Hitoshi Tamura

Person

Hikari, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus
- Patent number 12,002,655
- Issue date Jun 4, 2024
- HITACHI HIGH-TECH CORPORATION
- Chen Pin Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,948,776
- Issue date Apr 2, 2024
- HITACHI HIGH-TECH CORPORATION
- Chen Pin Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,460,913
- Issue date Oct 29, 2019
- Hitachi High-Technologies Corporation
- Nanako Tamari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 9,583,314
- Issue date Feb 28, 2017
- Hitachi High-Technologies Corporation
- Hitoshi Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 9,502,212
- Issue date Nov 22, 2016
- Hitachi High-Technologies Corporation
- Yuzuru Mizuhara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 8,216,420
- Issue date Jul 10, 2012
- Hitachi High-Technologies Corporation
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,142,674
- Issue date Mar 27, 2012
- Hitachi High-Technologies Corporation
- Hitoshi Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 7,955,514
- Issue date Jun 7, 2011
- Hitachi High-Technologies Corporation
- Kazue Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus having high frequency power source with...
- Patent number 7,615,132
- Issue date Nov 10, 2009
- Hitachi High-Technologies Corporation
- Naoki Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus using active matching
- Patent number 7,373,899
- Issue date May 20, 2008
- Hitachi High-Technologies Corporation
- Masahiro Sumiya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 7,169,255
- Issue date Jan 30, 2007
- Hitachi High-Technologies Corporation
- Naoki Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor light emitting device capable of suppressing silver m...
- Patent number 7,141,825
- Issue date Nov 28, 2006
- Stanley Electric Co., Ltd.
- Naochika Horio
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 7,029,594
- Issue date Apr 18, 2006
- Hitachi High-Technologies Corporation
- Naoki Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method using active matching
- Patent number 6,806,201
- Issue date Oct 19, 2004
- Hitachi, Ltd.
- Masahiro Sumiya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for fabricating a metal wiring and metal contact in a semic...
- Patent number 6,794,286
- Issue date Sep 21, 2004
- Kabushiki Kaisha Toshiba
- Hisako Aoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and apparatus
- Patent number 6,777,037
- Issue date Aug 17, 2004
- Hitachi, Ltd.
- Masahiro Sumiya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and apparatus
- Patent number 6,158,383
- Issue date Dec 12, 2000
- Hitachi, Ltd.
- Seiichi Watanabe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of making a semiconductor device
- Patent number 6,090,699
- Issue date Jul 18, 2000
- Kabushiki Kaisha Toshiba
- Hisako Aoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface wave plasma processing apparatus
- Patent number 5,886,473
- Issue date Mar 23, 1999
- Hitachi, Ltd.
- Seiichi Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and processing method
- Patent number 5,759,424
- Issue date Jun 2, 1998
- Hitachi, Ltd.
- Mitsuko Imatake
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a wiring layer with a barrier layer
- Patent number 5,592,024
- Issue date Jan 7, 1997
- Kabushiki Kaisha Toshiba
- Hisako Aoyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wet treatment adapted for mirror etching ZnSe
- Patent number 5,445,706
- Issue date Aug 29, 1995
- Stanley Electric Co., Ltd.
- Yasuo Okuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for controlling plasma processing
- Patent number 5,266,364
- Issue date Nov 30, 1993
- Hitachi, Ltd.
- Hitoshi Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film forming apparatus
- Patent number 5,074,985
- Issue date Dec 24, 1991
- Hitachi, Ltd.
- Hitoshi Tamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230352273
- Publication date Nov 2, 2023
- Hitachi High-Tech Corporation
- Chen Pin Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230352274
- Publication date Nov 2, 2023
- Hitachi High-Tech Corporation
- Hitoshi Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20220359162
- Publication date Nov 10, 2022
- Hitachi High-Tech Corporation
- Hitoshi Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20220344132
- Publication date Oct 27, 2022
- Hitachi High-Tech Corporation
- Chen Pin Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THE PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20190006153
- Publication date Jan 3, 2019
- Hitachi High-Technologies Corporation
- Nanako TAMARI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20160141151
- Publication date May 19, 2016
- Hitachi High-Technologies Corporation
- Hitoshi TAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Apparatus
- Publication number 20150348748
- Publication date Dec 3, 2015
- Hitachi High-Technologies Corporation
- Yuzuru MIZUHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20120186747
- Publication date Jul 26, 2012
- Shinji OBAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus and Plasma Processing Method
- Publication number 20120145323
- Publication date Jun 14, 2012
- Hitoshi Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY ETCHING METHOD OF HIGH-K FILM
- Publication number 20110171833
- Publication date Jul 14, 2011
- Koichi NAKAUNE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Apparatus And Plasma Processing Method
- Publication number 20090194506
- Publication date Aug 6, 2009
- Hitoshi Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY ETCHING METHOD OF HIGH-K FILM
- Publication number 20090065479
- Publication date Mar 12, 2009
- Koichi NAKAUNE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20080169065
- Publication date Jul 17, 2008
- Kazue Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and plasma processing method
- Publication number 20070193976
- Publication date Aug 23, 2007
- Hitoshi Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS HAVING HIGH FREQUENCY POWER SOURCE WITH...
- Publication number 20070186856
- Publication date Aug 16, 2007
- Naoki Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20060283550
- Publication date Dec 21, 2006
- Hideyuki Kazumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor light emitting device capable of suppressing silver m...
- Publication number 20050211989
- Publication date Sep 29, 2005
- Stanley Electric Co., Ltd
- Naochika Horio
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus having high frequency power source with...
- Publication number 20050081999
- Publication date Apr 21, 2005
- Naoki Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus using active matching
- Publication number 20050034813
- Publication date Feb 17, 2005
- Masahiro Sumiya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing method and apparatus
- Publication number 20040238490
- Publication date Dec 2, 2004
- Masahiro Sumiya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus and plasma processing method
- Publication number 20040045673
- Publication date Mar 11, 2004
- Naoki Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing device and plasma processing method
- Publication number 20030168012
- Publication date Sep 11, 2003
- Hitoshi Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and plasma processing method
- Publication number 20030155075
- Publication date Aug 21, 2003
- Naoki Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor device and process of fabricating the same
- Publication number 20020173116
- Publication date Nov 21, 2002
- Hisako Apyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing method and apparatus
- Publication number 20020114897
- Publication date Aug 22, 2002
- Masahiro Sumiya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma processing apparatus and method using active matching
- Publication number 20020038631
- Publication date Apr 4, 2002
- Masahiro Sumiya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Hitoshi Tamura

