Hisashi Okuchi

Person

Mie, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 12,022,668
- Issue date Jun 25, 2024
- Kioxia Corporation
- Masanori Mizukoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment device, substrate treatment method, and semicon...
- Patent number 11,342,182
- Issue date May 24, 2022
- Kioxia Corporation
- Yasuhito Yoshimizu
- B08 - CLEANING
Information Patent Grant
Surface treatment apparatus and method for semiconductor substrate
- Patent number 10,573,508
- Issue date Feb 25, 2020
- TOSHIBA MEMORY CORPORATION
- Tatsuhiko Koide
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment method and substrate treatment apparatus
- Patent number 10,529,588
- Issue date Jan 7, 2020
- TOSHIBA MEMORY CORPORATION
- Yuya Akeboshi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor storage device comprising resistance change film and...
- Patent number 10,522,596
- Issue date Dec 31, 2019
- TOSHIBA MEMORY CORPORATION
- Keiichi Sawa
- G11 - INFORMATION STORAGE
Information Patent Grant
Substrate processing method, substrate processing apparatus, and st...
- Patent number 10,199,240
- Issue date Feb 5, 2019
- TOSHIBA MEMORY CORPORATION
- Hidekazu Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and storage medium
- Patent number 10,096,462
- Issue date Oct 9, 2018
- TOSHIBA MEMORY CORPORATION
- Hidekazu Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment method and substrate treatment apparatus
- Patent number 10,014,186
- Issue date Jul 3, 2018
- TOSHIBA MEMORY CORPORATION
- Yuya Akeboshi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device manufacture method
- Patent number 9,991,159
- Issue date Jun 5, 2018
- TOSHIBA MEMORY CORPORATION
- Fuyuma Ito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method of treating surface of semiconductor substrate
- Patent number 9,991,111
- Issue date Jun 5, 2018
- TOSHIBA MEMORY CORPORATION
- Yoshihiro Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method of treating surface of semiconductor substrate
- Patent number 9,859,111
- Issue date Jan 2, 2018
- TOSHIBA MEMORY CORPORATION
- Yoshihiro Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing same
- Patent number 9,673,217
- Issue date Jun 6, 2017
- Kabushiki Kaisha Toshiba
- Atsuko Sakata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Supercritical drying method for semiconductor substrate and supercr...
- Patent number 9,583,330
- Issue date Feb 28, 2017
- Tokyo Electron Limited
- Linan Ji
- F26 - DRYING
Information Patent Grant
Supercritical drying method for semiconductor substrate
- Patent number 9,570,286
- Issue date Feb 14, 2017
- Kabushiki Kaisha Toshiba
- Yohei Sato
- F26 - DRYING
Information Patent Grant
Supercritical drying method for semiconductor substrate
- Patent number 9,437,416
- Issue date Sep 6, 2016
- Kabushiki Kaisha Toshiba
- Hidekazu Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of semiconductor device
- Patent number 9,384,980
- Issue date Jul 5, 2016
- Kabushiki Kaisha Toshiba
- Yasuhito Yoshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and manufacturing method of semiconductor...
- Patent number 9,177,781
- Issue date Nov 3, 2015
- Tokyo Electron Limited
- Shigeru Tahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposit removal method
- Patent number 9,126,229
- Issue date Sep 8, 2015
- Tokyo Electron Limited
- Shigeru Tahara
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Manufacturing method and manufacturing apparatus of functional element
- Patent number 9,065,064
- Issue date Jun 23, 2015
- Kabushiki Kaisha Toshiba
- Hiroshi Tomita
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Supercritical drying method for semiconductor substrate
- Patent number 8,950,082
- Issue date Feb 10, 2015
- Kabushiki Kaisha Toshiba
- Yohei Sato
- F26 - DRYING
Information Patent Grant
Film embedding method and semiconductor device
- Patent number 8,865,563
- Issue date Oct 21, 2014
- Kabushiki Kaisha Toshiba
- Yasuhito Yoshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Supercritical drying method for semiconductor substrate and supercr...
- Patent number 8,771,429
- Issue date Jul 8, 2014
- Kabushiki Kaisha Toshiba
- Linan Ji
- F26 - DRYING
Information Patent Grant
Method for forming interconnection pattern and semiconductor device
- Patent number 8,772,164
- Issue date Jul 8, 2014
- Kabushiki Kaisha Toshiba
- Yasuhito Yoshimizu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wet etching method for silicon nitride film
- Patent number 8,741,168
- Issue date Jun 3, 2014
- Kabushiki Kaisha Toshiba
- Yasuhito Yoshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Supercritical drying method for semiconductor substrate
- Patent number 8,709,170
- Issue date Apr 29, 2014
- Kabushiki Kaisha Toshiba
- Yohei Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method, cleaning apparatus
- Patent number 8,695,145
- Issue date Apr 15, 2014
- Kabushiki Kaisha Toshiba
- Yasuhito Yoshimizu
- A46 - BRUSHWARE
Information Patent Grant
Semiconductor substrate surface treatment method
- Patent number 8,435,903
- Issue date May 7, 2013
- Kabushiki Kaisha Toshiba
- Yoshihiro Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Template cleaning method, system, and apparatus
- Patent number 8,375,964
- Issue date Feb 19, 2013
- Kabushiki Kaisha Toshiba
- Hiroshi Tomita
- B08 - CLEANING
Information Patent Grant
Supercritical drying method and apparatus for semiconductor substrates
- Patent number 8,372,212
- Issue date Feb 12, 2013
- Kabushiki Kaisha Toshiba
- Yohei Sato
- F26 - DRYING
Information Patent Grant
Manufacturing apparatus for semiconductor device and manufacturing...
