Hisaya Murakoshi

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Electron beam device
- Patent number 11,515,121
- Issue date Nov 29, 2022
- HITACHI HIGH-TECH CORPORATION
- Tomohiko Ogata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 11,107,655
- Issue date Aug 31, 2021
- Hitachi High-Technologies Corporation
- Tomohiko Ogata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Defect inspection method and defect inspection device
- Patent number 11,002,687
- Issue date May 11, 2021
- HITACHI HIGH-TECH CORPORATION
- Masaki Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus, and method of adjusting charged pa...
- Patent number 10,923,315
- Issue date Feb 16, 2021
- HITACHI HIGH-TECH CORPORATION
- Masaki Hasegawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device and method for adjusting charged parti...
- Patent number 10,522,320
- Issue date Dec 31, 2019
- Hitachi High-Technologies Corporation
- Tomohiko Ogata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device, and method of manufacturing component...
- Patent number 10,170,273
- Issue date Jan 1, 2019
- Hitachi High-Technologies Corporation
- Takashi Ichimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing electron source
- Patent number 10,074,506
- Issue date Sep 11, 2018
- Hitachi High-Technologies Corporation
- Takashi Ichimura
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Charged particle beam radiation apparatus
- Patent number 8,803,411
- Issue date Aug 12, 2014
- Hitachi High-Technologies Corporation
- Shunichi Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Field-emission electron gun and method for controlling same
- Patent number 8,766,542
- Issue date Jul 1, 2014
- Hitachi High-Technologies Corporation
- Boklae Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Graphical user interface for use with electron beam wafer inspection
- Patent number 8,502,141
- Issue date Aug 6, 2013
- Hitachi High-Technologies Corporation
- Masaki Hasegawa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Scanning electron microscope
- Patent number 8,481,935
- Issue date Jul 9, 2013
- Hitachi High-Technologies Corporation
- Akira Ikegami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope
- Patent number 7,989,768
- Issue date Aug 2, 2011
- Hitachi High-Technologies Corporation
- Akira Ikegami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for wafer pattern inspection
- Patent number 7,982,188
- Issue date Jul 19, 2011
- Hitachi High-Technologies Corporation
- Hiroyuki Shinada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for pattern inspection
- Patent number 7,566,871
- Issue date Jul 28, 2009
- Hitachi High-Technologies Corporation
- Masaki Hasegawa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pattern defect inspection method and apparatus thereof
- Patent number 7,547,884
- Issue date Jun 16, 2009
- Hitachi High-Technologies Corporation
- Masaki Hasegawa
- G01 - MEASURING TESTING
Information Patent Grant
Inspection system, inspection method, and process management method
- Patent number 7,411,190
- Issue date Aug 12, 2008
- Hitachi High-Technologies Corporation
- Hiroshi Makino
- G01 - MEASURING TESTING
Information Patent Grant
Method of inspecting a circuit pattern and inspecting instrument
- Patent number 7,397,031
- Issue date Jul 8, 2008
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Grant
Electron microscope and electron beam inspection system
- Patent number 7,394,066
- Issue date Jul 1, 2008
- Hitachi High-Technologies Corporation
- Hisaya Murakoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterned wafer inspection method and apparatus therefor
- Patent number 7,288,948
- Issue date Oct 30, 2007
- Hitachi High-Technologies Corporation
- Masaki Hasegawa
- G01 - MEASURING TESTING
Information Patent Grant
Patterned wafer inspection method and apparatus therefor
- Patent number 7,242,015
- Issue date Jul 10, 2007
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Grant
Method of inspecting a circuit pattern and inspecting instrument
- Patent number 7,098,455
- Issue date Aug 29, 2006
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Grant
Inspection system, inspection method, and process management method
- Patent number 7,075,076
- Issue date Jul 11, 2006
- Hitachi High-Technologies Corp.
- Hiroshi Makino
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for wafer pattern inspection
- Patent number 7,022,986
- Issue date Apr 4, 2006
- Hitachi High-Technologies Corporation
- Hiroyuki Shinada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterned wafer inspection method and apparatus therefor
- Patent number 6,979,823
- Issue date Dec 27, 2005
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Grant
Patterned wafer inspection method and apparatus therefor
- Patent number 6,797,954
- Issue date Sep 28, 2004
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Grant
Method of inspecting a circuit pattern and inspecting instrument
- Patent number 6,583,413
- Issue date Jun 24, 2003
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for inspecting integrated circuit pattern usin...
- Patent number 6,476,390
- Issue date Nov 5, 2002
- Hitachi, Ltd.
- Hisaya Murakoshi
- G01 - MEASURING TESTING
Information Patent Grant
Defect observing electron microscope
- Patent number 5,744,800
- Issue date Apr 28, 1998
- Hitachi, Ltd.
- Hiroshi Kakibayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Field-emission transmission electron microscope and operation metho...
- Patent number 5,373,158
- Issue date Dec 13, 1994
- Hitachi, Ltd.
- Hisaya Murakoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Field emission electron device which produces a constant beam current
- Patent number 5,134,289
- Issue date Jul 28, 1992
- Hitachi, Ltd.
- Hisaya Murakoshi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Defect Inspection Method and Defect Inspection Device
- Publication number 20200292466
