Hyosan Lee

Person

Suwon-si, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Etching composition, a method of etching a metal barrier layer and...
- Patent number 11,795,550
- Issue date Oct 24, 2023
- Samsung Electronics Co., Ltd.
- Jungah Kim
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Process chamber and substrate processing apparatus including the same
- Patent number 11,610,788
- Issue date Mar 21, 2023
- Samsung Electronics Co., Ltd.
- Yong-Jhin Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etchant compositions for metal-containing films and methods of manu...
- Patent number 11,427,759
- Issue date Aug 30, 2022
- Samsung Electronics Co., Ltd.
- Kihun Song
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching composition and method for manufacturing semiconductor devi...
- Patent number 11,390,805
- Issue date Jul 19, 2022
- Samsung Electronics Co., Ltd.
- Jae Sung Lee
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Substrate drying method, photoresist developing method, photolithog...
- Patent number 11,189,503
- Issue date Nov 30, 2021
- Samsung Electronics Co., Ltd.
- Young-Hoo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon layer etchant composition and method of forming pattern by...
- Patent number 11,168,253
- Issue date Nov 9, 2021
- Samsung Electronics Co., Ltd.
- Changsu Jeon
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Etching composition, a method of etching a metal barrier layer and...
- Patent number 11,028,488
- Issue date Jun 8, 2021
- Samsung Electronics Co., Ltd.
- Jungah Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process chamber and substrate processing apparatus including the same
- Patent number 10,991,600
- Issue date Apr 27, 2021
- Samsung Electronics Co., Ltd.
- Yong-Jhin Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pre-treatment composition before etching SiGe and method of fabrica...
- Patent number 10,837,115
- Issue date Nov 17, 2020
- Samsung Electronics Co., Ltd.
- Soojin Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cleaning apparatus, chemical mechanical polishing system including...
- Patent number 10,388,537
- Issue date Aug 20, 2019
- Samsung Electronics Co., Ltd.
- Chae Lyoung Kim
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus and methods for treating a substrate
- Patent number 10,361,100
- Issue date Jul 23, 2019
- Samsung Electronics Co., Ltd.
- Hyosan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus
- Patent number 10,186,427
- Issue date Jan 22, 2019
- Samsung Electronics Co., Ltd.
- Kyoung Hwan Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal etchant compositions and methods of fabricating a semiconduct...
- Patent number 10,155,903
- Issue date Dec 18, 2018
- Samsung Electronics Co., Ltd.
- Hyosan Lee
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Manufacturing method and fluid supply system for treating substrate
- Patent number 9,941,110
- Issue date Apr 10, 2018
- Samsung Electronics Co., Ltd.
- Jung-Min Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for purifying cleaning agent
- Patent number 9,934,959
- Issue date Apr 3, 2018
- Samsung Electronics Co., Ltd.
- Yong-Jhin Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus and method of treating substrate
- Patent number 9,852,921
- Issue date Dec 26, 2017
- Samsung Electronics Co., Ltd.
- Kyoung Hwan Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for treating substrate
- Patent number 9,831,081
- Issue date Nov 28, 2017
- Samsung Electronics Co., Ltd.
- Jihoon Jeong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching composition
- Patent number 9,677,002
- Issue date Jun 13, 2017
- Samsung Electronics Co., Ltd.
- Sang Won Bae
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and methods for manufacturing semiconductor devices and t...
- Patent number 9,595,434
- Issue date Mar 14, 2017
- Samsung Electronics Co., Ltd.
- Kyoungseob Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for treating a substrate
- Patent number 9,534,839
- Issue date Jan 3, 2017
- Samsung Electronics Co., Ltd.
- Hyosan Lee
- F26 - DRYING
Information Patent Grant
Manufacturing method and fluid supply system for treating substrate
- Patent number 9,524,864
- Issue date Dec 20, 2016
- Samsung Electronics Co., Ltd.
- Jung-Min Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching composition and method of manufacturing semiconductor devic...
- Patent number 9,165,759
- Issue date Oct 20, 2015
- Samsung Electronics Co., Ltd.
- Sang Won Bae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of manufacturing a three-dimensional semiconductor device
- Patent number 9,153,597
- Issue date Oct 6, 2015
- Samsung Electronics Co., Ltd.
- Young-Hoo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming semiconductor devices
- Patent number 8,183,141
- Issue date May 22, 2012
- Samsung Electronics Co., Ltd.
- Sangjin Hyun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating nonvolatile memory device
- Patent number 8,076,198
- Issue date Dec 13, 2011
- Samsung Electronics Co., Ltd.
- Hyosan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for removing photoresist from a substrate
- Patent number 7,431,855
- Issue date Oct 7, 2008
- Samsung Electronics Co., Ltd.
- Donggyun Han
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ETCHING COMPOSITION FOR TITANIUM-CONTAINING LAYER, ETCHING METHOD O...
- Publication number 20240318078
- Publication date Sep 26, 2024
- Samsung Electronics Co., Ltd.
- Byungjoon KANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUITS...
- Publication number 20240059967
- Publication date Feb 22, 2024
- OCI COMPANY LTD.
- Daihyun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING COMPOSITION, METHOD OF ETCHING METAL-CONTAINING FILM BY USI...
- Publication number 20230407174
- Publication date Dec 21, 2023
- Samsung Electronics Co., Ltd.
