Ichiro Nakayama

Person

Kadoma-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,115,565
- Issue date Oct 30, 2018
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Tomohiro Okumura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Silicon substrate having textured surface, and process for producin...
- Patent number 9,397,242
- Issue date Jul 19, 2016
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Yasushi Taniguchi
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Polycrystalline-type solar cell panel and process for production th...
- Patent number 9,105,803
- Issue date Aug 11, 2015
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Ichiro Nakayama
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Plasma processing method
- Patent number 8,802,567
- Issue date Aug 12, 2014
- Panasonic Corporation
- Tomohiro Okumura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Silicon substrate having textured surface, solar cell having same,...
- Patent number 8,772,067
- Issue date Jul 8, 2014
- Panasonic Corporation
- Ichiro Nakayama
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Plasma doping method and plasma doping apparatus
- Patent number 8,709,926
- Issue date Apr 29, 2014
- Panasonic Corporation
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 8,703,613
- Issue date Apr 22, 2014
- Panasonic Corporation
- Tomohiro Okumura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma doping method with gate shutter
- Patent number 8,652,953
- Issue date Feb 18, 2014
- Panasonic Corporation
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method thereof
- Patent number 8,624,340
- Issue date Jan 7, 2014
- Panasonic Corporation
- Tomohiro Okumura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma doping method and apparatus thereof
- Patent number 8,450,819
- Issue date May 28, 2013
- Panasonic Corporation
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and apparatus
- Patent number 8,404,573
- Issue date Mar 26, 2013
- Panasonic Corporation
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and apparatus
- Patent number 8,288,259
- Issue date Oct 16, 2012
- Panasonic Corporation
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma doping device with gate shutter
- Patent number 8,257,501
- Issue date Sep 4, 2012
- Panasonic Corporation
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma doping method and apparatus
- Patent number 8,129,202
- Issue date Mar 6, 2012
- Panasonic Corporation
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma doping method and plasma doping apparatus
- Patent number 7,863,168
- Issue date Jan 4, 2011
- Panasonic Corporation
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and apparatus
- Patent number 7,858,537
- Issue date Dec 28, 2010
- Panasonic Corporation
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 7,858,155
- Issue date Dec 28, 2010
- Panasonic Corporation
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus of fabricating semiconductor device
- Patent number 7,858,479
- Issue date Dec 28, 2010
- Panasonic Corporation
- Bunji Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming impurity-introduced layer, method for cleaning o...
- Patent number 7,759,254
- Issue date Jul 20, 2010
- Panasonic Corporation
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of impurity introduction, impurity introduction apparatus an...
- Patent number 7,682,954
- Issue date Mar 23, 2010
- Panasonic Corporation
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of controlling impurity doping and impurity doping apparatus
- Patent number 7,666,770
- Issue date Feb 23, 2010
- Panasonic Corporation
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Impurity introducing apparatus and impurity introducing method
- Patent number 7,626,184
- Issue date Dec 1, 2009
- Panasonic Corporation
- Bunji Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Impurity introducing apparatus and impurity introducing method
- Patent number 7,622,725
- Issue date Nov 24, 2009
- Panaosnic Corporation
- Bunji Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for plasma processing
- Patent number 7,601,619
- Issue date Oct 13, 2009
- Panasonic Corporation
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of doping impurities, and electronic element using the same
- Patent number 7,582,492
- Issue date Sep 1, 2009
- Panasonic Corporation
- Cheng-Guo Jin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plasma doping
- Patent number 7,575,987
- Issue date Aug 18, 2009
- Panasonic Corporation
- Tomohiro Okumura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of introducing impurity, device and element
- Patent number 7,547,619
- Issue date Jun 16, 2009
- Panasonic Corporation
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and apparatus
- Patent number 7,510,667
- Issue date Mar 31, 2009
- Panasonic Corporation
- Tomohiro Okumura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method and apparatus
- Patent number 7,465,407
- Issue date Dec 16, 2008
- Panasonic Corporation
- Mitsuo Saitoh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for introducing impurities
- Patent number 7,456,085
- Issue date Nov 25, 2008
- Panasonic Corporation
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
NON-PLASMA DRY ETCHING APPARATUS
- Publication number 20140166206
- Publication date Jun 19, 2014