- Publication date Sep 17, 2020
- Hitachi High-Technologies Corporation
- Masaki HASEGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device
- Publication number 20200279714
- Publication date Sep 3, 2020
- Hitachi High-Technologies Corporation
- Tomohiko OGATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron Beam Device
- Publication number 20200152415
- Publication date May 14, 2020
- Hitachi High-Technologies Corporation
- Tomohiko OGATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Apparatus, and Method of Adjusting Charged Pa...
- Publication number 20190378685
- Publication date Dec 12, 2019
- Hitachi High-Technologies Corporation
- Masaki HASEGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device and Method for Adjusting Charged Parti...
- Publication number 20190108969
- Publication date Apr 11, 2019
- Hitachi High-Technologies Corporation
- Tomohiko OGATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Defect Inspection Device
- Publication number 20190079025
- Publication date Mar 14, 2019
- Masaki HASEGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device, and Method of Manufacturing Component...
- Publication number 20180019096
- Publication date Jan 18, 2018
- Hitachi High-Technologies Corporation
- Takashi ICHIMURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for Manufacturing Electron Source
- Publication number 20150255240
- Publication date Sep 10, 2015
- Hitachi High-Technologies Corporation
- Takashi Ichimura
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
FIELD-EMISSION ELECTRON GUN AND METHOD FOR CONTROLLING SAME
- Publication number 20130200788
- Publication date Aug 8, 2013
- Hitachi High-Technologies Corporation
- Boklae Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM RADIATION APPARATUS
- Publication number 20130140977
- Publication date Jun 6, 2013
- Hitachi High-Technologies Corporation
- Shunichi Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE GUN AND CHARGED PARTICLE BEAM DEVICE
- Publication number 20120104272
- Publication date May 3, 2012
- Hitachi High-Technologies Corporation
- Boklae Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANNING ELECTRON MICROSCOPE
- Publication number 20110278454
- Publication date Nov 17, 2011
- Hitachi High-Technologies Corporation
- Akira IKEGAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for pattern inspection
- Publication number 20090261252
- Publication date Oct 22, 2009
- Hitachi High-Technologies Corporation
- Masaki Hasegawa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ELECTRON MICROSCOPE
- Publication number 20090039264
- Publication date Feb 12, 2009
- Hitachi High-Technologies Corporation
- Akira IKEGAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron Microscope And Electron Beam Inspection System
- Publication number 20080265161
- Publication date Oct 30, 2008
- Hisaya Murakoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for pattern inspection
- Publication number 20070272857
- Publication date Nov 29, 2007
- Hitachi High-Technologies Corporation
- Masaki Hasegawa
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Electron microscope and electron bean inspection system.
- Publication number 20070181808
- Publication date Aug 9, 2007
- Hisaya Murakoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pattern defect inspection method and apparatus thereof
- Publication number 20070085005
- Publication date Apr 19, 2007
- Hitachi High-Technologies Corporation
- Masaki Hasegawa
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and method for wafer pattern inspection
- Publication number 20060249676
- Publication date Nov 9, 2006
- Hitachi High-Technologies Corp.
- Hiroyuki Shinada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of inspecting a circuit pattern and inspecting instrument
- Publication number 20060243908
- Publication date Nov 2, 2006
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Application
Inspection system, inspection method, and process management method
- Publication number 20060231758
- Publication date Oct 19, 2006
- Hiroshi Makino
- G01 - MEASURING TESTING
Information Patent Application
Patterned wafer inspection method and apparatus therefor
- Publication number 20060017014
- Publication date Jan 26, 2006
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Application
Electron microscope and electron beam inspection system
- Publication number 20060011835
- Publication date Jan 19, 2006
- Hisaya Murakoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Patterned wafer inspection method and apparatus therefor
- Publication number 20050139772
- Publication date Jun 30, 2005
- Masaki Hasegawa
- G01 - MEASURING TESTING
Information Patent Application
Inspection system, inspection method, and process management method
- Publication number 20050051722
- Publication date Mar 10, 2005
- Hiroshi Makino
- G01 - MEASURING TESTING
Information Patent Application
Patterned wafer inspection method and apparatus therefor
- Publication number 20040222377
- Publication date Nov 11, 2004
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Application
Method of inspecting a circuit pattern and inspecting instrument
- Publication number 20030201391
- Publication date Oct 30, 2003
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Application
Patterned wafer inspection method and apparatus therefor
- Publication number 20030164460
- Publication date Sep 4, 2003
- Hitachi, Ltd.
- Hiroyuki Shinada
- G01 - MEASURING TESTING
Information Patent Application
Apparatus and method for wafer pattern inspection
- Publication number 20030127593
- Publication date Jul 10, 2003
- Hitachi High-Technologies Corporation
- Hiroyuki Shinada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERNED WAFER INSPECTION METHOD AND APPARATUS THEREFOR
- Publication number 20020117635
- Publication date Aug 29, 2002
- HIROYUKI SHINADA
- G01 - MEASURING TESTING

