Ikuo SAWADA

Person

Kawasaki-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Vaporizing unit, film forming apparatus, film forming method, compu...
- Patent number 9,343,295
- Issue date May 17, 2016
- Tokyo Electron Limited
- Ikuo Sawada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus, plasma processing method and storage m...
- Patent number 9,252,001
- Issue date Feb 2, 2016
- Tokyo Electron Limited
- Ikuo Sawada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid processing apparatus, liquid processing method, and recordin...
- Patent number 9,202,731
- Issue date Dec 1, 2015
- Tokyo Electron Limited
- Shigeru Kasai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conveyance device and substrate processing system
- Patent number 9,165,810
- Issue date Oct 20, 2015
- Tokyo Electron Limited
- Tsutomu Hiroki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film deposition apparatus and film deposition method
- Patent number 8,696,814
- Issue date Apr 15, 2014
- Tokyo Electron Limited
- Eisuke Morisaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus, plasma processing method and storage m...
- Patent number 8,636,871
- Issue date Jan 28, 2014
- Tokyo Electron Limited
- Ikuo Sawada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method
- Patent number 8,419,960
- Issue date Apr 16, 2013
- Tokyo Electron Limited
- Ikuo Sawada
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of treating a mask layer prior to performing an etching process
- Patent number 7,642,193
- Issue date Jan 5, 2010
- Tokyo Electron Limited
- Peter L.G. Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of treating a mask layer prior to performing an etching process
- Patent number 7,572,386
- Issue date Aug 11, 2009
- Tokyo Electron Limited
- Peter L.G. Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of treating a mask layer prior to performing an etching process
- Patent number 7,449,414
- Issue date Nov 11, 2008
- Tokyo Electron Limited
- Peter L. G. Ventzek
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method of controlling flow of molten steel in mold
- Patent number 5,137,077
- Issue date Aug 11, 1992
- Nippon Steel Corporation
- Ikuo Sawada
- B22 - CASTING POWDER METALLURGY

Patents Applicationslast 30 patents

Information Patent Application
CONVEYANCE DEVICE AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20150125238
- Publication date May 7, 2015
- TOKYO ELECTRON LIMITED
- Tsutomu Hiroki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING DEVICE
- Publication number 20140373783
- Publication date Dec 25, 2014
- Ikuo SAWADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VAPORIZING UNIT, FILM FORMING APPARATUS, FILM FORMING METHOD, COMPU...
- Publication number 20140256157
- Publication date Sep 11, 2014
- TOKYO ELECTRON LIMITED
- Ikuo SAWADA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Processing Apparatus, Plasma Processing Method and Storage M...
- Publication number 20140138356
- Publication date May 22, 2014
- TOKYO ELECTRON LIMITED
- Ikuo Sawada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COATING APPARATUS AND COATING METHOD
- Publication number 20130011555
- Publication date Jan 10, 2013
- TOKYO ELECTRON LIMITED
- Ikuo SAWADA
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
FILM FORMATION APPARATUS
- Publication number 20120247390
- Publication date Oct 4, 2012
- TOKYO ELECTRON LIMITED
- Ikuo Sawada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Liquid Processing Apparatus, Liquid Processing Method, and Recordin...
- Publication number 20120160274
- Publication date Jun 28, 2012
- TOKYO ELECTRON LIMITED
- Shigeru Kasai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEAT TREATMENT APPARATUS
- Publication number 20120160833
- Publication date Jun 28, 2012
- TOKYO ELECTRON LIMITED
- Ikuo SAWADA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20110240222
- Publication date Oct 6, 2011
- TOKYO ELECTRON LIMITED
- Ikuo Sawada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20110174778
- Publication date Jul 21, 2011
- TOKYO ELECTRON LIMITED
- Ikuo Sawada
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
VAPORIZING UNIT, FILM FORMING APPARATUS, FILM FORMING METHOD, COMPU...
- Publication number 20100297346
- Publication date Nov 25, 2010
- TOKYO ELECTRON LIMITED
- Ikuo Sawada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM DEPOSITION APPARATUS AND FILM DEPOSITION METHOD
- Publication number 20100092666
- Publication date Apr 15, 2010
- TOKYO ELECTRON LIMITED
- Eisuke Morisaki
- C30 - CRYSTAL GROWTH
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND STORAGE M...
- Publication number 20100006543
- Publication date Jan 14, 2010
- TOKYO ELECTRON LIMITED
- Ikuo Sawada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing equipment
- Publication number 20090194236
- Publication date Aug 6, 2009
- Kyoto University
- Kouichi Ono
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Processing apparatus and process method
- Publication number 20090184109
- Publication date Jul 23, 2009
- TOKYO ELECTRON LIMITED
- Ikuo Sawada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Coating Apparatus and Coating Method
- Publication number 20090162547
- Publication date Jun 25, 2009
- Ikuo Sawada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Film Forming Method and Film Forming Apparatus
- Publication number 20080311313
- Publication date Dec 18, 2008
- TOKYO ELECTRON LIMITED
- Yasuo Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of treating a mask layer prior to performing an etching process
- Publication number 20080038926
- Publication date Feb 14, 2008
- TOKYO ELECTRON LIMITED
- Peter L.G. Ventzek
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Method of treating a mask layer prior to performing an etching process
- Publication number 20080029483
- Publication date Feb 7, 2008
- TOKYO ELECTRON LIMITED
- Peter L.G. Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of treating a mask layer prior to performing an etching process
- Publication number 20080032507
- Publication date Feb 7, 2008
- TOKYO ELECTRON LIMITED
- Peter L.G. Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing device and processing method
- Publication number 20060096531
- Publication date May 11, 2006
- TOKYO ELECTRON LIMITED
- Tadahiro Ishizaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Processing device and processing method
- Publication number 20050211167
- Publication date Sep 29, 2005
- TOKYO ELECTRON LIMITED
- Isao Gunji
- C30 - CRYSTAL GROWTH

Ikuo SAWADA

Person

Patents Grantslast 30 patents

Vaporizing unit, film forming apparatus, film forming method, compu...

Plasma processing apparatus, plasma processing method and storage m...

Liquid processing apparatus, liquid processing method, and recordin...

Conveyance device and substrate processing system

Film deposition apparatus and film deposition method

Plasma processing apparatus, plasma processing method and storage m...

Plasma processing apparatus and method

Method of treating a mask layer prior to performing an etching process

Method of treating a mask layer prior to performing an etching process

Method of treating a mask layer prior to performing an etching process

Method of controlling flow of molten steel in mold

Patents Applicationslast 30 patents

CONVEYANCE DEVICE AND SUBSTRATE PROCESSING SYSTEM

FILM FORMING DEVICE

VAPORIZING UNIT, FILM FORMING APPARATUS, FILM FORMING METHOD, COMPU...

Plasma Processing Apparatus, Plasma Processing Method and Storage M...

COATING APPARATUS AND COATING METHOD

FILM FORMATION APPARATUS

Liquid Processing Apparatus, Liquid Processing Method, and Recordin...

HEAT TREATMENT APPARATUS

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND METHOD

VAPORIZING UNIT, FILM FORMING APPARATUS, FILM FORMING METHOD, COMPU...

FILM DEPOSITION APPARATUS AND FILM DEPOSITION METHOD

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND STORAGE M...

Plasma processing equipment

Processing apparatus and process method

Coating Apparatus and Coating Method

Film Forming Method and Film Forming Apparatus

Method of treating a mask layer prior to performing an etching process

Method of treating a mask layer prior to performing an etching process

Method of treating a mask layer prior to performing an etching process

Processing device and processing method

Processing device and processing method