Hiroyuki Urano

Person

Joetsu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Positive photosensitive resin composition, positive photosensitive...
- Patent number 12,085,856
- Issue date Sep 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masashi Iio
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, patterning process, method for fo...
- Patent number 11,892,773
- Issue date Feb 6, 2024
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki Urano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer having a structure of polyamide, polyamide-imide, or polyim...
- Patent number 11,768,434
- Issue date Sep 26, 2023
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compound, polyimide resin and method of producing the same, photose...
- Patent number 11,572,442
- Issue date Feb 7, 2023
- International Business Machines Corporation
- Dmitry Zubarev
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer, photosensitive resin composition, patterning method, metho...
- Patent number 11,333,975
- Issue date May 17, 2022
- International Business Machines Corporation
- Dmitry Zubarev
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer of polyimide precursor, positive type photosensitive resin...
- Patent number 11,150,556
- Issue date Oct 19, 2021
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Tetracarboxylic dianhydride, polyimide resin and method for produci...
- Patent number 10,919,918
- Issue date Feb 16, 2021
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki Urano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Tetracarboxylic acid diester compound, polymer of polyimide precurs...
- Patent number 10,816,900
- Issue date Oct 27, 2020
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki Urano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Tetracarboxylic acid diester compound, polyimide precursor polymer...
- Patent number 10,457,779
- Issue date Oct 29, 2019
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Tetracarboxylic acid diester compound, polyimide precursor polymer...
- Patent number 10,216,085
- Issue date Feb 26, 2019
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Tetracarboxylic acid diester compound, polymer of polyimide precurs...
- Patent number 10,203,601
- Issue date Feb 12, 2019
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki Urano
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive photosensitive resin composition, photo-curable dry film a...
- Patent number 10,197,914
- Issue date Feb 5, 2019
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Silicone skeleton-containing polymer compound and method for produc...
- Patent number 10,114,287
- Issue date Oct 30, 2018
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki Urano
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Silicone skeleton-containing polymer compound, chemically amplified...
- Patent number 10,087,288
- Issue date Oct 2, 2018
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki Urano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Positive photosensitive resin composition, photo-curable dry film a...
- Patent number 9,557,645
- Issue date Jan 31, 2017
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer compound, chemically amplified negative resist composition,...
- Patent number 9,400,428
- Issue date Jul 26, 2016
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki Urano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Silicone structure-bearing polymer, negative resist composition, ph...
- Patent number 9,377,689
- Issue date Jun 28, 2016
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Silicone structure-bearing polymer, resin composition, and photo-cu...
- Patent number 9,366,961
- Issue date Jun 14, 2016
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki Urano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Negative resist composition and patterning process using same
- Patent number 9,310,681
- Issue date Apr 12, 2016
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Silicone structure-bearing polymer, resin composition, and photo-cu...
- Patent number 9,091,919
- Issue date Jul 28, 2015
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki Urano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemically amplified negative resist composition, photo-curable dry...
- Patent number 8,865,391
- Issue date Oct 21, 2014
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Biphenyl derivative, resist bottom layer material, bottom layer for...
- Patent number 8,835,697
- Issue date Sep 16, 2014
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
Negative Photosensitive Resin Composition, Patterning Process, Inte...
- Publication number 20230350294
- Publication date Nov 2, 2023
- Shin-Etsu Chemical Co., Ltd.
- Katsuya TAKEMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METH...
- Publication number 20220317570
- Publication date Oct 6, 2022
- Shin-Etsu Chemical Co., Ltd.
- Masashi IIO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, POSITIVE PHOTOSENSITIVE...
- Publication number 20220315676
- Publication date Oct 6, 2022
- Shin-Etsu Chemical Co., Ltd.
- Masashi IIO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYIMIDE-BASED POLYMER, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION,...
- Publication number 20220289911
- Publication date Sep 15, 2022
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki URANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FO...
