Huy CAO

Person

Rexford, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Forming high carbon content flowable dielectric film with low proce...
- Patent number 11,756,786
- Issue date Sep 12, 2023
- International Business Machines Corporation
- Benjamin D. Briggs
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-step insulator formation in trenches to avoid seams in insula...
- Patent number 10,964,599
- Issue date Mar 30, 2021
- GLOBALFOUNDRIES U.S. INC.
- Asli Sirman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cap structure
- Patent number 10,930,549
- Issue date Feb 23, 2021
- GLOBALFOUNDRIES U.S. INC.
- Jinsheng Gao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cap structure
- Patent number 10,460,986
- Issue date Oct 29, 2019
- GLOBALFOUNDRIES Inc.
- Jinsheng Gao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tone inversion method and structure for selective contact via patte...
- Patent number 10,453,751
- Issue date Oct 22, 2019
- GLOBALFOUNDRIES Inc.
- Xiaofeng Qiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-step insulator formation in trenches to avoid seams in insula...
- Patent number 10,431,500
- Issue date Oct 1, 2019
- GLOBALFOUNDRIES Inc.
- Asli Sirman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods, apparatus and system for providing a pre-RMG replacement m...
- Patent number 10,325,819
- Issue date Jun 18, 2019
- GLOBALFOUNDRIES Inc.
- Jinsheng Gao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods, apparatus and system for replacement contact for a finFET...
- Patent number 10,269,654
- Issue date Apr 23, 2019
- GLOBALFOUNDRIES Inc.
- Jinsheng Gao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Replacement contact cuts with an encapsulated low-K dielectric
- Patent number 10,256,089
- Issue date Apr 9, 2019
- GLOBALFOUNDRIES Inc.
- Huy Cao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Siloxane and organic-based MOL contact patterning
- Patent number 10,056,458
- Issue date Aug 21, 2018
- GLOBALFOUNDRIES Inc.
- Chang Ho Maeng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Airgaps to isolate metallization features
- Patent number 10,043,753
- Issue date Aug 7, 2018
- GLOBALFOUNDRIES Inc.
- Huy Cao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contact etch stop layer with sacrificial polysilicon layer
- Patent number 9,991,363
- Issue date Jun 5, 2018
- GLOBALFOUNDRIES Inc.
- Haigou Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming mask layers using a flowable carbon-containing...
- Patent number 9,793,169
- Issue date Oct 17, 2017
- GLOBALFOUNDRIES Inc.
- Huy Cao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Facilitating etch processing of a thin film via partial implantatio...
- Patent number 9,620,381
- Issue date Apr 11, 2017
- GLOBALFOUNDRIES Inc.
- Suraj K. Patil
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
FinFET device including silicon oxycarbon isolation structure
- Patent number 9,589,829
- Issue date Mar 7, 2017
- GLOBALFOUNDRIES Inc.
- Huy M. Cao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
10 nm alternative N/P doped fin for SSRW scheme
- Patent number 9,455,204
- Issue date Sep 27, 2016
- GLOBALFOUNDRIES Inc.
- Huy M. Cao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Opposite polarity borderless replacement metal contact scheme
- Patent number 9,390,979
- Issue date Jul 12, 2016
- GLOBALFOUNDRIES Inc.
- Andy Chih-Hung Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with diffusion barrier film and method of manu...
- Patent number 9,330,982
- Issue date May 3, 2016
- GLOBALFOUNDRIES Inc.
- Huy Cao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of carbon-rich contact liner material
- Patent number 9,318,440
- Issue date Apr 19, 2016
- GLOBALFOUNDRIES Inc.
- Huy Cao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of carbon-rich contact liner material
- Patent number 9,130,019
- Issue date Sep 8, 2015
- GLOBALFOUNDRIES Inc.
- Huy Cao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for fabricating integrated circuits utilizing silicon nitri...
- Patent number 8,940,650
- Issue date Jan 27, 2015
- GLOBALFOUNDRIES, INC.
- Huy Cao
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CARBON-NITRIDE-CARBON HARDMASK LAYER
- Publication number 20230260788
- Publication date Aug 17, 2023
- Intel Corporation
- Huy Cao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMING HIGH CARBON CONTENT FLOWABLE DIELECTRIC FILM WITH LOW PROCE...
- Publication number 20200234949
- Publication date Jul 23, 2020
- International Business Machines Corporation
- Benjamin D. Briggs
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CAP STRUCTURE
- Publication number 20200013672
- Publication date Jan 9, 2020
- GLOBALFOUNDRIES INC.
- Jinsheng GAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-STEP INSULATOR FORMATION IN TRENCHES TO AVOID SEAMS IN INSULA...
- Publication number 20190355624
- Publication date Nov 21, 2019
- GLOBALFOUNDRIES INC.
- Asli Sirman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATERIAL COMBINATIONS FOR POLISH STOPS AND GATE CAPS
- Publication number 20190326416
- Publication date Oct 24, 2019
- GLOBALFOUNDRIES INC.
- Haigou Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-STEP INSULATOR FORMATION IN TRENCHES TO AVOID SEAMS IN INSULA...
- Publication number 20190304843
- Publication date Oct 3, 2019
- GLOBALFOUNDRIES INC.
- Asli Sirman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAP STRUCTURE
- Publication number 20190237363
- Publication date Aug 1, 2019
- GLOBALFOUNDRIES INC.
- Jinsheng GAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REPLACEMENT CONTACT CUTS WITH AN ENCAPSULATED LOW-K DIELECTRIC
- Publication number 20180366324
- Publication date Dec 20, 2018
- GLOBALFOUNDRIES INC.
- Huy Cao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TONE INVERSION METHOD AND STRUCTURE FOR SELECTIVE CONTACT VIA PATTE...
- Publication number 20180261510
- Publication date Sep 13, 2018
- GLOBALFOUNDRIES INC.
- Xiaofeng QIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AIRGAPS TO ISOLATE METALLIZATION FEATURES
- Publication number 20180166383
- Publication date Jun 14, 2018
- GLOBALFOUNDRIES INC.
- Huy CAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING MASK LAYERS USING A FLOWABLE CARBON-CONTAINING...
- Publication number 20180005893
- Publication date Jan 4, 2018
- GLOBALFOUNDRIES INC.
- Huy Cao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD, APPARATUS AND SYSTEM FOR PROVIDING NITRIDE CAP LAYER IN REP...
- Publication number 20170338325
- Publication date Nov 23, 2017
- GLOBALFOUNDRIES INC.
- Huy Cao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILOXANE AND ORGANIC-BASED MOL CONTACT PATTERNING
- Publication number 20170200792
- Publication date Jul 13, 2017
- GLOBALFOUNDRIES INC.
- Chang Ho MAENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPPOSITE POLARITY BORDERLESS REPLACEMENT METAL CONTACT SCHEME
- Publication number 20160071774
- Publication date Mar 10, 2016
- GLOBAL FOUNDRIES Inc.
- Andy Chih-Hung Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION OF CARBON-RICH CONTACT LINER MATERIAL
- Publication number 20150357285
- Publication date Dec 10, 2015
- GLOBALFOUNDRIES INC.
- Huy CAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION OF CARBON-RICH CONTACT LINER MATERIAL
- Publication number 20150194342
- Publication date Jul 9, 2015
- GLOBALFOUNDRIES INC.
- Huy CAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FACILITATING ETCH PROCESSING OF A THIN FILM VIA PARTIAL IMPLANTATIO...
- Publication number 20150104948
- Publication date Apr 16, 2015
- GLOBALFOUNDRIES INC.
- Suraj K. PATIL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW-K NITRIDE FILM AND METHOD OF MAKING
- Publication number 20140346648
- Publication date Nov 27, 2014
- GLOBALFOUNDRIES INC.
- Huy CAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR FABRICATING INTEGRATED CIRCUITS UTILIZING SILICON NITRI...
- Publication number 20140256141
- Publication date Sep 11, 2014
- GLOBALFOUNDRIES, Inc.
- Huy Cao
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Forming high carbon content flowable dielectric film with low proce...

