Hozumi Yasuda

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,211,733
- Issue date Jan 28, 2025
- Ebara Corporation
- Nobuyuki Takada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing apparatus
- Patent number 12,128,523
- Issue date Oct 29, 2024
- Ebara Corporation
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate processing control system, substrate processing control m...
- Patent number 12,036,634
- Issue date Jul 16, 2024
- Ebara Corporation
- Koichi Takeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing head system and polishing apparatus
- Patent number 12,017,323
- Issue date Jun 25, 2024
- Ebara Corporation
- Itsuki Kobata
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,911,872
- Issue date Feb 27, 2024
- Ebara Corporation
- Nobuyuki Takada
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 11,735,457
- Issue date Aug 22, 2023
- Ebara Corporation
- Nobuyuki Takada
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing head and polishing apparatus
- Patent number 11,511,389
- Issue date Nov 29, 2022
- Ebara Corporation
- Kenichi Akazawa
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate holding device, substrate polishing apparatus, and method...
- Patent number 11,478,895
- Issue date Oct 25, 2022
- Ebara Corporation
- Shingo Togashi
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing machine and a polishing method for a substrate
- Patent number 11,465,254
- Issue date Oct 11, 2022
- Ebara Corporation
- Itsuki Kobata
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus
- Patent number 11,224,956
- Issue date Jan 18, 2022
- Ebara Corporation
- Osamu Nabeya
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus
- Patent number 10,702,972
- Issue date Jul 7, 2020
- Ebara Corporation
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate holding device, and substrate polishing apparatus
- Patent number 10,486,284
- Issue date Nov 26, 2019
- Ebara Corporation
- Shingo Togashi
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate polishing method, top ring, and substrate polishing appar...
- Patent number 10,464,185
- Issue date Nov 5, 2019
- Ebara Corporation
- Shintaro Isono
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate holding apparatus and polishing apparatus
- Patent number 10,442,056
- Issue date Oct 15, 2019
- Ebara Corporation
- Keisuke Namiki
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus and polishing method
- Patent number 10,414,015
- Issue date Sep 17, 2019
- Ebara Corporation
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus, control method and recording medium
- Patent number 10,391,603
- Issue date Aug 27, 2019
- Ebara Corporation
- Satoru Yamaki
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus
- Patent number 10,293,455
- Issue date May 21, 2019
- Ebara Corporation
- Osamu Nabeya
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane, substrate holding apparatus, and polishing apparatus
- Patent number 10,213,896
- Issue date Feb 26, 2019
- Ebara Corporation
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus, polishing head, and retainer ring
- Patent number 10,092,992
- Issue date Oct 9, 2018
- Ebara Corporation
- Hozumi Yasuda
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus
- Patent number 10,040,166
- Issue date Aug 7, 2018
- Ebara Corporation
- Osamu Nabeya
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing apparatus, polishing head, and retainer ring
- Patent number 10,035,239
- Issue date Jul 31, 2018
- Ebara Corporation
- Hozumi Yasuda
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing device and polishing method
- Patent number 9,999,956
- Issue date Jun 19, 2018
- Ebara Corporation
- Keisuke Namiki
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane for semiconductor wafer polishing apparatus
- Patent number D813180
- Issue date Mar 20, 2018
- Ebara Corporation
- Makoto Fukushima
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Elastic membrane and substrate holding apparatus
- Patent number 9,884,401
- Issue date Feb 6, 2018
- Ebara Corporation
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Grant
Elastic membrane for semiconductor wafer polishing apparatus
- Patent number D808349
- Issue date Jan 23, 2018
- Ebara Corporation
- Makoto Fukushima
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Substrate holder, polishing apparatus, polishing method, and retain...
- Patent number 9,815,171
- Issue date Nov 14, 2017
- Ebara Corporation
- Satoru Yamaki
- B24 - GRINDING POLISHING
Information Patent Grant
Substrate retaining ring
- Patent number D799437
- Issue date Oct 10, 2017
- Ebara Corporation
- Osamu Nabeya
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Retainer ring for substrate
- Patent number D794585
- Issue date Aug 15, 2017
- Ebara Corporation
- Osamu Nabeya
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Substrate retaining ring
- Patent number D793976
- Issue date Aug 8, 2017
- Ebara Corporation
- Makoto Fukushima
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Polishing apparatus
- Patent number 9,724,797
- Issue date Aug 8, 2017
- Ebara Corporation
- Osamu Nabeya
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
CHEMICAL MECHANICAL POLISHING SYSTEM AND CHEMICAL MECHANICAL POLISH...
- Publication number 20250217542
- Publication date Jul 3, 2025
- EBARA CORPORATION
- Yuki WATANABE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SUBSTRATE PROCESSING CONTROL SYSTEM, SUBSTRATE PROCESSING CONTROL M...
- Publication number 20240316720
- Publication date Sep 26, 2024
- EBARA CORPORATION
- Koichi TAKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20230060135
- Publication date Mar 2, 2023
- EBARA CORPORATION
- Nobuyuki TAKADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHEMICAL MECHANICAL POLISHING SYSTEM FOR A WORKPIECE, ARITHMETIC SY...
- Publication number 20230043639
- Publication date Feb 9, 2023
- EBARA CORPORATION
- Norikazu SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING HEAD SYSTEM AND POLISHING APPARATUS
- Publication number 20210237224
- Publication date Aug 5, 2021
- EBARA CORPORATION
- Itsuki Kobata
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20210237221
- Publication date Aug 5, 2021
- EBARA CORPORATION
- Nobuyuki TAKADA
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20210193494
- Publication date Jun 24, 2021
- EBARA CORPORATION
- Nobuyuki TAKADA
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING APPARATUS
- Publication number 20200361056
- Publication date Nov 19, 2020
- EBARA CORPORATION
- Makoto Fukushima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE POLISHING DEVICE AND SUBSTRATE POLISHING METHOD
- Publication number 20200269383
- Publication date Aug 27, 2020
- EBARA CORPORATION
- Hozumi YASUDA
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING MACHINE AND A POLISHING METHOD FOR A SUBSTRATE
- Publication number 20200171618
- Publication date Jun 4, 2020
- EBARA CORPORATION
- Itsuki KOBATA
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING HEAD AND POLISHING APPARATUS
- Publication number 20200094371
- Publication date Mar 26, 2020
- EBARA CORPORATION
- Kenichi Akazawa
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE HOLDING DEVICE, SUBSTRATE POLISHING APPARATUS, AND METHOD...
- Publication number 20200047308
- Publication date Feb 13, 2020
- EBARA CORPORATION
- Shingo TOGASHI
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE PROCESSING CONTROL SYSTEM, SUBSTRATE PROCESSING CONTROL M...
- Publication number 20190240799
- Publication date Aug 8, 2019
- EBARA CORPORATION
- Koichi TAKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING APPARATUS
- Publication number 20190224808
- Publication date Jul 25, 2019
- EBARA CORPORATION
- Osamu Nabeya
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE POLISHER AND POLISHING METHOD
- Publication number 20180236630
- Publication date Aug 23, 2018
- EBARA CORPORATION
- Hozumi YASUDA
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE POLISHING METHOD, TOP RING, AND SUBSTRATE POLISHING APPAR...
- Publication number 20170266779
- Publication date Sep 21, 2017
- EBARA CORPORATION
- Shintaro Isono
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING MACHINE AND A POLISHING METHOD FOR A SUBSTRATE
- Publication number 20170259395
- Publication date Sep 14, 2017
- EBARA CORPORATION
- Itsuki KOBATA
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING APPARATUS, CONTROL METHOD AND RECORDING MEDIUM
- Publication number 20170173756
- Publication date Jun 22, 2017
- EBARA CORPORATION
- Satoru Yamaki
- B24 - GRINDING POLISHING
Information Patent Application
ELASTIC MEMBRANE, SUBSTRATE HOLDING APPARATUS, AND POLISHING APPARATUS
- Publication number 20170144267
- Publication date May 25, 2017
- EBARA CORPORATION
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE HOLDING DEVICE, SUBSTRATE POLISHING APPARATUS, AND METHOD...
- Publication number 20170106497
- Publication date Apr 20, 2017
- EBARA CORPORATION
- Shingo TOGASHI
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING APPARATUS AND POLISHING METHOD
- Publication number 20170057049
- Publication date Mar 2, 2017
- EBARA CORPORATION
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING APPARATUS, POLISHING HEAD, AND RETAINER RING
- Publication number 20160368115
- Publication date Dec 22, 2016
- EBARA CORPORATION
- Hozumi YASUDA
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING APPARATUS
- Publication number 20160250735
- Publication date Sep 1, 2016
- EBARA CORPORATION
- Osamu Nabeya
- B24 - GRINDING POLISHING
Information Patent Application
RETAINER RING, SUBSTRATE HOLDING APPARATUS, AND POLISHING APPARATUS...
- Publication number 20160243670
- Publication date Aug 25, 2016
- EBARA CORPORATION
- Makoto FUKUSHIMA
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING APPARATUS
- Publication number 20160176009
- Publication date Jun 23, 2016
- EBARA CORPORATION
- Hiroshi YOSHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING APPARATUS AND POLISHING METHOD
- Publication number 20160074989
- Publication date Mar 17, 2016
- EBARA CORPORATION
- Makoto FUKUSHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING APPARATUS AND POLISHING METHOD
- Publication number 20150311097
- Publication date Oct 29, 2015
- EBARA CORPORATION
- Hiroshi YOSHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLISHING DEVICE AND POLISHING METHOD
- Publication number 20150273650
- Publication date Oct 1, 2015
- EBARA CORPORATION
- Keisuke Namiki
- B24 - GRINDING POLISHING
Information Patent Application
ELASTIC MEMBRANE, SUBSTRATE HOLDING APPARATUS, AND POLISHING APPARATUS
- Publication number 20150273657
- Publication date Oct 1, 2015
- EBARA CORPORATION
- Makoto Fukushima
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE HOLDING APPARATUS AND POLISHING APPARATUS
- Publication number 20150202733
- Publication date Jul 23, 2015
- EBARA CORPORATION
- Hozumi YASUDA
- H01 - BASIC ELECTRIC ELEMENTS

Hozumi Yasuda

Person

Patents Grantslast 30 patents

Substrate processing apparatus and substrate processing method

Polishing apparatus

Substrate processing control system, substrate processing control m...

Polishing head system and polishing apparatus

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Polishing head and polishing apparatus

Substrate holding device, substrate polishing apparatus, and method...

Polishing machine and a polishing method for a substrate

Polishing apparatus

Polishing apparatus

Substrate holding device, and substrate polishing apparatus

Substrate polishing method, top ring, and substrate polishing appar...

Substrate holding apparatus and polishing apparatus

Polishing apparatus and polishing method

Polishing apparatus, control method and recording medium

Polishing apparatus

Elastic membrane, substrate holding apparatus, and polishing apparatus

Polishing apparatus, polishing head, and retainer ring

Polishing apparatus

Polishing apparatus, polishing head, and retainer ring

Polishing device and polishing method

Elastic membrane for semiconductor wafer polishing apparatus

Elastic membrane and substrate holding apparatus

Elastic membrane for semiconductor wafer polishing apparatus

Substrate holder, polishing apparatus, polishing method, and retain...

Substrate retaining ring

Retainer ring for substrate

Substrate retaining ring

Polishing apparatus

Patents Applicationslast 30 patents

CHEMICAL MECHANICAL POLISHING SYSTEM AND CHEMICAL MECHANICAL POLISH...

SUBSTRATE PROCESSING CONTROL SYSTEM, SUBSTRATE PROCESSING CONTROL M...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

CHEMICAL MECHANICAL POLISHING SYSTEM FOR A WORKPIECE, ARITHMETIC SY...

POLISHING HEAD SYSTEM AND POLISHING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

POLISHING APPARATUS

SUBSTRATE POLISHING DEVICE AND SUBSTRATE POLISHING METHOD

POLISHING MACHINE AND A POLISHING METHOD FOR A SUBSTRATE

POLISHING HEAD AND POLISHING APPARATUS

SUBSTRATE HOLDING DEVICE, SUBSTRATE POLISHING APPARATUS, AND METHOD...

SUBSTRATE PROCESSING CONTROL SYSTEM, SUBSTRATE PROCESSING CONTROL M...

POLISHING APPARATUS

SUBSTRATE POLISHER AND POLISHING METHOD

SUBSTRATE POLISHING METHOD, TOP RING, AND SUBSTRATE POLISHING APPAR...

POLISHING MACHINE AND A POLISHING METHOD FOR A SUBSTRATE

POLISHING APPARATUS, CONTROL METHOD AND RECORDING MEDIUM

ELASTIC MEMBRANE, SUBSTRATE HOLDING APPARATUS, AND POLISHING APPARATUS

SUBSTRATE HOLDING DEVICE, SUBSTRATE POLISHING APPARATUS, AND METHOD...

POLISHING APPARATUS AND POLISHING METHOD

POLISHING APPARATUS, POLISHING HEAD, AND RETAINER RING

POLISHING APPARATUS

RETAINER RING, SUBSTRATE HOLDING APPARATUS, AND POLISHING APPARATUS...

POLISHING APPARATUS

POLISHING APPARATUS AND POLISHING METHOD

POLISHING APPARATUS AND POLISHING METHOD

POLISHING DEVICE AND POLISHING METHOD

ELASTIC MEMBRANE, SUBSTRATE HOLDING APPARATUS, AND POLISHING APPARATUS

SUBSTRATE HOLDING APPARATUS AND POLISHING APPARATUS