method
- Patent number 6,590,179
- Issue date Jul 8, 2003
- Hitachi, Ltd.
- Junichi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment method and manufacturing method of semiconductor d...
- Patent number 6,186,153
- Issue date Feb 13, 2001
- Hitachi, Ltd.
- Hiroyuki Kitsunai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Holder device and semiconductor producing apparatus having same
- Patent number 5,258,047
- Issue date Nov 2, 1993
- Hitachi, Ltd.
- Hiromitsu Tokisue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetic liquid seal with magnetized deformable magnet
- Patent number 4,708,350
- Issue date Nov 24, 1987
- Hitachi, Ltd.
- Muneo Mizumoto
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
STAGE APPARATUS AND CHARGED PARTICLE BEAM APPARATUS
- Publication number 20140042338
- Publication date Feb 13, 2014
- Hitachi High-Technologies Corporation
- Nobuo Shibata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR INSPECTING APPARATUS
- Publication number 20130327939
- Publication date Dec 12, 2013
- Hitachi High-Technologies
- Go MIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR INSPECTING APPARATUS
- Publication number 20120261589
- Publication date Oct 18, 2012
- Hitachi High-Technologies Corporation
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Scanning Electron Microscope
- Publication number 20120256087
- Publication date Oct 11, 2012
- Hitachi High-Technologies Corporation
- Seiichiro Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE AND EVALUATION METHOD USING THE CHARGE...
- Publication number 20120070066
- Publication date Mar 22, 2012
- Hitachi High-Technologies Corporation
- Hiroyuki Kitsunai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON MICROSCOPE, AND SPECIMEN HOLDING METHOD
- Publication number 20110303844
- Publication date Dec 15, 2011
- Hitachi High-Technologies Corporation
- Seiichiro Kanno
- G01 - MEASURING TESTING
Information Patent Application
SEMICONDUCTOR INSPECTING APPARATUS
- Publication number 20110095185
- Publication date Apr 28, 2011
- Hitachi High-Technologies Corporation
- Go Miya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Disturbance-Free, Recipe-Controlled Plasma Processing System And Me...
- Publication number 20090120580
- Publication date May 14, 2009
- Akira Kagoshima
- G05 - CONTROLLING REGULATING
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD FOR STABILIZING INNER WALL O...
- Publication number 20080257863
- Publication date Oct 23, 2008
- Hiroyuki Kitsunai
- B08 - CLEANING
Information Patent Application
Disturbance-free, recipe-controlled plasma processing system and me...
- Publication number 20070193687
- Publication date Aug 23, 2007
- Akira Kagoshima
- G05 - CONTROLLING REGULATING
Information Patent Application
Process monitoring device for sample processing apparatus and contr...
- Publication number 20070162172
- Publication date Jul 12, 2007
- Junichi Tanaka
- G05 - CONTROLLING REGULATING
Information Patent Application
Plasma processing apparatus and method
- Publication number 20070051470
- Publication date Mar 8, 2007
- Takehisa Iwakoshi
- B08 - CLEANING
Information Patent Application
Plasma processing apparatus and plasma processing method
- Publication number 20070035908
- Publication date Feb 15, 2007
- Hiroyuki Kitsunai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of monitoring and/or controlling a semiconductor manufacturi...
- Publication number 20060212156
- Publication date Sep 21, 2006
- Junichi Tanaka
- G05 - CONTROLLING REGULATING
Information Patent Application
Plasma processing method
- Publication number 20060151429
- Publication date Jul 13, 2006
- Hiroyuki Kitsunai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process monitoring device for sample processing apparatus and contr...
- Publication number 20060142888
- Publication date Jun 29, 2006
- Junichi Tanaka
- G05 - CONTROLLING REGULATING
Information Patent Application
Disturbance-free, recipe-controlled plasma processing system and me...
- Publication number 20060124243
- Publication date Jun 15, 2006
- Akira Kagoshima
- G05 - CONTROLLING REGULATING
Information Patent Application
Plasma processing apparatus and processing method
- Publication number 20050284574
- Publication date Dec 29, 2005
- Junichi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20050199183
- Publication date Sep 15, 2005
- Masatsugu Arai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PROCESSING METHOD
- Publication number 20050189070
- Publication date Sep 1, 2005
- Junichi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for processing semiconductor
- Publication number 20050158886
- Publication date Jul 21, 2005
- Junichi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method for stabilizing inner wall o...
- Publication number 20050087297
- Publication date Apr 28, 2005
- Hiroyuki Kitsunai
- B08 - CLEANING
Information Patent Application
Process monitoring device for sample processing apparatus and contr...
- Publication number 20050090914
- Publication date Apr 28, 2005
- Junichi Tanaka
- G05 - CONTROLLING REGULATING
Information Patent Application
Method of monitoring and/or controlling a semiconductor manufacturi...
- Publication number 20050087298
- Publication date Apr 28, 2005
- Junichi Tanaka
- G05 - CONTROLLING REGULATING
Information Patent Application
Method for processing plasma processing apparatus
- Publication number 20050072444
- Publication date Apr 7, 2005
- Shigeru Shirayone
- B08 - CLEANING
Information Patent Application
Disturbance-free, recipe-controlled plasma processing system and me...
- Publication number 20050022932
- Publication date Feb 3, 2005
- Akira Kagoshima
- G05 - CONTROLLING REGULATING
Information Patent Application
Process for producing semiconductor device
- Publication number 20040194887
- Publication date Oct 7, 2004
- Hiroyuki Kitsunai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and plasma processing method
- Publication number 20040173309
- Publication date Sep 9, 2004
- Go Miya
- G01 - MEASURING TESTING
Information Patent Application
Method and apparatus for processing semiconductor
- Publication number 20040175849
- Publication date Sep 9, 2004
- Junichi Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
processing method
- Publication number 20040166598
- Publication date Aug 26, 2004
- Go Miya
- G01 - MEASURING TESTING

