Hiroyuki Miyashita

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma observation system and plasma observation method
- Patent number 11,749,511
- Issue date Sep 5, 2023
- Tokyo Electron Limited
- Ryoji Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Directional coupler for use in a substrate processing apparatus, wh...
- Patent number 11,569,558
- Issue date Jan 31, 2023
- Tokyo Electron Limited
- Isao Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for heat-treating substrate
- Patent number 11,488,847
- Issue date Nov 1, 2022
- Tokyo Electron Limited
- Hiroyuki Miyashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma probe device and plasma processing apparatus
- Patent number 11,164,730
- Issue date Nov 2, 2021
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Acquisition method for S-parameters in microwave introduction modul...
- Patent number 9,702,913
- Issue date Jul 11, 2017
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power combiner and microwave introduction mechanism
- Patent number 9,704,693
- Issue date Jul 11, 2017
- Tokyo Electron Limited
- Taro Ikeda
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Microwave radiation antenna, microwave plasma source and plasma pro...
- Patent number 9,548,187
- Issue date Jan 17, 2017
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tuner, microwave plasma source and impedance matching method
- Patent number 9,520,273
- Issue date Dec 13, 2016
- Tokyo Electron Limited
- Yuki Osada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave emission mechanism, microwave plasma source and surface w...
- Patent number 9,520,272
- Issue date Dec 13, 2016
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave introducing mechanism, microwave plasma source and microw...
- Patent number 9,281,154
- Issue date Mar 8, 2016
- Tokyo Electron Limited
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Annealing apparatus
- Patent number 8,897,631
- Issue date Nov 25, 2014
- Tokyo Electron Limited
- Shigeru Kasai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Annealing device
- Patent number 8,440,939
- Issue date May 14, 2013
- Tokyo Electron Limited
- Shigeru Kasai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Annealing apparatus
- Patent number 8,246,900
- Issue date Aug 21, 2012
- Tokyo Electron Limited
- Shigeru Kasai
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 8,124,168
- Issue date Feb 28, 2012
- Tokyo Electron Limited
- Kunihiro Tada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Automatic control system and method using same
- Patent number 5,880,437
- Issue date Mar 9, 1999
- Tokyo Electron Limited
- Shigeru Kasai
- G05 - CONTROLLING REGULATING

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240297020
- Publication date Sep 5, 2024
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISTRIBUTOR AND PLASMA PROCESSING APPARATUS
- Publication number 20240297018
- Publication date Sep 5, 2024
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILTER CIRCUIT AND PLASMA PROCESSING APPARATUS
- Publication number 20240212985
- Publication date Jun 27, 2024
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230178340
- Publication date Jun 8, 2023
- TOKYO ELECTRON LIMITED
- Isao GUNJI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND MANUFACTURING METHOD FOR...
- Publication number 20230054452
- Publication date Feb 23, 2023
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA SOURCE AND PLASMA PROCESSING APPARATUS
- Publication number 20230033323
- Publication date Feb 2, 2023
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIRECTIONAL COUPLER, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE...
- Publication number 20210234248
- Publication date Jul 29, 2021
- TOKYO ELECTRON LIMITED
- Isao TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA OBSERVATION SYSTEM AND PLASMA OBSERVATION METHOD
- Publication number 20210225623
- Publication date Jul 22, 2021
- TOKYO ELECTRON LIMITED
- Ryoji YAMAZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR HEAT-TREATING SUBSTRATE
- Publication number 20210020477
- Publication date Jan 21, 2021
- TOKYO ELECTRON LIMITED
- Hiroyuki MIYASHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROBE DEVICE AND PLASMA PROCESSING APPARATUS
- Publication number 20190074166
- Publication date Mar 7, 2019
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Power Combiner and Microwave Introduction Mechanism
- Publication number 20160358750
- Publication date Dec 8, 2016
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNER, MICROWAVE PLASMA SOURCE AND IMPEDANCE MATCHING METHOD
- Publication number 20160276139
- Publication date Sep 22, 2016
- TOKYO ELECTRON LIMITED
- Yuki Osada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPEDANCE MATCHING SLUG, IMPEDANCE MATCHING DEVICE, ELECTROMAGNETIC...
- Publication number 20150348758
- Publication date Dec 3, 2015
- TOKYO ELECTRON LIMITED
- Hiroyuki MIYASHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACQUISITION METHOD FOR S-PARAMETERS IN MICROWAVE INTRODUCTION MODUL...
- Publication number 20150212127
- Publication date Jul 30, 2015
- TOKYO ELECTRON LIMITED
- Taro Ikeda
- G01 - MEASURING TESTING
Information Patent Application
MICROWAVE EMISSION MECHANISM, MICROWAVE PLASMA SOURCE AND SURFACE W...
- Publication number 20140361684
- Publication date Dec 11, 2014
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE RADIATION ANTENNA, MICROWAVE PLASMA SOURCE AND PLASMA PRO...
- Publication number 20140158302
- Publication date Jun 12, 2014
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE INTRODUCING MECHANISM, MICROWAVE PLASMA SOURCE AND MICROW...
- Publication number 20130180661
- Publication date Jul 18, 2013
- TOKYO ELECTRON LIMITED
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ANNEALING APPARATUS
- Publication number 20120279944
- Publication date Nov 8, 2012
- TOKYO ELECTRON LIMITED
- Shigeru KASAI
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
ANNEALING APPARATUS
- Publication number 20110033175
- Publication date Feb 10, 2011
- TOKYO ELECTRON LIMITED
- Shigeru Kasai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANNEALING DEVICE
- Publication number 20100314377
- Publication date Dec 16, 2010
- TOKYO ELECTRON LIMITED
- Shigeru Kasai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ANNEALING APPARATUS
- Publication number 20100038833
- Publication date Feb 18, 2010
- Tokyo Electron Limited
- Shigeru Kasai
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
Single wafer processing unit
- Publication number 20080280048
- Publication date Nov 13, 2008
- Shigeru Kasai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Processing Method and Substrate Processing Apparatus
- Publication number 20070292598
- Publication date Dec 20, 2007
- TOKYO ELECTRON LIMITED
- Kunihiro Tada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sheet-type treating device
- Publication number 20040069234
- Publication date Apr 15, 2004
- Shigeru Kasai
- H01 - BASIC ELECTRIC ELEMENTS

