Hiroyuki Shichida

Person

Kudamatsu, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Electrode cover for a plasma processing apparatus
- Patent number D557226
- Issue date Dec 11, 2007
- Hitachi High-Technologies Corporation
- Takeo Uchino
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,899,789
- Issue date May 31, 2005
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,676,805
- Issue date Jan 13, 2004
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,645,871
- Issue date Nov 11, 2003
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,610,170
- Issue date Aug 26, 2003
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,610,171
- Issue date Aug 26, 2003
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,544,379
- Issue date Apr 8, 2003
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,524,428
- Issue date Feb 25, 2003
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,336,991
- Issue date Jan 8, 2002
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,221,201
- Issue date Apr 24, 2001
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 6,217,705
- Issue date Apr 17, 2001
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate holding system including an electrostatic chuck
- Patent number 6,048,434
- Issue date Apr 11, 2000
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 5,985,035
- Issue date Nov 16, 1999
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 5,961,774
- Issue date Oct 5, 1999
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 5,906,684
- Issue date May 25, 1999
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of holding substrate and substrate holding system
- Patent number 5,792,304
- Issue date Aug 11, 1998
- Hitachi, Ltd.
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating method and apparatus and plasma processing method...
- Patent number 5,580,420
- Issue date Dec 3, 1996
- Hitachi, Ltd.
- Katsuya Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of and apparatus for securing and cooling/heating a wafer
- Patent number 5,458,687
- Issue date Oct 17, 1995
- Hitachi, Ltd.
- Hiroyuki Shichida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Method of holding substrate and substrate holding system
- Publication number 20030192647
- Publication date Oct 16, 2003
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of holding substrate and substrate holding system
- Publication number 20020108574
- Publication date Aug 15, 2002
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of holding substrate and substrate holding system
- Publication number 20020104618
- Publication date Aug 8, 2002
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of holding substrate and substrate holding system
- Publication number 20020096116
- Publication date Jul 25, 2002
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of holding substrate and substrate holding system
- Publication number 20020046706
- Publication date Apr 25, 2002
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of holding substrate and substrate holding system
- Publication number 20010025608
- Publication date Oct 4, 2001
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of holding substrate and substrate holding system
- Publication number 20010009178
- Publication date Jul 26, 2001
- Naoyuki Tamura
- H01 - BASIC ELECTRIC ELEMENTS

Hiroyuki Shichida

Person

Patents Grantslast 30 patents

Electrode cover for a plasma processing apparatus

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Substrate holding system including an electrostatic chuck

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Plasma generating method and apparatus and plasma processing method...

Method of and apparatus for securing and cooling/heating a wafer

Patents Applicationslast 30 patents

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system

Method of holding substrate and substrate holding system