- Publication number 20220091509
- Publication date Mar 24, 2022
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki URANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, POSITIVE PHOTOSENSITIVE...
- Publication number 20220043351
- Publication date Feb 10, 2022
- Shin-Etsu Chemical Co., Ltd.
- Masashi IIO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METH...
- Publication number 20220043348
- Publication date Feb 10, 2022
- Shin-Etsu Chemical Co., Ltd.
- Masashi IIO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD, METHO...
- Publication number 20210317268
- Publication date Oct 14, 2021
- International Business Machines Corporation
- Dmitry Zubarev
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NOVEL COMPOUND, POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, P...
- Publication number 20210317270
- Publication date Oct 14, 2021
- International Business Machines Corporation
- Dmitry Zubarev
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METH...
- Publication number 20200326624
- Publication date Oct 15, 2020
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki URANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER HAVING A STRUCTURE OF POLYAMIDE, POLYAMIDE-IMIDE, OR POLYIM...
- Publication number 20200041903
- Publication date Feb 6, 2020
- Shin-Etsu Chemical Co., Ltd.
- Katsuya TAKEMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NOVEL TETRACARBOXYLIC DIANHYDRIDE, POLYIMIDE RESIN AND METHOD FOR P...
- Publication number 20190169211
- Publication date Jun 6, 2019
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki URANO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYMER OF POLYIMIDE PRECURS...
- Publication number 20190018320
- Publication date Jan 17, 2019
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki URANO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POLYMER OF POLYIMIDE PRECURSOR, POSITIVE TYPE PHOTOSENSITIVE RESIN...
- Publication number 20180275513
- Publication date Sep 27, 2018
- Shin-Etsu Chemical Co., Ltd.
- Katsuya TAKEMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYMER OF POLYIMIDE PRECURS...
- Publication number 20180120702
- Publication date May 3, 2018
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki URANO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
THERMAL CROSSLINKING ACCELERATOR, POLYSILOXANE-CONTAINING RESIST UN...
- Publication number 20180081272
- Publication date Mar 22, 2018
- SHIN-ETSU CHEMICAL CO., LTD.
- Tsutomu OGIHARA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYIMIDE PRECURSOR POLYMER...
- Publication number 20180024434
- Publication date Jan 25, 2018
- Shin-Etsu Chemical Co., Ltd.
- Katsuya TAKEMURA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYIMIDE PRECURSOR POLYMER...
- Publication number 20170298186
- Publication date Oct 19, 2017
- Shin-Etsu Chemical Co., Ltd.
- Katsuya TAKEMURA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTO-CURABLE DRY FILM A...
- Publication number 20170255097
- Publication date Sep 7, 2017
- Shin-Etsu Chemical Co., Ltd.
- Katsuya TAKEMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SILICONE SKELETON-CONTAINING POLYMER COMPOUND, CHEMICALLY AMPLIFIED...
- Publication number 20160200877
- Publication date Jul 14, 2016
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki URANO
- B32 - LAYERED PRODUCTS
Information Patent Application
SILICONE SKELETON-CONTAINING POLYMER COMPOUND AND METHOD FOR PRODUC...
- Publication number 20160097973
- Publication date Apr 7, 2016
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki URANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SILICONE STRUCTURE-BEARING POLYMER, NEGATIVE RESIST COMPOSITION, PH...
- Publication number 20160033865
- Publication date Feb 4, 2016
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTO-CURABLE DRY FILM A...
- Publication number 20150370166
- Publication date Dec 24, 2015
- Shin-Etsu Chemical Co., Ltd.
- Katsuya TAKEMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILICONE STRUCTURE-BEARING POLYMER, RESIN COMPOSITION, AND PHOTO-CU...
- Publication number 20150293447
- Publication date Oct 15, 2015
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki Urano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME
- Publication number 20150198883
- Publication date Jul 16, 2015
- Shin-Etsu Chemical Co., Ltd.
- Jun HATAKEYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION,...
- Publication number 20150056545
- Publication date Feb 26, 2015
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki URANO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
THERMAL CROSSLINKING ACCELERATOR, POLYSILOXANE-CONTAINING RESIST UN...
- Publication number 20140205951
- Publication date Jul 24, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SILICONE STRUCTURE-BEARING POLYMER, RESIN COMPOSITION, AND PHOTO-CU...
- Publication number 20130196114
- Publication date Aug 1, 2013
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki Urano
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY...
- Publication number 20130149645
- Publication date Jun 13, 2013
- Shin-Etsu Chemical Co., Ltd.
- Katsuya Takemura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BIPHENYL DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, BOTTOM LAYER FOR...
- Publication number 20120252218
- Publication date Oct 4, 2012
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- C07 - ORGANIC CHEMISTRY