Person

Patents Grantslast 30 patents

Plasma processing apparatus

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Charged particle beam apparatus

Plasma processing apparatus

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and plasma processing method

Plasma processing apparatus having high frequency power source with...

Plasma processing apparatus using active matching

Plasma processing apparatus

Semiconductor light emitting device capable of suppressing silver m...

Plasma processing method

Plasma processing apparatus and method using active matching

Process for fabricating a metal wiring and metal contact in a semic...

Plasma processing method and apparatus

Plasma processing method and apparatus

Method of making a semiconductor device

Surface wave plasma processing apparatus

Plasma processing apparatus and processing method

Semiconductor device having a wiring layer with a barrier layer

Wet treatment adapted for mirror etching ZnSe

Method and apparatus for controlling plasma processing

Film forming apparatus

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

THE PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING APPARATUS

Charged Particle Beam Apparatus

PLASMA PROCESSING APPARATUS

Plasma Processing Apparatus and Plasma Processing Method

DRY ETCHING METHOD OF HIGH-K FILM

Plasma Processing Apparatus And Plasma Processing Method

DRY ETCHING METHOD OF HIGH-K FILM

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Plasma processing apparatus and plasma processing method

PLASMA PROCESSING APPARATUS HAVING HIGH FREQUENCY POWER SOURCE WITH...

Plasma processing apparatus

Semiconductor light emitting device capable of suppressing silver m...

Plasma processing apparatus having high frequency power source with...

Plasma processing apparatus using active matching

Plasma processing method and apparatus

Plasma processing apparatus and plasma processing method

Plasma processing device and plasma processing method

Plasma processing apparatus and plasma processing method

Semiconductor device and process of fabricating the same

Plasma processing method and apparatus

Plasma processing apparatus and method using active matching