- PANASONIC CORPORATION
- NAOSHI YAMAGUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20140094040
- Publication date Apr 3, 2014
- PANASONIC CORPORATION
- Tomohiro OKUMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON SUBSTRATE HAVING TEXTURED SURFACE, AND PROCESS FOR PRODUCIN...
- Publication number 20140020750
- Publication date Jan 23, 2014
- PANASONIC CORPORATION
- Yasushi Taniguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DOPING METHOD AND APPARATUS
- Publication number 20130323916
- Publication date Dec 5, 2013
- PANASONIC CORPORATION
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20130230990
- Publication date Sep 5, 2013
- PANASONIC CORPORATION
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON SUBSTRATE HAVING TEXTURED SURFACE, SOLAR CELL HAVING SAME,...
- Publication number 20130183791
- Publication date Jul 18, 2013
- PANASONIC CORPORATION
- Ichiro Nakayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN-FILM SOLAR CELL AND MANUFACTURING METHOD THEREOF
- Publication number 20130174898
- Publication date Jul 11, 2013
- PANASONIC CORPORATION
- Mitsuo SAITOH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYCRYSTALLINE SILICON SOLAR CELL PANEL AND MANUFACTURING METHOD T...
- Publication number 20130160849
- Publication date Jun 27, 2013
- PANASONIC CORPORATION
- HITOSHI YAMANISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYCRYSTALLINE-TYPE SOLAR CELL PANEL AND PROCESS FOR PRODUCTION TH...
- Publication number 20130081694
- Publication date Apr 4, 2013
- PANASONIC CORPORATION
- Ichiro Nakayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND APPARATUS
- Publication number 20130022759
- Publication date Jan 24, 2013
- PANASONIC CORPORATION
- Tomohiro OKUMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20120325777
- Publication date Dec 27, 2012
- PANASONIC CORPORATION
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DOPING METHOD WITH GATE SHUTTER
- Publication number 20120285818
- Publication date Nov 15, 2012
- PANASONIC CORPORATION
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS FOR PRODUCTION OF SILICON POWDER, MULTI-CRYSTAL-TYPE SOLAR...
- Publication number 20120227808
- Publication date Sep 13, 2012
- PANASONIC CORPORATION
- Ichiro Nakayama
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
PLASMA DOPING METHOD AND APPARATUS
- Publication number 20120186519
- Publication date Jul 26, 2012
- PANASONIC CORPORATION
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DOPING METHOD AND APPARATUS THEREOF
- Publication number 20120115317
- Publication date May 10, 2012
- Tomohiro OKUMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD THEREOF
- Publication number 20120058649
- Publication date Mar 8, 2012
- Tomohiro OKUMURA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA PROCESSING METHOD AND APPARATUS
- Publication number 20110081787
- Publication date Apr 7, 2011
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Doping Method and Plasma Doping Apparatus
- Publication number 20110065267
- Publication date Mar 17, 2011
- PANASONIC CORPORATION
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DOPING METHOD AND APPARATUS
- Publication number 20100098837
- Publication date Apr 22, 2010
- PANASONIC CORPORATION
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Doping Method and Apparatus
- Publication number 20090233383
- Publication date Sep 17, 2009
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Doping Method and Apparatus
- Publication number 20090181526
- Publication date Jul 16, 2009
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Doping Method and Plasma Processing Device
- Publication number 20090176355
- Publication date Jul 9, 2009
- PANASONIC CORPORATION
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Impurity Introducing Apparatus and Impurity Introducing Method
- Publication number 20090140174
- Publication date Jun 4, 2009
- PANASONIC CORPORATION
- Bunji Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, DIELECTRIC W...
- Publication number 20090130335
- Publication date May 21, 2009
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and Apparatus for Plasma Processing
- Publication number 20090068769
- Publication date Mar 12, 2009
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Method and Plasma Processing Apparatus
- Publication number 20080258082
- Publication date Oct 23, 2008
- Tomohiro Okumura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPURITY INTRODUCING APPARATUS AND IMPURITY INTRODUCING METHOD
- Publication number 20080210167
- Publication date Sep 4, 2008
- Matsushita Electric Industrial Co., Ltd.
- Bunji Mizino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LIQUID PHASE ETCHING METHOD AND LIQUID PHASE ETCHING APPARATUS
- Publication number 20080196834
- Publication date Aug 21, 2008
- Matsushita Electric Industrial Co., Ltd.
- Bunji Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPURITY INTRODUCING APPARATUS AND IMPURITY INTRODUCING METHOD
- Publication number 20080166861
- Publication date Jul 10, 2008
- Matsushita Electric Industrial Co., Ltd.
- Bunji Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Impurity Introduction, Impurity Introduction Apparatus an...
- Publication number 20080142931
- Publication date Jun 19, 2008
- Matsushita Electric Industrial Co., Ltd.
- Yuichiro Sasaki
- H01 - BASIC ELECTRIC ELEMENTS

