Hua-Yu Liu

Person

Palo Alto, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Correction for flare effects in lithography system
- Patent number 10,423,745
- Issue date Sep 24, 2019
- ASML Netherlands B.V.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lens heating aware source mask optimization for advanced lithography
- Patent number 9,940,427
- Issue date Apr 10, 2018
- ASML Netherlands B.V.
- Michael Matthew M. Crouse
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern selection for full-chip source and mask optimization
- Patent number 9,934,350
- Issue date Apr 3, 2018
- ASML Netherlands B.V.
- Hua-Yu Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern selection for full-chip source and mask optimization
- Patent number 9,183,324
- Issue date Nov 10, 2015
- ASML Netherlands B.V.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Correction for flare effects in lithography system
- Patent number 8,887,104
- Issue date Nov 11, 2014
- ASML Netherlands B.V.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of pattern selection for source and mask optimization
- Patent number 8,739,082
- Issue date May 27, 2014
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Selection of optimum patterns in a design layout based on diffracti...
- Patent number 8,543,947
- Issue date Sep 24, 2013
- ASML Netherlands B.V.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pattern selection for full-chip source and mask optimization
- Patent number 8,438,508
- Issue date May 7, 2013
- ASML Netherlands B.V.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for creating a focus-exposure model of a lithogra...
- Patent number 8,245,160
- Issue date Aug 14, 2012
- ASML Netherlands B.V.
- Jun Ye
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for creating a focus-exposure model of a lithogra...
- Patent number 8,065,636
- Issue date Nov 22, 2011
- ASML Netherlands B.V.
- Jun Ye
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for creating a focus-exposure model of a lithogra...
- Patent number 7,747,978
- Issue date Jun 29, 2010
- ASML Netherlands B.V.
- Jun Ye
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cell library that can automatically avoid forbidden pitches
- Patent number 7,251,377
- Issue date Jul 31, 2007
- Synopsys, Inc.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Alternating phase shift mask design conflict resolution
- Patent number 7,178,128
- Issue date Feb 13, 2007
- Synopsys Inc.
- Hua-Yu Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Simulation-based selection of evaluation points for model-based opt...
- Patent number 7,082,596
- Issue date Jul 25, 2006
- Synopsys, Inc.
- Hua-Yu Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method to determine impact of line end shortening
- Patent number 6,944,844
- Issue date Sep 13, 2005
- Synopsys, Inc.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Alleviating line end shortening by extending phase shifters
- Patent number 6,859,918
- Issue date Feb 22, 2005
- Numerical Technologies
- Melody W. Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for correcting 3D effects in an alternating phase...
- Patent number 6,830,854
- Issue date Dec 14, 2004
- Numerical Technologies, Inc.
- Yong Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Hybrid optical proximity correction for alternating aperture phase...
- Patent number 6,813,759
- Issue date Nov 2, 2004
- Numerical Technologies, Inc.
- Hua-yu Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Automated flow in PSM phase assignment
- Patent number 6,704,921
- Issue date Mar 9, 2004
- Numerical Technologies, Inc.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Microloading effect correction
- Patent number 6,684,382
- Issue date Jan 27, 2004
- Numerical Technologies, Inc.
- Hua-Yu Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for correcting 3D effects in an alternating phase...
- Patent number 6,670,082
- Issue date Dec 30, 2003
- Numerical Technologies, Inc.
- Yong Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for allowing phase conflicts in phase shifting...
- Patent number 6,664,009
- Issue date Dec 16, 2003
- Numerical Technologies, Inc.
- Hua-Yu Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for reducing incidental exposure by using a ph...
- Patent number 6,573,010
- Issue date Jun 3, 2003
- Numerical Technologies, Inc.
- Michael E. Kling
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Using double exposure effects during phase shifting to control line...
- Patent number 6,566,019
- Issue date May 20, 2003
- Numerical Technologies, Inc.
- Michael E. Kling
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alleviating line end shortening in transistor endcaps by extending...
- Patent number 6,553,560
- Issue date Apr 22, 2003
- Numerical Technologies, Inc.
- Melody W. Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alternating phase shift mask design conflict resolution
- Patent number 6,523,165
- Issue date Feb 18, 2003
- Numerical Technologies, Inc.
- Hua-Yu Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Single pass compensation for electron beam proximity effect
- Patent number 5,254,438
- Issue date Oct 19, 1993
- Hewlett-Packard Company
- Geraint Owen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for compensating for the E-beam proximity effect
- Patent number 4,988,284
- Issue date Jan 29, 1991
- Hewlett-Packard Company
- Hua-yu Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PATTERN SELECTION FOR FULL-CHIP SOURCE AND MASK OPTIMIZATION
- Publication number 20160026750
- Publication date Jan 28, 2016
- ASML NETHERLANDS B.V.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CORRECTION FOR FLARE EFFECTS IN LITHOGRAPHY SYSTEM
