Hisashi Inoue

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Thermocouple structure, heat treatment apparatus, and method of man...
- Patent number 11,815,407
- Issue date Nov 14, 2023
- Tokyo Electron Limited
- Hisashi Inoue
- G01 - MEASURING TESTING
Information Patent Grant
Assembling apparatus and assembling method for semiconductor manufa...
- Patent number 11,114,318
- Issue date Sep 7, 2021
- Tokyo Electron Limited
- Hisashi Inoue
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Clamp apparatus, substrate carry-in/out apparatus using the same, a...
- Patent number 9,857,124
- Issue date Jan 2, 2018
- Tokyo Electron Limited
- Mitsuru Obara
- F27 - FURNACES KILNS OVENS RETORTS
Information Patent Grant
Heat treatment method and heat treatment apparatus
- Patent number 9,064,916
- Issue date Jun 23, 2015
- Tokyo Electron Limited
- Hisashi Inoue
- C21 - METALLURGY OF IRON
Information Patent Grant
Heat treatment method and heat treatment apparatus
- Patent number 8,741,064
- Issue date Jun 3, 2014
- Tokyo Electron Limited
- Hisashi Inoue
- C21 - METALLURGY OF IRON
Information Patent Grant
Heat treatment method and heat treatment apparatus wherein the subs...
- Patent number 8,230,806
- Issue date Jul 31, 2012
- Tokyo Electron Limited
- Hisashi Inoue
- C21 - METALLURGY OF IRON
Information Patent Grant
Reaction tube and heat processing apparatus for a semiconductor pro...
- Patent number 8,216,378
- Issue date Jul 10, 2012
- Tokyo Electron Limited
- Hirofumi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Direct oxidation method for semiconductor process
- Patent number 8,153,534
- Issue date Apr 10, 2012
- Tokyo Electron Limited
- Hisashi Inoue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Heat processing apparatus for semiconductor process
- Patent number 8,002,895
- Issue date Aug 23, 2011
- Tokyo Electron Limited
- Hisashi Inoue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vertical thermal processing apparatus and method of using the same
- Patent number 7,935,188
- Issue date May 3, 2011
- Tokyo Electron Limited
- Wataru Nakajima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heat treatment method wherein the substrate holder is composed of t...
- Patent number 7,900,579
- Issue date Mar 8, 2011
- Tokyo Electron Limited
- Hisashi Inoue
- C21 - METALLURGY OF IRON
Information Patent Grant
Heat processing apparatus, method of automatically tuning control c...
- Patent number 7,860,585
- Issue date Dec 28, 2010
- Tokyo Electron Limited
- Goro Takahashi
- G05 - CONTROLLING REGULATING
Information Patent Grant
Process tube for manufacturing semiconductor wafers
- Patent number D594488
- Issue date Jun 16, 2009
- Tokyo Electron Limited
- Masataka Toiya
- D15 - Machines not elsewhere specified
Information Patent Grant
Process tube for manufacturing semiconductor wafers
- Patent number D586768
- Issue date Feb 17, 2009
- Tokyo Electron Limited
- Hisashi Inoue
- D13 - Equipment for production, distribution, or transformation of energy

