Ichirota NAGAHAMA

Person

Koga-Shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Inspection system by charged particle beam and method of manufactur...
- Patent number 9,368,314
- Issue date Jun 14, 2016
- Ebara Corporation
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Grant
Inspection system by charged particle beam and method of manufactur...
- Patent number 8,803,103
- Issue date Aug 12, 2014
- Ebara Corporation
- Mamoru Nakasuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern inspection method and pattern inspection apparatus
- Patent number 8,611,638
- Issue date Dec 17, 2013
- Kabushiki Kaisha Toshiba
- Ichirota Nagahama
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Inspection system by charged particle beam and method of manufactur...
- Patent number 8,368,031
- Issue date Feb 5, 2013
- Ebara Corporation
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Grant
Mapping-projection-type electron beam apparatus for inspecting samp...
- Patent number 8,124,933
- Issue date Feb 28, 2012
- Ebara Corporation
- Kenji Watanabe
- G01 - MEASURING TESTING
Information Patent Grant
Electron beam apparatus
- Patent number 8,067,732
- Issue date Nov 29, 2011
- Ebara Corporation
- Mamoru Nakasuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection system by charged particle beam and method of manufactur...
- Patent number 8,053,726
- Issue date Nov 8, 2011
- Ebara Corporation
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Grant
Projection electron beam apparatus and defect inspection system usi...
- Patent number 8,035,082
- Issue date Oct 11, 2011
- Kabushiki Kaisha Toshiba
- Yuichiro Yamazaki
- G01 - MEASURING TESTING
Information Patent Grant
Electron beam apparatus and an aberration correction optical apparatus
- Patent number 7,863,580
- Issue date Jan 4, 2011
- Ebara Corporation
- Masahiro Hatakeyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate inspection apparatus, substrate inspection method and met...
- Patent number 7,847,250
- Issue date Dec 7, 2010
- Kabushiki Kaisha Toshiba
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate inspection apparatus, substrate inspection method and sem...
- Patent number 7,838,831
- Issue date Nov 23, 2010
- Kabushiki Kaisha Toshiba
- Ichirota Nagahama
- G01 - MEASURING TESTING
Information Patent Grant
Mask pattern inspection method, exposure condition verification met...
- Patent number 7,674,570
- Issue date Mar 9, 2010
- Kabushiki Kaisha Toshiba
- Ichirota Nagahama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate inspection method, method of manufacturing semiconductor...
- Patent number 7,645,988
- Issue date Jan 12, 2010
- Kabushiki Kaisha Toshiba
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate inspection apparatus, substrate inspection method and sem...
- Patent number 7,608,821
- Issue date Oct 27, 2009
- Kabushiki Kaisha Toshiba
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mapping-projection-type electron beam apparatus for inspecting samp...
- Patent number 7,592,586
- Issue date Sep 22, 2009
- Ebara Corporation
- Kenji Watanabe
- G01 - MEASURING TESTING
Information Patent Grant
Electron beam inspection system and inspection method and method of...
- Patent number 7,569,838
- Issue date Aug 4, 2009
- Ebara Corporation
- Kenji Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate inspection apparatus, substrate inspection method and met...
- Patent number 7,462,829
- Issue date Dec 9, 2008
- Kabushiki Kaisha Toshiba
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Detecting apparatus and device manufacturing method
- Patent number 7,449,691
- Issue date Nov 11, 2008
- Ebara Corporation
- Masahiro Hatakeyama
- G01 - MEASURING TESTING
Information Patent Grant
Inspection system by charged particle beam and method of manufactur...
- Patent number 7,411,191
- Issue date Aug 12, 2008
- Ebara Corporation
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Grant
Electron beam apparatus with detailed observation function and samp...
- Patent number 7,352,195
- Issue date Apr 1, 2008
- Ebara Corporation
- Kenji Watanabe
- G01 - MEASURING TESTING
Information Patent Grant
Electron beam inspection system and inspection method and method of...
- Patent number 7,351,969
- Issue date Apr 1, 2008
- Ebara Corporation
- Kenji Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection system by charged particle beam and method of manufactur...
- Patent number 7,241,993
- Issue date Jul 10, 2007
- Ebara Corporation
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Grant
Substrate inspection apparatus, substrate inspection method and met...
- Patent number 7,211,796
- Issue date May 1, 2007
- Kabushiki Kaisha Toshiba
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam apparatus with detailed observation function and samp...
- Patent number 7,212,017
- Issue date May 1, 2007
- Ebara Corporation
- Kenji Watanabe
- G01 - MEASURING TESTING
Information Patent Grant
Defect inspection apparatus, program, and manufacturing method of s...
- Patent number 7,148,479
- Issue date Dec 12, 2006
- Kabushiki Kaisha Toshiba
- Atsushi Onishi
- G01 - MEASURING TESTING
Information Patent Grant
Electron beam apparatus and device manufacturing method using same
- Patent number 7,098,457
- Issue date Aug 29, 2006
- Ebara Corporation
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Detecting apparatus and device manufacturing method
- Patent number 7,075,072
- Issue date Jul 11, 2006
- Ebara Corporation
- Masahiro Hatakeyama
- G01 - MEASURING TESTING
Information Patent Grant
Electron beam inspection system and inspection method and method of...
- Patent number 6,992,290
- Issue date Jan 31, 2006
- Ebara Corporation
- Kenji Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam apparatus and device manufacturing method using same
- Patent number 6,909,092
- Issue date Jun 21, 2005
- Ebara Corporation
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate inspecting system using electron beam and substrate inspe...
- Patent number 6,563,114
- Issue date May 13, 2003
- Kabushiki Kaisha Toshiba
- Ichirota Nagahama
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