- Patent number 8,148,175
- Issue date Apr 3, 2012
- Kabushiki Kaisha Toshiba
- Hisashi Okuchi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20230092237
- Publication date Mar 23, 2023
- KIOXIA Corporation
- Masanori MIZUKOSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD
- Publication number 20220280969
- Publication date Sep 8, 2022
- KIOXIA Corporation
- Yurika KANNO
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SAME
- Publication number 20220077183
- Publication date Mar 10, 2022
- KIOXIA Corporation
- Takaumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT DEVICE, SUBSTRATE TREATMENT METHOD, AND SEMICON...
- Publication number 20200185221
- Publication date Jun 11, 2020
- Toshiba Memory Corporation
- Yasuhito YOSHIMIZU
- B08 - CLEANING
Information Patent Application
SEMICONDUCTOR STORAGE DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20190027538
- Publication date Jan 24, 2019
- Toshiba Memory Corporation
- Keiichi Sawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS
- Publication number 20180301349
- Publication date Oct 18, 2018
- Toshiba Memory Corporation
- Yuya AKEBOSHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD
- Publication number 20180082893
- Publication date Mar 22, 2018
- Toshiba Memory Corporation
- Fuyuma ITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD OF TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE
- Publication number 20180082832
- Publication date Mar 22, 2018
- Toshiba Memory Corporation
- Yoshihiro Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS
- Publication number 20160351417
- Publication date Dec 1, 2016
- Kabushiki Kaisha Toshiba
- Yuya Akeboshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD OF TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE
- Publication number 20160049289
- Publication date Feb 18, 2016
- Kabushiki Kaisha Toshiba
- Yoshihiro Ogawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Manufacturing Method of Semiconductor Device
- Publication number 20160005604
- Publication date Jan 7, 2016
- Kabushiki Kaisha Toshiba
- Yasuhito YOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE TREATMENT APPARATUS AND METHOD FOR SEMICONDUCTOR SUBSTRATE
- Publication number 20150371845
- Publication date Dec 24, 2015
- Kabushiki Kaisha Toshiba
- Tatsuhiko KOIDE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND APPARATUS THEREFOR
- Publication number 20150206773
- Publication date Jul 23, 2015
- Kabushiki Kaisha Toshiba
- Hidekazu HAYASHI
- B08 - CLEANING
Information Patent Application
SUPERCRITICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE
- Publication number 20150135549
- Publication date May 21, 2015
- Kabushiki Kaisha Toshiba
- Yohei Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPERCRITICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE AND SUPERCR...
- Publication number 20140250714
- Publication date Sep 11, 2014
- Kabushiki Kaisha Toshiba
- Linan JI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPERCRITICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE
- Publication number 20140174482
- Publication date Jun 26, 2014
- Kabushiki Kaisha Toshiba
- Yohei Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSIT REMOVAL METHOD
- Publication number 20140083979
- Publication date Mar 27, 2014
- TOKYO ELECTRON LIMITED
- Shigeru Tahara
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
MANUFACTURING METHOD AND MANUFACTURING APPARATUS OF FUNCTIONAL ELEMENT
- Publication number 20140065765
- Publication date Mar 6, 2014
- Kabushiki Kaisha Toshiba
- Hiroshi Tomita
- B82 - NANO-TECHNOLOGY
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20140065555
- Publication date Mar 6, 2014
- Kabushiki Kaisha Toshiba
- Yasuhito YOSHIMIZU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND STO...
- Publication number 20140020721
- Publication date Jan 23, 2014
- Hidekazu HAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM EMBEDDING METHOD AND SEMICONDUCTOR DEVICE
- Publication number 20130249062
- Publication date Sep 26, 2013
- Kabushiki Kaisha Toshiba
- Yasuhito YOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING INTERCONNECTION PATTERN AND SEMICONDUCTOR DEVICE
- Publication number 20130154087
- Publication date Jun 20, 2013
- Yasuhito YOSHIMIZU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20130122706
- Publication date May 16, 2013
- Hisashi OKUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD
- Publication number 20130065400
- Publication date Mar 14, 2013
- Yasuhito Yoshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPERCRITICAL DRYING METHOD AND SUPERCRITICAL DRYING APPARATUS FOR...
- Publication number 20130061492
- Publication date Mar 14, 2013
- Hisashi OKUCHI
- F26 - DRYING
Information Patent Application
SUPERCRlTICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE
- Publication number 20130055584
- Publication date Mar 7, 2013
- Yohei Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING METHOD, CLEANING APPARATUS
- Publication number 20130037055
- Publication date Feb 14, 2013
- Yasuhito YOSHIMIZU
- A46 - BRUSHWARE
Information Patent Application
SUPERCRITICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE AND SUPERCR...
- Publication number 20130019905
- Publication date Jan 24, 2013
- Linan JI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND ST...
- Publication number 20120304485
- Publication date Dec 6, 2012
- TOKYO ELECTRON LIMITED
- Hidekazu Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPERCRITICAL DRYING METHOD AND APPARATUS FOR SEMICONDUCTOR SUBSTRATES
- Publication number 20120247516
- Publication date Oct 4, 2012
- Yohei SATO
- F26 - DRYING