- Kyuyoung HWANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING COMPOSITION FOR REMOVING RESIDUES ON SURFACE, METHOD OF CL...
- Publication number 20230383218
- Publication date Nov 30, 2023
- Samsung Electronics Co., Ltd.
- Byungjoon Kang
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
SLURRY COMPOSITION FOR POLISHING METAL AND METHOD OF MANUFACTURING...
- Publication number 20230332015
- Publication date Oct 19, 2023
- Samsung Electronics Co., Ltd.
- Inkwon KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING COMPOSITION, METHOD OF ETCHING METAL-CONTAINING FILM BY USI...
- Publication number 20230313040
- Publication date Oct 5, 2023
- Samsung Electronics Co., Ltd.
- Kyuyoung Hwang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ETCHING COMPOSITION FOR ETCHING MOLYBDENUM FILM AND METHOD OF MANUF...
- Publication number 20230272278
- Publication date Aug 31, 2023
- SOULBRAIN CO., LTD
- Changjun PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHANT COMPOSITION FOR ETCHING SILICON GERMANIUM FILM AND METHOD O...
- Publication number 20230272280
- Publication date Aug 31, 2023
- SOULBRAIN CO., LTD
- Changjun PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING
- Publication number 20230104949
- Publication date Apr 6, 2023
- Samsung Electronics Co., Ltd.
- Inkwon KIM
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING
- Publication number 20210403756
- Publication date Dec 30, 2021
- Samsung Electronics Co., Ltd.
- Inkwon KIM
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ETCHING COMPOSITION, A METHOD OF ETCHING A METAL BARRIER LAYER AND...
- Publication number 20210254224
- Publication date Aug 19, 2021
- Samsung Electronics Co., Ltd.
- Jungah KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVI...
- Publication number 20210238478
- Publication date Aug 5, 2021
- SOULBRAIN CO., LTD
- Jae Sung LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process Chamber and Substrate Processing Apparatus Including the Same
- Publication number 20210217636
- Publication date Jul 15, 2021
- Samsung Electronics Co., Ltd.
- Yong-Jhin Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHANT COMPOSITIONS FOR METAL-CONTAINING FILMS AND METHODS OF MANU...
- Publication number 20210115334
- Publication date Apr 22, 2021
- Samsung Electronics Co., Ltd.
- Kihun Song
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING APPARATUS, CHEMICAL MECHANICAL POLISHING SYSTEM INCLUDING...
- Publication number 20210098261
- Publication date Apr 1, 2021
- Samsung Electronics Co., Ltd.
- Chae Lyoung KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON LAYER ETCHANT COMPOSITION AND METHOD OF FORMING PATTERN BY...
- Publication number 20200216757
- Publication date Jul 9, 2020
- DONGWOO FINE-CHEM CO., LTD
- Changsu JEON
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ETCHANT COMPOSITION FOR ETCHING METAL FILM AND METHOD OF FORMING PA...
- Publication number 20200208052
- Publication date Jul 2, 2020
- DONGWOO FINE-CHEM CO., LTD
- Kihun SONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE DRYING METHOD, PHOTORESIST DEVELOPING METHOD, PHOTOLITHOG...
- Publication number 20200152486
- Publication date May 14, 2020
- Samsung Electronics Co., Ltd.
- Young-Hoo KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING COMPOSITION, A METHOD OF ETCHING A METAL BARRIER LAYER AND...
- Publication number 20200087798
- Publication date Mar 19, 2020
- Samsung Electronics Co., Ltd.
- Jungah KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PRE-TREATMENT COMPOSITION BEFORE ETCHING SiGe AND METHOD OF FABRICA...
- Publication number 20190284701
- Publication date Sep 19, 2019
- ENF TECHNOLOGY CO., LTD
- Soojin KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Process Chamber and Substrate Processing Apparatus Including the Same
- Publication number 20180366349
- Publication date Dec 20, 2018
- Samsung Electronics Co., Ltd.
- Yong-Jhin Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING APPARATUS, CHEMICAL MECHANICAL POLISHING SYSTEM INCLUDING...
- Publication number 20180315613
- Publication date Nov 1, 2018
- Samsung Electronics Co., Ltd.
- Chae Lyoung KIM
- B24 - GRINDING POLISHING
Information Patent Application
CLEANING COMPOSITION, CLEANING APPARATUS, AND METHOD FOR MANUFACTUR...
- Publication number 20180151395
- Publication date May 31, 2018
- Samsung Electronics Co., Ltd.
- MIHYUN PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS
- Publication number 20180096856
- Publication date Apr 5, 2018
- Samsung Electronics Co., Ltd.
- Kyoung Hwan KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING APPARATUS, CHEMICAL MECHANICAL POLISHING SYSTEM INCLUDING...
- Publication number 20170301553
- Publication date Oct 19, 2017
- Samsung Electronics Co., Ltd.
- Chae Lyoung KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLEANING APPARATUS AND SUBSTRATE PROCESSING SYSTEM INCLUDING THE SAME
- Publication number 20170297164
- Publication date Oct 19, 2017
- Samsung Electronics Co., Ltd.
- Tae-Hong KIM
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
Apparatus and Methods for Treating a Substrate
- Publication number 20170084469
- Publication date Mar 23, 2017
- Samsung Electronics Co., Ltd.
- Hyosan Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR TREATING SUBSTRATE
- Publication number 20170069485
- Publication date Mar 9, 2017
- Samsung Electronics Co., Ltd.
- Jihoon JEONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD AND FLUID SUPPLY SYSTEM FOR TREATING SUBSTRATE
- Publication number 20170062208
- Publication date Mar 2, 2017
- Samsung Electronics Co., Ltd.
- Jung-Min Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS AND METHOD OF TREATING SUBSTRATE
- Publication number 20170062287
- Publication date Mar 2, 2017
- Samsung Electronics Co., Ltd.
- Kyoung Hwan KIM
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Etching composition, a method of etching a metal barrier layer and...

