Hitoshi Maeda

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Mask blank and method of manufacturing photomask
- Patent number 12,326,656
- Issue date Jun 10, 2025
- Hoya Corporation
- Hitoshi Maeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device
- Patent number 12,302,610
- Issue date May 13, 2025
- Renesas Electronics Corporation
- Hitoshi Maeda
Information Patent Grant
Mask blank, phase shift mask, and method of manufacturing semicondu...
- Patent number 11,720,014
- Issue date Aug 8, 2023
- Hoya Corporation
- Hitoshi Maeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 11,705,361
- Issue date Jul 18, 2023
- Renesas Electronics Corporation
- Hitoshi Maeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask blank, phase-shift mask, and method of manufacturing semicondu...
- Patent number 11,442,357
- Issue date Sep 13, 2022
- Hoya Corporation
- Hitoshi Maeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask blank, phase shift mask, and method for manufacturing semicond...
- Patent number 11,415,875
- Issue date Aug 16, 2022
- Hoya Corporation
- Hitoshi Maeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, phase shift mask, and method of manufacturing semicondu...
- Patent number 11,333,966
- Issue date May 17, 2022
- Hoya Corporation
- Osamu Nozawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank, phase shift mask, and method of manufacturing semicondu...
- Patent number 11,022,875
- Issue date Jun 1, 2021
- Hoya Corporation
- Kazutake Taniguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask blank, phase shift mask, and method for manufacturing semicond...
- Patent number 11,009,787
- Issue date May 18, 2021
- Hoya Corporation
- Hitoshi Maeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning probe microscope
- Patent number 6,745,618
- Issue date Jun 8, 2004
- Renesas Technology Corp.
- Yukari Imai
- G01 - MEASURING TESTING
Information Patent Grant
Scanning probe microscope
- Patent number 6,545,470
- Issue date Apr 8, 2003
- Mitsubishi Denki Kabushiki Kaisha
- Yukari Imai
- G01 - MEASURING TESTING
Information Patent Grant
Method for evaluating a semiconductor device
- Patent number 6,027,949
- Issue date Feb 22, 2000
- Mitsubishi Denki Kabushiki Kaisha
- Hitoshi Maeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and a process of manufacturing the same
- Patent number 5,780,870
- Issue date Jul 14, 1998
- Mitsubishi Denki Kabushiki Kaisha
- Hitoshi Maeda
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR PRODUCING SEMICONDUCTO...
- Publication number 20240337919
- Publication date Oct 10, 2024
- HOYA CORPORATION
- Kenta TSUKAGOSHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD OF MANUFACTURING...
- Publication number 20240319577
- Publication date Sep 26, 2024
- HOYA CORPORATION
- Hitoshi MAEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20240234528
- Publication date Jul 11, 2024
- RENESAS ELECTRONICS CORPORATION
- Hitoshi MAEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR PRODUCING SEMICONDUCTO...
- Publication number 20240184194
- Publication date Jun 6, 2024
- HOYA CORPORATION
- Hitoshi MAEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR DEVICE
- Publication number 20240136419
- Publication date Apr 25, 2024
- RENESAS ELECTRONICS CORPORATION
- Hitoshi MAEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR PRODUCING SEMICONDUCTO...
- Publication number 20230393457
- Publication date Dec 7, 2023
- HOYA CORPORATION
- Osamu NOZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, AND METHOD OF MANUFACTURING SEMICONDU...
- Publication number 20230314929
- Publication date Oct 5, 2023
- HOYA CORPORATION
- Hitoshi MAEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, TRANSFER MASK, AND METHOD OF MANUFACTURING SEMICONDUCTO...
- Publication number 20230142180
- Publication date May 11, 2023
- HOYA CORPORATION
- Hitoshi MAEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK AND METHOD OF MANUFACTURING PHOTOMASK
- Publication number 20230069092
- Publication date Mar 2, 2023
- HOYA CORPORATION
- Hitoshi MAEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, AND METHOD OF MANUFACTURING SEMICONDU...
- Publication number 20220342294
- Publication date Oct 27, 2022
- HOYA CORPORATION
- Hiroaki SHISHIDO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, PHASE SHIFT MASK AND METHOD FOR PRODUCING SEMICONDUCTOR...
- Publication number 20220252972
- Publication date Aug 11, 2022
- HOYA CORPORATION
- Hitoshi MAEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, METHOD OF MANUFACTURING PHASE SHIFT M...
- Publication number 20220128898
- Publication date Apr 28, 2022
- HOYA CORPORATION
- Hitoshi MAEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING SEMICOND...
- Publication number 20220121104
- Publication date Apr 21, 2022
- HOYA CORPORATION
- Hitoshi MAEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20220068706
- Publication date Mar 3, 2022
- RENESAS ELECTRONICS CORPORATION
- Hitoshi MAEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, TRANSFER MASK, AND SEMICONDUCTOR-DEVICE MANUFACTURING M...
- Publication number 20220043335
- Publication date Feb 10, 2022
- HOYA CORPORATION
- Ryo OHKUBO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, TRANSFER MASK, AND SEMICONDUCTOR-DEVICE MANUFACTURING M...
- Publication number 20220035235
- Publication date Feb 3, 2022
- HOYA CORPORATION
- Ryo OHKUBO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, AND METHOD OF MANUFACTURING SEMICONDU...
- Publication number 20210364909
- Publication date Nov 25, 2021
- HOYA CORPORATION
- Osamu NOZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING SEMICOND...
- Publication number 20210255538
- Publication date Aug 19, 2021
- HOYA CORPORATION
- Hitoshi MAEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, PHASE-SHIFT MASK, AND SEMICONDUCTOR DEVICE MANUFACTURIN...
- Publication number 20210208497
- Publication date Jul 8, 2021
- HOYA CORPORATION
- Hitoshi MAEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, PHASE-SHIFT MASK, AND SEMICONDUCTOR DEVICE MANUFACTURIN...
- Publication number 20210132488
- Publication date May 6, 2021
- HOYA CORPORATION
- Hiroaki SHISHIDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING SEMICOND...
- Publication number 20210088895
- Publication date Mar 25, 2021
- HOYA CORPORATION
- Hitoshi MAEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING SEMICOND...
- Publication number 20210026235
- Publication date Jan 28, 2021
- HOYA CORPORATION
- Hitoshi MAEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING SEMICOND...
- Publication number 20200409252
- Publication date Dec 31, 2020
- HOYA CORPORATION
- Kazutake TANIGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK BLANK, TRANSFER MASK, AND METHOD FOR MANUFACTURING SEMICONDUCT...
- Publication number 20200285144
- Publication date Sep 10, 2020
- HOYA CORPORATION
- Hitoshi MAEDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cantilever having improved resolution and manufacturing method therof
- Publication number 20040150413
- Publication date Aug 5, 2004
- Renesas Technology Corp.
- Hitoshi Maeda
- G01 - MEASURING TESTING
Information Patent Application
Scanning probe microscope
- Publication number 20030115939
- Publication date Jun 26, 2003
- Mitsubishi Denki Kabushiki Kaisha
- Yukari Imai
- G01 - MEASURING TESTING
Information Patent Application
Semiconductor device inspecting method using conducting AFM
- Publication number 20030057988
- Publication date Mar 27, 2003
- Mitsubishi Denki Kabushiki Kaisha
- Hitoshi Maeda
- G01 - MEASURING TESTING
Information Patent Application
Electronic device having multilayer interconnection structure
- Publication number 20030047810
- Publication date Mar 13, 2003
- Mitsubishi Denki Kabushiki Kaisha
- Hitoshi Maeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Scanning probe microscope
- Publication number 20030025498
- Publication date Feb 6, 2003
- Mitsubishi Denki Kabushiki Kaisha
- Yukari Imai
- B82 - NANO-TECHNOLOGY