Patents Applicationslast 30 patents

Information Patent Application
TEMPERATURE CONTROL METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250051922
- Publication date Feb 13, 2025
- TOKYO ELECTRON LIMITED
- Hisashi INOUE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
THERMOCOUPLE STRUCTURE, HEAT TREATMENT APPARATUS, AND METHOD OF MAN...
- Publication number 20210063247
- Publication date Mar 4, 2021
- TOKYO ELECTRON LIMITED
- Hisashi INOUE
- G01 - MEASURING TESTING
Information Patent Application
ASSEMBLING APPARATUS AND ASSEMBLING METHOD FOR SEMICONDUCTOR MANUFA...
- Publication number 20190333789
- Publication date Oct 31, 2019
- TOKYO ELECTRON LIMITED
- Hisashi Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLAMP APPARATUS, SUBSTRATE CARRY-IN/OUT APPARATUS USING THE SAME, A...
- Publication number 20160273836
- Publication date Sep 22, 2016
- TOKYO ELECTRON LIMITED
- Mitsuru Obara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEAT TREATMENT METHOD AND HEAT TREATMENT APPARATUS
- Publication number 20140220503
- Publication date Aug 7, 2014
- TOKYO ELECTRON LIMITED
- Hisashi Inoue
- C21 - METALLURGY OF IRON
Information Patent Application
HEAT TREATMENT METHOD AND HEAT TREATMENT APPARATUS
- Publication number 20120329291
- Publication date Dec 27, 2012
- TOKYO ELECTRON LIMITED
- Hisashi INOUE
- C21 - METALLURGY OF IRON
Information Patent Application
HEAT TREATMENT METHOD AND HEAT TREATMENT APPARATUS
- Publication number 20110162633
- Publication date Jul 7, 2011
- TOKYO ELECTRON LIMITED
- Hisashi Inoue
- C21 - METALLURGY OF IRON
Information Patent Application
DIRECT OXIDATION METHOD FOR SEMICONDUCTOR PROCESS
- Publication number 20110129604
- Publication date Jun 2, 2011
- TOKYO ELECTRON LIMITED
- Hisashi Inoue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REACTION TUBE AND HEAT PROCESSING APPARATUS FOR A SEMICONDUCTOR PRO...
- Publication number 20090250005
- Publication date Oct 8, 2009
- TOKYO ELECTRON LIMITED
- Hirofumi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vertical plasma processing apparatus and method for using same
- Publication number 20090124087
- Publication date May 14, 2009
- Nobutake Nodera
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Heat treatment method and heat treatment apparatus
- Publication number 20090081887
- Publication date Mar 26, 2009
- TOKYO ELECTRON LIMITED
- Hisashi Inoue
- C21 - METALLURGY OF IRON
Information Patent Application
Heat processing apparatus, method of automatically tuning control c...
- Publication number 20080255683
- Publication date Oct 16, 2008
- TOKYO ELECTRON LIMITED
- Goro Takahashi
- G05 - CONTROLLING REGULATING
Information Patent Application
Vertical Thermal Processing Apparatus and Method of Using the Same
- Publication number 20080187652
- Publication date Aug 7, 2008
- TOKYO ELECTRON LIMITED
- Wataru Nakajima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Heat processing apparatus for semiconductor process
- Publication number 20080083372
- Publication date Apr 10, 2008
- Hisashi Inoue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Oxidation apparatus and method for semiconductor process
- Publication number 20080075838
- Publication date Mar 27, 2008
- Hisashi Inoue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Film forming system, method of operating the same, and storage medi...
- Publication number 20080014351
- Publication date Jan 17, 2008
- Hisashi Inoue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Hisashi Inoue

Person

Patents Grantslast 30 patents

Thermocouple structure, heat treatment apparatus, and method of man...

Assembling apparatus and assembling method for semiconductor manufa...

Clamp apparatus, substrate carry-in/out apparatus using the same, a...

Heat treatment method and heat treatment apparatus

Heat treatment method and heat treatment apparatus

Heat treatment method and heat treatment apparatus wherein the subs...

Reaction tube and heat processing apparatus for a semiconductor pro...

Direct oxidation method for semiconductor process

Heat processing apparatus for semiconductor process

Vertical thermal processing apparatus and method of using the same

Heat treatment method wherein the substrate holder is composed of t...

Heat processing apparatus, method of automatically tuning control c...

Process tube for manufacturing semiconductor wafers

Process tube for manufacturing semiconductor wafers

Patents Applicationslast 30 patents

TEMPERATURE CONTROL METHOD AND SUBSTRATE PROCESSING APPARATUS

THERMOCOUPLE STRUCTURE, HEAT TREATMENT APPARATUS, AND METHOD OF MAN...

ASSEMBLING APPARATUS AND ASSEMBLING METHOD FOR SEMICONDUCTOR MANUFA...

CLAMP APPARATUS, SUBSTRATE CARRY-IN/OUT APPARATUS USING THE SAME, A...

HEAT TREATMENT METHOD AND HEAT TREATMENT APPARATUS

HEAT TREATMENT METHOD AND HEAT TREATMENT APPARATUS

HEAT TREATMENT METHOD AND HEAT TREATMENT APPARATUS

DIRECT OXIDATION METHOD FOR SEMICONDUCTOR PROCESS

REACTION TUBE AND HEAT PROCESSING APPARATUS FOR A SEMICONDUCTOR PRO...

Vertical plasma processing apparatus and method for using same

Heat treatment method and heat treatment apparatus

Heat processing apparatus, method of automatically tuning control c...

Vertical Thermal Processing Apparatus and Method of Using the Same

Heat processing apparatus for semiconductor process

Oxidation apparatus and method for semiconductor process

Film forming system, method of operating the same, and storage medi...