Process chamber and substrate processing apparatus including the same

Etchant compositions for metal-containing films and methods of manu...

Etching composition and method for manufacturing semiconductor devi...

Substrate drying method, photoresist developing method, photolithog...

Silicon layer etchant composition and method of forming pattern by...

Etching composition, a method of etching a metal barrier layer and...

Process chamber and substrate processing apparatus including the same

Pre-treatment composition before etching SiGe and method of fabrica...

Cleaning apparatus, chemical mechanical polishing system including...

Apparatus and methods for treating a substrate

Substrate treating apparatus

Metal etchant compositions and methods of fabricating a semiconduct...

Manufacturing method and fluid supply system for treating substrate

Method and apparatus for purifying cleaning agent

Substrate treating apparatus and method of treating substrate

Method for treating substrate

Etching composition

Apparatus and methods for manufacturing semiconductor devices and t...

Apparatus and methods for treating a substrate

Manufacturing method and fluid supply system for treating substrate

Etching composition and method of manufacturing semiconductor devic...

Methods of manufacturing a three-dimensional semiconductor device

Methods of forming semiconductor devices

Method of fabricating nonvolatile memory device

Apparatus and method for removing photoresist from a substrate

Patents Applicationslast 30 patents

ETCHING COMPOSITION FOR TITANIUM-CONTAINING LAYER, ETCHING METHOD O...

ETCHING COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUITS...

ETCHING COMPOSITION, METHOD OF ETCHING METAL-CONTAINING FILM BY USI...

CLEANING COMPOSITION FOR REMOVING RESIDUES ON SURFACE, METHOD OF CL...

SLURRY COMPOSITION FOR POLISHING METAL AND METHOD OF MANUFACTURING...

ETCHING COMPOSITION, METHOD OF ETCHING METAL-CONTAINING FILM BY USI...

ETCHING COMPOSITION FOR ETCHING MOLYBDENUM FILM AND METHOD OF MANUF...

ETCHANT COMPOSITION FOR ETCHING SILICON GERMANIUM FILM AND METHOD O...

SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING

SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING

ETCHING COMPOSITION, A METHOD OF ETCHING A METAL BARRIER LAYER AND...

ETCHING COMPOSITION AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVI...

Process Chamber and Substrate Processing Apparatus Including the Same

ETCHANT COMPOSITIONS FOR METAL-CONTAINING FILMS AND METHODS OF MANU...

CLEANING APPARATUS, CHEMICAL MECHANICAL POLISHING SYSTEM INCLUDING...

SILICON LAYER ETCHANT COMPOSITION AND METHOD OF FORMING PATTERN BY...

ETCHANT COMPOSITION FOR ETCHING METAL FILM AND METHOD OF FORMING PA...

SUBSTRATE DRYING METHOD, PHOTORESIST DEVELOPING METHOD, PHOTOLITHOG...

ETCHING COMPOSITION, A METHOD OF ETCHING A METAL BARRIER LAYER AND...

PRE-TREATMENT COMPOSITION BEFORE ETCHING SiGe AND METHOD OF FABRICA...

Process Chamber and Substrate Processing Apparatus Including the Same

CLEANING APPARATUS, CHEMICAL MECHANICAL POLISHING SYSTEM INCLUDING...

CLEANING COMPOSITION, CLEANING APPARATUS, AND METHOD FOR MANUFACTUR...

SUBSTRATE TREATING APPARATUS

CLEANING APPARATUS, CHEMICAL MECHANICAL POLISHING SYSTEM INCLUDING...

CLEANING APPARATUS AND SUBSTRATE PROCESSING SYSTEM INCLUDING THE SAME

Apparatus and Methods for Treating a Substrate

METHOD FOR TREATING SUBSTRATE

MANUFACTURING METHOD AND FLUID SUPPLY SYSTEM FOR TREATING SUBSTRATE

SUBSTRATE TREATING APPARATUS AND METHOD OF TREATING SUBSTRATE