Hui-Min Mao

Person

Taipei, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Overlay alignment mark and alignment method for the fabrication of...
- Patent number 7,723,181
- Issue date May 25, 2010
- Nanya Technology Corp.
- An-Hsiung Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication method for a damascene bit line contact plug
- Patent number 7,678,692
- Issue date Mar 16, 2010
- Nanya Technology Corporation
- Yi-Nan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alignment mark and alignment method for the fabrication of trench-c...
- Patent number 7,419,882
- Issue date Sep 2, 2008
- Nanya Technology Corp.
- Yuan-Hsun Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication method for a damascene bit line contact plug
- Patent number 7,285,377
- Issue date Oct 23, 2007
- Nanya Technology Corporation
- Yi-Nan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Memory device with vertical transistors and deep trench capacitors...
- Patent number 7,211,483
- Issue date May 1, 2007
- Nanya Technology Corporation
- Yi-Nan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming bit line contact via
- Patent number 7,195,975
- Issue date Mar 27, 2007
- Nanya Technology Corporation
- Tzu-Ching Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contact etching utilizing partially recessed hard mask
- Patent number 7,135,783
- Issue date Nov 14, 2006
- Nanya Technology Corporation
- Wen-Kuei Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming contact holes
- Patent number 7,105,453
- Issue date Sep 12, 2006
- Nanya Technology Corporation
- Yi-Nan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contact etching utilizing multi-layer hard mask
- Patent number 7,064,044
- Issue date Jun 20, 2006
- Nanya Technology Corporation
- Yi-Nan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Memory device with vertical transistors and deep trench capacitors...
- Patent number 7,009,236
- Issue date Mar 7, 2006
- Nanya Technology Corporation
- Yi-Nan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of evaluating reticle pattern overlay registration
- Patent number 6,987,053
- Issue date Jan 17, 2006
- Nanya Technology Corporation
- Wen-Bin Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Contact etching utilizing multi-layer hard mask
- Patent number 6,987,322
- Issue date Jan 17, 2006
- Nanya Technology Corporation
- Yi-Nan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of a MOSFET gate
- Patent number 6,977,134
- Issue date Dec 20, 2005
- Nanya Technology Corporation
- Chung-Peng Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming metal plug
- Patent number 6,960,525
- Issue date Nov 1, 2005
- Nanya Technology Corporation
- Yi-Nan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Trench-capacitor DRAM cell having a folded gate conductor
- Patent number 6,909,136
- Issue date Jun 21, 2005
- Nanya Technology Corp.
- Yinan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for measuring depth of source and drain
- Patent number 6,838,866
- Issue date Jan 4, 2005
- Nanya Technology Corporation
- Tzu-Ching Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of metal etching post cleaning
- Patent number 6,833,081
- Issue date Dec 21, 2004
- Nanya Technology Corporation
- Yi-Nan Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming contact
- Patent number 6,790,765
- Issue date Sep 14, 2004
- Nanya Technology Corporation
- Tse-Yao Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming source/drain regions in semiconductor devices
- Patent number 6,790,735
- Issue date Sep 14, 2004
- Nanya Technology Corporation
- Hui-Min Mao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bit line contact structure and method for forming the same
- Patent number 6,780,739
- Issue date Aug 24, 2004
- Nanya Technology Corporation
- Hui-Min Mao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating shallow trench isolation
- Patent number 6,774,007
- Issue date Aug 10, 2004
- Nanya Technology Corporation
- Hsien-Wen Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming inter-metal dielectric
- Patent number 6,709,975
- Issue date Mar 23, 2004
- Nanya Technology Corporation
- Hui Min Mao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming buried plates
- Patent number 6,706,587
- Issue date Mar 16, 2004
- Nanya Technology Corporation
- Tzu-Ching Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for estimating capacitance of deep trench capacitors
- Patent number 6,703,311
- Issue date Mar 9, 2004
- Nänaya Technology Corporation
- Tzu-Ching Tsai
- G01 - MEASURING TESTING
Information Patent Grant
Method of providing planarity of a photoresist
- Patent number 6,541,347
- Issue date Apr 1, 2003
- Nanya Technology Corporation
- Tzu Ching Tsai
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
OVERLAY ALIGNMENT MARK AND ALIGNMENT METHOD FOR THE FABRICATION OF...
- Publication number 20070190736
- Publication date Aug 16, 2007
- An-Hsiung Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Fabrication Method for a Damascene Bit Line Contact Plug
- Publication number 20070099125
- Publication date May 3, 2007
- NANYA TECHNOLOGY CORPORATION