INSPECTION SYSTEM BY CHARGED PARTICLE BEAM AND METHOD OF MANUFACTUR...
- Publication number 20140319346
- Publication date Oct 30, 2014
- EBARA CORPORATION
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Application
INSPECTION SYSTEM BY CHARGED PARTICLE BEAM AND METHOD OF MANUFACTUR...
- Publication number 20140034831
- Publication date Feb 6, 2014
- KABUSHIKI KAISHA TOSHIBA
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Application
INSPECTION SYSTEM BY CHARGED PARTICLE BEAM AND METHOD OF MANUFACTUR...
- Publication number 20120032079
- Publication date Feb 9, 2012
- KABUSHIKI KAISHA TOSHIBA
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Application
PATTERN INSPECTION METHOD AND PATTERN INSPECTION APPARATUS
- Publication number 20120026316
- Publication date Feb 2, 2012
- Ichirota NAGAHAMA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PROJECTION ELECTRON BEAM APPARATUS AND DEFECT INSPECTION SYSTEM USI...
- Publication number 20100096550
- Publication date Apr 22, 2010
- Kabushiki Kaisha Toshiba
- Yuichiro YAMAZAKI
- G01 - MEASURING TESTING
Information Patent Application
MAPPING-PROJECTION-TYPE ELECTRON BEAM APPARATUS FOR INSPECTING SAMP...
- Publication number 20100019149
- Publication date Jan 28, 2010
- EBARA CORPORATION
- Kenji WATANABE
- G01 - MEASURING TESTING
Information Patent Application
PATTERN INSPECTION APPARATUS, PATTERN INSPECTION METHOD AND COMPUTE...
- Publication number 20100021046
- Publication date Jan 28, 2010
- Ichirota Nagahama
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Substrate inspection apparatus, substrate inspection method and met...
- Publication number 20090072139
- Publication date Mar 19, 2009
- Kabushiki Kaisha Toshiba
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inspection system by charged particle beam and method of manufactur...
- Publication number 20090032708
- Publication date Feb 5, 2009
- EBARA CORPORATION
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Application
Substrate Inspection Apparatus, Substrate Inspection Method and Sem...
- Publication number 20080231856
- Publication date Sep 25, 2008
- Ichirota NAGAHAMA
- G01 - MEASURING TESTING
Information Patent Application
Electron beam inspection system and inspection method and method of...
- Publication number 20080173814
- Publication date Jul 24, 2008
- EBARA CORPORATION
- Kenji Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Defect inspection method, defect inspection apparatus, and semicond...
- Publication number 20080013824
- Publication date Jan 17, 2008
- Shinji Yamaguchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Inspection system by charged particle beam and method of manufactur...
- Publication number 20070235644
- Publication date Oct 11, 2007
- EBARA CORPORATION
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Application
Electron beam apparatus with detailed observation function and samp...
- Publication number 20070200569
- Publication date Aug 30, 2007
- EBARA CORPORATION
- Kenji Watanabe
- G01 - MEASURING TESTING
Information Patent Application
Substrate inspection apparatus, substrate inspection method and sem...
- Publication number 20070194232
- Publication date Aug 23, 2007
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate inspection apparatus, substrate inspection method and met...
- Publication number 20070187600
- Publication date Aug 16, 2007
- Kabushiki Kaisha Toshiba
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Mask pattern inspection method, exposure condition verification met...
- Publication number 20070009811
- Publication date Jan 11, 2007
- Ichirota Nagahama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mapping-projection-type electron beam apparatus for inspecting samp...
- Publication number 20060237646
- Publication date Oct 26, 2006
- Kenji Watanabe
- G01 - MEASURING TESTING
Information Patent Application
Detecting apparatus and device manufacturing method
- Publication number 20060219909
- Publication date Oct 5, 2006
- EBARA CORPORATION
- Masahiro Hatakeyama
- G01 - MEASURING TESTING
Information Patent Application
Electron beam inspection system and inspection method and method of...
- Publication number 20060118719
- Publication date Jun 8, 2006
- EBARA CORPORATION
- Kenji Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate inspection method, method of manufacturing semiconductor...
- Publication number 20050263701
- Publication date Dec 1, 2005
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Defect inspection apparatus, program, and manufacturing method of s...
- Publication number 20050230618
- Publication date Oct 20, 2005
- Atsushi Onishi
- G01 - MEASURING TESTING
Information Patent Application
Electron beam apparatus and device manufacturing method using same
- Publication number 20050205783
- Publication date Sep 22, 2005
- EBARA CORPORATION
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron beam apparatus with detailed observation function and samp...
- Publication number 20050199807
- Publication date Sep 15, 2005
- EBARA CORPORATION
- Kenji Watanabe
- G01 - MEASURING TESTING
Information Patent Application
Substrate inspection apparatus, substrate inspection method and met...
- Publication number 20050029451
- Publication date Feb 10, 2005
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron beam apparatus and device manufacturing method using same
- Publication number 20030213893
- Publication date Nov 20, 2003
- EBARA CORPORATION
- Ichirota Nagahama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Detecting apparatus and device manufacturing method
- Publication number 20030047682
- Publication date Mar 13, 2003
- Masahiro Hatakeyama
- G01 - MEASURING TESTING
Information Patent Application
Electron beam inspection system and inspection method and method of...
- Publication number 20020088940
- Publication date Jul 11, 2002
- Kenji Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inspection system by charged particle beam and method of manufactur...
- Publication number 20020028399
- Publication date Mar 7, 2002
- Mamoru Nakasuji
- G01 - MEASURING TESTING