Hiroyuki Kitsunai

Person

Patents Grantslast 30 patents

Measurement or inspecting apparatus

Electron microscope, and specimen holding method

Charged particle beam device and evaluation method using the charge...

Scanning electron microscope

Semiconductor inspecting apparatus

Semiconductor inspecting apparatus

Disturbance-free, recipe-controlled plasma processing system and me...

Plasma processing apparatus and plasma processing method

Method for processing semiconductor

Process monitoring device for sample processing apparatus and contr...

System for monitoring and controlling a semiconductor manufacturing...

Process monitoring device for sample processing apparatus and contr...

Plasma processing method

Plasma processing apparatus and plasma processing method

Method and apparatus for processing semiconductor

Method of monitoring and/or controlling a semiconductor manufacturi...

Process monitoring device for sample processing apparatus and contr...

Plasma processing apparatus and processing method

Disturbance-free, recipe-controlled plasma processing method

Process monitoring device for sample processing apparatus and contr...

Semiconductor plasma processing apparatus with first and second pro...

Plasma processing apparatus and method

Process for producing a semiconductor device including etching usin...

Disturbance-free, recipe-controlled plasma processing system and me...

Method of monitoring and/or controlling a semiconductor manufacturi...

Method of monitoring and/or controlling a semiconductor manufacturi...

Plasma processing apparatus and method

Plasma treatment method and manufacturing method of semiconductor d...

Holder device and semiconductor producing apparatus having same

Magnetic liquid seal with magnetized deformable magnet

Patents Applicationslast 30 patents

STAGE APPARATUS AND CHARGED PARTICLE BEAM APPARATUS

SEMICONDUCTOR INSPECTING APPARATUS

SEMICONDUCTOR INSPECTING APPARATUS

Scanning Electron Microscope

CHARGED PARTICLE BEAM DEVICE AND EVALUATION METHOD USING THE CHARGE...

ELECTRON MICROSCOPE, AND SPECIMEN HOLDING METHOD

SEMICONDUCTOR INSPECTING APPARATUS

Disturbance-Free, Recipe-Controlled Plasma Processing System And Me...

PLASMA PROCESSING APPARATUS AND METHOD FOR STABILIZING INNER WALL O...

Disturbance-free, recipe-controlled plasma processing system and me...

Process monitoring device for sample processing apparatus and contr...

Plasma processing apparatus and method

Plasma processing apparatus and plasma processing method

Method of monitoring and/or controlling a semiconductor manufacturi...

Plasma processing method

Process monitoring device for sample processing apparatus and contr...

Disturbance-free, recipe-controlled plasma processing system and me...

Plasma processing apparatus and processing method

Plasma processing apparatus

PLASMA PROCESSING APPARATUS AND PROCESSING METHOD

Method for processing semiconductor

Plasma processing apparatus and method for stabilizing inner wall o...

Process monitoring device for sample processing apparatus and contr...

Method of monitoring and/or controlling a semiconductor manufacturi...

Method for processing plasma processing apparatus

Disturbance-free, recipe-controlled plasma processing system and me...

Process for producing semiconductor device

Plasma processing apparatus and plasma processing method

Method and apparatus for processing semiconductor

processing method