- Yi-Nan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Contact etching utilizing partially recessed hard mask
- Publication number 20070018341
- Publication date Jan 25, 2007
- NANYA TECHNOLOGY CORPORATION
- Wen-Kuei Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALIGNMENT MARK AND ALIGNMENT METHOD FOR THE FABRICATION OF TRENCH-C...
- Publication number 20060234440
- Publication date Oct 19, 2006
- Yuan-Hsun WU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of forming bit line contact via
- Publication number 20060118886
- Publication date Jun 8, 2006
- NANYA TECHNOLOGY CORPORATION
- Tzu-Ching Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Contact etching utilizing partially recessed hard mask
- Publication number 20050275111
- Publication date Dec 15, 2005
- NANYA TECHNOLOGY CORPORATION
- Wen-Kuei Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTACT ETCHING UTILIZING MULTI-LAYER HARD MASK
- Publication number 20050275107
- Publication date Dec 15, 2005
- NANYA TECHNOLOGY CORPORATION
- Yi-Nan Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Contact etching utilizing multi-layer hard mask
- Publication number 20050277287
- Publication date Dec 15, 2005
- NANYA TECHNOLOGY CORPORATION
- Yi-Nan Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Memory device with vertical transistors and deep trench capacitors...
- Publication number 20050167719
- Publication date Aug 4, 2005
- NANYA TECHNOLOGY CORPORATION
- Yi-Nan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of evaluating reticle pattern overlay registration
- Publication number 20050168740
- Publication date Aug 4, 2005
- NANYA TECHNOLOGY CORPORATION
- Wen-Bin Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Bit line contact hole and method for forming the same
- Publication number 20050164491
- Publication date Jul 28, 2005
- NANYA TECHNOLOGY CORPORATION
- Hui-Min Mao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for formimg contact holes
- Publication number 20050106887
- Publication date May 19, 2005
- Yi-Nan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of evaluating reticle pattern overlay registration
- Publication number 20050048654
- Publication date Mar 3, 2005
- Wen-Bin Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TRENCH-CAPACITOR DRAM CELL HAVING A FOLDED GATE CONDUCTOR
- Publication number 20050012131
- Publication date Jan 20, 2005
- Yinan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Memory device with vertical transistors and deep trench capacitors...
- Publication number 20050001256
- Publication date Jan 6, 2005
- NANYA TECHNOLOGY CORPORATION
- Yi-Nan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Fabrication method for a damascene bit line contact plug
- Publication number 20040219462
- Publication date Nov 4, 2004
- NANYA TECHNOLOGY CORPORATION
- Yi-Nan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Bit line contact hole and method for forming the same
- Publication number 20040201043
- Publication date Oct 14, 2004
- Hui-Min Mao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming bit line contact via
- Publication number 20040198008
- Publication date Oct 7, 2004
- NANYA TECHNOLOGY CORPORATION
- Tzu-Ching Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming metal plug
- Publication number 20040192026
- Publication date Sep 30, 2004
- NANYA TECHNOLOGY CORPORATION
- Yi-Nan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming source/drain regions in semiconductor devices
- Publication number 20040092074
- Publication date May 13, 2004
- NANYA TECHNOLOGY CORPORATION
- Hui-Min Mao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING BURIED PLATES
- Publication number 20040063279
- Publication date Apr 1, 2004
- NANYA TECHNOLOGY CORPORATION
- Tzu-Ching Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process for measuring depth of source and drain
- Publication number 20040021473
- Publication date Feb 5, 2004
- NANYA TECHNOLOGY CORPORATION
- Tzu-Ching Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Manufacturing method of a MOSFET gate
- Publication number 20030232285
- Publication date Dec 18, 2003
- NANYA TECHNOLOGY CORPORATION
- Chung-Peng Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of fabricating shallow trench isolation
- Publication number 20030201473
- Publication date Oct 30, 2003
- Hsien-Wen Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming inter-metal dielectric
- Publication number 20030199138
- Publication date Oct 23, 2003
- NANYA TECHNOLOGY CORPORATION
- Hui Min Mao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of metal etching post cleaning
- Publication number 20030116534
- Publication date Jun 26, 2003
- NANYA TECHNOLOGY CORPORATION
- Yi-Nan Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for estimating capacitance of deep trench capacitors
- Publication number 20030087527
- Publication date May 8, 2003
- NANYA TECHNOLOGY CORPORATION
- Tzu-Ching Tsai
- G01 - MEASURING TESTING
Information Patent Application
Method of improving planarity of a photoresist
- Publication number 20020048895
- Publication date Apr 25, 2002
- Tzu Ching Tsai
- H01 - BASIC ELECTRIC ELEMENTS