Ichirota NAGAHAMA

Person

Patents Grantslast 30 patents

Inspection system by charged particle beam and method of manufactur...

Inspection system by charged particle beam and method of manufactur...

Pattern inspection method and pattern inspection apparatus

Inspection system by charged particle beam and method of manufactur...

Mapping-projection-type electron beam apparatus for inspecting samp...

Electron beam apparatus

Inspection system by charged particle beam and method of manufactur...

Projection electron beam apparatus and defect inspection system usi...

Electron beam apparatus and an aberration correction optical apparatus

Substrate inspection apparatus, substrate inspection method and met...

Substrate inspection apparatus, substrate inspection method and sem...

Mask pattern inspection method, exposure condition verification met...

Substrate inspection method, method of manufacturing semiconductor...

Substrate inspection apparatus, substrate inspection method and sem...

Mapping-projection-type electron beam apparatus for inspecting samp...

Electron beam inspection system and inspection method and method of...

Substrate inspection apparatus, substrate inspection method and met...

Detecting apparatus and device manufacturing method

Inspection system by charged particle beam and method of manufactur...

Electron beam apparatus with detailed observation function and samp...

Electron beam inspection system and inspection method and method of...

Inspection system by charged particle beam and method of manufactur...

Substrate inspection apparatus, substrate inspection method and met...

Electron beam apparatus with detailed observation function and samp...

Defect inspection apparatus, program, and manufacturing method of s...

Electron beam apparatus and device manufacturing method using same

Detecting apparatus and device manufacturing method

Electron beam inspection system and inspection method and method of...

Electron beam apparatus and device manufacturing method using same

Substrate inspecting system using electron beam and substrate inspe...

Patents Applicationslast 30 patents

INSPECTION SYSTEM BY CHARGED PARTICLE BEAM AND METHOD OF MANUFACTUR...

INSPECTION SYSTEM BY CHARGED PARTICLE BEAM AND METHOD OF MANUFACTUR...

INSPECTION SYSTEM BY CHARGED PARTICLE BEAM AND METHOD OF MANUFACTUR...

PATTERN INSPECTION METHOD AND PATTERN INSPECTION APPARATUS

PROJECTION ELECTRON BEAM APPARATUS AND DEFECT INSPECTION SYSTEM USI...

MAPPING-PROJECTION-TYPE ELECTRON BEAM APPARATUS FOR INSPECTING SAMP...

PATTERN INSPECTION APPARATUS, PATTERN INSPECTION METHOD AND COMPUTE...

Substrate inspection apparatus, substrate inspection method and met...

Inspection system by charged particle beam and method of manufactur...

Substrate Inspection Apparatus, Substrate Inspection Method and Sem...

Electron beam inspection system and inspection method and method of...

Defect inspection method, defect inspection apparatus, and semicond...

Inspection system by charged particle beam and method of manufactur...

Electron beam apparatus with detailed observation function and samp...

Substrate inspection apparatus, substrate inspection method and sem...

Substrate inspection apparatus, substrate inspection method and met...

Mask pattern inspection method, exposure condition verification met...

Mapping-projection-type electron beam apparatus for inspecting samp...

Detecting apparatus and device manufacturing method

Electron beam inspection system and inspection method and method of...

Substrate inspection method, method of manufacturing semiconductor...

Defect inspection apparatus, program, and manufacturing method of s...

Electron beam apparatus and device manufacturing method using same

Electron beam apparatus with detailed observation function and samp...

Substrate inspection apparatus, substrate inspection method and met...

Electron beam apparatus and device manufacturing method using same

Detecting apparatus and device manufacturing method

Electron beam inspection system and inspection method and method of...

Inspection system by charged particle beam and method of manufactur...