Ichiro Nakayama

Person

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Silicon substrate having textured surface, and process for producin...

Polycrystalline-type solar cell panel and process for production th...

Plasma processing method

Silicon substrate having textured surface, solar cell having same,...

Plasma doping method and plasma doping apparatus

Plasma processing apparatus and plasma processing method

Plasma doping method with gate shutter

Plasma processing apparatus and method thereof

Plasma doping method and apparatus thereof

Plasma processing method and apparatus

Plasma processing method and apparatus

Plasma doping device with gate shutter

Plasma doping method and apparatus

Plasma doping method and plasma doping apparatus

Plasma processing method and apparatus

Plasma processing method and plasma processing apparatus

Method and apparatus of fabricating semiconductor device

Method for forming impurity-introduced layer, method for cleaning o...

Method of impurity introduction, impurity introduction apparatus an...

Method of controlling impurity doping and impurity doping apparatus

Impurity introducing apparatus and impurity introducing method

Impurity introducing apparatus and impurity introducing method

Method and apparatus for plasma processing

Method of doping impurities, and electronic element using the same

Method of plasma doping

Method of introducing impurity, device and element

Plasma processing method and apparatus

Plasma processing method and apparatus

Method for introducing impurities

Patents Applicationslast 30 patents

NON-PLASMA DRY ETCHING APPARATUS

PLASMA PROCESSING METHOD

SILICON SUBSTRATE HAVING TEXTURED SURFACE, AND PROCESS FOR PRODUCIN...

PLASMA DOPING METHOD AND APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SILICON SUBSTRATE HAVING TEXTURED SURFACE, SOLAR CELL HAVING SAME,...

THIN-FILM SOLAR CELL AND MANUFACTURING METHOD THEREOF

POLYCRYSTALLINE SILICON SOLAR CELL PANEL AND MANUFACTURING METHOD T...

POLYCRYSTALLINE-TYPE SOLAR CELL PANEL AND PROCESS FOR PRODUCTION TH...

PLASMA PROCESSING METHOD AND APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA DOPING METHOD WITH GATE SHUTTER

PROCESS FOR PRODUCTION OF SILICON POWDER, MULTI-CRYSTAL-TYPE SOLAR...

PLASMA DOPING METHOD AND APPARATUS

PLASMA DOPING METHOD AND APPARATUS THEREOF

PLASMA PROCESSING APPARATUS AND METHOD THEREOF

PLASMA PROCESSING METHOD AND APPARATUS

Plasma Doping Method and Plasma Doping Apparatus

PLASMA DOPING METHOD AND APPARATUS

Plasma Doping Method and Apparatus

Plasma Doping Method and Apparatus

Plasma Doping Method and Plasma Processing Device

Impurity Introducing Apparatus and Impurity Introducing Method

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, DIELECTRIC W...

Method and Apparatus for Plasma Processing

Plasma Processing Method and Plasma Processing Apparatus

IMPURITY INTRODUCING APPARATUS AND IMPURITY INTRODUCING METHOD

LIQUID PHASE ETCHING METHOD AND LIQUID PHASE ETCHING APPARATUS

IMPURITY INTRODUCING APPARATUS AND IMPURITY INTRODUCING METHOD

Method of Impurity Introduction, Impurity Introduction Apparatus an...