Hiroyuki Urano

Person

Patents Grantslast 30 patents

Positive photosensitive resin composition, positive photosensitive...

Photosensitive resin composition, patterning process, method for fo...

Polymer having a structure of polyamide, polyamide-imide, or polyim...

Compound, polyimide resin and method of producing the same, photose...

Polymer, photosensitive resin composition, patterning method, metho...

Polymer of polyimide precursor, positive type photosensitive resin...

Tetracarboxylic dianhydride, polyimide resin and method for produci...

Tetracarboxylic acid diester compound, polymer of polyimide precurs...

Tetracarboxylic acid diester compound, polyimide precursor polymer...

Tetracarboxylic acid diester compound, polyimide precursor polymer...

Tetracarboxylic acid diester compound, polymer of polyimide precurs...

Positive photosensitive resin composition, photo-curable dry film a...

Silicone skeleton-containing polymer compound and method for produc...

Silicone skeleton-containing polymer compound, chemically amplified...

Positive photosensitive resin composition, photo-curable dry film a...

Polymer compound, chemically amplified negative resist composition,...

Silicone structure-bearing polymer, negative resist composition, ph...

Silicone structure-bearing polymer, resin composition, and photo-cu...

Negative resist composition and patterning process using same

Silicone structure-bearing polymer, resin composition, and photo-cu...

Chemically amplified negative resist composition, photo-curable dry...

Biphenyl derivative, resist bottom layer material, bottom layer for...

Patents Applicationslast 30 patents

Negative Photosensitive Resin Composition, Patterning Process, Inte...

NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METH...

POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, POSITIVE PHOTOSENSITIVE...

POLYIMIDE-BASED POLYMER, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION,...

PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FO...

POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, POSITIVE PHOTOSENSITIVE...

NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METH...

POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD, METHO...

NOVEL COMPOUND, POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, P...

POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METH...

POLYMER HAVING A STRUCTURE OF POLYAMIDE, POLYAMIDE-IMIDE, OR POLYIM...

NOVEL TETRACARBOXYLIC DIANHYDRIDE, POLYIMIDE RESIN AND METHOD FOR P...

TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYMER OF POLYIMIDE PRECURS...

POLYMER OF POLYIMIDE PRECURSOR, POSITIVE TYPE PHOTOSENSITIVE RESIN...

TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYMER OF POLYIMIDE PRECURS...

THERMAL CROSSLINKING ACCELERATOR, POLYSILOXANE-CONTAINING RESIST UN...

TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYIMIDE PRECURSOR POLYMER...

TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYIMIDE PRECURSOR POLYMER...

POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTO-CURABLE DRY FILM A...

SILICONE SKELETON-CONTAINING POLYMER COMPOUND, CHEMICALLY AMPLIFIED...

SILICONE SKELETON-CONTAINING POLYMER COMPOUND AND METHOD FOR PRODUC...

SILICONE STRUCTURE-BEARING POLYMER, NEGATIVE RESIST COMPOSITION, PH...

POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTO-CURABLE DRY FILM A...

SILICONE STRUCTURE-BEARING POLYMER, RESIN COMPOSITION, AND PHOTO-CU...

NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME

POLYMER COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION,...

THERMAL CROSSLINKING ACCELERATOR, POLYSILOXANE-CONTAINING RESIST UN...

SILICONE STRUCTURE-BEARING POLYMER, RESIN COMPOSITION, AND PHOTO-CU...

CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY...

BIPHENYL DERIVATIVE, RESIST BOTTOM LAYER MATERIAL, BOTTOM LAYER FOR...