- Publication number 20150058815
- Publication date Feb 26, 2015
- ASML NETHERLANDS B.V.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PATTERN SELECTION FOR FULL-CHIP SOURCE AND MASK OPTIMIZATION
- Publication number 20130311958
- Publication date Nov 21, 2013
- ASML NETHERLANDS B.V.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LENS HEATING AWARE SOURCE MASK OPTIMIZATION FOR ADVANCED LITHOGRAPHY
- Publication number 20130212543
- Publication date Aug 15, 2013
- ASML NETHERLANDS B.V.
- Michael Matthew M. CROUSE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CORRECTION FOR FLARE EFFECTS IN LITHOGRAPHY SYSTEM
- Publication number 20130185681
- Publication date Jul 18, 2013
- ASML NETHERLANDS B.V.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method of Pattern Selection for Source and Mask Optimization
- Publication number 20120216156
- Publication date Aug 23, 2012
- ASML NETHERLANDS B.V.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
System and Method for Creating a Focus-Exposure Model of a Lithogra...
- Publication number 20120017183
- Publication date Jan 19, 2012
- ASML NETHERLANDS B.V.
- Jun YE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Selection of Optimum Patterns in a Design Layout Based on Diffracti...
- Publication number 20110107280
- Publication date May 5, 2011
- ASML NETHERLANDS B.V.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Pattern Selection for Full-Chip Source and Mask Optimization
- Publication number 20110099526
- Publication date Apr 28, 2011
- ASML NETHERLANDS B.V.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEM AND METHOD FOR CREATING A FOCUS-EXPOSURE MODEL OF A LITHOGRA...
- Publication number 20100229147
- Publication date Sep 9, 2010
- ASML NETHERLANDS B.V.
- Jun YE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR CREATING A FOCUS-EXPOSURE MODEL OF A LITHOGRA...
- Publication number 20070031745
- Publication date Feb 8, 2007
- BRION TECHNOLOGIES, INC.
- Jun Ye
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Cell library that can automatically avoid forbidden pitches
- Publication number 20040218831
- Publication date Nov 4, 2004
- NUMERICAL TECHNOLOGIES, INC.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Simulation-based selection of evaluation points for model-based opt...
- Publication number 20040102945
- Publication date May 27, 2004
- Numerical Technologies Inc.
- Hua-Yu Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for correcting 3D effects in an alternating phase...
- Publication number 20040076895
- Publication date Apr 22, 2004
- NUMERICAL TECHNOLOGIES, INC.
- Yong Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Hybrid optical proximity correction for alternating aperture phase...
- Publication number 20040049761
- Publication date Mar 11, 2004
- Numerical Technologies, Inc.
- Hua-yu Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Automated flow in PSM phase assignment
- Publication number 20030192025
- Publication date Oct 9, 2003
- NUMERICAL TECHNOLOGIES, INC.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method and apparatus to facilitate test pattern design for model ca...
- Publication number 20030192015
- Publication date Oct 9, 2003
- Numerical Technologies, Inc.
- Hua-Yu Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method to determine impact of line end shortening
- Publication number 20030192012
- Publication date Oct 9, 2003
- NUMERICAL TECHNOLOGIES, INC.
- Hua-Yu Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
System and method for determining manufacturing error enhancement f...
- Publication number 20030121021
- Publication date Jun 26, 2003
- Numerical Technologies, Inc.
- Hua-Yu Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for correcting 3D effects in an alternating phase...
- Publication number 20030068564
- Publication date Apr 10, 2003
- Numerical Technologies
- Yong Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alleviating line end shortening by extending phase shifters
- Publication number 20030066038
- Publication date Apr 3, 2003
- Numerical Technologies, Inc.
- Melody W. Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alternating phase shift mask design conflict resolution
- Publication number 20030056190
- Publication date Mar 20, 2003
- NUMERICAL TECHNOLOGIES, INC.
- Hua-Yu Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Microloading effect correction
- Publication number 20030046653
- Publication date Mar 6, 2003
- Numerical Technologies, Inc.
- Hua-Yu Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for allowing phase conflicts in phase shifting...
- Publication number 20030023401
- Publication date Jan 30, 2003
- NUMERICAL TECHNOLOGIES, INC.
- Hua-Yu Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALTERNATING PHASE SHIFT MASK DESIGN CONFLICT RESOLUTION
- Publication number 20030014732
- Publication date Jan 16, 2003
- NUMERICAL TECHNOLOGIES, INC.
- Hua-Yu Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alleviating line end shortening in transistor endcaps by extending...
- Publication number 20020144232
- Publication date Oct 3, 2002
- Numerical Technologies, Inc.
- Melody W. Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for reducing incidental exposure by using a ph...
- Publication number 20020142231
- Publication date Oct 3, 2002
- Numerical Technologies, Inc.
- Michael E. Kling
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Using double exposure effects during phase shifting to control line...
- Publication number 20020142232
- Publication date Oct 3, 2002
- Numerical Technologies, Inc.
- Michael E. Kling
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Person