Hisashi Okuchi

Person

Patents Grantslast 30 patents

Semiconductor device and method of manufacturing the same

Substrate treatment device, substrate treatment method, and semicon...

Surface treatment apparatus and method for semiconductor substrate

Substrate treatment method and substrate treatment apparatus

Semiconductor storage device comprising resistance change film and...

Substrate processing method, substrate processing apparatus, and st...

Substrate processing method and storage medium

Substrate treatment method and substrate treatment apparatus

Semiconductor device manufacture method

Apparatus and method of treating surface of semiconductor substrate

Apparatus and method of treating surface of semiconductor substrate

Semiconductor device and method for manufacturing same

Supercritical drying method for semiconductor substrate and supercr...

Supercritical drying method for semiconductor substrate

Supercritical drying method for semiconductor substrate

Manufacturing method of semiconductor device

Plasma processing method and manufacturing method of semiconductor...

Deposit removal method

Manufacturing method and manufacturing apparatus of functional element

Supercritical drying method for semiconductor substrate

Film embedding method and semiconductor device

Supercritical drying method for semiconductor substrate and supercr...

Method for forming interconnection pattern and semiconductor device

Wet etching method for silicon nitride film

Supercritical drying method for semiconductor substrate

Cleaning method, cleaning apparatus

Semiconductor substrate surface treatment method

Template cleaning method, system, and apparatus

Supercritical drying method and apparatus for semiconductor substrates

Manufacturing apparatus for semiconductor device and manufacturing...

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SAME

SUBSTRATE TREATMENT DEVICE, SUBSTRATE TREATMENT METHOD, AND SEMICON...

SEMICONDUCTOR STORAGE DEVICE AND METHOD OF MANUFACTURING THE SAME

SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

APPARATUS AND METHOD OF TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE

SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS

APPARATUS AND METHOD OF TREATING SURFACE OF SEMICONDUCTOR SUBSTRATE

Manufacturing Method of Semiconductor Device

SURFACE TREATMENT APPARATUS AND METHOD FOR SEMICONDUCTOR SUBSTRATE

SUBSTRATE PROCESSING METHOD AND APPARATUS THEREFOR

SUPERCRITICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE

SUPERCRITICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE AND SUPERCR...

SUPERCRITICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE

DEPOSIT REMOVAL METHOD

MANUFACTURING METHOD AND MANUFACTURING APPARATUS OF FUNCTIONAL ELEMENT

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND STO...

FILM EMBEDDING METHOD AND SEMICONDUCTOR DEVICE

METHOD FOR FORMING INTERCONNECTION PATTERN AND SEMICONDUCTOR DEVICE

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

ETCHING METHOD

SUPERCRITICAL DRYING METHOD AND SUPERCRITICAL DRYING APPARATUS FOR...

SUPERCRlTICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE

CLEANING METHOD, CLEANING APPARATUS

SUPERCRITICAL DRYING METHOD FOR SEMICONDUCTOR SUBSTRATE AND SUPERCR...

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, AND ST...

SUPERCRITICAL DRYING METHOD AND APPARATUS FOR SEMICONDUCTOR SUBSTRATES