Hitoshi Maeda

Person

Patents Grantslast 30 patents

Mask blank and method of manufacturing photomask

Semiconductor device

Mask blank, phase shift mask, and method of manufacturing semicondu...

Method of manufacturing semiconductor device

Mask blank, phase-shift mask, and method of manufacturing semicondu...

Mask blank, phase shift mask, and method for manufacturing semicond...

Mask blank, phase shift mask, and method of manufacturing semicondu...

Mask blank, phase shift mask, and method of manufacturing semicondu...

Mask blank, phase shift mask, and method for manufacturing semicond...

Scanning probe microscope

Scanning probe microscope

Method for evaluating a semiconductor device

Semiconductor device and a process of manufacturing the same

Patents Applicationslast 30 patents

MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR PRODUCING SEMICONDUCTO...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD OF MANUFACTURING...

SEMICONDUCTOR DEVICE

MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR PRODUCING SEMICONDUCTO...

SEMICONDUCTOR DEVICE

MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR PRODUCING SEMICONDUCTO...

MASK BLANK, PHASE SHIFT MASK, AND METHOD OF MANUFACTURING SEMICONDU...

MASK BLANK, TRANSFER MASK, AND METHOD OF MANUFACTURING SEMICONDUCTO...

MASK BLANK AND METHOD OF MANUFACTURING PHOTOMASK

MASK BLANK, PHASE SHIFT MASK, AND METHOD OF MANUFACTURING SEMICONDU...

MASK BLANK, PHASE SHIFT MASK AND METHOD FOR PRODUCING SEMICONDUCTOR...

MASK BLANK, PHASE SHIFT MASK, METHOD OF MANUFACTURING PHASE SHIFT M...

MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING SEMICOND...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

MASK BLANK, TRANSFER MASK, AND SEMICONDUCTOR-DEVICE MANUFACTURING M...

MASK BLANK, TRANSFER MASK, AND SEMICONDUCTOR-DEVICE MANUFACTURING M...

MASK BLANK, PHASE SHIFT MASK, AND METHOD OF MANUFACTURING SEMICONDU...

MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING SEMICOND...

MASK BLANK, PHASE-SHIFT MASK, AND SEMICONDUCTOR DEVICE MANUFACTURIN...

MASK BLANK, PHASE-SHIFT MASK, AND SEMICONDUCTOR DEVICE MANUFACTURIN...

MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING SEMICOND...

MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING SEMICOND...

MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR MANUFACTURING SEMICOND...

MASK BLANK, TRANSFER MASK, AND METHOD FOR MANUFACTURING SEMICONDUCT...

Cantilever having improved resolution and manufacturing method therof

Scanning probe microscope

Semiconductor device inspecting method using conducting AFM

Electronic device having multilayer interconnection structure

Scanning probe microscope