Patents Grantslast 30 patents

Correction for flare effects in lithography system

Lens heating aware source mask optimization for advanced lithography

Pattern selection for full-chip source and mask optimization

Pattern selection for full-chip source and mask optimization

Correction for flare effects in lithography system

Method of pattern selection for source and mask optimization

Selection of optimum patterns in a design layout based on diffracti...

Pattern selection for full-chip source and mask optimization

System and method for creating a focus-exposure model of a lithogra...

System and method for creating a focus-exposure model of a lithogra...

System and method for creating a focus-exposure model of a lithogra...

Cell library that can automatically avoid forbidden pitches

Alternating phase shift mask design conflict resolution

Simulation-based selection of evaluation points for model-based opt...

System and method to determine impact of line end shortening

Alleviating line end shortening by extending phase shifters

System and method for correcting 3D effects in an alternating phase...

Hybrid optical proximity correction for alternating aperture phase...

Automated flow in PSM phase assignment

Microloading effect correction

System and method for correcting 3D effects in an alternating phase...

Method and apparatus for allowing phase conflicts in phase shifting...

Method and apparatus for reducing incidental exposure by using a ph...

Using double exposure effects during phase shifting to control line...

Alleviating line end shortening in transistor endcaps by extending...

Alternating phase shift mask design conflict resolution

Single pass compensation for electron beam proximity effect

Method for compensating for the E-beam proximity effect

Patents Applicationslast 30 patents

PATTERN SELECTION FOR FULL-CHIP SOURCE AND MASK OPTIMIZATION

CORRECTION FOR FLARE EFFECTS IN LITHOGRAPHY SYSTEM

PATTERN SELECTION FOR FULL-CHIP SOURCE AND MASK OPTIMIZATION

LENS HEATING AWARE SOURCE MASK OPTIMIZATION FOR ADVANCED LITHOGRAPHY

CORRECTION FOR FLARE EFFECTS IN LITHOGRAPHY SYSTEM

Method of Pattern Selection for Source and Mask Optimization

System and Method for Creating a Focus-Exposure Model of a Lithogra...

Selection of Optimum Patterns in a Design Layout Based on Diffracti...

Pattern Selection for Full-Chip Source and Mask Optimization

SYSTEM AND METHOD FOR CREATING A FOCUS-EXPOSURE MODEL OF A LITHOGRA...

SYSTEM AND METHOD FOR CREATING A FOCUS-EXPOSURE MODEL OF A LITHOGRA...

Cell library that can automatically avoid forbidden pitches

Simulation-based selection of evaluation points for model-based opt...

System and method for correcting 3D effects in an alternating phase...

Hybrid optical proximity correction for alternating aperture phase...

Automated flow in PSM phase assignment

Method and apparatus to facilitate test pattern design for model ca...

System and method to determine impact of line end shortening

System and method for determining manufacturing error enhancement f...

System and method for correcting 3D effects in an alternating phase...

Alleviating line end shortening by extending phase shifters

Alternating phase shift mask design conflict resolution

Microloading effect correction

Method and apparatus for allowing phase conflicts in phase shifting...

ALTERNATING PHASE SHIFT MASK DESIGN CONFLICT RESOLUTION

Alleviating line end shortening in transistor endcaps by extending...

Method and apparatus for reducing incidental exposure by using a ph...

Using double exposure effects during phase shifting to control line...