Multi-step insulator formation in trenches to avoid seams in insula...

Cap structure

Cap structure

Tone inversion method and structure for selective contact via patte...

Multi-step insulator formation in trenches to avoid seams in insula...

Methods, apparatus and system for providing a pre-RMG replacement m...

Methods, apparatus and system for replacement contact for a finFET...

Replacement contact cuts with an encapsulated low-K dielectric

Siloxane and organic-based MOL contact patterning

Airgaps to isolate metallization features

Contact etch stop layer with sacrificial polysilicon layer

Methods for forming mask layers using a flowable carbon-containing...

Facilitating etch processing of a thin film via partial implantatio...

FinFET device including silicon oxycarbon isolation structure

10 nm alternative N/P doped fin for SSRW scheme

Opposite polarity borderless replacement metal contact scheme

Semiconductor device with diffusion barrier film and method of manu...

Formation of carbon-rich contact liner material

Formation of carbon-rich contact liner material

Methods for fabricating integrated circuits utilizing silicon nitri...

Patents Applicationslast 30 patents

CARBON-NITRIDE-CARBON HARDMASK LAYER

FORMING HIGH CARBON CONTENT FLOWABLE DIELECTRIC FILM WITH LOW PROCE...

CAP STRUCTURE

MULTI-STEP INSULATOR FORMATION IN TRENCHES TO AVOID SEAMS IN INSULA...

MATERIAL COMBINATIONS FOR POLISH STOPS AND GATE CAPS

MULTI-STEP INSULATOR FORMATION IN TRENCHES TO AVOID SEAMS IN INSULA...

CAP STRUCTURE

REPLACEMENT CONTACT CUTS WITH AN ENCAPSULATED LOW-K DIELECTRIC

TONE INVERSION METHOD AND STRUCTURE FOR SELECTIVE CONTACT VIA PATTE...

AIRGAPS TO ISOLATE METALLIZATION FEATURES

METHODS FOR FORMING MASK LAYERS USING A FLOWABLE CARBON-CONTAINING...

METHOD, APPARATUS AND SYSTEM FOR PROVIDING NITRIDE CAP LAYER IN REP...

SILOXANE AND ORGANIC-BASED MOL CONTACT PATTERNING

OPPOSITE POLARITY BORDERLESS REPLACEMENT METAL CONTACT SCHEME

FORMATION OF CARBON-RICH CONTACT LINER MATERIAL

FORMATION OF CARBON-RICH CONTACT LINER MATERIAL

FACILITATING ETCH PROCESSING OF A THIN FILM VIA PARTIAL IMPLANTATIO...

LOW-K NITRIDE FILM AND METHOD OF MAKING

METHODS FOR FABRICATING INTEGRATED CIRCUITS UTILIZING SILICON NITRI...