Hisashi Matsumura

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Niigata, JP

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Patents Applicationslast 30 patents

Information Patent Application
METHOD OF MANUFACTURING SILICON EPITAXIAL SUBSTRATE AND SILICON EPI...
- Publication number 20250051961
- Publication date Feb 13, 2025
- GlobalWafers Japan Co., Ltd.
- Takeshi SENDA
- C30 - CRYSTAL GROWTH
Information Patent Application
METHOD OF MANUFACTURING SILICON WAFERS
- Publication number 20240339315
- Publication date Oct 10, 2024
- GlobalWafers Japan Co., Ltd.
- Susumu MAEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SILICON WAFER AND SILICON WAFER
- Publication number 20240304458
- Publication date Sep 12, 2024
- GLOBAL WAFERS JAPAN CO., LTD.
- Susumu MAEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON WAFER AND METHOD FOR PRODUCING SILICON WAFER
- Publication number 20230243062
- Publication date Aug 3, 2023
- GLOBALWAFERS JAPAN CO., LTD.
- Haruo SUDO
- C30 - CRYSTAL GROWTH
Information Patent Application
ELECTROLYSIS APPARATUS
- Publication number 20100258436
- Publication date Oct 14, 2010
- Kinotech Solar Energy Corporation
- Yoshinori Takeuchi
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
SILICON MANUFACTURING APPARATUS AND RELATED METHOD
- Publication number 20100247416
- Publication date Sep 30, 2010
- Kinotech Solar Energy Corporation
- Yoshinori Takeuchi
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL