Hu Kang

Person

Tualatin, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Dynamic precursor dosing for atomic layer deposition
- Patent number 11,970,772
- Issue date Apr 30, 2024
- Lam Research Corporation
- Purushottam Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of atomic layer deposition
- Patent number 11,670,503
- Issue date Jun 6, 2023
- Lam Research Corporation
- Jun Qian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ultrathin atomic layer deposition film accuracy thickness control
- Patent number 11,646,198
- Issue date May 9, 2023
- Lam Research Corporation
- Jun Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-cycle ALD process for film uniformity and thickness profile m...
- Patent number 11,479,856
- Issue date Oct 25, 2022
- Lam Research Corporation
- Purushottam Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing system with tandem source activation for CVD
- Patent number 11,434,567
- Issue date Sep 6, 2022
- Lam Research Corporation
- Adrien LaVoie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dynamic precursor dosing for atomic layer deposition
- Patent number 11,180,850
- Issue date Nov 23, 2021
- Lam Research Corporation
- Purushottam Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gapfill of variable aspect ratio features with a composite PEALD an...
- Patent number 11,133,180
- Issue date Sep 28, 2021
- Lam Research Corporation
- Hu Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for suppressing parasitic plasma and reducing w...
- Patent number 11,127,567
- Issue date Sep 21, 2021
- Lam Research Corporation
- Hu Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ultrathin atomic layer deposition film accuracy thickness control
- Patent number 11,101,129
- Issue date Aug 24, 2021
- Lam Research Corporation
- Jun Qian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for depositing films on sensitive substrates
- Patent number 10,741,458
- Issue date Aug 11, 2020
- Novellus Systems, Inc.
- Hu Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low volume showerhead with porous baffle
- Patent number 10,741,365
- Issue date Aug 11, 2020
- Lam Research Corporation
- Ramesh Chandrasekharan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for suppressing parasitic plasma and reducing w...
- Patent number 10,665,429
- Issue date May 26, 2020
- Lam Research Corporation
- Hu Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tandem source activation for CVD of films
- Patent number 10,577,688
- Issue date Mar 3, 2020
- Lam Research Corporation
- Adrien LaVoie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Single ALD cycle thickness control in multi-station substrate depos...
- Patent number 10,577,691
- Issue date Mar 3, 2020
- Lam Research Corporation
- Romuald Nowak
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ultrathin atomic layer deposition film accuracy thickness control
- Patent number 10,566,187
- Issue date Feb 18, 2020
- Lam Research Corporation
- Jun Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hardware and process for film uniformity improvement
- Patent number 10,526,700
- Issue date Jan 7, 2020
- Lam Research Corporation
- Purushottam Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-cycle ALD process for film uniformity and thickness profile m...
- Patent number 10,526,701
- Issue date Jan 7, 2020
- Lam Research Corporation
- Purushottam Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatuses for showerhead backside parasitic plasma su...
- Patent number 10,407,773
- Issue date Sep 10, 2019
- Lam Research Corporation
- Adrien LaVoie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low volume showerhead with faceplate holes for improved flow unifor...
- Patent number 10,378,107
- Issue date Aug 13, 2019
- Lam Research Corporation
- Ramesh Chandrasekharan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gapfill of variable aspect ratio features with a composite PEALD an...
- Patent number 10,361,076
- Issue date Jul 23, 2019
- Lam Research Corporation
- Hu Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Hardware and process for film uniformity improvement
- Patent number 10,100,407
- Issue date Oct 16, 2018
- Lam Research Corporation
- Purushottam Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dynamic precursor dosing for atomic layer deposition
- Patent number 10,094,018
- Issue date Oct 9, 2018
- Lam Research Corporation
- Purushottam Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for depositing films on sensitive substrates
- Patent number 10,008,428
- Issue date Jun 26, 2018
- Novellus Systems, Inc.
- Hu Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for vapor delivery in a substrate processing sy...
- Patent number 9,970,108
- Issue date May 15, 2018
- Lam Research Corporation
- Jun Qian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inhibitor plasma mediated atomic layer deposition for seamless feat...
- Patent number 9,966,299
- Issue date May 8, 2018
- Lam Research Corporation
- Wei Tang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for removing particles from a substrate process...
- Patent number 9,899,195
- Issue date Feb 20, 2018
- Lam Research Corporation
- Hu Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Variable temperature hardware and methods for reduction of wafer ba...
- Patent number 9,870,917
- Issue date Jan 16, 2018
- Lam Research Corporation
- Hu Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Single ALD cycle thickness control in multi-station substrate depos...
- Patent number 9,797,042
- Issue date Oct 24, 2017
- Lam Research Corporation
- Romuald Nowak
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gapfill of variable aspect ratio features with a composite PEALD an...
- Patent number 9,793,110
- Issue date Oct 17, 2017
- Lam Research Corporation
- Hu Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for suppressing parasitic plasma and reducing w...
- Patent number 9,793,096
- Issue date Oct 17, 2017
- Lam Research Corporation
- Hu Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SHOWERHEAD TEMPERATURE BASED DEPOSITION TIME COMPENSATION FOR THICK...
- Publication number 20240344201
- Publication date Oct 17, 2024
- LAM RESEARCH CORPORATION
- Dong WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DYNAMIC PRECURSOR DOSING FOR ATOMIC LAYER DEPOSITION
- Publication number 20240240316
- Publication date Jul 18, 2024
- LAM RESEARCH CORPORATION
- Purushottam Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ULTRATHIN ATOMIC LAYER DEPOSITION FILM ACCURACY THICKNESS CONTROL
- Publication number 20230298884
- Publication date Sep 21, 2023
- LAM RESEARCH CORPORATION
- Jun Qian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAPFILL OF VARIABLE ASPECT RATIO FEATURES WITH A COMPOSITE PEALD AN...
- Publication number 20220059348
- Publication date Feb 24, 2022
- LAM RESEARCH CORPORATION
- Hu Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DYNAMIC PRECURSOR DOSING FOR ATOMIC LAYER DEPOSITION
- Publication number 20220033967
- Publication date Feb 3, 2022
- LAM RESEARCH CORPORATION
- Purushottam Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ULTRATHIN ATOMIC LAYER DEPOSITION FILM ACCURACY THICKNESS CONTROL
- Publication number 20210343520
- Publication date Nov 4, 2021
- LAM RESEARCH CORPORATION
- Jun Qian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS FOR SUPPRESSING PARASITIC PLASMA AND REDUCING W...
- Publication number 20200335304
- Publication date Oct 22, 2020
- LAM RESEARCH CORPORATION
- Hu Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM WITH TANDEM SOURCE ACTIVATION FOR CVD
- Publication number 20200199747
- Publication date Jun 25, 2020
- LAM RESEARCH CORPORATION
- Adrien LAVOIE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ULTRATHIN ATOMIC LAYER DEPOSITION FILM ACCURACY THICKNESS CONTROL
- Publication number 20200152446
- Publication date May 14, 2020
- LAM RESEARCH CORPORATION
- Jun Qian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-CYCLE ALD PROCESS FOR FILM UNIFORMITY AND THICKNESS PROFILE M...
- Publication number 20200087786
- Publication date Mar 19, 2020
- LAM RESEARCH CORPORATION
- Purushottam Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ULTRATHIN ATOMIC LAYER DEPOSITION FILM ACCURACY THICKNESS CONTROL
- Publication number 20190378710
- Publication date Dec 12, 2019
- LAM RESEARCH CORPORATION
- Jun Qian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAPFILL OF VARIABLE ASPECT RATIO FEATURES WITH A COMPOSITE PEALD AN...
- Publication number 20190311897
- Publication date Oct 10, 2019
- LAM RESEARCH CORPORATION
- Hu Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HARDWARE AND PROCESS FOR FILM UNIFORMITY IMPROVEMENT
- Publication number 20190040528
- Publication date Feb 7, 2019
- LAM RESEARCH CORPORATION
- Purushottam Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DYNAMIC PRECURSOR DOSING FOR ATOMIC LAYER DEPOSITION
- Publication number 20190024233
- Publication date Jan 24, 2019
- Lam Research Corporation
- Purushottam Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR DEPOSITING FILMS ON SENSITIVE SUBSTRATES
- Publication number 20180247875
- Publication date Aug 30, 2018
- Novellus Systems, Inc.
- Hu Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS FOR SUPPRESSING PARASITIC PLASMA AND REDUCING W...
- Publication number 20180068833
- Publication date Mar 8, 2018
- LAM RESEARCH CORPORATION
- Hu Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SINGLE ALD CYCLE THICKNESS CONTROL IN MULTI-STATION SUBSTRATE DEPOS...
- Publication number 20180010250
- Publication date Jan 11, 2018
- LAM RESEARCH CORPORATION
- Romuald Nowak
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DYNAMIC PRECURSOR DOSING FOR ATOMIC LAYER DEPOSITION
- Publication number 20170362705
- Publication date Dec 21, 2017
- LAM RESEARCH CORPORATION
- Purushottam Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TANDEM SOURCE ACTIVATION FOR CVD OF FILMS
- Publication number 20170327947
- Publication date Nov 16, 2017
- LAM RESEARCH CORPORATION
- Adrien LaVoie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAPFILL OF VARIABLE ASPECT RATIO FEATURES WITH A COMPOSITE PEALD AN...
- Publication number 20170323786
- Publication date Nov 9, 2017
- LAM RESEARCH CORPORATION
- Hu Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHAMBER UNDERCOAT PREPARATION METHOD FOR LOW TEMPERATURE ALD FILMS
- Publication number 20170314128
- Publication date Nov 2, 2017
- Lam Research Corporation
- Hu Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR DEPOSITING FILMS ON SENSITIVE SUBSTRATES
- Publication number 20170316988
- Publication date Nov 2, 2017
- Novellus Systems, Inc.
- Hu Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VARIABLE TEMPERATURE HARDWARE AND METHODS FOR REDUCTION OF WAFER BA...
- Publication number 20170178898
- Publication date Jun 22, 2017
- LAM RESEARCH CORPORATION
- Hu Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUSES FOR SHOWERHEAD BACKSIDE PARASITIC PLASMA SU...
- Publication number 20170167017
- Publication date Jun 15, 2017
- LAM RESEARCH CORPORATION
- Adrien LaVoie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DYNAMIC PRECURSOR DOSING FOR ATOMIC LAYER DEPOSITION
- Publication number 20170096735
- Publication date Apr 6, 2017
- LAM RESEARCH CORPORATION
- Purushottam Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS FOR REMOVING PARTICLES FROM A SUBSTRATE PROCESS...
- Publication number 20170011893
- Publication date Jan 12, 2017
- LAM RESEARCH CORPORATION
- Hu Kang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTI-CYCLE ALD PROCESS FOR FILM UNIFORMITY AND THICKNESS PROFILE M...
- Publication number 20170009346
- Publication date Jan 12, 2017
- LAM RESEARCH CORPORATION
- Purushottam Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW VOLUME SHOWERHEAD WITH FACEPLATE HOLES FOR IMPROVED FLOW UNIFOR...
- Publication number 20160340782
- Publication date Nov 24, 2016
- LAM RESEARCH CORPORATION
- Ramesh Chandrasekharan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INHIBITOR PLASMA MEDIATED ATOMIC LAYER DEPOSITION FOR SEAMLESS FEAT...
- Publication number 20160329238
- Publication date Nov 10, 2016
- LAM RESEARCH CORPORATION
- Wei Tang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS OF MODULATING RESIDUAL STRESS IN THIN FILMS
- Publication number 20160329206
- Publication date Nov 10, 2016
- LAM RESEARCH CORPORATION
- Purushottam Kumar
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Dynamic precursor dosing for atomic layer deposition

Method of atomic layer deposition

Ultrathin atomic layer deposition film accuracy thickness control

Multi-cycle ALD process for film uniformity and thickness profile m...

Substrate processing system with tandem source activation for CVD

Dynamic precursor dosing for atomic layer deposition

Gapfill of variable aspect ratio features with a composite PEALD an...

Systems and methods for suppressing parasitic plasma and reducing w...

Ultrathin atomic layer deposition film accuracy thickness control

Methods for depositing films on sensitive substrates

Low volume showerhead with porous baffle

Systems and methods for suppressing parasitic plasma and reducing w...

Tandem source activation for CVD of films

Single ALD cycle thickness control in multi-station substrate depos...

Ultrathin atomic layer deposition film accuracy thickness control

Hardware and process for film uniformity improvement

Multi-cycle ALD process for film uniformity and thickness profile m...

Methods and apparatuses for showerhead backside parasitic plasma su...

Low volume showerhead with faceplate holes for improved flow unifor...

Gapfill of variable aspect ratio features with a composite PEALD an...

Hardware and process for film uniformity improvement

Dynamic precursor dosing for atomic layer deposition

Methods for depositing films on sensitive substrates

Systems and methods for vapor delivery in a substrate processing sy...

Inhibitor plasma mediated atomic layer deposition for seamless feat...

Systems and methods for removing particles from a substrate process...

Variable temperature hardware and methods for reduction of wafer ba...

Single ALD cycle thickness control in multi-station substrate depos...

Gapfill of variable aspect ratio features with a composite PEALD an...

Systems and methods for suppressing parasitic plasma and reducing w...

Patents Applicationslast 30 patents

SHOWERHEAD TEMPERATURE BASED DEPOSITION TIME COMPENSATION FOR THICK...

DYNAMIC PRECURSOR DOSING FOR ATOMIC LAYER DEPOSITION

ULTRATHIN ATOMIC LAYER DEPOSITION FILM ACCURACY THICKNESS CONTROL

GAPFILL OF VARIABLE ASPECT RATIO FEATURES WITH A COMPOSITE PEALD AN...

DYNAMIC PRECURSOR DOSING FOR ATOMIC LAYER DEPOSITION

ULTRATHIN ATOMIC LAYER DEPOSITION FILM ACCURACY THICKNESS CONTROL

SYSTEMS AND METHODS FOR SUPPRESSING PARASITIC PLASMA AND REDUCING W...

SUBSTRATE PROCESSING SYSTEM WITH TANDEM SOURCE ACTIVATION FOR CVD

ULTRATHIN ATOMIC LAYER DEPOSITION FILM ACCURACY THICKNESS CONTROL

MULTI-CYCLE ALD PROCESS FOR FILM UNIFORMITY AND THICKNESS PROFILE M...

ULTRATHIN ATOMIC LAYER DEPOSITION FILM ACCURACY THICKNESS CONTROL

GAPFILL OF VARIABLE ASPECT RATIO FEATURES WITH A COMPOSITE PEALD AN...

HARDWARE AND PROCESS FOR FILM UNIFORMITY IMPROVEMENT

DYNAMIC PRECURSOR DOSING FOR ATOMIC LAYER DEPOSITION

METHODS FOR DEPOSITING FILMS ON SENSITIVE SUBSTRATES

SYSTEMS AND METHODS FOR SUPPRESSING PARASITIC PLASMA AND REDUCING W...

SINGLE ALD CYCLE THICKNESS CONTROL IN MULTI-STATION SUBSTRATE DEPOS...

DYNAMIC PRECURSOR DOSING FOR ATOMIC LAYER DEPOSITION

TANDEM SOURCE ACTIVATION FOR CVD OF FILMS

GAPFILL OF VARIABLE ASPECT RATIO FEATURES WITH A COMPOSITE PEALD AN...

CHAMBER UNDERCOAT PREPARATION METHOD FOR LOW TEMPERATURE ALD FILMS

METHODS FOR DEPOSITING FILMS ON SENSITIVE SUBSTRATES

VARIABLE TEMPERATURE HARDWARE AND METHODS FOR REDUCTION OF WAFER BA...

METHODS AND APPARATUSES FOR SHOWERHEAD BACKSIDE PARASITIC PLASMA SU...

DYNAMIC PRECURSOR DOSING FOR ATOMIC LAYER DEPOSITION

SYSTEMS AND METHODS FOR REMOVING PARTICLES FROM A SUBSTRATE PROCESS...

MULTI-CYCLE ALD PROCESS FOR FILM UNIFORMITY AND THICKNESS PROFILE M...

LOW VOLUME SHOWERHEAD WITH FACEPLATE HOLES FOR IMPROVED FLOW UNIFOR...

INHIBITOR PLASMA MEDIATED ATOMIC LAYER DEPOSITION FOR SEAMLESS FEAT...

METHODS OF MODULATING RESIDUAL STRESS IN THIN FILMS