Hisaya Murakoshi

Person

Patents Grantslast 30 patents

Electron beam device

Charged particle beam device

Defect inspection method and defect inspection device

Charged particle beam apparatus, and method of adjusting charged pa...

Charged particle beam device and method for adjusting charged parti...

Charged particle beam device, and method of manufacturing component...

Method for manufacturing electron source

Charged particle beam radiation apparatus

Field-emission electron gun and method for controlling same

Graphical user interface for use with electron beam wafer inspection

Scanning electron microscope

Scanning electron microscope

Apparatus and method for wafer pattern inspection

Method and apparatus for pattern inspection

Pattern defect inspection method and apparatus thereof

Inspection system, inspection method, and process management method

Method of inspecting a circuit pattern and inspecting instrument

Electron microscope and electron beam inspection system

Patterned wafer inspection method and apparatus therefor

Patterned wafer inspection method and apparatus therefor

Method of inspecting a circuit pattern and inspecting instrument

Inspection system, inspection method, and process management method

Apparatus and method for wafer pattern inspection

Patterned wafer inspection method and apparatus therefor

Patterned wafer inspection method and apparatus therefor

Method of inspecting a circuit pattern and inspecting instrument

Method and apparatus for inspecting integrated circuit pattern usin...

Defect observing electron microscope

Field-emission transmission electron microscope and operation metho...

Field emission electron device which produces a constant beam current

Patents Applicationslast 30 patents

Defect Inspection Method and Defect Inspection Device

Charged Particle Beam Device

Electron Beam Device

Charged Particle Beam Apparatus, and Method of Adjusting Charged Pa...

Charged Particle Beam Device and Method for Adjusting Charged Parti...

Defect Inspection Device

Charged Particle Beam Device, and Method of Manufacturing Component...

Method for Manufacturing Electron Source

FIELD-EMISSION ELECTRON GUN AND METHOD FOR CONTROLLING SAME

CHARGED PARTICLE BEAM RADIATION APPARATUS

CHARGED PARTICLE GUN AND CHARGED PARTICLE BEAM DEVICE

SCANNING ELECTRON MICROSCOPE

Method and apparatus for pattern inspection

ELECTRON MICROSCOPE

Electron Microscope And Electron Beam Inspection System

Method and apparatus for pattern inspection

Electron microscope and electron bean inspection system.

Pattern defect inspection method and apparatus thereof

Apparatus and method for wafer pattern inspection

Method of inspecting a circuit pattern and inspecting instrument

Inspection system, inspection method, and process management method

Patterned wafer inspection method and apparatus therefor

Electron microscope and electron beam inspection system

Patterned wafer inspection method and apparatus therefor

Inspection system, inspection method, and process management method

Patterned wafer inspection method and apparatus therefor

Method of inspecting a circuit pattern and inspecting instrument

Patterned wafer inspection method and apparatus therefor

Apparatus and method for wafer pattern inspection

PATTERNED WAFER INSPECTION METHOD AND APPARATUS THEREFOR