Hiroyuki Miyashita

Person

Patents Grantslast 30 patents

Plasma observation system and plasma observation method

Directional coupler for use in a substrate processing apparatus, wh...

Apparatus and method for heat-treating substrate

Plasma probe device and plasma processing apparatus

Acquisition method for S-parameters in microwave introduction modul...

Power combiner and microwave introduction mechanism

Microwave radiation antenna, microwave plasma source and plasma pro...

Tuner, microwave plasma source and impedance matching method

Microwave emission mechanism, microwave plasma source and surface w...

Microwave introducing mechanism, microwave plasma source and microw...

Annealing apparatus

Annealing device

Annealing apparatus

Substrate processing method and substrate processing apparatus

Automatic control system and method using same

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

DISTRIBUTOR AND PLASMA PROCESSING APPARATUS

FILTER CIRCUIT AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

SEMICONDUCTOR MANUFACTURING APPARATUS AND MANUFACTURING METHOD FOR...

PLASMA SOURCE AND PLASMA PROCESSING APPARATUS

DIRECTIONAL COUPLER, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE...

PLASMA OBSERVATION SYSTEM AND PLASMA OBSERVATION METHOD

APPARATUS AND METHOD FOR HEAT-TREATING SUBSTRATE

PLASMA PROBE DEVICE AND PLASMA PROCESSING APPARATUS

Power Combiner and Microwave Introduction Mechanism

TUNER, MICROWAVE PLASMA SOURCE AND IMPEDANCE MATCHING METHOD

IMPEDANCE MATCHING SLUG, IMPEDANCE MATCHING DEVICE, ELECTROMAGNETIC...

ACQUISITION METHOD FOR S-PARAMETERS IN MICROWAVE INTRODUCTION MODUL...

MICROWAVE EMISSION MECHANISM, MICROWAVE PLASMA SOURCE AND SURFACE W...

MICROWAVE RADIATION ANTENNA, MICROWAVE PLASMA SOURCE AND PLASMA PRO...

MICROWAVE INTRODUCING MECHANISM, MICROWAVE PLASMA SOURCE AND MICROW...

ANNEALING APPARATUS

ANNEALING APPARATUS

ANNEALING DEVICE

ANNEALING APPARATUS

Single wafer processing unit

Substrate Processing Method and Substrate Processing Apparatus

Sheet-type treating device