Hui-Min Mao

Person

Patents Grantslast 30 patents

Overlay alignment mark and alignment method for the fabrication of...

Fabrication method for a damascene bit line contact plug

Alignment mark and alignment method for the fabrication of trench-c...

Fabrication method for a damascene bit line contact plug

Memory device with vertical transistors and deep trench capacitors...

Method of forming bit line contact via

Contact etching utilizing partially recessed hard mask

Method for forming contact holes

Contact etching utilizing multi-layer hard mask

Memory device with vertical transistors and deep trench capacitors...

Method of evaluating reticle pattern overlay registration

Contact etching utilizing multi-layer hard mask

Manufacturing method of a MOSFET gate

Method of forming metal plug

Trench-capacitor DRAM cell having a folded gate conductor

Process for measuring depth of source and drain

Method of metal etching post cleaning

Method for forming contact

Method of forming source/drain regions in semiconductor devices

Bit line contact structure and method for forming the same

Method of fabricating shallow trench isolation

Method of forming inter-metal dielectric

Method for forming buried plates

Method for estimating capacitance of deep trench capacitors

Method of providing planarity of a photoresist

Patents Applicationslast 30 patents

OVERLAY ALIGNMENT MARK AND ALIGNMENT METHOD FOR THE FABRICATION OF...

Fabrication Method for a Damascene Bit Line Contact Plug

Contact etching utilizing partially recessed hard mask

ALIGNMENT MARK AND ALIGNMENT METHOD FOR THE FABRICATION OF TRENCH-C...

Method of forming bit line contact via

Contact etching utilizing partially recessed hard mask

CONTACT ETCHING UTILIZING MULTI-LAYER HARD MASK

Contact etching utilizing multi-layer hard mask

Memory device with vertical transistors and deep trench capacitors...

Method of evaluating reticle pattern overlay registration

Bit line contact hole and method for forming the same

Method for formimg contact holes

Method of evaluating reticle pattern overlay registration

TRENCH-CAPACITOR DRAM CELL HAVING A FOLDED GATE CONDUCTOR

Memory device with vertical transistors and deep trench capacitors...

Fabrication method for a damascene bit line contact plug

Bit line contact hole and method for forming the same

Method of forming bit line contact via

Method of forming metal plug

Method of forming source/drain regions in semiconductor devices

METHOD FOR FORMING BURIED PLATES

Process for measuring depth of source and drain

Manufacturing method of a MOSFET gate

Method of fabricating shallow trench isolation

Method of forming inter-metal dielectric

Method of metal etching post cleaning

Method for estimating capacitance of deep trench capacitors

Method of improving planarity of a photoresist